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1. 发明授权

US06774646B1 Electron beam inspection system using multiple electron beams and uniform focus and deflection mechanisms 有权
标题翻译：电子束检查系统采用多个电子束和均匀的焦点和偏转机制
公开(公告)号：US06774646B1
公开(公告)日：2004-08-10
申请号：US10058614
申请日：2002-01-28
申请人： Liqun Han , Mark A. McCord
发明人： Liqun Han , Mark A. McCord
IPC分类号： G01R3100
CPC分类号： H01J37/28 , G01N23/04 , H01J37/04 , H01J37/141 , H01J37/145 , H01J37/147 , H01J2237/04756 , H01J2237/103 , H01J2237/2817
摘要： A method for inspecting samples uses a multiple beam electron system having a uniform magnetic focusing field. Deflection of the incident electron beams is produced by deflector plates generating an electrostatic deflection force which produces a uniform force on the electron beams. Thermal field emission sources generate incident electron beams towards at least two portions of the sample. A detector array collects multiple detection electrons.
摘要翻译：用于检查样品的方法使用具有均匀磁场的多束电子系统。入射电子束的偏转由偏转板产生，该偏转板产生在电子束上产生均匀的力的静电偏转力。热场发射源朝向样品的至少两部分产生入射电子束。检测器阵列收集多个检测电子。

2. 发明授权

US07315022B1 High-speed electron beam inspection 有权
标题翻译：高速电子束检查
公开(公告)号：US07315022B1
公开(公告)日：2008-01-01
申请号：US11031091
申请日：2005-01-06
申请人： David L. Adler , Mark A. McCord , Mehdi Vaez-Iravani , Liqun Han , Kirk J. Bertsche
发明人： David L. Adler , Mark A. McCord , Mehdi Vaez-Iravani , Liqun Han , Kirk J. Bertsche
IPC分类号： H01J37/20 , G01R31/28
CPC分类号： G01R31/307 , H01J37/244 , H01J37/28 , H01J2237/0653 , H01J2237/20214 , H01J2237/20228 , H01J2237/244 , H01J2237/24507 , H01J2237/24564 , H01J2237/24592 , H01J2237/248 , H01J2237/2809 , H01J2237/2817
摘要： One embodiment disclosed relates to an electron beam apparatus for inspection of a semiconductor wafer, wherein substantially an entire area of the wafer surface is scanned without moving the stage. A cathode ray tube (CRT) gun may be used to rapidly (and cost effectively) scan the beam over the wafer. Another embodiment disclosed relates to a high-speed automated e-beam inspector configured to scan the e-beam in one dimension while translating the wafer in a perpendicular direction. The translation may be linear, or alternatively, may be in a spiral path. Other embodiments are also disclosed.
摘要翻译：所公开的一个实施例涉及一种用于检查半导体晶片的电子束装置，其中在不移动载物台的情况下扫描晶片表面的大致整个区域。阴极射线管（CRT）枪可以用于快速（并且成本有效地）扫描晶片上的光束。所公开的另一实施例涉及一种配置成在一个维度上扫描电子束的高速自动电子束检查器，同时沿垂直方向平移晶片。平移可以是线性的，或者可以是螺旋形路径。还公开了其他实施例。

3. 发明授权

US08614427B1 Suspended membrane calibration sample 有权
标题翻译：悬浮膜校准样品
公开(公告)号：US08614427B1
公开(公告)日：2013-12-24
申请号：US10195638
申请日：2002-07-15
申请人： Mark A. McCord , Liqun Han
发明人： Mark A. McCord , Liqun Han
IPC分类号： G01N23/00
CPC分类号： G01N23/225 , G01N2223/303 , G01N2223/611
摘要： One embodiment disclosed relates to a method for fabricating a calibration sample. The method includes lithographically patterning a first side of a wafer with a pattern of a self-supporting membrane, etching the first side of the wafer to form the self-supporting membrane in a layer on the first side, and etching a second side of the wafer to reach the layer so as to suspend the membrane over an empty space. Another embodiment disclosed relates to a charged particle beam system. The system includes a charged particle source, a focusing column and lens assembly, a detector, and a suspended membrane calibration sample. Another embodiment disclosed relates a suspended membrane calibration sample for a charged particle beam system. The calibration sample includes a plurality of calibration patterns in an array, a suspended membrane that is self-supporting and includes the plurality of calibration patterns, and an empty space underneath the membrane.
摘要翻译：公开的一个实施例涉及一种用于制造校准样品的方法。该方法包括利用自支撑膜的图案将晶片的第一侧光刻图案化，蚀刻晶片的第一侧以在第一侧上的层中形成自支撑膜，并且蚀刻第二面晶片到达该层，以便将膜悬挂在空的空间上。所公开的另一实施例涉及带电粒子束系统。该系统包括带电粒子源，聚焦柱和透镜组件，检测器和悬浮膜校准样品。所公开的另一实施例涉及用于带电粒子束系统的悬浮膜校准样品。校准样品包括阵列中的多个校准图案，自支撑并包括多个校准图案的悬浮膜和膜下方的空白空间。

4. 发明授权

US08089051B2 Electron reflector with multiple reflective modes 有权
标题翻译：具有多种反射模式的电子反射镜
公开(公告)号：US08089051B2
公开(公告)日：2012-01-03
申请号：US12711966
申请日：2010-02-24
申请人： Luca Grella , Regina Freed , Mark A. McCord
发明人： Luca Grella , Regina Freed , Mark A. McCord
IPC分类号： G21K1/08
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J2237/31789
摘要： One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is directed to the array of electron reflectors. A first plurality of the reflectors is configured to reflect electrons in a first reflective mode such that the reflected electrons exiting the reflector form a focused beam. A second plurality of the reflectors is configured to reflect electrons in a second reflective mode such that the reflected electrons exiting the reflector are defocused. Another embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. Other embodiments, aspects and features are also disclosed.
摘要翻译：一个实施例涉及从电子反射器阵列可控地反射电子的方法。入射电子束由电子源形成，入射光束被引导到电子反射体阵列。第一多个反射器被配置为以第一反射模式反射电子，使得离开反射器的反射电子形成聚焦光束。第二多个反射器被配置为以第二反射模式反射电子，使得离开反射器的反射电子散焦。另一个实施例涉及用于反射电子束光刻的动态图案发生器的装置。还公开了其它实施例，方面和特征。

5. 发明授权

US07710556B1 Inspection system 失效
标题翻译：检验系统
公开(公告)号：US07710556B1
公开(公告)日：2010-05-04
申请号：US11752958
申请日：2007-05-24
申请人： Mark A. McCord
发明人： Mark A. McCord
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N2021/8822 , G01N2021/8825 , G01N2201/101
摘要： A substrate inspection system of a type that receives substrates disposed within a cassette and inspects a planar surface of the substrates with a read head, where the substrates are inspected while they are disposed within the cassette, and the read head is of a size to fit between adjacent substrates within the cassette. In this manner, the substrates do not need to be removed from the cassette, and no robotic arm is required to do so.
摘要翻译：一种衬底检查系统，其接收设置在盒内的衬底并用读头检查衬底的平坦表面，其中衬底被布置在盒内时被检查，读头的尺寸适合在盒内的相邻基板之间。以这种方式，不需要从盒中取出基板，并且不需要机器人手臂。

6. 发明授权

US07176468B2 Method for charging substrate to a potential 有权
标题翻译：将基板充电到电位的方法
公开(公告)号：US07176468B2
公开(公告)日：2007-02-13
申请号：US10942184
申请日：2004-09-16
申请人： Kirk J. Bertsche , Mark A. McCord
发明人： Kirk J. Bertsche , Mark A. McCord
IPC分类号： H01J37/244
CPC分类号： G21K7/00 , H01J37/026 , H01J2237/0045 , H01J2237/0048
摘要： A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is less than one. In another embodiment, the substrate is provided with the surface in a state at an approximate initial potential above the target potential. The surface is then flooded with charged particle such that the charge yield of scattered particles is less than one, such that a steady state is reached at which the target potential is achieved. Another embodiment pertains to an apparatus for charging a surface of an insulating is substrate to a target potential.
摘要翻译：将绝缘基板的表面充电至目标电位。在一个实施方案中，表面充满了较高能量的电子束，使得电子产率大于1。随后，表面被低能电子束淹没，使得电子产率小于1。在另一个实施例中，衬底被提供有处于大于目标电位的初始电位的状态的表面。然后用带电粒子充满表面，使得散射颗粒的电荷产率小于1，使得达到达到目标电势的稳定状态。另一个实施例涉及一种用于将绝缘体的表面充电至靶电位的装置。

7. 发明授权

US06828571B1 Apparatus and methods of controlling surface charge and focus 有权
标题翻译：控制表面电荷和聚焦的装置和方法
公开(公告)号：US06828571B1
公开(公告)日：2004-12-07
申请号：US10699708
申请日：2003-11-03
申请人： Mark A. McCord , Jan A. Lauber , Paul Petric , Ross W. Thompson , Jason Lim , Frank Y. H. Fan , Gabor D. Toth
发明人： Mark A. McCord , Jan A. Lauber , Paul Petric , Ross W. Thompson , Jason Lim , Frank Y. H. Fan , Gabor D. Toth
IPC分类号： H01L2100
CPC分类号： G01R31/307 , G01R31/2653 , H01J37/026 , H01J37/21 , H01J2237/0048 , H01J2237/20 , H01J2237/216 , H01J2237/2817
摘要： One embodiment disclosed relates to a method of setting a surface charge of an area on a substrate to a desired level. The substrate is held on a stage, and a stage bias voltage applied to the stage is controlled. A flood of electrons is directed to the area. The stage bias voltage is controlled such that the surface charge of the area reaches an equilibrium at the desired level. Another embodiment disclosed relates to a method of auto-focusing a main electron beam incident upon an imaging area of a substrate. A monitor electron beam is generated and directed towards a monitoring area of the substrate at a non-perpendicular incidence angle. An in-focus band in data collected from the monitor beam is detected. The focal length of an objective lens focusing the main beam is adjusted based upon a position of the in-focus band.
摘要翻译：公开的一个实施例涉及一种将衬底上的区域的表面电荷设置到期望水平的方法。将基板保持在平台上，并且控制施加到载物台的载物台偏置电压。大量的电子被引导到该地区。阶段偏置电压被控制使得该区域的表面电荷达到期望水平的平衡。公开的另一实施例涉及一种自动聚焦入射到基板的成像区域上的主电子束的方法。产生监视电子束并以非垂直入射角朝向基板的监视区域。检测从监视器束收集的数据中的对焦带。聚焦主光束的物镜的焦距基于对焦带的位置进行调整。

8. 发明授权

US4992728A Electrical probe incorporating scanning proximity microscope 失效
标题翻译：电探头结合扫描接近显微镜
公开(公告)号：US4992728A
公开(公告)日：1991-02-12
申请号：US454677
申请日：1989-12-21
申请人： Mark A. McCord , Leonard Berenbaum
发明人： Mark A. McCord , Leonard Berenbaum
IPC分类号： G01B7/34 , G01B21/30 , G01N37/00 , G01Q10/04 , G01Q20/00 , G01Q30/02 , G01Q60/04 , G01Q60/24 , G01Q60/30 , G01R1/06 , G01R31/308 , H01J37/28
CPC分类号： G01Q60/30 , B82Y35/00 , G01Q10/04 , G01Q30/025 , G01R31/308
摘要： An electrical probe which incorporates a scanning proximity microscope for probing the sub-micron features of an integrated circuit. An optical microscope is provided to find the general region of interest, and a piezoelectric tube scanner which controls the position of the probe is disposed at an acute angle to the substrate, so as not to obscure the view of the optical microscope. A number of such probes may be located around the integrated circuit.

9. 发明授权

US07660687B1 Robust measurement of parameters 有权
标题翻译：稳健的测量参数
公开(公告)号：US07660687B1
公开(公告)日：2010-02-09
申请号：US11420243
申请日：2006-05-25
申请人： Indranil De , Mark A. McCord , David L. Adler
发明人： Indranil De , Mark A. McCord , David L. Adler
IPC分类号： G01D18/00 , G06F17/40 , G06F19/00
CPC分类号： H01J37/222 , G01R31/307 , H01J37/263 , H01J37/28 , H01J2237/2826
摘要： A method of increasing consistency between separate parametric measurement readings that are taken with an electron beam imaging tool at different times within a period of time, by correcting drift in the imaging tool at a time frequency that is less than a time period during which the drift is anticipated to be undesirably large.
摘要翻译：一种提高在一段时间内在不同时间用电子束成像工具拍摄的单独的参数测量读数之间的一致性的方法，通过以小于漂移的时间段的时间频率校正成像工具中的漂移，预计将不合需要。

10. 发明授权

US07507959B2 Method for charging substrate to a potential 有权
标题翻译：将基板充电到电位的方法
公开(公告)号：US07507959B2
公开(公告)日：2009-03-24
申请号：US11644591
申请日：2006-12-21
申请人： Kirk J. Bertsche , Mark A. McCord
发明人： Kirk J. Bertsche , Mark A. McCord
IPC分类号： H01J37/14 , H01J37/28
CPC分类号： G21K7/00 , H01J37/026 , H01J2237/0045 , H01J2237/0048
摘要： A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is less than one. In another embodiment, the substrate is provided with the surface in a state at an approximate initial potential above the target potential. The surface is then flooded with charged particle such that the charge yield of scattered particles is less than one, such that a steady state is reached at which the target potential is achieved. Another embodiment pertains to an apparatus for charging a surface of an insulating substrate to a target potential.
摘要翻译：将绝缘基板的表面充电至目标电位。在一个实施方案中，表面充满了较高能量的电子束，使得电子产率大于1。随后，表面被低能电子束淹没，使得电子产率小于1。在另一个实施例中，衬底被提供有处于大于目标电位的初始电位的状态的表面。然后用带电粒子充满表面，使得散射颗粒的电荷产率小于1，使得达到达到目标电势的稳定状态。另一个实施例涉及一种用于将绝缘衬底的表面充电到目标电位的装置。

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