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    • 1. 发明申请
    • Electron Reflector With Multiple Reflective Modes
    • 具有多重反射模式的电子反射器
    • US20110204251A1
    • 2011-08-25
    • US12711966
    • 2010-02-24
    • Luca GRELLARegina FREEDMark A. McCORD
    • Luca GRELLARegina FREEDMark A. McCORD
    • H01J3/14
    • H01J37/3175B82Y10/00B82Y40/00H01J2237/31789
    • One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is directed to the array of electron reflectors. A first plurality of the reflectors is configured to reflect electrons in a first reflective mode such that the reflected electrons exiting the reflector form a focused beam. A second plurality of the reflectors is configured to reflect electrons in a second reflective mode such that the reflected electrons exiting the reflector are defocused. Another embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. Other embodiments, aspects and features are also disclosed.
    • 一个实施例涉及从电子反射器阵列可控地反射电子的方法。 入射电子束由电子源形成,入射光束被引导到电子反射体阵列。 第一多个反射器被配置为以第一反射模式反射电子,使得离开反射器的反射电子形成聚焦光束。 第二多个反射器被配置为以第二反射模式反射电子,使得离开反射器的反射电子散焦。 另一个实施例涉及用于反射电子束光刻的动态图案发生器的装置。 还公开了其它实施例,方面和特征。
    • 3. 发明授权
    • Method for charging substrate to a potential
    • 将基板充电到电位的方法
    • US07507959B2
    • 2009-03-24
    • US11644591
    • 2006-12-21
    • Kirk J. BertscheMark A. McCord
    • Kirk J. BertscheMark A. McCord
    • H01J37/14H01J37/28
    • G21K7/00H01J37/026H01J2237/0045H01J2237/0048
    • A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is less than one. In another embodiment, the substrate is provided with the surface in a state at an approximate initial potential above the target potential. The surface is then flooded with charged particle such that the charge yield of scattered particles is less than one, such that a steady state is reached at which the target potential is achieved. Another embodiment pertains to an apparatus for charging a surface of an insulating substrate to a target potential.
    • 将绝缘基板的表面充电至目标电位。 在一个实施方案中,表面充满了较高能量的电子束,使得电子产率大于1。 随后,表面被低能电子束淹没,使得电子产率小于1。 在另一个实施例中,衬底被提供有处于大于目标电位的初始电位的状态的表面。 然后用带电粒子充满表面,使得散射颗粒的电荷产率小于1,使得达到达到目标电势的稳定状态。 另一个实施例涉及一种用于将绝缘衬底的表面充电到目标电位的装置。
    • 5. 发明授权
    • Scanning electron beam microscope having an electrode for controlling charge build up during scanning of a sample
    • 具有用于在扫描样品期间控制电荷的电极的扫描电子束显微镜
    • US06586736B1
    • 2003-07-01
    • US09394133
    • 1999-09-10
    • Mark A. McCord
    • Mark A. McCord
    • H01J37147
    • H01J37/026H01J37/28H01J2237/3175
    • A method and apparatus for generating an image of a sample with a electron beam apparatus is disclosed. The image is generated from a portion of the sample with a measurement device having a source unit for directing an electron beam substantially towards the sample. The measurement device also has a detector for detecting particles that are emitted from the sample, an electrode proximal to the sample having a hole through which the electron beam and a portion of the emitted particles may pass, and an image generator for generating the image of the sample from the detected particles. A first voltage is applied to the electrode when the electron beam is substantially in a center of the hole. The first voltage is selected to control positive charge build up on the sample. A second voltage is applied to the electrode when the electron beam is deflected a predetermined distance from the center of the hole. The second voltage is selected to allow a significant amount of emitted particles to reach the detector to facilitate image generation while maintaining charge control.
    • 公开了一种用电子束装置产生样本图像的方法和装置。 图像由样品的一部分产生,其中测量装置具有用于将电子束基本上朝向样品引导的源单元。 测量装置还具有用于检测从样品发射的颗粒的检测器,靠近样品的电极,具有孔,电子束和发射的颗粒的一部分可以穿过该孔,以及用于产生图像的图像的图像发生器 来自检测到的颗粒的样品。 当电子束基本上在孔的中心时,第一电压被施加到电极。 选择第一个电压以控制样品上的正电荷积聚。 当电子束从孔的中心偏转预定距离时,向电极施加第二电压。 选择第二电压以允许显着量的发射颗粒到达检测器以促进图像产生,同时保持电荷控制。
    • 7. 发明授权
    • Electron reflector with multiple reflective modes
    • 具有多种反射模式的电子反射镜
    • US08089051B2
    • 2012-01-03
    • US12711966
    • 2010-02-24
    • Luca GrellaRegina FreedMark A. McCord
    • Luca GrellaRegina FreedMark A. McCord
    • G21K1/08
    • H01J37/3175B82Y10/00B82Y40/00H01J2237/31789
    • One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is directed to the array of electron reflectors. A first plurality of the reflectors is configured to reflect electrons in a first reflective mode such that the reflected electrons exiting the reflector form a focused beam. A second plurality of the reflectors is configured to reflect electrons in a second reflective mode such that the reflected electrons exiting the reflector are defocused. Another embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. Other embodiments, aspects and features are also disclosed.
    • 一个实施例涉及从电子反射器阵列可控地反射电子的方法。 入射电子束由电子源形成,入射光束被引导到电子反射体阵列。 第一多个反射器被配置为以第一反射模式反射电子,使得离开反射器的反射电子形成聚焦光束。 第二多个反射器被配置为以第二反射模式反射电子,使得离开反射器的反射电子散焦。 另一个实施例涉及用于反射电子束光刻的动态图案发生器的装置。 还公开了其它实施例,方面和特征。
    • 9. 发明授权
    • Method for charging substrate to a potential
    • 将基板充电到电位的方法
    • US07176468B2
    • 2007-02-13
    • US10942184
    • 2004-09-16
    • Kirk J. BertscheMark A. McCord
    • Kirk J. BertscheMark A. McCord
    • H01J37/244
    • G21K7/00H01J37/026H01J2237/0045H01J2237/0048
    • A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is less than one. In another embodiment, the substrate is provided with the surface in a state at an approximate initial potential above the target potential. The surface is then flooded with charged particle such that the charge yield of scattered particles is less than one, such that a steady state is reached at which the target potential is achieved. Another embodiment pertains to an apparatus for charging a surface of an insulating is substrate to a target potential.
    • 将绝缘基板的表面充电至目标电位。 在一个实施方案中,表面充满了较高能量的电子束,使得电子产率大于1。 随后,表面被低能电子束淹没,使得电子产率小于1。 在另一个实施例中,衬底被提供有处于大于目标电位的初始电位的状态的表面。 然后用带电粒子充满表面,使得散射颗粒的电荷产率小于1,使得达到达到目标电势的稳定状态。 另一个实施例涉及一种用于将绝缘体的表面充电至靶电位的装置。