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1. 发明申请

US20110204251A1 Electron Reflector With Multiple Reflective Modes 有权
标题翻译：具有多重反射模式的电子反射器
公开(公告)号：US20110204251A1
公开(公告)日：2011-08-25
申请号：US12711966
申请日：2010-02-24
申请人： Luca GRELLA , Regina FREED , Mark A. McCORD
发明人： Luca GRELLA , Regina FREED , Mark A. McCORD
IPC分类号： H01J3/14
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J2237/31789
摘要： One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is directed to the array of electron reflectors. A first plurality of the reflectors is configured to reflect electrons in a first reflective mode such that the reflected electrons exiting the reflector form a focused beam. A second plurality of the reflectors is configured to reflect electrons in a second reflective mode such that the reflected electrons exiting the reflector are defocused. Another embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. Other embodiments, aspects and features are also disclosed.
摘要翻译：一个实施例涉及从电子反射器阵列可控地反射电子的方法。入射电子束由电子源形成，入射光束被引导到电子反射体阵列。第一多个反射器被配置为以第一反射模式反射电子，使得离开反射器的反射电子形成聚焦光束。第二多个反射器被配置为以第二反射模式反射电子，使得离开反射器的反射电子散焦。另一个实施例涉及用于反射电子束光刻的动态图案发生器的装置。还公开了其它实施例，方面和特征。

2. 发明授权

US07660687B1 Robust measurement of parameters 有权
标题翻译：稳健的测量参数
公开(公告)号：US07660687B1
公开(公告)日：2010-02-09
申请号：US11420243
申请日：2006-05-25
申请人： Indranil De , Mark A. McCord , David L. Adler
发明人： Indranil De , Mark A. McCord , David L. Adler
IPC分类号： G01D18/00 , G06F17/40 , G06F19/00
CPC分类号： H01J37/222 , G01R31/307 , H01J37/263 , H01J37/28 , H01J2237/2826
摘要： A method of increasing consistency between separate parametric measurement readings that are taken with an electron beam imaging tool at different times within a period of time, by correcting drift in the imaging tool at a time frequency that is less than a time period during which the drift is anticipated to be undesirably large.
摘要翻译：一种提高在一段时间内在不同时间用电子束成像工具拍摄的单独的参数测量读数之间的一致性的方法，通过以小于漂移的时间段的时间频率校正成像工具中的漂移，预计将不合需要。

3. 发明授权

US07507959B2 Method for charging substrate to a potential 有权
标题翻译：将基板充电到电位的方法
公开(公告)号：US07507959B2
公开(公告)日：2009-03-24
申请号：US11644591
申请日：2006-12-21
申请人： Kirk J. Bertsche , Mark A. McCord
发明人： Kirk J. Bertsche , Mark A. McCord
IPC分类号： H01J37/14 , H01J37/28
CPC分类号： G21K7/00 , H01J37/026 , H01J2237/0045 , H01J2237/0048
摘要： A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is less than one. In another embodiment, the substrate is provided with the surface in a state at an approximate initial potential above the target potential. The surface is then flooded with charged particle such that the charge yield of scattered particles is less than one, such that a steady state is reached at which the target potential is achieved. Another embodiment pertains to an apparatus for charging a surface of an insulating substrate to a target potential.
摘要翻译：将绝缘基板的表面充电至目标电位。在一个实施方案中，表面充满了较高能量的电子束，使得电子产率大于1。随后，表面被低能电子束淹没，使得电子产率小于1。在另一个实施例中，衬底被提供有处于大于目标电位的初始电位的状态的表面。然后用带电粒子充满表面，使得散射颗粒的电荷产率小于1，使得达到达到目标电势的稳定状态。另一个实施例涉及一种用于将绝缘衬底的表面充电到目标电位的装置。

4. 发明授权

US07446320B1 Electronically-variable immersion electrostatic lens 有权
标题翻译：电子可变浸没静电透镜
公开(公告)号：US07446320B1
公开(公告)日：2008-11-04
申请号：US11260586
申请日：2005-10-26
申请人： Mark A. McCord , Kirk J. Bertsche , Francisco Machuca
发明人： Mark A. McCord , Kirk J. Bertsche , Francisco Machuca
IPC分类号： H01J37/12 , H01J42/22
CPC分类号： H01J37/12 , H01J37/145 , H01J37/21 , H01J37/28 , H01J2237/1035 , H01J2237/281
摘要： One embodiment relates to an electronically-variable electrostatic immersion lens in an electron beam apparatus. The electrostatic immersion lens includes a top electrode configured with a first voltage applied thereto, an upper bottom electrode configured with a second voltage applied thereto, and a lower bottom electrode configured with a third voltage applied thereto. The third voltage is controlled separately from the second voltage. Other embodiments are also disclosed.
摘要翻译：一个实施例涉及电子束装置中的电子可变静电浸没透镜。静电浸没透镜包括配置有施加到其上的第一电压的上电极，施加有第二电压的上底电极，以及施加有第三电压的下底电极。第三电压与第二电压分开控制。还公开了其他实施例。

5. 发明授权

US06586736B1 Scanning electron beam microscope having an electrode for controlling charge build up during scanning of a sample 有权
标题翻译：具有用于在扫描样品期间控制电荷的电极的扫描电子束显微镜
公开(公告)号：US06586736B1
公开(公告)日：2003-07-01
申请号：US09394133
申请日：1999-09-10
申请人： Mark A. McCord
发明人： Mark A. McCord
IPC分类号： H01J37147
CPC分类号： H01J37/026 , H01J37/28 , H01J2237/3175
摘要： A method and apparatus for generating an image of a sample with a electron beam apparatus is disclosed. The image is generated from a portion of the sample with a measurement device having a source unit for directing an electron beam substantially towards the sample. The measurement device also has a detector for detecting particles that are emitted from the sample, an electrode proximal to the sample having a hole through which the electron beam and a portion of the emitted particles may pass, and an image generator for generating the image of the sample from the detected particles. A first voltage is applied to the electrode when the electron beam is substantially in a center of the hole. The first voltage is selected to control positive charge build up on the sample. A second voltage is applied to the electrode when the electron beam is deflected a predetermined distance from the center of the hole. The second voltage is selected to allow a significant amount of emitted particles to reach the detector to facilitate image generation while maintaining charge control.
摘要翻译：公开了一种用电子束装置产生样本图像的方法和装置。图像由样品的一部分产生，其中测量装置具有用于将电子束基本上朝向样品引导的源单元。测量装置还具有用于检测从样品发射的颗粒的检测器，靠近样品的电极，具有孔，电子束和发射的颗粒的一部分可以穿过该孔，以及用于产生图像的图像的图像发生器来自检测到的颗粒的样品。当电子束基本上在孔的中心时，第一电压被施加到电极。选择第一个电压以控制样品上的正电荷积聚。当电子束从孔的中心偏转预定距离时，向电极施加第二电压。选择第二电压以允许显着量的发射颗粒到达检测器以促进图像产生，同时保持电荷控制。

6. 发明授权

US5932966A Electron sources utilizing patterned negative electron affinity photocathodes 失效
标题翻译：利用图案化负电子亲和光电阴极的电子源
公开(公告)号：US5932966A
公开(公告)日：1999-08-03
申请号：US987397
申请日：1997-12-09
申请人： James E. Schneider , Kenneth A. Costello , Mark A. McCord , R. Fabian Pease , Aaron W. Baum
发明人： James E. Schneider , Kenneth A. Costello , Mark A. McCord , R. Fabian Pease , Aaron W. Baum
IPC分类号： H01J40/06 , G03F7/20 , H01J3/02 , H01J27/04 , H01J37/073 , H01J37/075 , H01J40/16
CPC分类号： G03F7/70375 , H01J27/04 , H01J3/021 , H01J37/073 , H01J37/075 , H01J40/16 , H01J2201/3423 , H01J2237/06333 , H01J2237/31779
摘要： An electron source includes a negative electron affinity photocathode on a light-transmissive substrate and a light beam generator for directing a light beam through the substrate at the photocathode for exciting electrons into the conduction band. The photocathode has at least one active area for emission of electrons with dimensions of less than about two micrometers. The electron source further includes electron optics for forming the electrons into an electron beam and a vacuum enclosure for maintaining the photocathode at high vacuum. The photocathode is patterned to define emission areas. A patterned mask may be located on the emission surface of the active layer, may be buried within the active layer or may be located between the active layer and the substrate.
摘要翻译：电子源包括透光性基板上的负电子亲合性光电阴极和光束发生器，用于将光束引导到光电阴极处的基板，用于将电子激发到导带中。光电阴极具有用于发射尺寸小于约两微米的电子的至少一个有源面积。电子源还包括用于将电子形成电子束的电子光学器件和用于将光电阴极保持在高真空的真空外壳。图案化光电阴极以限定发射区域。图案化掩模可以位于有源层的发射表面上，可以被掩埋在有源层内或者可以位于有源层和衬底之间。

7. 发明授权

US08089051B2 Electron reflector with multiple reflective modes 有权
标题翻译：具有多种反射模式的电子反射镜
公开(公告)号：US08089051B2
公开(公告)日：2012-01-03
申请号：US12711966
申请日：2010-02-24
申请人： Luca Grella , Regina Freed , Mark A. McCord
发明人： Luca Grella , Regina Freed , Mark A. McCord
IPC分类号： G21K1/08
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J2237/31789
摘要： One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is directed to the array of electron reflectors. A first plurality of the reflectors is configured to reflect electrons in a first reflective mode such that the reflected electrons exiting the reflector form a focused beam. A second plurality of the reflectors is configured to reflect electrons in a second reflective mode such that the reflected electrons exiting the reflector are defocused. Another embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. Other embodiments, aspects and features are also disclosed.
摘要翻译：一个实施例涉及从电子反射器阵列可控地反射电子的方法。入射电子束由电子源形成，入射光束被引导到电子反射体阵列。第一多个反射器被配置为以第一反射模式反射电子，使得离开反射器的反射电子形成聚焦光束。第二多个反射器被配置为以第二反射模式反射电子，使得离开反射器的反射电子散焦。另一个实施例涉及用于反射电子束光刻的动态图案发生器的装置。还公开了其它实施例，方面和特征。

8. 发明授权

US07710556B1 Inspection system 失效
标题翻译：检验系统
公开(公告)号：US07710556B1
公开(公告)日：2010-05-04
申请号：US11752958
申请日：2007-05-24
申请人： Mark A. McCord
发明人： Mark A. McCord
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N2021/8822 , G01N2021/8825 , G01N2201/101
摘要： A substrate inspection system of a type that receives substrates disposed within a cassette and inspects a planar surface of the substrates with a read head, where the substrates are inspected while they are disposed within the cassette, and the read head is of a size to fit between adjacent substrates within the cassette. In this manner, the substrates do not need to be removed from the cassette, and no robotic arm is required to do so.
摘要翻译：一种衬底检查系统，其接收设置在盒内的衬底并用读头检查衬底的平坦表面，其中衬底被布置在盒内时被检查，读头的尺寸适合在盒内的相邻基板之间。以这种方式，不需要从盒中取出基板，并且不需要机器人手臂。

9. 发明授权

US07176468B2 Method for charging substrate to a potential 有权
标题翻译：将基板充电到电位的方法
公开(公告)号：US07176468B2
公开(公告)日：2007-02-13
申请号：US10942184
申请日：2004-09-16
申请人： Kirk J. Bertsche , Mark A. McCord
发明人： Kirk J. Bertsche , Mark A. McCord
IPC分类号： H01J37/244
CPC分类号： G21K7/00 , H01J37/026 , H01J2237/0045 , H01J2237/0048
摘要： A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is less than one. In another embodiment, the substrate is provided with the surface in a state at an approximate initial potential above the target potential. The surface is then flooded with charged particle such that the charge yield of scattered particles is less than one, such that a steady state is reached at which the target potential is achieved. Another embodiment pertains to an apparatus for charging a surface of an insulating is substrate to a target potential.
摘要翻译：将绝缘基板的表面充电至目标电位。在一个实施方案中，表面充满了较高能量的电子束，使得电子产率大于1。随后，表面被低能电子束淹没，使得电子产率小于1。在另一个实施例中，衬底被提供有处于大于目标电位的初始电位的状态的表面。然后用带电粒子充满表面，使得散射颗粒的电荷产率小于1，使得达到达到目标电势的稳定状态。另一个实施例涉及一种用于将绝缘体的表面充电至靶电位的装置。

10. 发明授权

US06828571B1 Apparatus and methods of controlling surface charge and focus 有权
标题翻译：控制表面电荷和聚焦的装置和方法
公开(公告)号：US06828571B1
公开(公告)日：2004-12-07
申请号：US10699708
申请日：2003-11-03
申请人： Mark A. McCord , Jan A. Lauber , Paul Petric , Ross W. Thompson , Jason Lim , Frank Y. H. Fan , Gabor D. Toth
发明人： Mark A. McCord , Jan A. Lauber , Paul Petric , Ross W. Thompson , Jason Lim , Frank Y. H. Fan , Gabor D. Toth
IPC分类号： H01L2100
CPC分类号： G01R31/307 , G01R31/2653 , H01J37/026 , H01J37/21 , H01J2237/0048 , H01J2237/20 , H01J2237/216 , H01J2237/2817
摘要： One embodiment disclosed relates to a method of setting a surface charge of an area on a substrate to a desired level. The substrate is held on a stage, and a stage bias voltage applied to the stage is controlled. A flood of electrons is directed to the area. The stage bias voltage is controlled such that the surface charge of the area reaches an equilibrium at the desired level. Another embodiment disclosed relates to a method of auto-focusing a main electron beam incident upon an imaging area of a substrate. A monitor electron beam is generated and directed towards a monitoring area of the substrate at a non-perpendicular incidence angle. An in-focus band in data collected from the monitor beam is detected. The focal length of an objective lens focusing the main beam is adjusted based upon a position of the in-focus band.
摘要翻译：公开的一个实施例涉及一种将衬底上的区域的表面电荷设置到期望水平的方法。将基板保持在平台上，并且控制施加到载物台的载物台偏置电压。大量的电子被引导到该地区。阶段偏置电压被控制使得该区域的表面电荷达到期望水平的平衡。公开的另一实施例涉及一种自动聚焦入射到基板的成像区域上的主电子束的方法。产生监视电子束并以非垂直入射角朝向基板的监视区域。检测从监视器束收集的数据中的对焦带。聚焦主光束的物镜的焦距基于对焦带的位置进行调整。

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