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    • 1. 发明授权
    • Electrodeposition method
    • 电沉积法
    • US06475367B1
    • 2002-11-05
    • US09501522
    • 2000-02-09
    • Noboru ToyamaKozo AraoYuichi SonodaYusuke Miyamoto
    • Noboru ToyamaKozo AraoYuichi SonodaYusuke Miyamoto
    • C25D706
    • C25D9/08C25D7/0614C25D7/0657
    • There is disclosed an electrodeposition method capable of suppressing the drop in the power supply voltage and minimizing the heat loss by the electrodeposition current, thereby achieving uniform film formation with satisfactory characteristics. A conductive substrate is dipped in an electrodeposition bath held in an electrodeposition tank, and an oxide is electrolytically deposited on the conductive substrate. An electricity feed means as at least one electrode of the electrodeposition tank is composed of a conductive member so provided as to be in contact with a back surface of the conductive substrate, wherein the contact position of the electricity feed means and the conductive substrate is outside the electrodeposition bath, and wherein the resistance, including contact resistance, between the closer to the electricity feed means of a position of entry of the conductive substrate into the electrodeposition bath and a position of discharge of the conductive substrate from the electrodeposition bath, and the contact position of the conductive substrate with the electricity feed means is 20&OHgr; or less.
    • 公开了一种能够抑制电源电压降低并且通过电沉积电流最小化热损失的电沉积方法,从而获得具有令人满意的特性的均匀成膜。 将导电性基材浸渍在保持在电沉积槽中的电沉积浴中,氧化物电解沉积在导电性基材上。 一种供电装置,其特征在于,所述电沉积槽的至少一个电极由导电构件构成,所述导电构件设置为与所述导电基板的背面接触,其中所述供电装置和所述导电基板的接触位置在外部 电沉积浴,并且其中在导电基底进入电沉积浴的位置更接近馈电装置之间的电阻(包括接触电阻)和导电基底从电沉积浴放电的位置,以及 导电基板与供电装置的接触位置为20OMEGA以下。
    • 2. 发明授权
    • Process for electrodepositing zinc oxide film
    • 电沉积氧化锌膜的工艺
    • US06632346B2
    • 2003-10-14
    • US09897947
    • 2001-07-05
    • Kozo AraoNoboru ToyamaYuichi SonodaYusuke Miyamoto
    • Kozo AraoNoboru ToyamaYuichi SonodaYusuke Miyamoto
    • C25D1100
    • H01G9/2027C25D9/08C25D21/02H01L31/03921H01L31/1836Y02E10/542Y02P70/521
    • The present process for electrodepositing a zinc oxide film comprises the steps of immersing a substrate and an opposing electrode in an electrodeposition bath which contains zinc nitrate and is kept heated, and forming the zinc oxide film on the substrate by passing a current between the substrate and the opposing electrode, wherein the process further includes a step of trapping the particles of zinc oxide precipitated in the electrodeposition bath by circulating or stirring the bath before the formation of the zinc oxide film, whereby the present process can prevent the generated zinc oxide powder from depositing on the surfaces of the substrate and the zinc oxide film formed by electrodeposition when restarting or starting the formation of a zinc oxide film by the electrodeposition using an electrodeposition apparatus, and hence the formation of a uniform zinc oxide film free from defects.
    • 本发明的电沉积氧化锌膜的方法包括以下步骤:将基材和相对电极浸入含有硝酸锌的电沉积浴中并保持加热,并通过在基板和基板之间传递电流而在基板上形成氧化锌膜 所述对置电极,其中,所述方法还包括通过在形成所述氧化锌膜之前循环或搅拌所述浴来捕集在所述电沉积浴中析出的氧化锌颗粒的步骤,由此本发明的方法可以防止所产生的氧化锌粉末 当通过使用电沉积装置的电沉积来重新启动或开始形成氧化锌膜时,通过电沉积形成的基板和氧化锌膜的表面上沉积,从而形成均匀的没有缺陷的氧化锌膜。 PTEXT>
    • 6. 发明授权
    • Apparatus and process for producing zinc oxide film
    • 用于生产氧化锌膜的设备和方法
    • US06733650B2
    • 2004-05-11
    • US09897012
    • 2001-07-03
    • Yuichi SonodaKozo AraoNoboru ToyamaYusuke Miyamoto
    • Yuichi SonodaKozo AraoNoboru ToyamaYusuke Miyamoto
    • C25D706
    • C25D9/08C25D7/0614C25D21/18
    • Disclosed are a process for producing a zinc oxide film comprising the steps of transporting a conductive long substrate via above at least one electrode comprised of zinc in an electrodeposition bath held in an electrodeposition tank and applying an electric field between the electrode and the conductive long substrate, thereby forming a zinc oxide film on the conductive long substrate, the process comprising a first step of forming the zinc oxide film on a part of the conductive long substrate; a second step of stopping the application of the electric field and the transportation; and a third step of bringing at least a region of a part of the conductive long substrate being in contact with the electrodeposition bath in the second step into non-contact with the electrodeposition bath, and an apparatus suitably used for the process. The process and apparatus enables high-quality zinc oxide films to be produced.
    • 公开了一种生产氧化锌膜的方法,包括以下步骤:将导电长基材经由上述至少一个由锌组成的电极输送到保持在电沉积槽中的电沉积浴中并在电极和导电长基板之间施加电场 从而在导电性长基板上形成氧化锌膜,该方法包括在导电性长基板的一部分上形成氧化锌膜的第一工序; 停止电场和运输的应用的第二步; 以及第三步骤,使得在第二步骤中的导电长基板的与电沉积浴接触的部分的至少一部分区域与电沉积浴非接触,以及适合用于该方法的设备。 该方法和装置能够生产出高质量的氧化锌膜。
    • 9. 发明授权
    • Method of producing thin film of zinc oxide, process for manufacturing photovoltaic element using its method, and photovoltaic element
    • 氧化锌薄膜的制造方法,使用其制造光电元件的方法和光电元件
    • US06544877B1
    • 2003-04-08
    • US09447239
    • 1999-11-23
    • Yuichi SonodaKozo AraoNoboru ToyamaYusuke Miyamoto
    • Yuichi SonodaKozo AraoNoboru ToyamaYusuke Miyamoto
    • C25D1100
    • H01L31/022425C25D9/08H01L21/02422H01L21/02425H01L21/02491H01L21/02532H01L21/02554H01L21/02628H01L31/056Y02E10/52
    • The method of the present invention is a method of producing a thin film of zinc oxide, which comprises immersing a counter electrode and a conductive substrate as a negative electrode in an aqueous solution containing nitrate ions and 0.05 mol/liter or more of zinc ions, and passing a current between the counter electrode and the conductive substrate to electrochemically deposit zinc oxide on the conductive substrate from the aqueous solution, thereby forming a thin film of zinc oxide, wherein a film forming rate of the thin film is varied at least one time midway during an electrolytic deposition reaction for forming the thin film. The present invention can provide the following meritorious advantages: it is possible to form a texture-structured thin film effective in optical confinement in a short time by using the above electrolytic deposition method advantageous for lowering a production cost, to prevent abnormal growth of a deposited film, to have a film surface excellent in uniformity and adhesion, and to improve photoelectric characteristics and promote mass productivity by applying the present invention to the stacked structure of a photovoltaic element.
    • 本发明的方法是一种氧化锌薄膜的制造方法,其特征在于,将含有硝酸根离子和0.05mol / l以上锌离子的水溶液中的相对电极和导电性基板作为负极浸渍, 并且在对电极和导电基板之间通过电流,以从电解液中将氧化锌从水溶液中沉积在导电性基板上,由此形成氧化锌薄膜,其中薄膜的成膜速度至少改变一次 在用于形成薄膜的电解沉积反应期间的中途。 本发明可以提供以下优点:通过使用有利于降低生产成本的上述电解沉积方法,可以在短时间内形成有效的光学限制的纹理结构薄膜,以防止沉积物的异常生长 膜具有均匀性和粘合性优异的膜表面,并且通过将本发明应用于光伏元件的堆叠结构来改善光电特性并提高质量生产率。