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    • 1. 发明授权
    • Method of manufacturing a capacitor coupled contactless imager with high
resolution and wide dynamic range
    • 制造具有高分辨率和宽动态范围的电容耦合非接触式成像仪的方法
    • US5576237A
    • 1996-11-19
    • US543960
    • 1995-10-17
    • Albert BergemontCarver A. MeadMin-hwa ChiHosam Haggag
    • Albert BergemontCarver A. MeadMin-hwa ChiHosam Haggag
    • H01L27/105H01L27/146H01L31/11H01L21/8222
    • H01L31/1105H01L27/105Y10S148/124
    • A capacitor coupled contactless imager structure and a method of manufacturing the structure results in a phototransistor that structure includes an N-type collector region formed in P-type semiconductor material. A P-type base region is formed in the collector region. An n-doped polysilicon emitter contact is formed in contact with the surface of the P-type base region such that an n+ epitaxial region is formed in the base region as the emitter of the phototransistor. Silicon dioxide separates the poly1 emitter content and exposed surfaces at the base region from a layer of poly2 about 3000-4000 .ANG. thick that partially covers the base region; the gates of the CMOS peripheral devices are also poly2. The poly2 over the base region serves as a base coupling capacitor and a row conductor for the imager structure. The thickness of the poly2 capacitor plate allows it to be doped utilizing conventional techniques and silicided to improve the RC constant.
    • 电容器耦合的非接触式成像器结构和制造该结构的方法产生一种光电晶体管,其结构包括形成在P型半导体材料中的N型集电极区域。 在集电区域形成P型基极区域。 形成与P型基极区域的表面接触的n掺杂多晶硅发射极触点,使得在基极区域中形成n +外延区域作为光电晶体管的发射极。 二氧化硅将poly1发射体含量和基底区域的暴露表面与部分覆盖基极区域的约3000-4000厚的poly2层分离; CMOS外围器件的栅极也是poly2。 基极区域上的poly2用作成像器结构的基极耦合电容器和行导体。 poly2电容器板的厚度允许使用常规技术进行掺杂,并且硅化以改善RC常数。
    • 4. 发明授权
    • Capacitor coupled contactless imager with high resolution and wide
dynamic range
    • 电容耦合非接触式成像仪具有高分辨率和宽动态范围
    • US5552619A
    • 1996-09-03
    • US436181
    • 1995-05-10
    • Albert BergemontCarver A. MeadMin-hwa ChiHosam Haggag
    • Albert BergemontCarver A. MeadMin-hwa ChiHosam Haggag
    • H01L27/105H01L27/146H01L31/11H01L31/06
    • H01L31/1105H01L27/105Y10S148/124
    • A capacitor coupled contactless imager structure and a method of manufacturing the structure results is a phototransistor that structure includes an N-type collector region formed in P-type semiconductor material. A P-type base region is formed in the collector region. An n-doped polysilicon emitter contact is formed in contact with the surface to the P-type base region such that an n+ epitaxial region is formed in the base region as the emitter of the phototransistor. Silicon dioxide separates the poly1 emitter contact and exposed surfaces at the base region from a layer of poly2 about 3000-4000 .ANG. thick that partially covers the base region; the gates of the CMOS peripheral devices are also poly2. The poly2 over the base region serves as a base coupling capacitor and a row conductor for the imager structure. The thickness of the poly2 capacitor plate allows it to be doped utilizing conventional techniques and silicided to improve the RC constant.
    • 电容耦合非接触式成像器结构及其结构制造方法是一种光电晶体管,其结构包括形成在P型半导体材料中的N型集电极区域。 在集电区域形成P型基极区域。 形成与P型基极区域的表面接触的n掺杂多晶硅发射极触点,使得在基极区域中形成n +外延区域作为光电晶体管的发射极。 二氧化硅将poly1发射极接触和暴露在基部区域的表面与部分覆盖基极区域的约3000-4000厚的poly2层分离; CMOS外围器件的栅极也是poly2。 基极区域上的poly2用作成像器结构的基极耦合电容器和行导体。 poly2电容器板的厚度允许使用常规技术进行掺杂,并且硅化以改善RC常数。
    • 7. 发明授权
    • pMOS EEPROM non-volatile data storage
    • pMOS EEPROM非易失性数据存储
    • US6144581A
    • 2000-11-07
    • US201327
    • 1998-11-30
    • Christopher J. DiorioCarver A. Mead
    • Christopher J. DiorioCarver A. Mead
    • G11C16/04
    • G11C16/0416G11C16/10
    • A pMOS EEPROM cell includes a source, drain, channel, control gate and well contact. The device is a fully functional single element p-type floating gate MOSFET. A floating gate overlaps the well contact and completely surrounds the drain and source implants. The pMOS cell is written to by means of hot-electron injection, using an intrinsic feedback mechanism to write analog values. Hot electrons are generated in the channel by means of hole impact ionization at the transistor's drain. The pMOS cell is erased by Fowler-Nordheim tunneling. The tunneling voltage is applied only to the well to tunnel electrons from the floating gate. The well-source and well-drain junctions are protected from breakdown by means of guard rings.
    • pMOS EEPROM单元包括源极,漏极,通道,控制栅极和阱接触。 该器件是一个功能齐全的单元件p型浮栅MOSFET。 浮动栅极与阱接触重叠,并完全围绕漏极和源植入。 通过热电子注入将pMOS单元写入,使用内在反馈机制来写入模拟值。 通过在晶体管漏极处的空穴冲击电离在通道中产生热电子。 Fowler-Nordheim隧道消除了pMOS细胞。 隧道电压仅施加到阱以从浮动栅极隧道电子。 井源井漏井路口通过护环免受破坏。
    • 8. 发明授权
    • Hearing aid device incorporating signal processing techniques
    • 含有信号处理技术的助听器
    • US06072885A
    • 2000-06-06
    • US697412
    • 1996-08-22
    • Thomas G. Stockham, Jr.Douglas M. ChabriesCarver A. Mead
    • Thomas G. Stockham, Jr.Douglas M. ChabriesCarver A. Mead
    • H04R1/26H04R25/00
    • H04R25/356H04R1/26H04R25/453
    • A hearing compensation system for the hearing impaired comprises an input transducer for converting acoustical information at an input to electrical signals at an output, an output transducer for converting electrical signals at an input to acoustical information at an output, a plurality of bandpass filters, each bandpass filter having an input connected to the output of said input transducer, a plurality of AGC circuits, each individual AGC circuit associated with a different one of the bandpass filters and having an input connected to the output of its associated bandpass filter and an output connected to the input of the output transducer. The bandpass filters and AGC circuits may be divided into two processing channels, one for low frequencies and one for high frequencies and may drive separate audio transducers, one configured for maximum efficiency at low frequencies and one configured for maximum efficiency at high frequencies.
    • 用于听力受损的听力补偿系统包括:输入变换器,用于将输入处的声学信息转换成输出端的电信号;输出换能器,用于将输入处的电信号转换成输出处的声学信息,多个带通滤波器,每个 带通滤波器,具有连接到所述输入换能器的输出端的输入,多个AGC电路,每个单独的AGC电路与不同的带通滤波器相关联,并且具有连接到其相关带通滤波器的输出的输入端和连接的输出端 到输出传感器的输入。 带通滤波器和AGC电路可以分为两个处理通道,一个用于低频,一个用于高频,并且可以驱动单独的音频换能器,一个配置为在低频下实现最大效率,一个配置为在高频下实现最大效率。
    • 10. 发明授权
    • Paintbrush stylus for capacitive touch sensor pad
    • 用于电容式触摸传感器垫的画笔触控笔
    • US5488204A
    • 1996-01-30
    • US324438
    • 1994-10-17
    • Carver A. MeadRalph WolfTimothy P. Allen
    • Carver A. MeadRalph WolfTimothy P. Allen
    • G06F3/023G06F3/033G06F3/041G06F3/044G06F3/048G08C21/00
    • G06F3/04855G06F3/041G06F3/044G06F3/0488G06F3/04883G06F3/04892G06K9/00335
    • A proximity sensor system includes a touch-sensor pad with a sensor matrix array having a characteristic capacitance on horizontal and vertical conductors connected to sensor pads. The capacitance changes as a function of the proximity of an object or objects to the sensor matrix. The change in capacitance of each node in both the X and Y directions of the matrix due to the approach of an object is converted to a set of voltages in the X and Y directions. These voltages are processed by circuitry to develop electrical signals representative of the centroid of the profile of the object, i.e, its position in the X and Y dimensions. Noise reduction and background level setting techniques inherently available in the architecture are employed. A conductive paintbrush-type stylus is used to produce paint-like strokes on a display associated with the touch-sensor pad.
    • 接近传感器系统包括具有传感器矩阵阵列的触摸传感器焊盘,该传感器阵列在连接到传感器焊盘的水平和垂直导体上具有特征电容。 电容根据物体或传感器矩阵的接近度而变化。 由于物体的接近,矩阵的X和Y方向上的每个节点的电容的变化被转换成在X和Y方向上的一组电压。 这些电压由电路处理以产生表示物体轮廓的质心的电信号,即其在X和Y尺寸中的位置。 采用本构架中固有可用的降噪和背景设置技术。 导电画笔型触笔用于在与触摸传感器垫相关联的显示器上产生油漆状笔触。