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    • 2. 发明授权
    • Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser
    • 用于补偿由准分子激光器外部的测量系统检测的光束特性漂移的方法和装置
    • US06822977B1
    • 2004-11-23
    • US10165767
    • 2002-06-06
    • Uwe StammHans-Stephan AlbrechtGünter Nowinski
    • Uwe StammHans-Stephan AlbrechtGünter Nowinski
    • H01S310
    • H01S3/225H01S3/1305H01S3/1312H01S3/134
    • A lithography laser system for incorporating with a semiconductor processing system includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber and connected with a discharge circuit for energizing the laser gas, a resonator including the discharge chamber for generating a laser beam, and a processor. The processor runs an energy control algorithm and sends a signal to the discharge circuit based on said algorithm to apply electrical pulses to the electrodes so that the laser beam exiting the laser system has a specified first energy distribution over a group of pulses. The energy control algorithm is based upon a second energy distribution previously determined of a substantially same pattern of pulses as the group of pulses having the first energy distribution. The second energy distribution is determined for the laser beam at a location after passing the beam through beam shaping optical elements of the semiconductor processing system while a value of the energy of the laser beam exiting the laser system is maintained at an approximately constant first energy.
    • 一种用于与半导体处理系统结合的光刻激光系统包括:填充有分子氟和缓冲气体的激光气体的放电室,放电室内的多个电极,并与用于激励激光气体的放电电路连接,包括 用于产生激光束的放电室和处理器。 处理器运行能量控制算法,并且基于所述算法将信号发送到放电电路,以将电脉冲施加到电极,使得离开激光系统的激光束在一组脉冲上具有规定的第一能量分布。 能量控制算法基于先前确定的具有与具有第一能量分布的脉冲群基本相同的脉冲模式的第二能量分布。 在将光束通过半导体处理系统的光束整形光学元件之后的位置处的激光束确定第二能量分布,同时离开激光系统的激光束的能量的值保持在大致恒定的第一能量。