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1. 发明授权

US11929232B2 Systems and methods for charged particle flooding to enhance voltage contrast defect signal 有权
公开(公告)号：US11929232B2
公开(公告)日：2024-03-12
申请号：US17026044
申请日：2020-09-18
申请人： ASML Netherlands B.V.
发明人： Frank Nan Zhang , Zhongwei Chen , Yixiang Wang , Ying Crystal Shen
IPC分类号： H01J37/26 , H01J37/04 , H01J37/28
CPC分类号： H01J37/265 , H01J37/045 , H01J37/266 , H01J37/28 , H01J2237/0044 , H01J2237/0048 , H01J2237/0453 , H01J2237/0455 , H01J2237/0458 , H01J2237/049 , H01J2237/28 , H01J2237/2817
摘要： Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.

2. 发明公开

US20230197402A1 SEMICONDUCTOR INSPECTION APPARATUS AND SEMICONDUCTOR INSPECTION METHOD USING THE SAME 审中-公开
公开(公告)号：US20230197402A1
公开(公告)日：2023-06-22
申请号：US17891204
申请日：2022-08-19
申请人： Samsung Electronics Co., Ltd.
发明人： YUJIN CHO , JONGHYUK KANG , INHYE PARK , SUYOUNG LEE , CHUNGSAM JUN , HONGCHE NOH , JANGHEE LEE
IPC分类号： H01J37/28 , H01J37/244 , H01J37/26 , H01J37/147
CPC分类号： H01J37/28 , H01J37/244 , H01J37/265 , H01J37/1471 , H01J2237/2817 , H01J2237/0048 , H01J2237/24592
摘要： Disclosed are semiconductor inspection apparatuses and methods. The semiconductor inspection apparatus comprises a stage that supports a semiconductor device, a first column that irradiates a first electron beam toward the semiconductor device on the stage, a second column that irradiates a second electron beam toward the semiconductor device, and a detector that detects a secondary electron generated by the second electron beam. The first column is disposed to make a first angle with a top surface of the semiconductor device. The second column is disposed to make a second angle with the top surface of the semiconductor device. The first angle and the second angle are different from each other.

3. 发明授权

US11676792B2 Sample pre-charging methods and apparatuses for charged particle beam inspection 有权
公开(公告)号：US11676792B2
公开(公告)日：2023-06-13
申请号：US16652025
申请日：2018-09-25
申请人： ASML Netherlands B.V.
发明人： Xuedong Liu , Qingpo Xi , Youfei Jiang , Weiming Ren , Xuerang Hu , Zhongwei Chen
IPC分类号： H01J37/12 , H01J37/28
CPC分类号： H01J37/12 , H01J37/28 , H01J2237/0048
摘要： Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.

4. 发明申请

US20160035537A1 CHARGED PARTICLE BEAM SPECIMEN INSPECTION SYSTEM AND METHOD FOR OPERATION THEREOF 审中-公开
标题翻译：充电颗粒光束样本检查系统及其操作方法
公开(公告)号：US20160035537A1
公开(公告)日：2016-02-04
申请号：US14446146
申请日：2014-07-29
申请人： Applied Materials Israel, Ltd.
发明人： Gilad Erel , Michal Avinun-Kalish , Stefan Lanio
IPC分类号： H01J37/26 , H01J37/147 , H01J37/08
CPC分类号： H01J37/28 , H01J37/026 , H01J2237/0044 , H01J2237/0048
摘要： A charged particle beam specimen inspection system is described. The system includes an emitter for emitting at least one charged particle beam, a specimen support table configured for supporting the specimen, an objective lens for focusing the at least one charged particle beam, a charge control electrode provided between the objective lens and the specimen support table, wherein the charge control electrode has at least one aperture opening for the at least one charged particle beam, and a flood gun configured to emit further charged particles for charging of the specimen, wherein the charge control electrode has a flood gun aperture opening.
摘要翻译：描述带电粒子束样品检查系统。该系统包括用于发射至少一个带电粒子束的发射器，被配置为支撑样本的样本支撑台，用于聚焦至少一个带电粒子束的物镜，设置在物镜和样本支架之间的充电控制电极其中所述充电控制电极具有用于所述至少一个带电粒子束的至少一个开口开口，以及配置为发射用于对所述样本进行充电的另外的带电粒子的泛喷枪，其中所述充电控制电极具有喷枪孔开口。

5. 发明授权

US08461548B2 Ion beam irradiation device and method for suppressing ion beam divergence 有权
标题翻译：离子束照射装置及离子束发散抑制方法
公开(公告)号：US08461548B2
公开(公告)日：2013-06-11
申请号：US13377253
申请日：2010-04-27
申请人： Dan Nicolaescu , Shigeki Sakai , Junzo Ishikawa , Yasuhito Gotoh
发明人： Dan Nicolaescu , Shigeki Sakai , Junzo Ishikawa , Yasuhito Gotoh
IPC分类号： H01J3/26
CPC分类号： H01J37/3171 , H01J2237/004 , H01J2237/0041 , H01J2237/0048 , H01J2237/06341 , H01J2237/083 , H01J2237/1538 , H01J2237/24535 , H01J2237/24542
摘要： To improve an efficiency of utilizing electrons and efficiently suppress an ion beam spread by a space charge effect while eliminating a need for a special magnetic pole structure by effectively using a space in the vicinity of a magnet, there are provided an ion source, a collimating magnet and a plurality of electron sources, wherein the electron sources are arranged in a magnetic field gradient region formed on an ion beam upstream side or ion beam downstream side of the collimating magnet and arranged outside a region passed by the ion beam, and an irradiation direction of the electrons is directed to supply the electrons to the magnetic field gradient region.
摘要翻译：为了提高利用电子的效率，有效地抑制通过空间电荷效应扩散的离子束，同时通过有效地利用磁体附近的空间来消除对专用磁极结构的需要，提供离子源，准直磁体和多个电子源，其中电子源被布置在形成在准直磁体的离子束上游侧或离子束下游侧的磁场梯度区域中，并且布置在通过离子束的区域的外侧，电子的方向被引导以将电子提供给磁场梯度区域。

6. 发明申请

US20130009057A1 Electron Beam Irradiation Method and Scanning Electron Microscope 有权
标题翻译：电子束照射方法和扫描电子显微镜
公开(公告)号：US20130009057A1
公开(公告)日：2013-01-10
申请号：US13580288
申请日：2011-02-09
申请人： Toshiyuki Yokosuka , Minoru Yamazaki , Hideyuki Kazumi , Kazutami Tago
发明人： Toshiyuki Yokosuka , Minoru Yamazaki , Hideyuki Kazumi , Kazutami Tago
IPC分类号： H01J37/29
CPC分类号： H01J37/28 , H01J37/026 , H01J37/266 , H01J37/268 , H01J2237/0048 , H01J2237/24564 , H01J2237/2594
摘要： The present invention has for its object to provide a charged particle beam irradiation method and a charged particle beam apparatus which can suppress unevenness of electrification even when a plurality of different kinds of materials are contained in a pre-dosing area or degrees of density of patterns inside the pre-dosing area differs with positions.To accomplish the above object, a charged particle beam irradiation method and a charged particle beam apparatus are provided according to which the pre-dosing area is divided into a plurality of divisional areas and electrifications are deposited to the plural divisional areas by using a beam under different beam irradiation conditions. With the above construction, the electrifications can be deposited to the pre-dosing area on the basis of such an irradiation condition that the differences in electrification at individual positions inside the pre-dosing area can be suppressed and consequently, an influence an electric field has upon the charged particle beam and electrons given off from the sample can be suppressed.
摘要翻译：本发明的目的是提供一种带电粒子束照射方法和带电粒子束装置，其即使在预给料区域中包含多种不同种类的材料或图案密度程度时也能抑制通电不均匀性预给药区域内的位置与位置不同。为了实现上述目的，提供一种带电粒子束照射方法和带电粒子束装置，根据该装置，预给料区域被分成多个分区，并且通过使用下面的束将电气沉积到多个分区域不同的束照射条件。通过上述结构，可以基于这样一种照射条件将电气沉积到预给料区域，即可以抑制预给料区域内各个位置的通电差异，从而影响电场可以抑制带电粒子束和从样品发出的电子。

7. 发明申请

US20120292506A1 SAMPLE OBSERVATION METHOD USING ELECTRON BEAMS AND ELECTRON MICROSCOPE 审中-公开
标题翻译：使用电子束和电子显微镜的样品观察方法
公开(公告)号：US20120292506A1
公开(公告)日：2012-11-22
申请号：US13508774
申请日：2010-11-08
申请人： Natsuki Tsuno , Hiroshi Makino , Makoto Suzuki , Yusuke Ominami
发明人： Natsuki Tsuno , Hiroshi Makino , Makoto Suzuki , Yusuke Ominami
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J2237/0048 , H01J2237/206 , H01J2237/24564
摘要： A disclosed method for observing the structure and characteristics of a specimen by an electron microscope realizes high-density charge accumulation on a specimen and improves the quality of voltage contrast images. For structural observation of a specimen and evaluation of its electrical characteristic using an electron beam, charging the specimen is performed. In this charging process, high-density charge accumulation on the specimen is achieved by irradiating the specimen with an electron beam set to have injection energy that falls within an injection energy band for which high charging efficiency is attained during electron beam irradiation and changing irradiation energy, while maintaining the injection energy.
摘要翻译：通过电子显微镜观察样品的结构和特性的公开方法实现了样品上的高密度电荷累积，并提高了电压对比度图像的质量。对于样品的结构观察和使用电子束评估其电特性，对样品进行充电。在该充电过程中，通过用电子束照射样品来实现样品上的高密度电荷积累，该电子束设定为具有落入在电子束照射期间获得高充电效率的注入能带内的注入能量并且改变照射能量同时保持注射能量。

8. 发明授权

US08153966B2 Electrode unit and charged particle beam device 有权
标题翻译：电极单元和带电粒子束装置
公开(公告)号：US08153966B2
公开(公告)日：2012-04-10
申请号：US12992788
申请日：2009-05-15
申请人： Noriaki Arai , Hideyuki Kazumi
发明人： Noriaki Arai , Hideyuki Kazumi
IPC分类号： H01J37/244
CPC分类号： H01J37/026 , H01J3/027 , H01J37/04 , H01J37/28 , H01J2237/0041 , H01J2237/0048 , H01J2237/30 , H01J2237/31749
摘要： A high-resolution sample image is acquired by eliminating both of charge over an entire sample (global charge) and charge in a local region irradiated with a primary charged particle beam (local charge). An electrode unit (50) according to the present invention is used in a charged particle beam device. The electrode unit (50) includes a plate electrode disposed facing an insulator sample between an objective lens and the sample, and further includes: a first charge-neutralization charged particle beam source which emits a first charged particle beam to eliminate local charge on the sample; and a second charge-neutralization charged particle beam source (25) which emits a second charged particle beam to eliminate global charge on the sample. A first hole (53) through which a primary charged particle beam passes, and a second hole through which the second charged particle beam is emitted are provided in the plate electrode, and the first and second charge-neutralization charged particle beam sources are disposed at such positions as not to interfere with each other. The charged particle beam emitted from the first charge-neutralization charged particle beam source is introduced in the vicinity of the first hole (53).
摘要翻译：通过在整个样品（全局电荷）上消除电荷并在用初级带电粒子束（局部电荷）照射的局部区域中的电荷获得高分辨率采样图像。根据本发明的电极单元（50）用于带电粒子束装置。电极单元（50）包括面对物镜和样品之间的绝缘体样品的平板电极，还包括：第一电荷中和带电粒子束源，其发射第一带电粒子束以消除样品上的局部电荷 ; 以及发射第二带电粒子束以消除样品上的全局电荷的第二电荷中和带电粒子束源（25）。初级带电粒子束通过的第一孔53和第二带电粒子束发射的第二孔设置在板电极中，第一和第二电荷中和带电粒子束源设置在这样的位置不会相互干扰。从第一电荷中和带电粒子束源发射的带电粒子束被引入第一孔（53）附近。

9. 发明授权

US08030621B2 Focused ion beam field source 有权
标题翻译：聚焦离子束场源
公开(公告)号：US08030621B2
公开(公告)日：2011-10-04
申请号：US12251917
申请日：2008-10-15
申请人： Paulo Lozano , Manuel Martinez-Sanchez
发明人： Paulo Lozano , Manuel Martinez-Sanchez
IPC分类号： H01T23/00
CPC分类号： H01J3/04 , H01J27/26 , H01J37/08 , H01J2237/0048 , H01J2237/08 , H01J2237/0815 , H01J2237/0822 , H01J2237/31749
摘要： An apparatus for producing ions can include an emitter having a first end and a second end. The emitter can be coated with an ionic liquid room-temperature molten salt. The apparatus can also include a power supply and a first electrode disposed downstream relative to the first end of the emitter and electrically connected to a first lead of the power supply. The apparatus can also include a second electrode disposed downstream relative to the second end of the emitter and electrically connected to a second lead of the power supply.
摘要翻译：用于产生离子的装置可以包括具有第一端和第二端的发射体。发射体可以用离子液体室温熔融盐涂覆。该装置还可以包括电源和设置在发射器的第一端的下游并电连接到电源的第一引线的第一电极。该装置还可以包括设置在发射器的第二端的下游并电连接到电源的第二引线的第二电极。

10. 发明授权

US07863581B2 Focused negative ion beam field source 有权
标题翻译：聚焦负离子束场源
公开(公告)号：US07863581B2
公开(公告)日：2011-01-04
申请号：US12135464
申请日：2008-06-09
申请人： Paulo Lozano , Manuel Martinez-Sanchez
发明人： Paulo Lozano , Manuel Martinez-Sanchez
IPC分类号： H01J27/00
CPC分类号： H01J37/08 , H01J27/028 , H01J27/26 , H01J2237/0048 , H01J2237/08 , H01J2237/0815 , H01J2237/0827 , H01J2237/31749
摘要： An apparatus for producing negative ions including an emitter coated with an ionic liquid room-temperature molten salt, an electrode positioned downstream relative to the emitter, a power supply that applies a voltage to the emitter with respect to the electrode. The power supply is sufficient to generate a stable high brightness beam of negative ions having minimal chromatic and spherical aberrations in the beam. An electrostatic lens and deflector is used to focus and direct the beam to a target.
摘要翻译：一种用于产生负离子的装置，包括涂覆有离子液体室温熔融盐的发射体，位于发射极下游的电极，相对于电极向发射极施加电压的电源。电源足以产生稳定的高亮度的负离子束，该束具有在光束中最小的色差和球面像差。静电透镜和偏转器用于聚焦并将光束引导到目标。

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