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1. 发明授权

US5104944A Process for nucleophilic derivatization of materials having an imide group conjugated to an aromatic moiety 失效
标题翻译：具有连接到一个神经环境的组合物的材料的核化衍生物的方法
公开(公告)号：US5104944A
公开(公告)日：1992-04-14
申请号：US381627
申请日：1989-07-18
申请人： Martin J. Goldberg , Daniel P. Morris , Alfred Viehbeck
发明人： Martin J. Goldberg , Daniel P. Morris , Alfred Viehbeck
IPC分类号： C25B3/04 , C08G73/10 , C08G85/00 , G03F7/038 , H05K1/03 , H05K3/18 , H05K3/38
CPC分类号： G03F7/0387 , C08G73/10 , C08G73/1007 , C08G85/00 , H05K1/0346 , H05K3/181 , H05K3/381
摘要： A process for the synthesis of derivatives of materials containing an imide group conjugated to an aromatic moiety to form an ester, a thioester, an amide, a ketone, and silylesters. Electrons are supplied to redox sites to form a reduced imide material. The reduced imide material is contacted with a nucleophile which opens the imide ring of the reduced imide and chemically combines with a carbonyl carbon atom of the open imide ring to form an imide derivative.

2. 发明授权

US5045159A Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and electrophilic methods of fabrication thereof 失效
标题翻译：含有与芳族部分共轭的羰基的化合物的衍生物和亲电的制造方法
公开(公告)号：US5045159A
公开(公告)日：1991-09-03
申请号：US381552
申请日：1989-07-18
申请人： Martin J. Goldberg , Daniel P. Morris , Alfred Viehbeck
发明人： Martin J. Goldberg , Daniel P. Morris , Alfred Viehbeck
IPC分类号： C07D209/48 , C07B43/00 , C07B45/00 , C07D471/06 , C07D487/04 , C07D519/00 , C08G73/10 , C08G85/00 , C25B3/04 , H05K1/03 , H05K3/00 , H05K3/46
CPC分类号： C08G85/00 , C08G73/10 , C08G73/1067 , C08G73/1082 , C25B3/04 , H05K1/0346 , H05K3/0017 , H05K3/4644
摘要： Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and methods of fabrication thereof consisting of a thioether, an ester, an ether, a phosphate and a silylether. Electrons are supplied to the carbonyl group conjugated to an aromatic moiety to form a reduced material. The reduced material is contacted with an electrophile which attacks and chemically combines with the carbonyl group conjugated to an aromatic moiety. The parent material can be regenerated by hydrolysis of the derivative. A silyl derivative can be selectively formed on a polyimide material surface which can act as a barrier to an RIE etch of the polyimide material. After etch the polyimide material is regenerated from the silyl derivative.

3. 发明授权

US5281447A Patterned deposition of metals via photochemical decomposition of metal-oxalate complexes 失效
标题翻译：通过金属 - 草酸盐络合物的光化学分解形成金属沉积
公开(公告)号：US5281447A
公开(公告)日：1994-01-25
申请号：US783054
申请日：1991-10-25
申请人： Michael J. Brady , Stephen L. Buchwalter , Richard J. Gambino , Martin J. Goldberg , Kam L. Lee , Alfred Viehbeck
发明人： Michael J. Brady , Stephen L. Buchwalter , Richard J. Gambino , Martin J. Goldberg , Kam L. Lee , Alfred Viehbeck
IPC分类号： C23C18/14 , G03C5/58 , G03F7/004 , G03F7/26 , H05K3/10 , B05D3/06 , B05D5/12
CPC分类号： C23C18/14 , C23C18/1608 , C23C18/1612 , C23C18/204 , C23C18/208 , C23C18/30 , G03C5/58 , G03F7/0047 , G03F7/265 , H05K3/105 , H05K2203/056 , H05K2203/121
摘要： The invention is directed to a method for forming a metal coating on a substrate by applying an oxalate of a Group VIII element from the Periodic Table of the Elements to the substrate. The oxalate is selected so that it will decompose to a complex of a zero valent Group VIII element or a Group VIII element on exposure to an energy source. Microelectronic circuits, etch masks or metal contacts on superconductors can be formed by the method when the oxalate coating is exposed to an energy source through a mask or the energy source beamed at the oxalate to trace a pattern on it.The metal thus obtained can be subsequently coated by electroless compositions especially where the Group VIII element is a catalyst for electroless coatings such as palladium. Additionally, the metal coating may be coated by an electrolytic composition.Through hole plating can also be achieved by applying the oxalates of a Group VIII element in the through hole of a circuit board followed by exposure to an energy source optionally followed by the application of an electroless and/or electrolytic metal composition.
摘要翻译：本发明涉及一种通过将元素周期表中第VIII族元素的草酸盐施用到基材上而在基材上形成金属涂层的方法。选择草酸盐，使其在暴露于能量源时将分解成零价VIII族元素或VIII族元素的络合物。当通过掩模将草酸盐涂层暴露于能量源或者在草酸盐上辐射的能量源来追踪其上的图案时，可以通过该方法形成微电子电路，超导体上的金属接触或金属接触。由此获得的金属可以随后通过无电组合物涂覆，特别是其中VIII族元素是无电镀涂层如钯的催化剂。此外，金属涂层可以由电解组合物涂覆。也可以通过将VIII族元素的草酸盐施加到电路板的通孔中，然后暴露于能量源，随后施加无电解和/或电解金属组合物来实现通孔电镀。

4. 发明授权

US5179467A Charge transfer salts and uses thereof 失效
标题翻译：电荷转移盐及其用途
公开(公告)号：US5179467A
公开(公告)日：1993-01-12
申请号：US583888
申请日：1990-09-17
申请人： Stephen L. Buchwalter , Martin J. Goldberg , Revathi Iyengar , Terrence R. O'Toole , Alfred Viehbeck
发明人： Stephen L. Buchwalter , Martin J. Goldberg , Revathi Iyengar , Terrence R. O'Toole , Alfred Viehbeck
IPC分类号： C09K9/02 , H01B1/12
CPC分类号： H01B1/121 , C09K9/02 , H01B1/12
摘要： An electrochemical color change cell incorporating as a color changing agent intramolecular charge transfer salt or an intermolecular charge transfer salt. The intermolecular charge transfer salts and the intramolecular charge transfer salts have a plurality of oxidation states and a wide variation in color change. The intermolecular and intramolecular charge transfer salts preferably contain a violene moiety and a moiety having a carbonyl group conjugated to an aromatic moiety. The intramolecular charge transfer salts have a stable covalent radical-anion/radical-cation configuration. The intermolecular charge transfer salts have a stable ionic radical-anion/radical-cation configuration.
摘要翻译：一种结合作为变色剂分子内电荷转移盐或分子内电荷转移盐的电化学变色细胞。分子间电荷转移盐和分子内电荷转移盐具有多种氧化态和颜色变化的广泛变化。分子间和分子内电荷转移盐优选含有突出部分和具有与芳族部分结合的羰基的部分。分子内电荷转移盐具有稳定的共价自由基 - 阴离子/自由基 - 阳离子配置。分子间电荷转移盐具有稳定的离子自由基 - 阴离子/自由基 - 阳离子配置。

5. 发明授权

US5563273A Covalent compound having a radical-cationic moiety covalently linked to a radical anionicmoiety 失效
标题翻译：共价化合物具有与自由基阴离子性共价连接的自由基 - 阳离子部分
公开(公告)号：US5563273A
公开(公告)日：1996-10-08
申请号：US193921
申请日：1994-02-09
申请人： Stephen L. Buchwalter , Martin J. Goldberg , Revathi Iyengar , Terrence R. O'Toole , Alfred Viehbeck
发明人： Stephen L. Buchwalter , Martin J. Goldberg , Revathi Iyengar , Terrence R. O'Toole , Alfred Viehbeck
IPC分类号： G02F1/15 , C09K9/00 , C09K9/02 , G09F9/30 , G09G3/38 , H01B1/12 , C07D213/22 , C07D487/02
CPC分类号： H01B1/12 , C09K9/02 , H01B1/121
摘要： An electrochemical color change cell incorporating as a color changing agent intramolecular charge transfer salt or an intermolecular charge transfer salt. The intermolecular charge transfer salts and the intramolecular charge transfer salts have a plurality of oxidation states and a wide variation in color change. The intermolecular and intramolecular charge transfer salts preferably contain a violene moiety and a moiety having a carbonyl group conjugated to an aromatic moiety. The intramolecular charge transfer salts have a stable covalent radical-anion/radical-cation configuration. The intermolecular charge transfer salts have a stable ionic radical-anion/radical-cation configuration.
摘要翻译：一种结合作为变色剂分子内电荷转移盐或分子内电荷转移盐的电化学变色细胞。分子间电荷转移盐和分子内电荷转移盐具有多种氧化态和颜色变化的广泛变化。分子间和分子内电荷转移盐优选含有突出部分和具有与芳族部分结合的羰基的部分。分子内电荷转移盐具有稳定的共价自由基 - 阴离子/自由基 - 阳离子配置。分子间电荷转移盐具有稳定的离子自由基 - 阴离子/自由基 - 阳离子配置。

6. 发明授权

US5135779A Method for conditioning an organic polymeric material 失效
标题翻译：调理有机聚合物材料的方法
公开(公告)号：US5135779A
公开(公告)日：1992-08-04
申请号：US705556
申请日：1991-05-24
申请人： Alfred Viehbeck , Stephen L. Buchwalter , Martin J. Goldberg , Caroline A. Kovac , Stephen L. Tisdale
发明人： Alfred Viehbeck , Stephen L. Buchwalter , Martin J. Goldberg , Caroline A. Kovac , Stephen L. Tisdale
IPC分类号： C23C18/16 , C23C18/28 , H05K3/38
CPC分类号： H05K3/381 , C23C18/1608 , C23C18/2086 , C23C18/30 , C23C18/31
摘要： Certain organic polymeric materials are capable of reversibly accepting or donating electrons from a reducing entity. The redox sites in the polymer accept electrons and, as a result, a change in the properties of the polymer occurs. This change is useful in modifying or etching the polymeric material. The material can be modified by incorporation of metallic seeds into the material at a controlled depth. The seeds are incorporated by interaction of cations of the metals with the redox sites in the polymer, which cause the reduction of the cations to form the neutral metallic seeds. Subsequent exposure of the polymeric material containing the seeds to an electroless bath causes further deposition of metal having the desirable characteristic of good adhesion to the polymeric material. Etching of the polymeric material can be carried out as a result of an increase in solubility of the polymer in aprotic solvents when its redox sites have accepted electrons. The increased solubility allows openings to be etched in certain areas of the polymeric material that have been reduced, leaving other areas unchanged.
摘要翻译：某些有机聚合材料能够可逆地接受或捐赠来自还原剂的电子。聚合物中的氧化还原位点接受电子，结果发生聚合物的性质变化。该改变可用于改性或蚀刻聚合物材料。可以通过在受控的深度将金属种子并入材料中来修饰材料。种子通过金属阳离子与聚合物中的氧化还原位点的相互作用而引入，这导致阳离子还原形成中性金属种子。随后将含有种子的聚合材料暴露于无电镀浴中，导致具有对聚合物材料具有良好粘附性的所需特性的金属的进一步沉积。聚合物材料的蚀刻可以作为聚合物在非质子传递溶剂中当其氧化还原位点已经接受电子时的溶解度增加的结果进行。增加的溶解度允许在已经还原的聚合物材料的某些区域中蚀刻开口，留下其它区域不变。

7. 发明授权

US5374454A Method for conditioning halogenated polymeric materials and structures fabricated therewith 失效
标题翻译：用于调节卤化聚合物材料和用其制造的结构的方法
公开(公告)号：US5374454A
公开(公告)日：1994-12-20
申请号：US13652
申请日：1993-02-04
申请人： Harry R. Bickford , Peter J. Duke , Elizabeth Foster , Martin J. Goldberg , Voya R. Markovich , Linda C. Matthew , Donald G. McBride , Terrence R. O'Toole , Stephen L. Tisdale , Alfred Viehbeck
发明人： Harry R. Bickford , Peter J. Duke , Elizabeth Foster , Martin J. Goldberg , Voya R. Markovich , Linda C. Matthew , Donald G. McBride , Terrence R. O'Toole , Stephen L. Tisdale , Alfred Viehbeck
IPC分类号： C08J3/24 , C23C18/20 , C23C18/28 , C25D5/56 , H05K1/03 , H05K3/18 , H05K3/38 , H05K3/42 , B05D1/00
CPC分类号： H05K3/422 , C23C18/208 , C23C18/2093 , C23C18/30 , C25D5/56 , H05K3/381 , H05K1/034 , H05K3/181 , Y10S428/901 , Y10T428/24273 , Y10T428/24322 , Y10T428/24339 , Y10T428/24802 , Y10T428/3154 , Y10T428/31544 , Y10T428/31678
摘要： A halogenated polymeric material is exposed to a reducing agent and/or an electrolyte and applied voltage to render exposed portions capable of being metallized and of being etched. The exposed portions can also be doped to thereby induce electrical conductivity therein. Also, new structures containing a free standing halogenated polymeric-containing layer and electrical conductive pattern thereon are provided.
摘要翻译：将卤化聚合物材料暴露于还原剂和/或电解质和施加的电压以使得能够被金属化并被蚀刻的暴露部分。暴露部分也可以被掺杂从而在其中诱导电导率。此外，提供了含有独立卤代聚合物层和在其上的导电图案的新结构。

8. 发明授权

US5242713A Method for conditioning an organic polymeric material 失效
标题翻译：用于调节有机聚合材料的方法
公开(公告)号：US5242713A
公开(公告)日：1993-09-07
申请号：US290486
申请日：1988-12-23
申请人： Alfred Viehbeck , Stephen L. Buchwalter , William A. Donson , John J. Glenning , Martin J. Goldberg , Kurt R. Grebe , Caroline A. Kovac , Linda C. Matthew , Walter P. Pawlowski , Mark J. Schadt , Michael R. Scheuermann , Stephen L. Tisdale
发明人： Alfred Viehbeck , Stephen L. Buchwalter , William A. Donson , John J. Glenning , Martin J. Goldberg , Kurt R. Grebe , Caroline A. Kovac , Linda C. Matthew , Walter P. Pawlowski , Mark J. Schadt , Michael R. Scheuermann , Stephen L. Tisdale
IPC分类号： C23C18/20 , C08J5/12 , C08J7/00 , C23C18/16 , C23C18/28 , H05K3/38
CPC分类号： C23C18/1608 , C23C18/166 , C23C18/2086 , C23C18/28 , C23C18/30 , H05K3/381 , Y10S525/903
摘要： Certain organic polymeric materials are capable of reversibly accepting or donating electrons from a reducing entity. The redox sites in the polymer accept electrons and, as a result, a change in the properties of the polymer occurs. This change is useful in modifying or etching the polymeric material The material can be modified by incorporation of metallic seeds into the material at a controlled depth. The seeds are incorporated by interaction of cations of the metals with the redox sites in the polymer, which cause the reduction of the cations to form the neutral metallic seeds. Subsequent exposure of the polymeric material containing the seeds to an electroless bath causes further deposition of metal having the desirable characteristic of good adhesion to the polymeric material. Etching of the polymeric material can be carried out as a result of an increase in solubility of the polymer in aprotic solvents when its redox sites have accepted electrons. The increased solubility allows openings to be etched in certain areas of the polymeric material that have been reduced, leaving other areas unchanged.

9. 发明授权

US06309831B1 Method of manufacturing biological chips 有权
标题翻译：制造生物芯片的方法
公开(公告)号：US06309831B1
公开(公告)日：2001-10-30
申请号：US09245329
申请日：1999-02-05
申请人： Martin J. Goldberg , Richard P. Rava
发明人： Martin J. Goldberg , Richard P. Rava
IPC分类号： C12Q168
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00378 , B01J2219/00387 , B01J2219/00432 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00608 , B01J2219/00659 , B01J2219/00675 , B01J2219/00677 , B01J2219/00689 , B01J2219/00693 , B01J2219/00695 , B01J2219/00711 , B01J2219/00722 , C07K1/045 , C07K1/047 , C40B40/06 , C40B50/14 , C40B60/14 , G07C3/14
摘要： A method of manufacturing items in parallel. Selected samples of items to be manufactured are subjected to additional steps in a manufacturing process. If such sample items meet the requisite quality control standard, remaining items are subjected to further manufacturing steps. If the sample items which have been further processed do not meet the requisite quality control standard, the lot from which the samples do not undergo the additional manufacturing step. Invention provides an improved method of manufacturing in that it prevents unnecessary manufacturing steps.
摘要翻译：并行制造物品的方法。要制造的物品的选定样品在制造过程中经受另外的步骤。如果这些样品符合必要的质量控制标准，剩余物品将进行进一步的制造步骤。如果进一步处理的样品不符合必要的质量控制标准，样品不经过附加制造步骤的批次。本发明提供了一种改进的制造方法，因为它可防止不必要的制造步骤。

10. 发明授权

US06239273B1 Printing molecular library arrays 有权
标题翻译：印刷分子库阵列
公开(公告)号：US06239273B1
公开(公告)日：2001-05-29
申请号：US09427850
申请日：1999-10-26
申请人： R. Fabian Pease , Glenn McGall , Martin J. Goldberg , Richard P. Rava , Stephen P. A. Fodor , Virginia Goss , Lubert Stryer , James L. Winkler
发明人： R. Fabian Pease , Glenn McGall , Martin J. Goldberg , Richard P. Rava , Stephen P. A. Fodor , Virginia Goss , Lubert Stryer , James L. Winkler
IPC分类号： C07M2100
CPC分类号： G03F7/00 , B01J19/0046 , B01J2219/00378 , B01J2219/00382 , B01J2219/00385 , B01J2219/00427 , B01J2219/00432 , B01J2219/00454 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B41M3/00 , B82Y30/00 , C07B2200/11 , C07H21/00 , C07K1/047 , C40B40/06 , C40B40/10 , C40B50/14 , C40B60/14
摘要： A method and apparatus for selectively applying a print material onto a substrate for the synthesis of an array of oligonucleotides at selected regions of a substrate. The print material includes a barrier material, a monomer sequence, a nucleoside, a deprotection agent, a carrier material, among other materials. The method and apparatus also relies upon standard DMT based chemistry, and a vapor phase deprotection agent such as solid TCA and the like.
摘要翻译：一种用于选择性地将印刷材料施加到基底上以在基底的选定区域合成寡核苷酸阵列的方法和装置。印刷材料包括阻挡材料，单体序列，核苷，去保护剂，载体材料等。该方法和装置还依赖于基于标准的基于DMT的化学，以及气相脱保护剂如固体TCA等。

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