专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US10723032B2 Formation of thin uniform coatings on blade edges using isostatic press 有权
公开(公告)号：US10723032B2
公开(公告)日：2020-07-28
申请号：US14136548
申请日：2013-12-20
申请人： The Gillette Company
发明人： Xiandong Wang , Neville Sonnenberg
IPC分类号： B26B21/60 , C08J7/00 , B26B21/58
摘要： The invention discloses utilizing isostatic-press (IP) processes apply a polymeric material (e.g, a PTFE foil) to uncoated razor blade edges forming thin, dense, and uniform coatings on blade edges which in turn exhibit low initial cutting forces correlating with more comfortable shaves. The isostatic press may be a hot isostatic press (HIP) or a cold isostatic press (CIP) or any other isostatic press process. The HIP conditions may include an environment of elevated temperatures and pressures in an inert atmosphere. The CIP conditions may include room temperature and elevated pressure. The polymeric material may be a fluoropolymer or non-fluoropolymeric material or any composite thereof. The lower surface of the polymeric material may be modified (e.g., chemical etching) to enhance adhesion to the blade edge. Two or more layers of polymeric material of similar or different properties may be isostatically pressed onto the uncoated blades.

2. 发明授权

US10370462B2 Melt-processable perfluoropolymers having improved thermal and mechanical properties after heating treatment 有权
公开(公告)号：US10370462B2
公开(公告)日：2019-08-06
申请号：US15316083
申请日：2015-06-02
申请人： SOLVAY SPECIALTY POLYMERS ITALY S.P.A.
发明人： Pasqua Colaianna , Valeriy Kapelyushko , Mattia Bassi , Marco Mirenda , Vincenzo Arcella
IPC分类号： C08L27/18 , C08J7/00 , C08F6/00 , B29C71/02 , C08F214/26 , C08F6/28 , B29C35/04
摘要： The invention mainly pertains to a method for heat treating a composition [composition (C)] which contains at least one melt-processible perfluoropolymer [polymer (F)] formed of tetrafluoroethylene (TFE) copolymer with one or more perfluorinated comonomers [comonomer (F)] containing at least one unsaturation of ethylene type in amounts from 0.5% to 13% by weight, preferably from 0.6% to 11% by weight, and more preferably from 0.8% to 9% by weight; said polymer (F) possessing reactive end groups comprising at least one of the group consisting of hydrogen atoms, oxygen atoms and ethylenically unsaturated double bonds in an amount of at least 4.5 mmol/kg, the process comprising at least the step of heat-treating the composition (C) at a temperature of at least 260° C.

3. 发明授权

US10336976B2 Photosensitive resin composition for forming cell culture substrate 有权
公开(公告)号：US10336976B2
公开(公告)日：2019-07-02
申请号：US15303930
申请日：2015-04-10
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Takahiro Senzaki
IPC分类号： G03F7/031 , G03F7/028 , C12M3/00 , C12M1/00 , B29C41/12 , C08F2/46 , C08J7/00 , B29C35/00 , B29C35/08 , B29C41/00 , B29C41/42 , B29C71/00 , B29C71/04 , B29D7/00 , B29K33/04 , B29K67/00 , B29K71/00 , B29L7/00
摘要： A photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, has low cytotoxicity, and that can form a cell culture substrate; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. The photosensitive resin composition includes a photopolymerizable monomer and a photopolymerization initiator. The photopolymerizable monomer contains a defined amount of a polyfunctional monomer that is at least trifunctional, and the content of the photopolymerization initiator is within a prescribed range.

4. 发明授权

US10233204B2 Phosphazene compound, and a composition, a prepreg and a wiring board comprising the same 有权
公开(公告)号：US10233204B2
公开(公告)日：2019-03-19
申请号：US15234014
申请日：2016-08-11
申请人： Guangdong Guangshan New Materials Co., Ltd.
发明人： Qingchong Pan
IPC分类号： C07F9/659 , C08J7/00 , C09K21/12 , C07F9/6593 , C08K5/5399 , C08J5/24
摘要： The present invention relates to a phosphazene compound and a composite metal laminate. The phosphazene compound with a partial structure of carboxylic esters has a structure as shown in Formula (I). The present invention obtains a phosphazene compound with a partial structure of carboxylic esters using an M group having specific components. The cured products of the phosphazene compound have good flame retardancy, heat resistance, mechanical properties, flame retardancy, and low dielectric constant, and are a low dielectric flame retardant material having great economic properties and being environmental friendly.

5. 发明申请

US20180341044A1 POLYMERS AND NANOGEL MATERIALS AND METHODS FOR MAKING AND USING THE SAME 审中-公开
公开(公告)号：US20180341044A1
公开(公告)日：2018-11-29
申请号：US16053865
申请日：2018-08-03
申请人： Johnson & Johnson Vision Care, Inc.
发明人： Charles W. Scales , Kevin P. McCabe , Brent Matthew Healy
IPC分类号： G02B1/04 , B82Y30/00 , C08J7/00 , C08F293/00 , C08L53/00 , C08L101/14 , C08L83/04 , C08L81/00
摘要： Provided are compositions comprising a block copolymer of the following formula: [A]-B-[Q], wherein [A] is a polymer that has an affinity for a substrate; B is a linking group comprising an optionally-substituted, polyvalent linking group having a molecular weight of no more than 1000 g/mole; and [Q] comprises a semi-crosslinked, ungelled polymer derived from copolymerization of an ethylenically unsaturated monomer with a poly-functional ethylenically unsaturated monomer. Such block copolymers are cross-linked via the [Q] segment, but not macroscopically gelled. The [Q] segment is hydrophilic and has a degree of polymerization in the range of about 10 to about 10,000. The [A] segment is located on at least one terminal end of said block copolymer, comprises between about 1 and about 200 repeating units. The block copolymer is associated, via the linear substrate associative segment with a surface comprising at least one hydrophobic site, such as a silicone hydrogel. The polymers may be incorporated into a formulation from which the silicone hydrogel is made or may be contacted with the silicone hydrogel post-formation.

6. 发明授权

US09982664B2 Systems and methods for metering a dose volume of fluid used to treat microelectronic substrates 有权
公开(公告)号：US09982664B2
公开(公告)日：2018-05-29
申请号：US14815467
申请日：2015-07-31
申请人： TEL FSI, Inc.
发明人： William P. Inhofer , Lance Van Elsen
IPC分类号： C23F1/00 , F04B23/04 , C08J7/00 , B05B11/00 , B81C1/00 , F04B19/00 , H01L21/306
CPC分类号： F04B23/04 , B05B11/3032 , B81C1/00539 , C08J7/00 , F04B19/006 , H01L21/30604
摘要： The disclosure relates to systems and methods for metering a dose volume of fluid that may be used to treat microelectronic substrates. The system enables precision dispensing of relatively small amounts of a liquid chemical into a chemical bath or processing chamber for microelectronic substrates. The dispensing device may include a fluid conduit with a plurality of actuation devices that may limit fluid communication between the actuation devices and store a portion of the fluid in expandable membrane. The actuation devices may push or pull the fluid within the fluid conduit when the expandable membrane expands or contracts. The configuration and operation of the actuation devices may enable the collection, isolation, and dispensing of the dose volume.

7. 发明授权

US09982101B2 Method to fuse silicone and thermoplastic resin 有权
公开(公告)号：US09982101B2
公开(公告)日：2018-05-29
申请号：US15145821
申请日：2016-05-04
申请人： HANGZHOU FREETRON INDUSTRIAL CO., LTD.
发明人： Ming Xie , Kaixiang Shu
IPC分类号： C08J5/12 , C08J3/24 , B65D43/00 , C08J7/00 , C09J5/02 , C09J5/06 , B29C65/48 , B29C65/00 , B29L31/56 , B29C65/02
CPC分类号： C08J5/12 , B29C65/02 , B29C65/48 , B29C66/028 , B29C66/612 , B29C66/71 , B29C66/7392 , B29C66/919 , B29C66/949 , B29L2031/565 , B65D43/00 , C08J3/247 , C08J7/00 , C08J2323/06 , C08J2323/12 , C08J2383/04 , C09J5/02 , C09J5/06 , C09J2423/046 , C09J2423/048 , C09J2423/106 , C09J2423/108 , C09J2483/006 , B29K2083/00 , B29K2023/12 , B29K2023/06
摘要： This invention discloses a method to fuse silicone and thermoplastic resin, comprising the following steps: Step A: conducting treatment twice on thermoplastic resin lid upon molding in plasma equipment under normal temperature, and opening the inert molecular chain of thermoplastic resin; wherein the power for treating the thermoplastic resin lid ranges 500 to 800 W, the time of treatment ranges from 5 s to 60 s; Step B: applying glue on the place for laying silicone gasket on thermoplastic resin lid, baking in the oven for 15-20 min; Step C: putting the treated thermoplastic resin lid and silicone gasket in step B into the over mold for encapsulation, the time of which is 2-3 min; conducting post vulcanization for 2 h after completing the encapsulation.

8. 发明授权

US09371427B2 Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：US09371427B2
公开(公告)日：2016-06-21
申请号：US14636034
申请日：2015-03-02
申请人： KABUSHIKI KAISHA TOSHIBA
发明人： Katsutoshi Kobayashi , Yusuke Kasahara , Hiroki Yonemitsu , Hitoshi Kubota , Ayako Kawanishi
IPC分类号： C23F1/00 , C08J7/00 , B81C1/00 , C23F4/00
CPC分类号： C23F1/00 , B81C1/00396 , C23F4/00 , G03F7/0002
摘要： A pattern is formed by forming a first pattern on a first film, forming a block copolymer layer including a first block chain and a second block chain on the first pattern, forming a second pattern, forming a second film on the second pattern, selectively removing the second film until the second pattern is exposed, forming a third pattern, and processing the first film using the third pattern as a mask. The second pattern is formed by microphase-separating the block copolymer layer, and removing the first block chain or the second block chain. The second film is formed by applying a material having an etch rate that is less than an etch rate of a material of the first pattern and the second pattern. The third pattern is formed by selectively removing the second pattern and the first pattern using the second film as a mask.
摘要翻译：通过在第一膜上形成第一图案形成图案，在第一图案上形成包含第一嵌段链和第二嵌段链的嵌段共聚物层，形成第二图案，在第二图案上形成第二膜，选择性地除去直到第二图案曝光的第二膜，形成第三图案，并且使用第三图案作为掩模来处理第一膜。第二图案通过微相分离嵌段共聚物层并除去第一嵌段链或第二嵌段链形成。通过施加具有小于第一图案和第二图案的材料的蚀刻速率的蚀刻速率的材料来形成第二膜。通过使用第二膜作为掩模选择性地去除第二图案和第一图案来形成第三图案。

9. 发明授权

US09120293B2 Preliminary-cured material, roughened preliminary-cured material, and laminated body 有权
标题翻译：预固化材料，粗化预固化材料和层压体
公开(公告)号：US09120293B2
公开(公告)日：2015-09-01
申请号：US13582214
申请日：2011-03-31
申请人： Reona Yokota , Koichi Shibayama , Akihiro Uenishi , Hidenobu Deguchi , Tomoki Kunikawa , Tatsushi Hayashi
发明人： Reona Yokota , Koichi Shibayama , Akihiro Uenishi , Hidenobu Deguchi , Tomoki Kunikawa , Tatsushi Hayashi
IPC分类号： B32B5/16 , B32B27/20 , B32B27/38 , C08J7/00 , G11B5/64 , B32B15/092 , C08G59/40 , C08G59/42 , C08G59/62 , C08G59/68 , C08L63/00 , C08K3/36
CPC分类号： B32B15/092 , B32B15/08 , B32B15/20 , B32B27/20 , B32B27/38 , B32B2264/102 , B32B2307/538 , C08G59/4014 , C08G59/42 , C08G59/621 , C08G59/686 , C08J7/00 , C08K3/36 , C08L63/00 , Y10T428/259 , Y10T428/268 , C08L71/12
摘要： A preliminary-cured material permits reduced surface roughness of a roughening-treated surface, and increase of an adhesive strength between a cured object and a metal layer. The preliminary-cured material is obtained by advancing curing of an epoxy resin material that contains an epoxy resin, a curing agent, and a silica. The preliminary-cured material includes a first principal surface to be roughening-treated, and a second principal surface. The silica includes a first small particle-diameter silica whose particle diameter is not smaller than 0.01 μm but smaller than 0.5 μm, and a second large particle-diameter silica whose particle diameter is not smaller than 0.5 μm but not larger than 20 μm. The first small particle-diameter silica is localized to exist in large quantity on a side of the first principal surface, and the second large particle-diameter silica is localized to exist in large quantity on a side of the second principal surface.
摘要翻译：预固化材料允许粗糙化处理的表面的表面粗糙度降低，并且增加固化物体和金属层之间的粘合强度。预固化材料是通过使包含环氧树脂，固化剂和二氧化硅的环氧树脂材料进行固化而得到的。预固化材料包括待粗化处理的第一主表面和第二主表面。二氧化硅包括粒径不小于0.01μm但小于0.5μm的第一小粒径二氧化硅和粒径不小于0.5μm但不大于20μm的第二大粒径二氧化硅。第一小粒径二氧化硅被定位成大量存在于第一主表面的一侧，第二大颗粒直径二氧化硅在第二主表面的一侧大量存在。

10. 发明授权

US08765862B2 Metal nanoparticle composite and production method thereof 有权
标题翻译：金属纳米复合材料及其制备方法
公开(公告)号：US08765862B2
公开(公告)日：2014-07-01
申请号：US13581800
申请日：2011-02-08
申请人： Yasufumi Matsumura , Ryuzo Shinta , Yasushi Enomoto
发明人： Yasufumi Matsumura , Ryuzo Shinta , Yasushi Enomoto
IPC分类号： C08J7/00 , C08J7/12 , C08J7/14 , C08K3/08 , C08L79/08
CPC分类号： C08J7/00 , B22F9/20 , C08G73/1042 , C08G73/1067 , C08J7/08 , C08J7/14 , C08K3/08 , C08L79/08 , C09D5/30 , C09D5/32 , C09D7/69 , C22C1/1026 , C22C32/0094 , C22C2001/1089 , C23C18/08 , H01B1/22 , Y10S977/778 , Y10S977/90
摘要： A metal nanoparticle composite is provided, in which a matrix resin layer and metal nanoparticles are immobilized on the matrix resin layer. The metal nanoparticle composite has the following characteristics: a) the metal nanoparticles are obtained by heat-reducing metal ions or metal salts contained in the matrix resin layer or a precursor resin layer thereof; b) the metal nanoparticles exist within a region from the surface of the matrix resin layer to a depth of at least 50 nm; c) particle diameters of the metal nanoparticles are in the range of 1 nm to 100 nm with the mean particle diameter of greater than and equal to 3 nm; and d) a spacing between adjacent metal nanoparticles is greater than and equal to the particle diameter of a larger one of the adjacent metal nanoparticles.
摘要翻译：提供了一种金属纳米颗粒复合材料，其中将基体树脂层和金属纳米颗粒固定在基体树脂层上。金属纳米粒子复合体具有以下特征：a）金属纳米粒子是通过将金属离子或基体树脂层中含有的金属盐或其前体树脂层进行还原而得到的， b）金属纳米粒子存在于从基体树脂层的表面到至少50nm的深度的区域内; c）金属纳米粒子的粒径在1nm〜100nm的范围内，平均粒径大于等于3nm; 和d）相邻的金属纳米颗粒之间的间距大于并且等于较大的相邻金属纳米颗粒的粒径。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式