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1. 发明授权

US4666291A Light-exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4666291A
公开(公告)日：1987-05-19
申请号：US852729
申请日：1986-04-16
申请人： Motoya Taniguchi , Asahiro Kuni , Ryuichi Funatsu , Yukio Kembo , Akira Inagaki
发明人： Motoya Taniguchi , Asahiro Kuni , Ryuichi Funatsu , Yukio Kembo , Akira Inagaki
IPC分类号： H01L51/00 , G03F7/20 , G03F9/00 , G03B27/68
CPC分类号： G03F9/7053 , G03F7/703 , G03F7/707
摘要： A light-exposure apparatus which can keep uniform the gap between a mask and a wafer and reduce the density of arrangement of vertical movers adapted to deform the wafer to thereby reduce cost and weight of the apparatus. The apparatus has a thin plate deforming mechanism comprising a chuck platen for holding on its top surface the wafer, the bottom surface of the chuck platen being formed with imperforate slits patterned in the form of a grid composed of a plurality of triangular meshes so that the chuck platen may be deformed along bending lines near the triangular meshes, and a plurality of vertical movers for vertically deforming the individual triangular meshes so as to flatten or deform into a desired shape the wafer.
摘要翻译：能够使掩模和晶片之间的间隙保持均匀并且减小适于使晶片变形的垂直移动器的布置密度，从而降低装置的成本和重量的曝光装置。该装置具有薄板变形机构，其包括用于在其顶表面上保持晶片的卡盘台板，卡盘台板的底表面形成为由多个三角形网格构成的网格形式的无孔狭缝，使得卡盘台板可以沿着三角形网格附近的弯曲线变形，并且多个垂直移动器用于使各个三角形网格垂直变形，以使其平坦化或变形成所需形状的晶片。

2. 发明授权

US4777641A Method and apparatus for alignment 失效
标题翻译：对准方法和装置
公开(公告)号：US4777641A
公开(公告)日：1988-10-11
申请号：US918004
申请日：1986-10-14
申请人： Akira Inagaki , Yukio Kembo , Ryuichi Funatsu , Asahiro Kuni , Keiichi Okamoto , Yoshihiro Komeyama
发明人： Akira Inagaki , Yukio Kembo , Ryuichi Funatsu , Asahiro Kuni , Keiichi Okamoto , Yoshihiro Komeyama
IPC分类号： G02B7/00 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/67 , H01L21/68 , G21K5/00
CPC分类号： G03F9/70
摘要： A method and apparatus for alignment for use in X-ray exposure or the like wherein a mask is provided having a formation of an alignment pattern made up of at least one linear segment formed in a peripheral section of the mask and a wafer is provided having a formation of an alignment pattern formed in a same direction as the alignment pattern of the mask and made up of linear segments. An illuminating arrangement illuminates a light to the mask alignment pattern along a direction inclined to the alignment direction and the mask alignment pattern and the wafer alignment pattern are imaged and transformed into a video signal. An A/D converts the video signal into a digital signal and stores the digital signal in a memory. The digital video signal is read out from the memory and averaged in a mask alignment pattern by removing a shadow portion caused by the mask alignment pattern and additionally averaged in a wafer alignment pattern area with an averaged wafer alignment pattern signal and an averaged wafer alignment pattern signal being provided. Relative displacement between the mask and the wafer is detected from the averaged mask alignment pattern signal and the averaged wafer alignment pattern signal and the mask and wafer are aligned by moving at least one of the mask and wafer so that displacement between the mask and the wafer does not exist.
摘要翻译：一种用于X射线曝光等的对准用的方法和装置，其中提供具有由形成在掩模的周边部分中的至少一个线性部分构成的取向图案的掩模和晶片，其具有：形成与由掩模的对准图形相同的方向形成并由直线段构成的对准图案。照明装置沿着对准方向倾斜的方向照射到掩模对准图案，并且将掩模对准图案和晶片对准图案成像并变换为视频信号。 A / D将视频信号转换为数字信号，并将数字信号存储在存储器中。从存储器中读出数字视频信号，并通过去除由掩模对准图形引起的阴影部分并以平均的晶片对准图案信号和平均的晶片对准图案在晶片对准图案区域中平均化，以掩模对准图案平均化提供信号。从平均的掩模对准图案信号中检测掩模和晶片之间的相对位移，并且通过移动掩模和晶片中的至少一个来对准平均的晶片对准图案信号并且掩模和晶片，使得掩模和晶片之间的位移不存在。

3. 发明授权

US4708484A Projection alignment method and apparatus 失效
标题翻译：投影对准方法及装置
公开(公告)号：US4708484A
公开(公告)日：1987-11-24
申请号：US789778
申请日：1985-10-21
申请人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
发明人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
IPC分类号： G01R31/26 , G03F9/00 , H01L21/30 , G01B11/26
CPC分类号： G03F9/7023 , G03F9/7049 , G03F9/7076
摘要： The present invention relates, in a projection aligner wherein a mask and a wafer are held proximate to one another and wherein a circuit pattern depicted on the mask is transferred onto the wafer, to a method of detecting the respective positions of the mask and the wafer for the relative positioning between the mask and the wafer. To the end of dispensing with the withdrawal of a microscope objective in such a way that the objective of a microscope for detecting the mask and the wafer and projection light, for example, an X-ray, are prevented from interfering, thereby to achieve the enhancement of throughput and to permit the detection of the positions of the mask and the wafer even during projection, the present invention consists in that the objective of the microscope is inclined with respect to a perpendicular to the plane of the mask or the plane of the wafer being a plane to-be-detected, so as not to interfere with the projection light, for example, the X-ray, whereby the circuit pattern can be transferred while the relative positions of the mask and the wafer are being detected.
摘要翻译：本发明涉及一种投影对准器，其中掩模和晶片彼此靠近地保持，并且其中将掩模上描绘的电路图案转印到晶片上，以检测掩模和晶片的相应位置的方法用于掩模和晶片之间的相对定位。以这样的方式分配显微镜物镜的取出的结束，使得防止用于检测掩模和晶片的显微镜和例如X射线的投射光的目的被干扰，从而实现增加吞吐量并且即使在投影期间也能够检测掩模和晶片的位置，本发明的目的在于，显微镜的目的是相对于掩模的平面垂直于或平面的倾斜晶片是要被检测的平面，以便不干涉诸如X射线的投影光，由此可以在检测掩模和晶片的相对位置的同时传输电路图案。

4. 发明授权

US5121449A Information detecting system of scanning type 失效
标题翻译：扫描型信息检测系统
公开(公告)号：US5121449A
公开(公告)日：1992-06-09
申请号：US513911
申请日：1990-04-24
申请人： Masataka Shiba , Ryuichi Funatsu , Motoya Taniguchi , Minoru Tanaka , Akira Inagaki
发明人： Masataka Shiba , Ryuichi Funatsu , Motoya Taniguchi , Minoru Tanaka , Akira Inagaki
IPC分类号： G02F1/335 , G02B6/12 , G11B7/12
CPC分类号： G02B6/12004 , G11B7/1245
摘要： Disclosed is an information detecting system of scanning type which comprises a substrate formed with an optical waveguide layer, a laser oscillator emitting a laser beam, a SAW type beam deflecting device formed on the optical waveguide layer, a beam irradiating section irradiating a specimen with the laser beam derived from the optical waveguide layer, a controller controlling the frequency of a high-frequency voltage applied to the SAW type beam deflecting device so as to scan the specimen with the laser beam directed from the beam irradiating section, and a detecting section detecting the position and/or the intensity of the laser beam scanning the specimen with respect to the SAW control signal controlled by the controller.
摘要翻译：公开了一种扫描型信息检测系统，其包括形成有光波导层的基板，发射激光束的激光振荡器，形成在光波导层上的SAW型光束偏转装置，用该光波导层照射试样的光束照射部衍生自光波导层的激光束，控制施加到SAW型光束偏转装置的高频电压的频率的控制器，以便用从光束照射部分引导的激光束扫描样本;以及检测部分检测相对于由控制器控制的SAW控制信号扫描样本的激光束的位置和/或强度。

5. 发明授权

US4825453A X-ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：US4825453A
公开(公告)日：1989-04-25
申请号：US788861
申请日：1985-10-17
申请人： Yukio Kembo , Yoshihiro Komeyama , Minoru Ikeda , Akira Inagaki
发明人： Yukio Kembo , Yoshihiro Komeyama , Minoru Ikeda , Akira Inagaki
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30 , G21K5/00
CPC分类号： B82Y10/00 , G03F7/2039 , G03F7/70033 , G03F7/70841 , G03F7/70866
摘要： Disclosed is an X-ray exposure apparatus having a low attenuation chamber supplied with a gas absorbing little X-rays, the low attenuation chamber being interposed between an X-ray source and a mask so that X-rays transmitted through the low attenuation chamber are irradiated on the mask so as to transfer a mask pattern onto a resist on a wafer, the apparatus comprising detecting means for detecting the gas or components mixed in the gas in the low attenuation chamber, control means for controlling a quantity of supply of the gas into the low attenuation chamber in accordance with an output signal of the detecting means, and/or adjusting means for adjusting a quantity of exposure of said X-rays irradiated on the mask in accordance with an output signal of the detecting means.
摘要翻译：公开了一种具有低吸收少量X射线吸收气体的低衰减室的X射线曝光装置，该低衰减室插入在X射线源和掩模之间，使得透过低衰减室的X射线为照射在掩模上以将掩模图案转印到晶片上的抗蚀剂上，该装置包括用于检测混合在低衰减室中的气体中的气体或成分的检测装置，用于控制气体供应量的控制装置根据检测装置的输出信号进入低衰减室，和/或调节装置，用于根据检测装置的输出信号调节照射在掩模上的所述X射线的曝光量。

6. 发明授权

US5195070A Optical information processing apparatus and optical pickup therefor 失效
标题翻译：光信息处理装置及其光拾取装置
公开(公告)号：US5195070A
公开(公告)日：1993-03-16
申请号：US551794
申请日：1990-07-12
申请人： Masataka Shiba , Kazumi Kawamoto , Yasuo Hira , Akira Inagaki , Hidemi Sato , Kenchi Ito , Atsuko Fukushima , Ryuichi Funatsu
发明人： Masataka Shiba , Kazumi Kawamoto , Yasuo Hira , Akira Inagaki , Hidemi Sato , Kenchi Ito , Atsuko Fukushima , Ryuichi Funatsu
IPC分类号： G11B7/09 , G11B7/12 , G11B7/125 , G11B7/13 , G11B7/14
CPC分类号： G11B7/131 , G11B7/0903 , G11B7/1245 , G11B7/127 , G11B7/14
摘要： Using an optical pickup, recording/reproducing of information is performed by irradiating light beams to an optical recording medium to form light spots. The optical pickup includes means for generating plural light beams, an optical waveguide for guiding the plural light beams in a row into a flat space, and a light deflecting element for deflecting the light beams, which run in the optical waveguide, within a plane formed by a vector perpendicular to a plane of the optical waveguide and a directional vector of the light beams. The light deflecting element deflects the plural light spots, which are to be arranged in a row, in a direction perpendicular to the light spot row to perform micro seek.
摘要翻译：使用光学拾取器，通过将光束照射到光学记录介质以形成光斑来进行信息的记录/再现。光拾取器包括用于产生多个光束的装置，用于将多个光束一行地引导到平坦空间中的光波导和用于使在光波导中延伸的光束偏转在形成的平面内的光偏转元件通过垂直于光波导的平面的矢量和光束的方向矢量。光偏转元件在垂直于光点行的方向上偏转排列成一列的多个光点，以执行微寻迹。

7. 发明授权

US5134298A Beam control method and apparatus 失效
标题翻译：光束控制方法和装置
公开(公告)号：US5134298A
公开(公告)日：1992-07-28
申请号：US668099
申请日：1991-03-12
申请人： Akira Inagaki , Ryuichi Funatsu , Yasuhiko Nakayama
发明人： Akira Inagaki , Ryuichi Funatsu , Yasuhiko Nakayama
IPC分类号： H01L21/027 , G03F7/20 , H01J37/304
CPC分类号： H01J37/3045 , H01J2237/3175
摘要： A beam control method and apparatus for processing a specimen. A specimen is irradiated with a first beam capable of modifying a property of the specimen. Subsequently, a second beam, incapable of modifying a property of the specimen, irradiates the trace formed by the first beam to thereby identify the actual position of the trace by detecting a signal representing the actual position of the trace. On the basis of comparing actual position of the trace with a desired position of the trace, the latter is controlled.
摘要翻译：一种用于处理样品的束控制方法和装置。用能够改变样品的性质的第一光束照射样品。随后，不能修改样本的特性的第二光束照射由第一光束形成的迹线，从而通过检测表示迹线的实际位置的信号来识别迹线的实际位置。基于将轨迹的实际位置与轨迹的期望位置进行比较，后者被控制。

8. 发明授权

US08658102B2 Chemical analysis apparatus and chemical analysis method 有权
标题翻译：化学分析仪器和化学分析方法
公开(公告)号：US08658102B2
公开(公告)日：2014-02-25
申请号：US12785835
申请日：2010-05-24
申请人： Hajime Katou , Ryo Miyake , Hiroyasu Uchida , Katsuhiro Kambara , Takenori Okusa , Shigenori Watari , Yoichiro Suzuki , Tomonori Mimura , Miki Taki , Akira Inagaki
发明人： Hajime Katou , Ryo Miyake , Hiroyasu Uchida , Katsuhiro Kambara , Takenori Okusa , Shigenori Watari , Yoichiro Suzuki , Tomonori Mimura , Miki Taki , Akira Inagaki
IPC分类号： B06B1/06
CPC分类号： G01N35/1002 , B01F11/0283 , B01F2215/0037 , G01N35/025 , G01N2035/00554 , Y10S707/962 , Y10S707/99933 , Y10S707/99942 , Y10S707/99943 , Y10S707/99956
摘要： A chemical analysis apparatus comprising reaction containers containing therein a substance to be analyzed; an agitating mechanism spaced from the substance to be analyzed and agitating said substance to be analyzed with a liquid in said reaction container; and, a measuring portion for measuring physical properties of the substance to be analyzed, said agitating mechanism having a sound supply portion supplying sound waves to the substance to be analyzed, wherein said sound supply portion comprises a mechanism changing, in time, intensity of ultrasonic waves to be irradiated so as to apply pulsation to a swirl flow in the reaction container.
摘要翻译：一种化学分析装置，包括含有待分析物质的反应容器; 与待分析物质间隔开的搅拌机构，并在所述反应容器中用液体搅拌待分析物质; 以及用于测量被分析物质的物理性质的测量部分，所述搅拌机构具有向待分析物质供应声波的声音供给部分，其中所述声音供应部分包括时间上改变超声波强度的机构要被照射的波浪以便对反应容器中的涡流施加脉动。

9. 发明授权

US07492521B2 Optical sheet, backlight unit, electro-optical device, electronic apparatus and method for manufacturing the optical sheet 失效
标题翻译：光学片，背光单元，电光装置，电子设备以及光学片的制造方法
公开(公告)号：US07492521B2
公开(公告)日：2009-02-17
申请号：US11422205
申请日：2006-06-05
申请人： Hironori Hasei , Akira Inagaki
发明人： Hironori Hasei , Akira Inagaki
IPC分类号： G02B27/10
CPC分类号： G02B3/0031 , G02B3/0056
摘要： A method for manufacturing an optical sheet, comprises: (a) discharging a first lens material in liquid form being a material for a micro lens on a sheet in a dot array; (b) semi-curing the first lens material arranged on the sheet; (c) discharging a second lens material in liquid form being a material for the micro lens towards gap portions between the dots of the first lens material; and (d) forming a micro lens array by full curing the first and the second lens materials.
摘要翻译：一种制造光学片的方法，包括：（a）将作为微透镜材料的液体形式的第一透镜材料排放在点阵列的片材上; （b）半固化布置在片材上的第一透镜材料; （c）将液晶形式的第二透镜材料排出为用于所述微透镜的材料朝向所述第一透镜材料的所述点之间的间隙部分; 和（d）通过完全固化第一和第二透镜材料形成微透镜阵列。

10. 发明授权

US5247329A Projection type exposure method and apparatus 失效
标题翻译：投影式曝光方法及装置
公开(公告)号：US5247329A
公开(公告)日：1993-09-21
申请号：US813002
申请日：1991-12-24
申请人： Yoshitada Oshida , Toshiei Kurosaki , Akira Inagaki , Yoshihiko Aiba
发明人： Yoshitada Oshida , Toshiei Kurosaki , Akira Inagaki , Yoshihiko Aiba
IPC分类号： G03F1/44 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7023 , G03F7/70241
摘要： A projection type exposure apparatus and method comprising an exposure illumination light source, an exposure illumination system, a mask or reticle on which an original pattern to be projected on the exposed matter is drawn, an optical projection system, a stage for retaining the exposed matter and a mechanism for finely moving the stage along the exposure optical axis. The apparatus is provided with an exposure detection pattern area on the mask, detection illumination means for projecting on the exposure detection pattern area a light ray which is the same or almost the same in wavelength as exposure light having a desired directivity, exposure detection means for detecting the transmitted or reflected light diffracted by 1 degree after the light carrying the image formed on the exposed matter by the light passed through the above-noted optical projection system after projection by the detection illumination means onto the exposure pattern and then diffracted goes in reverse through the above-noted optical projection system and forms an image again on the exposure pattern on the above-noted mask and a control circuit for driving and controlling the above-noted fine movement mechanism by using the signal obtained by the exposure detection means.
摘要翻译：一种投影式曝光装置和方法，包括曝光照明光源，曝光照明系统，掩模或掩模版，其上将要投射在暴露物体上的原始图案被拉出，光学投影系统，用于保持暴露物质的台以及用于沿着曝光光轴精细地移动台的机构。该设备在掩模上设置曝光检测图案区域，检测照明装置用于在曝光检测图案区域上投射与具有所需方向性的曝光光相同或几乎相同的波长的光线，曝光检测装置在通过检测照明装置投影到曝光图案上之后，在通过上述光学投影系统的光在携带在曝光物体上形成的图像的光之后，将被发射或反射的光衍射1度，然后衍射反向通过上述光学投影系统并在上述掩模上的曝光图案上再次形成图像，以及通过使用由曝光检测装置获得的信号来驱动和控制上述微动机构的控制电路。

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