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    • 2. 发明授权
    • Photoimageable dielectric epoxy resin system film
    • 可光成像介电环氧树脂体系膜
    • US06835533B2
    • 2004-12-28
    • US10781073
    • 2004-02-18
    • Elizabeth FosterGary A. JohanssonHeike MarcelloDavid J. Russell
    • Elizabeth FosterGary A. JohanssonHeike MarcelloDavid J. Russell
    • G03F7038
    • G03F7/0385G03F7/038H05K3/0023H05K3/4644H05K3/4676Y10T428/24851
    • A method for fabricating circuitized substrates which reduces shorts, and does not require baking and resulting film. The method employs a photoimageable dielectric film, having a solvent content less than about 5%, and a glass transition temperature, when cured, which is greater than about 110° C. A photoimageable dielectric film is provided having from about 95% to about 100% solids, and comprising: from 0% to about 30% of the solids, of a particulate rheology modifier; from about 70% to about 100% of the solids of an epoxy resin system (liquid at 20° C.) comprising: from about 85% to about 99.9% epoxy resins; and from about 0.1 to 15 parts of the total resin weight, a cationic photoinitiator; from 0% to about 5% solvent; applying the photoimageable dielectric film to a circuitized substrate; and exposing the film to actinic radiation.
    • 一种制造电路化基板的方法,其减少短路,并且不需要烘烤和得到的膜。 该方法使用溶剂含量小于约5%的光致成像电介质膜,当固化时玻璃化转变温度大于约110℃。提供具有约95%至约100的光致成像电介质膜 %固体,并且包含:0%至约30%的固体,颗粒状流变改性剂; 约70%至约100%的环氧树脂体系的固体(20℃的液体),包含:约85%至约99.9%的环氧树脂; 和约0.1至15份的总树脂重量,阳离子光引发剂; 0%至约5%的溶剂; 将光致成像电介质膜施加到电路化基板上; 并将膜暴露于光化辐射。
    • 3. 发明授权
    • Method of fabricating circuitized structures
    • 制造电路结构的方法
    • US06706464B2
    • 2004-03-16
    • US10345561
    • 2003-01-16
    • Elizabeth FosterGary A. JohanssonHeike MarcelloDavid J. Russell
    • Elizabeth FosterGary A. JohanssonHeike MarcelloDavid J. Russell
    • G03F740
    • G03F7/0385G03F7/038H05K3/0023H05K3/4644H05K3/4676Y10T428/24851
    • A method for fabricating circuitized substrates which reduces shorts, and does not require baking and resulting film. The method employs a photoimageable dielectric film, having a solvent content less than about 5%, and a glass transition temperature, when cured, which is greater than about 110° C. A photoimageable dielectric film, is provided having from about 95% to about 100% solids, and comprising: from 0% to about 30% of the solids, of a particulate rheology modifier, from about 70% to about 100% of the solids of an epoxy resin system (liquid at 20° C. comprising: from about 85% to about 99.9% epoxy resins; and from about 0.1 to 15 parts of the total resin weight, a cationic photoinitiator; from 0 to about 5% solvent, applying the photoimageable dielectric film to a circuitized substrate; and exposing the film to actinic radiation.
    • 一种制造电路化基板的方法,其减少短路,并且不需要烘烤和得到的膜。 该方法采用溶剂含量小于约5%的光致成像电介质膜,当固化时玻璃化转变温度大于约110℃。提供了可见光电介质膜,其具有约95%至约 100%固体,并且包含:固体的0%至约30%的颗粒状流变改性剂,约70%至约100%的环氧树脂体系的固体(液体在20℃,包括:来自 约85%至约99.9%的环氧树脂;和约0.1至15份的总树脂重量,阳离子光引发剂; 0至约5%的溶剂,将可光成像的电介质膜施加到电路化基板;以及将膜暴露于 光化辐射。
    • 7. 发明授权
    • Method of fabricating circuitized structures
    • 制造电路结构的方法
    • US06528218B1
    • 2003-03-04
    • US09808334
    • 2001-03-14
    • Elizabeth FosterGary A. JohanssonHeike MarcelloDavid J. Russell
    • Elizabeth FosterGary A. JohanssonHeike MarcelloDavid J. Russell
    • G03F711
    • G03F7/0385G03F7/038H05K3/0023H05K3/4644H05K3/4676Y10T428/24851
    • A method for fabricating circuitized substrates which reduces shorts, and does not require baking and resulting film. The method employs a photoimageable dielectric film, having a solvent content less than about 5%, and a glass transition temperature, when cured, which is greater than about 110° C. A photoimageable dielectric film is provided having from about 95% to about 100% solids, and comprising: from 0% to about 30% of the solids, of a particulate rheology modifier; from about 70% to about 100% of the solids of an epoxy resin system (liquid at 20° C.) comprising: from about 85% to about 99.9% epoxy resins; and from about 0.1 to 15 parts of the total resin weight, a cationic photoinitiator; from 0 to about 5% solvent; applying the photoimageable dielectric film to a circuitized substrate; and exposing the film to actinic radiation.
    • 一种制造电路化基板的方法,其减少短路,并且不需要烘烤和得到的膜。 该方法使用溶剂含量小于约5%的光致成像电介质膜,当固化时玻璃化转变温度大于约110℃。提供具有约95%至约100的光致成像电介质膜 %固体,并且包含:0%至约30%的固体,颗粒状流变改性剂; 约70%至约100%的环氧树脂体系的固体(20℃的液体),包含:约85%至约99.9%的环氧树脂; 和约0.1至15份的总树脂重量,阳离子光引发剂; 0至约5%的溶剂; 将光致成像电介质膜施加到电路化基板上; 并将膜暴露于光化辐射。
    • 10. 发明授权
    • Method and apparatus for customizing lesson plans
    • 用于定制课程计划的方法和设备
    • US07974569B2
    • 2011-07-05
    • US10991133
    • 2004-11-17
    • Renee Carolyn MansfieldLaura Larsen DudleyKaren Theresa DeGregoryKatherine Elizabeth Foster
    • Renee Carolyn MansfieldLaura Larsen DudleyKaren Theresa DeGregoryKatherine Elizabeth Foster
    • G09B3/00
    • G09B7/00
    • Computer method and apparatus enable customization of lesson plans per student. The invention method and apparatus include a curriculum data store holding a plurality of curriculum records, a student record data store and a processor routine coupled to the student record data store and the curriculum data store. Each curriculum record indicates a respective teaching activity and implementation details of the activity as part of a lesson plan. There are different activities for different domains. The processor routine enables, for a given student, educator-user selection of a curriculum record with its respective activity, as a function of assessed skill level in a subject domain and/or learning profile of the student. The processor routine generates a custom lesson plan, for the given student, that includes the activity of the user-selected curriculum record. The processor routine may suspend or otherwise hold the custom lesson plan pending supervisory review at various times.
    • 计算机方法和设备能够为学生定制课程计划。 本发明的方法和装置包括保存多个课程记录的课程数据存储器,学生记录数据存储器和耦合到学生记录数据存储器和课程数据存储器的处理器程序。 每个课程记录表明课程的相应教学活动和实施细节,作为课程计划的一部分。 不同领域有不同的活动。 处理器程序使得对于给定的学生,教育者用户选择具有各自活动的课程记录,作为学生领域的评估技能水平和/或学生的学习简档的函数。 处理器例程为给定的学生生成一个自定义课程计划,包括用户选择的课程记录的活动。 处理器程序可能会在不同时间暂停或以其他方式保持定制课程计划进行监督审查。