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    • 1. 发明授权
    • Method of manufacturing a capacitor coupled contactless imager with high
resolution and wide dynamic range
    • 制造具有高分辨率和宽动态范围的电容耦合非接触式成像仪的方法
    • US5576237A
    • 1996-11-19
    • US543960
    • 1995-10-17
    • Albert BergemontCarver A. MeadMin-hwa ChiHosam Haggag
    • Albert BergemontCarver A. MeadMin-hwa ChiHosam Haggag
    • H01L27/105H01L27/146H01L31/11H01L21/8222
    • H01L31/1105H01L27/105Y10S148/124
    • A capacitor coupled contactless imager structure and a method of manufacturing the structure results in a phototransistor that structure includes an N-type collector region formed in P-type semiconductor material. A P-type base region is formed in the collector region. An n-doped polysilicon emitter contact is formed in contact with the surface of the P-type base region such that an n+ epitaxial region is formed in the base region as the emitter of the phototransistor. Silicon dioxide separates the poly1 emitter content and exposed surfaces at the base region from a layer of poly2 about 3000-4000 .ANG. thick that partially covers the base region; the gates of the CMOS peripheral devices are also poly2. The poly2 over the base region serves as a base coupling capacitor and a row conductor for the imager structure. The thickness of the poly2 capacitor plate allows it to be doped utilizing conventional techniques and silicided to improve the RC constant.
    • 电容器耦合的非接触式成像器结构和制造该结构的方法产生一种光电晶体管,其结构包括形成在P型半导体材料中的N型集电极区域。 在集电区域形成P型基极区域。 形成与P型基极区域的表面接触的n掺杂多晶硅发射极触点,使得在基极区域中形成n +外延区域作为光电晶体管的发射极。 二氧化硅将poly1发射体含量和基底区域的暴露表面与部分覆盖基极区域的约3000-4000厚的poly2层分离; CMOS外围器件的栅极也是poly2。 基极区域上的poly2用作成像器结构的基极耦合电容器和行导体。 poly2电容器板的厚度允许使用常规技术进行掺杂,并且硅化以改善RC常数。
    • 5. 发明授权
    • Capacitor coupled contactless imager with high resolution and wide
dynamic range
    • 电容耦合非接触式成像仪具有高分辨率和宽动态范围
    • US5552619A
    • 1996-09-03
    • US436181
    • 1995-05-10
    • Albert BergemontCarver A. MeadMin-hwa ChiHosam Haggag
    • Albert BergemontCarver A. MeadMin-hwa ChiHosam Haggag
    • H01L27/105H01L27/146H01L31/11H01L31/06
    • H01L31/1105H01L27/105Y10S148/124
    • A capacitor coupled contactless imager structure and a method of manufacturing the structure results is a phototransistor that structure includes an N-type collector region formed in P-type semiconductor material. A P-type base region is formed in the collector region. An n-doped polysilicon emitter contact is formed in contact with the surface to the P-type base region such that an n+ epitaxial region is formed in the base region as the emitter of the phototransistor. Silicon dioxide separates the poly1 emitter contact and exposed surfaces at the base region from a layer of poly2 about 3000-4000 .ANG. thick that partially covers the base region; the gates of the CMOS peripheral devices are also poly2. The poly2 over the base region serves as a base coupling capacitor and a row conductor for the imager structure. The thickness of the poly2 capacitor plate allows it to be doped utilizing conventional techniques and silicided to improve the RC constant.
    • 电容耦合非接触式成像器结构及其结构制造方法是一种光电晶体管,其结构包括形成在P型半导体材料中的N型集电极区域。 在集电区域形成P型基极区域。 形成与P型基极区域的表面接触的n掺杂多晶硅发射极触点,使得在基极区域中形成n +外延区域作为光电晶体管的发射极。 二氧化硅将poly1发射极接触和暴露在基部区域的表面与部分覆盖基极区域的约3000-4000厚的poly2层分离; CMOS外围器件的栅极也是poly2。 基极区域上的poly2用作成像器结构的基极耦合电容器和行导体。 poly2电容器板的厚度允许使用常规技术进行掺杂,并且硅化以改善RC常数。
    • 6. 发明授权
    • Capacitor-coupled bipolar active pixel sensor with integrated electronic
shutter
    • 具有集成电子快门的电容耦合双极型有源像素传感器
    • US5932873A
    • 1999-08-03
    • US932272
    • 1997-09-17
    • Albert BergemontMin-Hwa ChiHosam HaggagCarver Mead
    • Albert BergemontMin-Hwa ChiHosam HaggagCarver Mead
    • H01L27/146H01L31/11H01L21/00
    • H01L31/1105H01L27/14681
    • A capacitor coupled bipolar phototransistor having an integrated electronic shutter for reducing the overflow and blooming problems associated with the imaging of strong images. Overflow control and an anti-blooming mechanism are obtained by use of a second emitter (the "shutter") which is used to remove excess image generated charge. This prevents the base-emitter junction potential from becoming forward biased during image integration when the phototransistor is exposed to a strong image. The shutter is biased slightly lower than the first emitter of the phototransistor so that the base-shutter junction is forward biased sooner than the base-emitter junction when the imaging element is exposed to a strong image. The overflow current of the generated holes is then drained to the shutter, rather than into the emitter where it would produce noise on the column sense line.
    • 具有集成电子快门的电容器耦合双极光电晶体管,用于减少与强图像成像有关的溢出和开花问题。 通过使用用于去除多余图像产生的电荷的第二发射器(“快门”)来获得溢流控制和防喷射机制。 这样就可以防止在光电晶体管暴露于强影像时图像积分期间基极 - 发射极结电位变得正向偏置。 快门被偏置成比光电晶体管的第一发射极略低,以便当成像元件暴露于强影像时,基极 - 快门结点比基极 - 发射极结更早地向前偏置。 所产生的孔的溢流电流然后被排放到快门,而不是进入发射器,在那里它会在列感测线上产生噪声。
    • 8. 发明授权
    • Memory array of floating gate-based non-volatile memory cells
    • 基于浮动栅极的非易失性存储单元的存储器阵列
    • US07903465B2
    • 2011-03-08
    • US11861111
    • 2007-09-25
    • Hosam HaggagAlexander KalnitskyEdgardo LaberMichael D. ChurchYun Yue
    • Hosam HaggagAlexander KalnitskyEdgardo LaberMichael D. ChurchYun Yue
    • G11C16/06G11C16/10G11C16/12
    • G11C16/0433
    • A memory array comprises a plurality of memory cells organized in a matrix of rows and columns. Each of the memory cells includes a high voltage access transistor, a floating gate memory transistor electrically connected to the access transistor, and a coupling capacitor electrically connected to the memory transistor. A first set of word lines are each electrically connected to the capacitor in each of the memory cells in a respective row. A second set of word lines are each electrically connected to the access transistor in each of the memory cells in a respective row. A first set of bit lines are each electrically connected to the access transistor in each of the memory cells in a respective column. A second set of bit lines are each electrically connected to the memory transistor in each of the memory cells in a respective column. Various combinations of voltages can be applied to the word lines and bit lines in operations to program, erase, read, or inhibit a logic state stored by the memory transistor in one or more of the memory cells.
    • 存储器阵列包括以行和列的矩阵组织的多个存储器单元。 每个存储单元包括高电压存取晶体管,电连接到存取晶体管的浮动栅极存储晶体管和电连接到存储晶体管的耦合电容器。 第一组字线分别电连接到相应行中的每个存储器单元中的电容器。 第二组字线各自电连接到相应行中的每个存储单元中的存取晶体管。 第一组位线分别电连接到相应列中每个存储单元中的存取晶体管。 第二组位线分别电连接到相应列中每个存储器单元中的存储晶体管。 在操作中可以对字线和位线施加电压的各种组合,以对存储器晶体管存储在一个或多个存储器单元中的逻辑状态进行编程,擦除,读取或禁止。
    • 9. 发明授权
    • Memory array of floating gate-based non-volatile memory cells
    • 基于浮动栅极的非易失性存储单元的存储器阵列
    • US08325522B2
    • 2012-12-04
    • US13012361
    • 2011-01-24
    • Hosam HaggagAlexander KalnitskyEdgardo LaberMichael D. ChurchYun Yue
    • Hosam HaggagAlexander KalnitskyEdgardo LaberMichael D. ChurchYun Yue
    • G11C16/04G11C16/06
    • G11C16/0433
    • A memory array comprises a plurality of memory cells organized in a matrix of rows and columns. Each of the memory cells includes a high voltage access transistor, a floating gate memory transistor electrically connected to the access transistor, and a coupling capacitor electrically connected to the memory transistor. A first set of word lines are each electrically connected to the capacitor in each of the memory cells in a respective row. A second set of word lines are each electrically connected to the access transistor in each of the memory cells in a respective row. A first set of bit lines are each electrically connected to the access transistor in each of the memory cells in a respective column. A second set of bit lines are each electrically connected to the memory transistor in each of the memory cells in a respective column. Various combinations of voltages can be applied to the word lines and bit lines in operations to program, erase, read, or inhibit a logic state stored by the memory transistor in one or more of the memory cells.
    • 存储器阵列包括以行和列的矩阵组织的多个存储器单元。 每个存储单元包括高电压存取晶体管,电连接到存取晶体管的浮动栅极存储晶体管和电连接到存储晶体管的耦合电容器。 第一组字线分别电连接到相应行中的每个存储器单元中的电容器。 第二组字线各自电连接到相应行中的每个存储单元中的存取晶体管。 第一组位线分别电连接到相应列中每个存储单元中的存取晶体管。 第二组位线分别电连接到相应列中每个存储器单元中的存储晶体管。 在操作中可以对字线和位线施加电压的各种组合,以对存储器晶体管存储在一个或多个存储器单元中的逻辑状态进行编程,擦除,读取或禁止。
    • 10. 发明申请
    • MEMORY ARRAY OF FLOATING GATE-BASED NON-VOLATILE MEMORY CELLS
    • 基于盖帽的不挥发性记忆细胞的记忆阵列
    • US20080266959A1
    • 2008-10-30
    • US11861111
    • 2007-09-25
    • Hosam HaggagAlexander KalnitskyEdgardo LaberMichael D. ChurchYun Yue
    • Hosam HaggagAlexander KalnitskyEdgardo LaberMichael D. ChurchYun Yue
    • G11C16/04
    • G11C16/0433
    • A memory array comprises a plurality of memory cells organized in a matrix of rows and columns. Each of the memory cells includes a high voltage access transistor, a floating gate memory transistor electrically connected to the access transistor, and a coupling capacitor electrically connected to the memory transistor. A first set of word lines are each electrically connected to the capacitor in each of the memory cells in a respective row. A second set of word lines are each electrically connected to the access transistor in each of the memory cells in a respective row. A first set of bit lines are each electrically connected to the access transistor in each of the memory cells in a respective column. A second set of bit lines are each electrically connected to the memory transistor in each of the memory cells in a respective column. Various combinations of voltages can be applied to the word lines and bit lines in operations to program, erase, read, or inhibit a logic state stored by the memory transistor in one or more of the memory cells.
    • 存储器阵列包括以行和列的矩阵组织的多个存储器单元。 每个存储单元包括高电压存取晶体管,电连接到存取晶体管的浮动栅极存储晶体管和电连接到存储晶体管的耦合电容器。 第一组字线分别电连接到相应行中的每个存储器单元中的电容器。 第二组字线各自电连接到相应行中的每个存储单元中的存取晶体管。 第一组位线分别电连接到相应列中每个存储单元中的存取晶体管。 第二组位线分别电连接到相应列中每个存储器单元中的存储晶体管。 在操作中可以对字线和位线施加电压的各种组合,以对存储器晶体管存储在一个或多个存储器单元中的逻辑状态进行编程,擦除,读取或禁止。