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1. 发明授权

US4810473A Molecular beam epitaxy apparatus 失效
标题翻译：分子束外延装置
公开(公告)号：US4810473A
公开(公告)日：1989-03-07
申请号：US127622
申请日：1987-11-30
申请人： Naoyuki Tamura , Hideaki Kamohara , Norio Kanai , Kazuaki Ichihashi
发明人： Naoyuki Tamura , Hideaki Kamohara , Norio Kanai , Kazuaki Ichihashi
IPC分类号： H01L21/203 , C30B23/00 , C30B23/02 , C30B35/00 , H01L21/677
CPC分类号： H01L21/67766 , C30B23/02 , C30B35/005 , H01L21/67742 , H01L21/67745
摘要： In a molecular beam epitaxy apparatus in accordance with the present invention, transfer means for transferring substrates, which have been transferred from an introduction chamber, to a growth chamber and for transferring the substrates after the growth of a film, which have been transferred from the growth chamber, to a discharge chamber consists of a rotary disc which supports thereon a plurality of substrates and transfers them to the growth chamber and then to the discharge chamber, and all of the introduction chamber, the growth chamber and the discharge chamber are disposed at predetermined positions, respectively, so that the molecular beam crystal growth can be effected in a clean room which is separated from a maintenance room.
摘要翻译：在根据本发明的分子束外延装置中，用于将已经从导入室转移的基板转移到生长室并在膜生长之后转移基板的转印装置生长室到排出室由支撑在其上的多个基板的旋转盘组成，并将它们传送到生长室，然后传送到排出室，并且所有的引入室，生长室和排出室都设置在分子束晶体生长可以在与维护室分离的洁净室中进行。

2. 发明授权

US4932357A Vacuum apparatus 失效
标题翻译：真空装置
公开(公告)号：US4932357A
公开(公告)日：1990-06-12
申请号：US181703
申请日：1988-04-14
申请人： Naoyuki Tamura , Norio Kanai
发明人： Naoyuki Tamura , Norio Kanai
IPC分类号： B01J3/02 , H01L21/00
CPC分类号： H01L21/67253 , Y10S414/141
摘要： A vacuum apparatus comprising a substrate setting disc which is arranged in a conveyance chamber and on which substrates are placed, a drive system which drives and rotates the disc, a cam which is fixed to the disc, switching means to switch signal circuits through the cam, calculation means to receive digital signals generated by the switching operations of the switching means, signals from the drive system and signals from respective processing devices so as to execute calculations, a memory which registers calculated results, and a display unit which displays the registered contents on a screen, rotational positions of the disc being loaded so as to control the hysteretic aspects of the individual substrates within the conveyance chamber with the substrates at the respective positions and addresses held in correspondence.

3. 发明授权

US4824309A Vacuum processing unit and apparatus 失效
标题翻译：真空处理单元和设备
公开(公告)号：US4824309A
公开(公告)日：1989-04-25
申请号：US904202
申请日：1986-09-08
申请人： Yutaka Kakehi , Norio Nakazato , Yoshimasa Fukushima , Fumio Shibata , Tsunehiko Tsubone , Norio Kanai
发明人： Yutaka Kakehi , Norio Nakazato , Yoshimasa Fukushima , Fumio Shibata , Tsunehiko Tsubone , Norio Kanai
IPC分类号： H01L21/677 , B01J3/00 , B01J3/03 , B23Q41/02 , B65G49/07 , C23C14/54 , C23C14/56 , H01J37/18 , H01L21/00 , H01L21/02 , H01L21/67 , B65G65/00
CPC分类号： C23C14/541 , B01J3/006 , B01J3/03 , C23C14/568 , H01J37/185 , H01L21/02 , Y10S414/139
摘要： A vacuum processing unit and apparatus comprises a buffer chamber that can be evacuated, a processing chamber that can be communicated with said buffer chamber a first sample carrier installed in said buffer chamber, a vacuum opening/closing device provided in the buffer chamber to correspond to the first sample carrier, a vacuum prechamber provided for the buffer chamber via the vacuum opening/closing device, a second sample carrier which carries the sample between the vacuum prechamber and the first sample carrier via the vacuum opening/closing device, and a third sample carrier which carries the sample between said first sample carrier and the processing chamber. The vacuum processing units can be connected in groups via vacuum opening/closing devices provided for the buffer chambers in locations corresponding to the end of the first sample carriers therein. The number of connected processing chambers can be freely changed to meet a change in the process or the manufacturing line.
摘要翻译：真空处理单元和装置包括可以抽真空的缓冲室，可与所述缓冲室连通的处理室，安装在所述缓冲室中的第一样品载体，设置在所述缓冲室中的真空开闭装置，以对应于第一样品载体，经由真空开闭装置为缓冲室设置的真空预处理机，第二样品载体，其通过真空开闭装置将样品携带在真空预处理器和第一样品载体之间;第三样品载体，其携带在所述第一样品载体和处理室之间的样品。真空处理单元可以通过在与第一样品载体的端部对应的位置处设置用于缓冲室的真空开/关装置分组连接。连接的处理室的数量可以自由地改变以满足过程或生产线的变化。

4. 发明授权

US4352974A Plasma etcher having isotropic subchamber with gas outlet for producing uniform etching 失效
标题翻译：等离子体蚀刻机具有用于产生均匀蚀刻的气体出口的各向同性小室
公开(公告)号：US4352974A
公开(公告)日：1982-10-05
申请号：US173364
申请日：1980-07-29
申请人： Tatsumi Mizutani , Norio Kanai , Kunio Harada , Hideo Komatsu , Shinya Iida
发明人： Tatsumi Mizutani , Norio Kanai , Kunio Harada , Hideo Komatsu , Shinya Iida
IPC分类号： B23K10/00 , C30B33/00 , H01J37/32 , H01L21/302 , H01L21/3065 , H01L21/3215 , B23K9/00 , C23F1/02
CPC分类号： H01L21/3065 , B23K10/00 , C30B33/00 , H01J37/3244 , H01L21/32155
摘要： A plasma etcher wherein the provision of a gas outlet directly in an etching chamber is avoided and wherein a subchamber having a sufficient capacity is connected to the etching chamber through a joint part, the gas outlet being provided in this subchamber. With the apparatus, the distribution of etching rates in plasma etching becomes uniform.
摘要翻译：一种等离子体蚀刻器，其中避免了直接在蚀刻室中提供气体出口，并且其中具有足够容量的子室通过接头部分连接到蚀刻室，气体出口设置在该子室中。利用该装置，等离子体蚀刻中的蚀刻速率的分布变得均匀。

5. 发明申请

US20110297974A1 LED ASSEMBLY WITH COLOR TEMPERATURE CORRECTION CAPABILITY 有权
标题翻译： LED组件具有彩色温度校正能力
公开(公告)号：US20110297974A1
公开(公告)日：2011-12-08
申请号：US13210147
申请日：2011-08-15
申请人： Jun Takashima , Norio Kanai
发明人： Jun Takashima , Norio Kanai
IPC分类号： H01L33/60
CPC分类号： H01L33/60 , H01L25/0753 , H01L33/50 , H01L33/52 , H01L2924/0002 , H01L2924/00
摘要： An illumination assembly is provided which is capable of correcting a color temperature. The assembly includes a substrate with a plurality of coatings applied on a respective plurality of surface portions of a base material. A light emitting device includes one or more light emitting elements of a first color temperature mounted on surface portions of the substrate having a first color coating, and one or more light emitting elements having a second color temperature mounted on surface portions of the substrate having a second color coating. Light emitting elements are individually sealed with a resin containing an excitable phosphor, with a reflectance factor of the first color coating and a reflectance factor of the second color coating set corresponding to light emitted from the light emitting elements having the first and second color temperatures, respectively, with respect to a desired color temperature for the light emitting device.
摘要翻译：提供能够校正色温的照明组件。组件包括具有施加在基材的相应多个表面部分上的多个涂层的基底。一种发光器件包括一个或多个安装在具有第一颜色涂层的衬底的表面部分上的第一色温的发光元件，以及一个或多个具有第二色温的发光元件，该第二色温安装在衬底的表面部分上，第二色涂层。发光元件由含有可兴奋荧光体的树脂单独密封，第一颜色涂层的反射系数和与从具有第一和第二色温的发光元件发射的光对应的第二彩色涂层的反射系数，相对于发光器件的期望色温。

6. 发明申请

US20100001297A1 LED ASSEMBLY WITH COLOR TEMPERATURE CORRECTION CAPABILITY 审中-公开
标题翻译： LED组件具有彩色温度校正能力
公开(公告)号：US20100001297A1
公开(公告)日：2010-01-07
申请号：US12429787
申请日：2009-04-24
申请人： Jun Takashima , Norio Kanai
发明人： Jun Takashima , Norio Kanai
IPC分类号： H01L27/15 , H01L33/00
CPC分类号： H01L33/60 , H01L25/0753 , H01L33/50 , H01L33/52 , H01L2924/0002 , H01L2924/00
摘要： An illumination assembly is provided which is capable of correcting a color temperature. The assembly generally comprises a substrate and a light emitting device mounted on the substrate that further comprises a light emitting element and a resin containing a phosphor excitable by light emitted from the light emitting element. A reflectance factor of the substrate may be set corresponding to light emitted from the light emitting device, such that the light emitted by the light emitting device complies with a desired light emission for the illumination assembly. A translucent filling resin or translucent coating resin may further be applied on the light emitting device and the substrate, the translucent resin having a refractive index and correspondingly operable to suppress variations in color temperature. The assembly may comprise a plurality of light emitting devices having variable light color temperatures, wherein a plurality of substrate coatings may be provided having reflectance factors corresponding to the associated light color temperatures. One or more translucent resins may be applied on light emitting devices as desired to further suppress variations in color temperature.
摘要翻译：提供能够校正色温的照明组件。组件通常包括衬底和安装在衬底上的发光器件，该发光器件还包括发光元件和含有可从由发光元件发出的光而激发的荧光体的树脂。衬底的反射率可以对应于从发光器件发射的光来设置，使得由发光器件发射的光符合用于照明组件的期望的发光。半透明填充树脂或半透明涂层树脂可以进一步施加在发光器件和基板上，半透明树脂具有折射率并且可相应地可操作地抑制色温变化。组件可以包括具有可变光色温度的多个发光器件，其中可以提供具有对应于相关联的光色温度的反射系数的多个衬底涂层。可以根据需要将一种或多种半透明树脂施加到发光器件上，以进一步抑制色温的变化。

7. 发明授权

US4274004A Ion implanter 失效
标题翻译：离子注入机
公开(公告)号：US4274004A
公开(公告)日：1981-06-16
申请号：US112818
申请日：1980-01-17
申请人： Norio Kanai
发明人： Norio Kanai
IPC分类号： B23K15/00 , C23C14/48 , H01J37/317 , H01L21/265 , H01L21/673 , G21K5/10
CPC分类号： H01L21/68771 , H01J37/3171 , H01L21/68764
摘要： The present invention relates to an ion implanter which is so constructed that specimens placed in the specimen chamber are caused to move so that ions supplied from an ion source are homogeneously implanted into the surfaces of the specimens, wherein said specimen chamber is so constructed that the whole mechanism which transmits the motion for moving the specimens is surrounded by space which is different from space which includes the specimens.
摘要翻译：离子注入机技术领域本发明涉及一种离子注入机，该离子注入机被构造成使放置在试样室中的试样移动，使得从离子源供给的离子均匀地注入到试样的表面，其中所述试样室的构造使得传递移动样本的运动的整个机构由与包含标本的空间不同的空间包围。

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