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1. 发明授权

US6058544A Scrubbing apparatus and scrubbing method 失效
标题翻译：擦洗装置和洗涤方法
公开(公告)号：US6058544A
公开(公告)日：2000-05-09
申请号：US25344
申请日：1998-02-18
申请人： Kimio Motoda , Yoshiharu Ota , Norio Uchihira , Kiyohisa Tateyama
发明人： Kimio Motoda , Yoshiharu Ota , Norio Uchihira , Kiyohisa Tateyama
IPC分类号： G02F1/13 , B08B1/00 , B08B1/04 , B08B3/04 , B08B11/02 , G11B23/50 , H01L21/00 , H01L21/304 , B08B3/10
CPC分类号： H01L21/67051 , B08B1/007 , B08B1/04 , B08B11/02 , H01L21/67046 , G11B23/505
摘要： A scrubbing apparatus comprises a holding member, which holds the outer circumference of the substrate from its back surface and has an opening to expose the back surface of the held substrate toward the bottom side; a supporting member, which supports substantially the center between two opposed sides of the holding member; a scrubbing brush, which comes in contact with the exposed back surface of the substrate from the bottom side; a brush drive mechanism, which transfers the scrubbing brush along the two opposed sides of the holding member; and a rotation drive mechanism, which drives to rotate the holding member together with the supporting member. Thus, a space can be saved, and the back surface of the substrate can be scrubbed.
摘要翻译：洗涤装置包括保持构件，该保持构件从其后表面保持衬底的外周，并具有用于将保持的衬底的后表面朝向底侧露出的开口; 支撑构件，其基本上支撑在所述保持构件的两个相对侧之间的中心; 洗涤刷，其从底侧与衬底的暴露的背面接触; 刷驱动机构，其沿着保持构件的两个相对侧传送洗刷刷; 以及旋转驱动机构，其驱动以使支撑构件与支撑构件一起旋转。因此，可以节省空间，并且可以擦洗衬底的背面。

2. 发明授权

US6159288A Method and apparatus for cleaning treatment 失效
公开(公告)号：US6159288A
公开(公告)日：2000-12-12
申请号：US935917
申请日：1997-09-23
申请人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Kimio Motoda , Yoshitaka Matsuda , Tetsuya Sada , Kiyohisa Tateyama
发明人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Kimio Motoda , Yoshitaka Matsuda , Tetsuya Sada , Kiyohisa Tateyama
IPC分类号： B05C11/08 , B05C9/06 , B05C11/00
CPC分类号： B05C11/08 , Y10S134/902
摘要： An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.

3. 发明授权

US6013317A Coating apparatus and method therefor 失效
标题翻译：涂布装置及其方法
公开(公告)号：US6013317A
公开(公告)日：2000-01-11
申请号：US40267
申请日：1998-03-16
申请人： Kimio Motoda , Kiyohisa Tateyama
发明人： Kimio Motoda , Kiyohisa Tateyama
IPC分类号： B05C5/00 , B05C11/08 , B05D1/40 , B08B3/00 , B08B9/00 , G03F7/16 , H01L21/00 , H01L21/027 , B05D3/12
CPC分类号： H01L21/6715 , B05C11/08 , B08B3/00 , B08B9/00 , G03F7/162 , Y10S134/902
摘要： A coating apparatus comprises a rotary container rotatable about a rotational axis as the center, a rotary rest table, located in the rotary container to be movable vertically and rotatable about the rotational axis as the center, for supporting a target substrate thereon, coating solution supply pipe for applying a coating solution to the target substrate, cleaning solution supply pipe for spraying a cleaning solution to an inner surface of the rotary container, a seal member provided between the rotary rest table and the bottom wall of the rotary container and capable of sealing a gap between the rotary rest table and the bottom wall of the rotary container, and connecting mechanism for connecting the rotary container and the rotary rest table so as to rotate together. The cleaning solution supply pipe projects from a through hole formed in the upper portion of the rotary container to be coaxial with the rotational axis, and the coating solution supply pipe projects from the through hole of the rotary container to be coaxial with the rotational axis.
摘要翻译：一种涂覆装置，包括以围绕作为中心的旋转轴线可旋转的旋转容器，旋转托架，位于旋转容器中，以可旋转轴线为中心垂直移动并可旋转，用于将目标基板支撑在其上，用于将涂布溶液施加到目标基板的管道，用于将清洗溶液喷射到旋转容器的内表面的清洁溶液供给管，设置在旋转托架和旋转容器的底壁之间并且能够密封的清洁溶液供给管旋转托架和旋转容器的底壁之间的间隙，以及用于连接旋转容器和旋转托架一起旋转的连接机构。清洗液供给管从形成在旋转容器的上部的贯通孔突出成与旋转轴线同轴，涂布液供给管从旋转容器的贯通孔突出成与旋转轴线同轴。

4. 发明授权

US5762708A Coating apparatus therefor 失效
标题翻译：涂装设备
公开(公告)号：US5762708A
公开(公告)日：1998-06-09
申请号：US525342
申请日：1995-09-07
申请人： Kimio Motoda , Kiyohisa Tateyama
发明人： Kimio Motoda , Kiyohisa Tateyama
IPC分类号： B05C5/00 , B05C11/08 , B05D1/40 , B08B3/00 , B08B9/00 , G03F7/16 , H01L21/00 , H01L21/027 , B05C11/02
CPC分类号： H01L21/6715 , B05C11/08 , B08B3/00 , B08B9/00 , G03F7/162 , Y10S134/902
摘要： A coating apparatus comprises a rotary container rotatable about a rotational axis as the center, a rotary rest table, located in the rotary container to be movable vertically and rotatable about the rotational axis as the center, for supporting a target substrate thereon, coating solution supply pipe for applying a coating solution to the target substrate, cleaning solution supply pipe for spraying a cleaning solution to an inner surface of the rotary container, a seal member provided between the rotary rest table and the bottom wall of the rotary container and capable of sealing a gap between the rotary rest table and the bottom wall of the rotary container, and connecting mechanism for connecting the rotary container and the rotary rest table so as to rotate together. The cleaning solution supply pipe projects from a through hole formed in the upper portion of the rotary container to be coaxial with the rotational axis, and the coating solution supply pipe projects from the through hole of the rotary container to be coaxial with the rotational axis.
摘要翻译：一种涂覆装置，包括以围绕作为中心的旋转轴线可旋转的旋转容器，旋转托架，位于旋转容器中，以可旋转轴线为中心垂直移动并可旋转，用于将目标基板支撑在其上，用于将涂布溶液施加到目标基板的管道，用于将清洗溶液喷射到旋转容器的内表面的清洁溶液供给管，设置在旋转托架和旋转容器的底壁之间并且能够密封的清洁溶液供给管旋转托架和旋转容器的底壁之间的间隙，以及用于连接旋转容器和旋转托架一起旋转的连接机构。清洗液供给管从形成在旋转容器的上部的贯通孔突出成与旋转轴线同轴，涂布液供给管从旋转容器的贯通孔突出成与旋转轴线同轴。

5. 发明授权

US5945161A Apparatus and method for supplying process solution to surface of substrate to be processed 失效
标题翻译：将处理液供给到待处理基板的表面的装置和方法
公开(公告)号：US5945161A
公开(公告)日：1999-08-31
申请号：US993021
申请日：1997-12-18
申请人： Hiroshi Hashimoto , Kiyohisa Tateyama , Kiyomitsu Yamaguchi , Yoshitaka Matsuda , Norio Uchihira , Mitsuhiro Sakai , Fumio Satou
发明人： Hiroshi Hashimoto , Kiyohisa Tateyama , Kiyomitsu Yamaguchi , Yoshitaka Matsuda , Norio Uchihira , Mitsuhiro Sakai , Fumio Satou
IPC分类号： B05C11/08 , B05D1/00 , H01L21/00 , B05D3/12
CPC分类号： H01L21/6715 , B05C11/08 , B05D1/005
摘要： Disclosed is a processing apparatus comprising holding means, support means, process solution supply means, life means, and rotating means. A substrate to be processed is rotatably held by the holding means. An overhanging portion of the substrate extending over an edge of the holding means is supported by the support means to maintain a front surface of the substrate horizontally flat. A process solution is supplied from the process solution supply means onto the front surface of the substrate held by the holding means and supported by the support means. The substrate held by the holding means is vertically moved by the lift means relative to the support means. Further, the substrate moved upward relative to the support means is rotated by the rotating means.
摘要翻译：公开了一种处理装置，包括保持装置，支撑装置，处理液供给装置，寿命装置和旋转装置。待加工的基板被保持装置可旋转地保持。在保持装置的边缘上延伸的衬底的悬伸部分被支撑装置支撑，以使衬底的前表面水平地保持平坦。处理液从处理液供给装置供给到由保持装置保持的基板的前表面上并由支撑装置支撑。由保持装置保持的基板通过提升装置相对于支撑装置垂直移动。此外，相对于支撑装置向上移动的基板由旋转装置旋转。

6. 发明授权

US5718763A Resist processing apparatus for a rectangular substrate 失效
标题翻译：用于矩形基板的抗蚀加工装置
公开(公告)号：US5718763A
公开(公告)日：1998-02-17
申请号：US416369
申请日：1995-04-04
申请人： Kiyohisa Tateyama , Kimio Motoda , Tatsuya Iwasaki , Takenobu Matsuo , Kazuki Denpoh , Eiji Yamaguchi
发明人： Kiyohisa Tateyama , Kimio Motoda , Tatsuya Iwasaki , Takenobu Matsuo , Kazuki Denpoh , Eiji Yamaguchi
IPC分类号： B05C11/08 , G03F7/16 , H01L21/00 , H01L21/687 , D05C5/00
CPC分类号： H01L21/67173 , B05C11/08 , G03F7/162 , G03F7/168 , H01L21/6715 , H01L21/68707 , Y10S134/902
摘要： A apparatus of resist-processing a rectangular substrate including a resist coating step of supplying resist solution to the substrate, while rotating it, to form resist film at least on one surface of it and a resist removing step of jetting removing liquid, which can solve resist, to both surfaces of it at its side peripheral portions to remove the resist film from them.
摘要翻译：一种对矩形基板进行抗蚀处理的装置，包括在将抗蚀剂溶液旋转的同时将抗蚀剂溶液供给到基板的抗蚀剂涂布步骤，至少在其一个表面上形成抗蚀剂膜，以及除去液体的抗蚀剂去除步骤，其可以解决在其侧边缘处抵抗其两个表面以从它们去除抗蚀剂膜。

7. 发明授权

US5688322A Apparatus for coating resist on substrate 失效
标题翻译：用于在基材上涂覆抗蚀剂的装置
公开(公告)号：US5688322A
公开(公告)日：1997-11-18
申请号：US653341
申请日：1996-05-24
申请人： Kimio Motoda , Kiyohisa Tateyama , Noriyuki Anai
发明人： Kimio Motoda , Kiyohisa Tateyama , Noriyuki Anai
IPC分类号： B05C11/08 , G03F7/16 , B05C5/00
CPC分类号： G03F7/162 , B05C11/08
摘要： Disclosed is an apparatus for coating resist comprising a spin-chuck capable of moving vertically, holding a substrate received and rotating together with the substrate, resist solution supplying mean for supplying a resist solution onto a substrate held on the spin-chuck, a rotating cup surrounding the substrate held on the spin-chuck and rotated in synchronism with the spin-chuck, for receiving the resist solution centrifugally separated from the substrate, a drain cup provided around the rotating cup, for receiving a waste material discharged from the rotating cup, the drain cup having a collecting space for collecting the waste material received, a drainage passage having a drainage port opening into the collecting space for discharging a liquid component of the waste material collected in the collecting space therefrom, an exhaust passage having an exhaust port communicating with the collecting space, for discharging a gas component of the waste material collected in the collecting space therefrom, an exhaust gas guiding passage provided at a level higher than at least the drainage port, for guiding the gas component from the collecting space to the exhaust passage, and a gas-liquid separating member provided in the exhaust gas guiding passage, for condensing a liquid component contained in air containing the gas component by striking it against the gas-liquid separating member, thereby preventing the liquid component from going around the exhaust passage.
摘要翻译：公开了一种涂覆抗蚀剂的装置，包括能够垂直移动的旋转卡盘，保持与基板一起容纳和旋转的基板，用于将抗蚀剂溶液供应到保持在旋转卡盘上的基板上的抗蚀剂溶液供应装置，旋转杯围绕保持在旋转卡盘上的基板并与旋转卡盘同步旋转，用于接收从基板离心分离的抗蚀剂溶液;设置在旋转杯周围的用于接收从旋转杯排出的废料的排液杯，所述排水杯具有用于收集所接收的废料的收集空间，排水通道，具有通向所述收集空间的排出口，用于排出收集在所述收集空间中的废料的液体成分;排气通道，具有收集空间，用于排出收集在集合体中的废料的气体成分 g的空气引导通道，排气导引通道，其设置在比至少所述排水口高的位置，用于将气体成分从收集空间引导到排气通道;以及气体分离部件，设置在排气引导通道中，用于通过将包含在气体成分的空气中的液体成分撞击气液分离部件而冷凝，从而防止液体成分绕排气通路。

8. 发明授权

US5853803A Resist processing method and apparatus 失效
标题翻译：抗蚀剂加工方法及装置
公开(公告)号：US5853803A
公开(公告)日：1998-12-29
申请号：US964608
申请日：1997-11-05
申请人： Kiyohisa Tateyama , Kimio Motoda , Tatsuya Iwasaki , Takenobu Matsuo , Kazuki Denpoh , Eiji Yamaguchi
发明人： Kiyohisa Tateyama , Kimio Motoda , Tatsuya Iwasaki , Takenobu Matsuo , Kazuki Denpoh , Eiji Yamaguchi
IPC分类号： B05C11/08 , G03F7/16 , H01L21/00 , H01L21/687 , B05D3/12
CPC分类号： H01L21/67173 , B05C11/08 , G03F7/162 , G03F7/168 , H01L21/6715 , H01L21/68707 , Y10S134/902
摘要： A method of resist-processing a rectangular substrate including a resist coating step of supplying resist solution to the substrate, while rotating it, to form resist film at least on one surface of it and a resist removing step of jetting removing liquid, which can solve resist, to both surfaces of it at its side peripheral portions to remove the resist film from them.
摘要翻译：一种抗蚀剂处理方法，包括抗蚀剂涂布步骤，该方法包括在将抗蚀剂溶液旋转的同时向其提供抗蚀剂溶液，以至少在其一个表面上形成抗蚀剂膜，以及除去液体的抗蚀剂去除步骤，其可以解决在其侧边缘处抵抗其两个表面以从它们去除抗蚀剂膜。

9. 发明授权

US06749688B2 Coating method and apparatus for semiconductor process 失效
标题翻译：用于半导体工艺的涂覆方法和装置
公开(公告)号：US06749688B2
公开(公告)日：2004-06-15
申请号：US09270781
申请日：1999-03-17
申请人： Kiyohisa Tateyama , Kimio Motoda , Noriyuki Anai
发明人： Kiyohisa Tateyama , Kimio Motoda , Noriyuki Anai
IPC分类号： B05B716
CPC分类号： B05C11/08 , B05D1/005 , B05D3/104 , G03F7/16 , G03F7/161
摘要： A coating apparatus has a spin chuck for attracting and holding a semiconductor wafer in a horizontal state by means of vacuum. A movable beam is arranged above the spin chuck. The movable beam includes first and second nozzles integrally formed. The first nozzle is used for supplying a photo-resist liquid while the second nozzle is used for supplying a solvent for the photo-resist liquid. When a coating process is performed, the movable beam above the wafer is horizontally moved in one direction. The solvent is first supplied onto the wafer from the second nozzle, and the coating or photo-resist liquid is then supplied from the first nozzle, following the solvent. Wettability of the wafer relative to the photo-resist is increased by the solvent, prior to supply of the photo-resist liquid.
摘要翻译：涂布装置具有用于通过真空吸引并保持水平状态的半导体晶片的旋转卡盘。可移动光束布置在旋转卡盘上方。可动梁包括一体形成的第一和第二喷嘴。第一喷嘴用于供应光致抗蚀剂液体，而第二喷嘴用于供应用于光致抗蚀剂液体的溶剂。当执行涂覆处理时，晶片上方的可移动光束在一个方向上水平移动。首先从第二喷嘴将溶剂供应到晶片上，然后在溶剂之后从第一喷嘴提供涂层或光致抗蚀剂液体。在提供光致抗蚀剂液体之前，晶片相对于光致抗蚀剂的润湿性由溶剂增加。

10. 发明授权

US06168665A Substrate processing apparatus 失效
标题翻译：基板加工装置
公开(公告)号：US06168665A
公开(公告)日：2001-01-02
申请号：US09185503
申请日：1998-11-04
申请人： Mitsuhiro Sakai , Kiyohisa Tateyama , Kimio Motoda
发明人： Mitsuhiro Sakai , Kiyohisa Tateyama , Kimio Motoda
IPC分类号： B05C2100
CPC分类号： H01L21/67017 , B05C11/08
摘要： A substrate processing apparatus comprising a substrate mounting table, a cup having an upper opening and surrounding the substrate mounting table, a lid for opening/closing the upper opening of the cup, a support arm for supporting the lid, a first lifting mechanism having a first piston for supporting the support arm directly or indirectly and a first cylinder for guiding the first piston in an up-and-down motion, a second lifting mechanism having a second piston for supporting the support arm directly or indirectly and a second cylinder for guiding the second piston in up-and -down motion, a driving circuit for supplying the pressurized fluid to the first and second cylinders, independently and exhausting the pressurized fluid from the first and second cylinders, independently, and a control mechanism for controlling operations of the driving circuit.
摘要翻译：一种基板处理装置，包括基板安装台，具有上开口并围绕基板安装台的杯，用于打开/关闭杯的上开口的盖，用于支撑盖的支撑臂，具有第一提升机构，用于直接或间接地支撑支撑臂的第一活塞和用于上下运动地引导第一活塞的第一气缸，具有用于直接或间接地支撑支撑臂的第二活塞的第二提升机构和用于引导的第二气缸所述第二活塞是上下运动的驱动电路，用于独立地将加压流体供应到第一和第二气缸的驱动电路独立地从第一和第二气缸排出加压流体;以及控制机构，用于控制驱动电路。

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