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1. 发明授权

US06475367B1 Electrodeposition method 失效
标题翻译：电沉积法
公开(公告)号：US06475367B1
公开(公告)日：2002-11-05
申请号：US09501522
申请日：2000-02-09
申请人： Noboru Toyama , Kozo Arao , Yuichi Sonoda , Yusuke Miyamoto
发明人： Noboru Toyama , Kozo Arao , Yuichi Sonoda , Yusuke Miyamoto
IPC分类号： C25D706
CPC分类号： C25D9/08 , C25D7/0614 , C25D7/0657
摘要： There is disclosed an electrodeposition method capable of suppressing the drop in the power supply voltage and minimizing the heat loss by the electrodeposition current, thereby achieving uniform film formation with satisfactory characteristics. A conductive substrate is dipped in an electrodeposition bath held in an electrodeposition tank, and an oxide is electrolytically deposited on the conductive substrate. An electricity feed means as at least one electrode of the electrodeposition tank is composed of a conductive member so provided as to be in contact with a back surface of the conductive substrate, wherein the contact position of the electricity feed means and the conductive substrate is outside the electrodeposition bath, and wherein the resistance, including contact resistance, between the closer to the electricity feed means of a position of entry of the conductive substrate into the electrodeposition bath and a position of discharge of the conductive substrate from the electrodeposition bath, and the contact position of the conductive substrate with the electricity feed means is 20&OHgr; or less.
摘要翻译：公开了一种能够抑制电源电压降低并且通过电沉积电流最小化热损失的电沉积方法，从而获得具有令人满意的特性的均匀成膜。将导电性基材浸渍在保持在电沉积槽中的电沉积浴中，氧化物电解沉积在导电性基材上。一种供电装置，其特征在于，所述电沉积槽的至少一个电极由导电构件构成，所述导电构件设置为与所述导电基板的背面接触，其中所述供电装置和所述导电基板的接触位置在外部电沉积浴，并且其中在导电基底进入电沉积浴的位置更接近馈电装置之间的电阻（包括接触电阻）和导电基底从电沉积浴放电的位置，以及导电基板与供电装置的接触位置为20OMEGA以下。

2. 发明授权

US06632346B2 Process for electrodepositing zinc oxide film 失效
标题翻译：电沉积氧化锌膜的工艺
公开(公告)号：US06632346B2
公开(公告)日：2003-10-14
申请号：US09897947
申请日：2001-07-05
申请人： Kozo Arao , Noboru Toyama , Yuichi Sonoda , Yusuke Miyamoto
发明人： Kozo Arao , Noboru Toyama , Yuichi Sonoda , Yusuke Miyamoto
IPC分类号： C25D1100
CPC分类号： H01G9/2027 , C25D9/08 , C25D21/02 , H01L31/03921 , H01L31/1836 , Y02E10/542 , Y02P70/521
摘要： The present process for electrodepositing a zinc oxide film comprises the steps of immersing a substrate and an opposing electrode in an electrodeposition bath which contains zinc nitrate and is kept heated, and forming the zinc oxide film on the substrate by passing a current between the substrate and the opposing electrode, wherein the process further includes a step of trapping the particles of zinc oxide precipitated in the electrodeposition bath by circulating or stirring the bath before the formation of the zinc oxide film, whereby the present process can prevent the generated zinc oxide powder from depositing on the surfaces of the substrate and the zinc oxide film formed by electrodeposition when restarting or starting the formation of a zinc oxide film by the electrodeposition using an electrodeposition apparatus, and hence the formation of a uniform zinc oxide film free from defects.
摘要翻译：本发明的电沉积氧化锌膜的方法包括以下步骤：将基材和相对电极浸入含有硝酸锌的电沉积浴中并保持加热，并通过在基板和基板之间传递电流而在基板上形成氧化锌膜所述对置电极，其中，所述方法还包括通过在形成所述氧化锌膜之前循环或搅拌所述浴来捕集在所述电沉积浴中析出的氧化锌颗粒的步骤，由此本发明的方法可以防止所产生的氧化锌粉末当通过使用电沉积装置的电沉积来重新启动或开始形成氧化锌膜时，通过电沉积形成的基板和氧化锌膜的表面上沉积，从而形成均匀的没有缺陷的氧化锌膜。 PTEXT>

3. 发明授权

US06471848B1 Electrodeposition method of forming an oxide film 失效
标题翻译：电沉积法形成氧化膜
公开(公告)号：US06471848B1
公开(公告)日：2002-10-29
申请号：US09248891
申请日：1999-02-12
申请人： Kozo Arao , Noboru Toyama , Yuichi Sonoda , Yusuke Miyamoto
发明人： Kozo Arao , Noboru Toyama , Yuichi Sonoda , Yusuke Miyamoto
IPC分类号： C25D548
CPC分类号： H01L31/02167 , C23C8/40 , C25D5/48 , C25D7/0621 , C25D9/08 , Y02E10/50 , Y10S205/917
摘要： This invention provides an electrodeposition apparatus, comprising at least one electrodeposition vessel for supplying a current between a substrate and an electrode in an electrodeposition bath to form an oxide film or the substrate and a rinsing means for rinsing the substrate after passing the electrodeposition tank with water, wherein a humidifying means for preventing drying of at least the film forming surface of the substrate is provided along the transporting path of the substrate at least at the exit side of the electrodeposition vessel and an oxide film forming method. Thus a uniform oxide film without unevenness can be formed on the substrate.
摘要翻译：本发明提供了一种电沉积装置，其包括至少一个电沉积容器，用于在电沉积浴中在基底和电极之间提供电流以形成氧化膜或基底;以及漂洗装置，用于在使电沉积槽通过水后漂洗基底其特征在于，至少在所述电沉积容器的出口侧，沿着所述基板的输送路径设置防止至少所述基板的成膜面干燥的加湿机构和氧化膜形成方法。因此，可以在基板上形成不均匀的均匀的氧化膜。

4. 发明授权

US06383359B2 Method for forming a zinc oxide layer and method for producing a photovoltaic device 有权
标题翻译：氧化锌层的形成方法及其制造方法
公开(公告)号：US06383359B2
公开(公告)日：2002-05-07
申请号：US09824041
申请日：2001-04-03
申请人： Kozo Arao , Hideo Tamura , Noboru Toyama , Yuichi Sonoda , Yusuke Miyamoto
发明人： Kozo Arao , Hideo Tamura , Noboru Toyama , Yuichi Sonoda , Yusuke Miyamoto
IPC分类号： C23C2800
CPC分类号： H01L31/1884 , C25D9/08 , H01L31/022483 , H01L31/02366 , H01L31/056 , H01L31/206 , Y02E10/52 , Y02P70/521 , Y10S428/935 , Y10T428/12549 , Y10T428/1259 , Y10T428/12611 , Y10T428/12618 , Y10T428/12639 , Y10T428/12743 , Y10T428/1275 , Y10T428/12757 , Y10T428/12764 , Y10T428/12979 , Y10T428/12986 , Y10T428/265
摘要： Provided are a substrate with a zinc oxide layer, in which at least a zinc oxide layer is provided on a support substrate, wherein the zinc oxide layer comprises a zinc oxide layer having the c axis perpendicular to the support substrate and a zinc oxide layer having the c axis slantindicular to the support substrate in the order from the side of the support substrate; and a photovoltaic device in which a semiconductor layer is formed on the substrate with the zinc oxide layer. Thus provided is the inexpensive photovoltaic device with excellent reflective performance and optical confinement effect and with high photoelectric conversion efficiency.
摘要翻译：本发明提供一种具有氧化锌层的基板，其中至少在支撑基板上设置有氧化锌层，其中氧化锌层包括具有垂直于支撑基板的c轴的氧化锌层和具有与支撑基板垂直的氧化锌层， c轴从支撑基板的一侧依次倾斜到支撑基板; 以及在氧化锌层的基板上形成有半导体层的光电转换装置。因此提供了具有优异的反射性能和光限制效应以及高光电转换效率的便宜的光电器件。

5. 发明授权

US06752915B2 Web conveying apparatus, and apparatus and method for electrodeposition using web conveying apparatus 失效
标题翻译：纸幅输送装置以及使用纸幅输送装置的电沉积的装置和方法
公开(公告)号：US06752915B2
公开(公告)日：2004-06-22
申请号：US09817301
申请日：2001-03-27
申请人： Kozo Arao , Noboru Toyama , Yuichi Sonoda , Yusuke Miyamoto
发明人： Kozo Arao , Noboru Toyama , Yuichi Sonoda , Yusuke Miyamoto
IPC分类号： C25D2112
CPC分类号： B65H23/105 , B21B37/68 , B21C47/003 , B21C47/34 , B21C47/3425 , B21C47/345 , B65H23/038 , B65H2511/214 , B65H2555/24 , B65H2220/01
摘要： The present invention provides a web conveying apparatus for conveying a web while holding the web and applying tension to the web, wherein the conveying apparatus has a plurality of rollers with which the web contacts to be conveyed, and at least one roller of the plurality of rollers has a mechanism for limiting deformation of the web within Y/E, and a web conveying method using a web conveying apparatus for conveying a web while holding the web and applying tension to the web, wherein the conveying apparatus has a plurality of rollers with which the web contacts to be conveyed, and the web is conveyed while the deformation of the web is limited within Y/E by a mechanism that is provided for at least one roller of the plurality of rollers. The apparatus and the method prevent meandering of the web.
摘要翻译：本发明提供一种纸幅输送装置，用于在保持纸幅并且向纸幅施加张力的同时传送纸幅，其中，所述输送装置具有多个辊，所述纸幅与所述辊接触以被输送，并且所述多个辊中的至少一个辊辊子具有用于限制幅材在Y / E内的变形的机构，以及使用幅材输送装置的幅材输送方法，所述幅材输送装置用于在保持纸幅并且向纸幅施加张力的同时输送纸幅，其中所述输送装置具有多个辊，当纸幅的变形被限制在Y / E内时，通过为多个辊中的至少一个辊提供的机构来传送纸幅。该装置和方法防止网页的曲折。

6. 发明授权

US06733650B2 Apparatus and process for producing zinc oxide film 失效
标题翻译：用于生产氧化锌膜的设备和方法
公开(公告)号：US06733650B2
公开(公告)日：2004-05-11
申请号：US09897012
申请日：2001-07-03
申请人： Yuichi Sonoda , Kozo Arao , Noboru Toyama , Yusuke Miyamoto
发明人： Yuichi Sonoda , Kozo Arao , Noboru Toyama , Yusuke Miyamoto
IPC分类号： C25D706
CPC分类号： C25D9/08 , C25D7/0614 , C25D21/18
摘要： Disclosed are a process for producing a zinc oxide film comprising the steps of transporting a conductive long substrate via above at least one electrode comprised of zinc in an electrodeposition bath held in an electrodeposition tank and applying an electric field between the electrode and the conductive long substrate, thereby forming a zinc oxide film on the conductive long substrate, the process comprising a first step of forming the zinc oxide film on a part of the conductive long substrate; a second step of stopping the application of the electric field and the transportation; and a third step of bringing at least a region of a part of the conductive long substrate being in contact with the electrodeposition bath in the second step into non-contact with the electrodeposition bath, and an apparatus suitably used for the process. The process and apparatus enables high-quality zinc oxide films to be produced.
摘要翻译：公开了一种生产氧化锌膜的方法，包括以下步骤：将导电长基材经由上述至少一个由锌组成的电极输送到保持在电沉积槽中的电沉积浴中并在电极和导电长基板之间施加电场从而在导电性长基板上形成氧化锌膜，该方法包括在导电性长基板的一部分上形成氧化锌膜的第一工序; 停止电场和运输的应用的第二步; 以及第三步骤，使得在第二步骤中的导电长基板的与电沉积浴接触的部分的至少一部分区域与电沉积浴非接触，以及适合用于该方法的设备。该方法和装置能够生产出高质量的氧化锌膜。

7. 发明授权

US06592739B1 Process and apparatus for forming zinc oxide film, and process and apparatus for producing photovoltaic device 失效
标题翻译：用于形成氧化锌膜的方法和设备，以及用于生产光伏器件的工艺和设备
公开(公告)号：US06592739B1
公开(公告)日：2003-07-15
申请号：US09722652
申请日：2000-11-28
申请人： Yuichi Sonoda , Kozo Arao , Noboru Toyama , Yusuke Miyamoto
发明人： Yuichi Sonoda , Kozo Arao , Noboru Toyama , Yusuke Miyamoto
IPC分类号： C25D706
CPC分类号： H01L31/076 , C23C28/322 , C23C28/345 , C25D5/028 , C25D5/48 , C25D7/0614 , C25D9/04 , H01L31/1836 , Y02E10/548
摘要： Disclosed are an electrodeposition process comprising the steps of transporting a substrate in an electrodeposition bath, and forming a film on the substrate, which process further comprises the step of removing particles from the surface of the substrate; and an electrodeposition apparatus comprising an electrodeposition tank for holding therein an electrodeposition bath, a mechanism for transporting a continuous-length-substrate while holding the substrate thereon, and an opposing electrode, which apparatus further comprises a mechanism for removing particles from the surface of the continuous-length substrate. These can provide a process and an apparatus by and in which dust in the bath or any particles due to film-peeling from electrodes can be prevented from causing difficulties such as impact marks in a film-deposited substrate during its transport, to form a good-quality electrodeposited film.
摘要翻译：公开了电沉积方法，其包括以下步骤：在电沉积浴中输送基底，并在基底上形成膜，该方法还包括从基底表面去除颗粒的步骤; 以及电沉积装置，其包括用于保持电沉积浴的电沉积槽，用于在保持基板的同时保持基板的同时输送连续长度基板的机构，以及相对电极，该装置还包括用于从其表面去除颗粒的机构连续长度衬底。这些可以提供一种工艺和装置，其中可以防止浴中的灰尘或由于电极的膜剥离引起的任何颗粒在运输过程中在膜沉积基材中引起诸如冲击痕的困难，形成良好的质量电沉积膜。

8. 发明授权

US06238808B1 Substrate with zinc oxide layer, method for producing zinc oxide layer, photovoltaic device, and method for producing photovoltaic device 有权
标题翻译：具有氧化锌层的基板，氧化锌层的制造方法，光电转换装置以及光电转换装置的制造方法
公开(公告)号：US06238808B1
公开(公告)日：2001-05-29
申请号：US09233328
申请日：1999-01-20
申请人： Kozo Arao , Hideo Tamura , Noboru Toyama , Yuichi Sonoda , Yusuke Miyamoto
发明人： Kozo Arao , Hideo Tamura , Noboru Toyama , Yuichi Sonoda , Yusuke Miyamoto
IPC分类号： B32B1500
CPC分类号： H01L31/1884 , C25D9/08 , H01L31/022483 , H01L31/02366 , H01L31/056 , H01L31/206 , Y02E10/52 , Y02P70/521 , Y10S428/935 , Y10T428/12549 , Y10T428/1259 , Y10T428/12611 , Y10T428/12618 , Y10T428/12639 , Y10T428/12743 , Y10T428/1275 , Y10T428/12757 , Y10T428/12764 , Y10T428/12979 , Y10T428/12986 , Y10T428/265
摘要： Provided are a substrate with a zinc oxide layer, in which at least a zinc oxide layer is provided on a support substrate, wherein the zinc oxide layer comprises a zinc oxide layer having the c axis perpendicular to the support substrate and a zinc oxide layer having the c axis slantindicular to the support substrate in the order from the side of the support substrate; and a photovoltaic device in which a semiconductor layer is formed on the substrate with the zinc oxide layer. Thus provided is the inexpensive photovoltaic device with excellent reflective performance and optical confinement effect and with high photoelectric conversion efficiency.
摘要翻译：本发明提供一种具有氧化锌层的基板，其中至少在支撑基板上设置有氧化锌层，其中氧化锌层包括具有垂直于支撑基板的c轴的氧化锌层和具有与支撑基板垂直的氧化锌层， c轴从支撑基板的一侧依次倾斜到支撑基板; 以及在氧化锌层的基板上形成有半导体层的光电转换装置。因此提供了具有优异的反射性能和光限制效应以及高光电转换效率的便宜的光电器件。

9. 发明授权

US06544877B1 Method of producing thin film of zinc oxide, process for manufacturing photovoltaic element using its method, and photovoltaic element 失效
标题翻译：氧化锌薄膜的制造方法，使用其制造光电元件的方法和光电元件
公开(公告)号：US06544877B1
公开(公告)日：2003-04-08
申请号：US09447239
申请日：1999-11-23
申请人： Yuichi Sonoda , Kozo Arao , Noboru Toyama , Yusuke Miyamoto
发明人： Yuichi Sonoda , Kozo Arao , Noboru Toyama , Yusuke Miyamoto
IPC分类号： C25D1100
CPC分类号： H01L31/022425 , C25D9/08 , H01L21/02422 , H01L21/02425 , H01L21/02491 , H01L21/02532 , H01L21/02554 , H01L21/02628 , H01L31/056 , Y02E10/52
摘要： The method of the present invention is a method of producing a thin film of zinc oxide, which comprises immersing a counter electrode and a conductive substrate as a negative electrode in an aqueous solution containing nitrate ions and 0.05 mol/liter or more of zinc ions, and passing a current between the counter electrode and the conductive substrate to electrochemically deposit zinc oxide on the conductive substrate from the aqueous solution, thereby forming a thin film of zinc oxide, wherein a film forming rate of the thin film is varied at least one time midway during an electrolytic deposition reaction for forming the thin film. The present invention can provide the following meritorious advantages: it is possible to form a texture-structured thin film effective in optical confinement in a short time by using the above electrolytic deposition method advantageous for lowering a production cost, to prevent abnormal growth of a deposited film, to have a film surface excellent in uniformity and adhesion, and to improve photoelectric characteristics and promote mass productivity by applying the present invention to the stacked structure of a photovoltaic element.
摘要翻译：本发明的方法是一种氧化锌薄膜的制造方法，其特征在于，将含有硝酸根离子和0.05mol / l以上锌离子的水溶液中的相对电极和导电性基板作为负极浸渍，并且在对电极和导电基板之间通过电流，以从电解液中将氧化锌从水溶液中沉积在导电性基板上，由此形成氧化锌薄膜，其中薄膜的成膜速度至少改变一次在用于形成薄膜的电解沉积反应期间的中途。本发明可以提供以下优点：通过使用有利于降低生产成本的上述电解沉积方法，可以在短时间内形成有效的光学限制的纹理结构薄膜，以防止沉积物的异常生长膜具有均匀性和粘合性优异的膜表面，并且通过将本发明应用于光伏元件的堆叠结构来改善光电特性并提高质量生产率。

10. 发明授权

US6110347A Method for the formation of an indium oxide film by electrodeposition process or electroless deposition process, a substrate provided with the indium oxide film for a semiconductor element, and a semiconductor element provided with the substrate 有权
标题翻译：通过电沉积法或无电沉积法形成氧化铟膜的方法，设置有用于半导体元件的氧化铟膜的衬底以及设置有衬底的半导体元件
公开(公告)号：US6110347A
公开(公告)日：2000-08-29
申请号：US172774
申请日：1998-10-15
申请人： Kozo Arao , Katsumi Nakagawa , Yukiko Iwasaki
发明人： Kozo Arao , Katsumi Nakagawa , Yukiko Iwasaki
IPC分类号： H01L31/0224 , H01L31/052 , H01L31/075 , H01L31/18 , C25D9/00 , B05D1/18 , C25D9/04 , C25D9/10
CPC分类号： H01L31/022466 , H01L31/056 , H01L31/075 , H01L31/1884 , Y02E10/52 , Y02E10/548
摘要： A method for forming an indium oxide film on an electrically conductive substrate by immersing the substrate and a counter electrode in an aqueous solution containing at least nitrate and indium ions and flowing an electric current between the substrate and the couter electrode, thereby causing indium oxide film formation on the substrate, is provided. A substrate for a semiconductor element and a photovoltaic element produced using the film forming method are also provided. An aqueous solution for the formation of an indium oxide film by an electroless deposition process, containing at least nitrate and indium ions and tartrate, is also disclosed. A film-forming method for the formation of an indium oxide film on a substrate by an electroless deposition process, using the aqueous solution, and a substrate for a semiconductor element and a photovoltaic element produced using the film-forming method are further provided.
摘要翻译：一种通过将基板和对电极浸入至少含有硝酸盐和铟离子的水溶液中并在基板和couter电极之间流动电流从而在导电基板上形成氧化铟膜的方法，从而使氧化铟膜提供了衬底上的形成。还提供了一种用于半导体元件的基板和使用该膜形成方法制造的光电元件。还公开了通过无电沉积方法形成氧化铟膜的水溶液，其至少含有硝酸盐和铟离子和酒石酸盐。还提供了一种通过使用该水溶液的无电沉积工艺在衬底上形成氧化铟膜的膜形成方法，以及使用该膜形成方法制造的半导体元件用基板和光电元件。

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