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    • 3. 发明授权
    • Laser wavelength and bandwidth monitor
    • US06597462B2
    • 2003-07-22
    • US09791496
    • 2001-02-22
    • Matthias KramerMarcus Serwazi
    • Matthias KramerMarcus Serwazi
    • G01B902
    • G01J9/0246H01S3/1305H01S3/1392
    • A first method for determining the relative wavelength shift of a laser beam away from a known reference line, such as an absorption line of a gas in an opto-galvanic cell or a reference line of reference laser uses a monitor etalon. The FSR of the etalon used to calculate the wavelength shift is determined based on a calculated gap spacing between the etalon plates, or etalon constant. The gap spacing is determined based on a fit to measured values of wavelength deviations of the FSR as a function of the relative wavelength shift. The FSR used to calculate the wavelength shift is also based on the wavelength shift itself. A second method for measuring the absolute bandwidth and spectral purity of a tunable laser beam uses an opto-galvanic or absorption cell. The laser beam is directed to interact with a gas in the cell that undergoes an optical transition within the spectral tuning range of the laser. The beam is tuned through the optical transition line of the gas in the cell, and the opto-galvanic or absorption spectrum of the line is measured. The measured bandwidth and spectral purity are convoluted or broadened by the bandwidth of the laser beam used in the measurement. The bandwidth and spectral purity of the laser beam are determined based on the bandwidth and spectral purity, respectively, of the measured spectrum and a known correspondence between the measured convoluted bandwidth and spectral purity and the bandwidth and spectral purity, respectively, of the laser beam.
    • 6. 发明授权
    • Excimer laser with line narrowing
    • 准分子激光线变窄
    • US06476987B1
    • 2002-11-05
    • US09629256
    • 2000-07-31
    • Juergen KleinschmidtPeter HeistMatthias Kramer
    • Juergen KleinschmidtPeter HeistMatthias Kramer
    • G02B504
    • G02B5/04H01S3/0811H01S3/223H01S3/225
    • A line narrowing unit for use within an excimer or molecular fluorine laser resonator includes a dispersive prism having antireflection coatings on entrance and exit surfaces. Entrance and exit angles and an apex angle are increased to enhance the dispersive power of the prism, while the antireflective coatings limit reflective losses. Preferably, a laser beam makes a non-symmetric pass through said prism. The apex angle is preferably greater than 65°, or even 75°, and the angle of incidence and the exit angle of the beam are each preferably greater than 65°. A beam expanding prism configured for enhanced beam expansion has an apex angle between within a range of 37.5° and 42.5°, and a beam incidence angle at the entrance surface of more than 65°, and an antireflection coating on preferably both the entrance and exit surfaces.
    • 在准分子或分子氟激光谐振器内使用的线窄化单元包括在入射和出射表面上具有抗反射涂层的分散棱镜。 增加出入角和顶角以增强棱镜的分散力,而抗反射涂层则限制了反射损耗。 优选地,激光束使不对称通过所述棱镜。 顶角优选大于65°或甚至75°,并且梁的入射角和出射角各自优选地大于65°。 配置用于增强光束膨胀的光束扩张棱镜具有在37.5°和42.5°之间的范围内的顶角和大于65°的入射面处的光束入射角,并且优选地,入射和出射两者的抗反射涂层 表面。