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    • 1. 发明授权
    • Local exposure apparatus, local exposure method and storage medium
    • 本地曝光装置,局部曝光方法和存储介质
    • US09146481B2
    • 2015-09-29
    • US13171972
    • 2011-06-29
    • Yoshiharu OtaShigeru MoriyamaYuki MatsumuraShigeki Tanaka
    • Yoshiharu OtaShigeru MoriyamaYuki MatsumuraShigeki Tanaka
    • G03B27/42G03F7/20H01L27/12
    • G03F7/70791G03F7/70291H01L27/1288
    • A local exposure apparatus for performing exposure processing on a specific area of a photosensitive film formed on a substrate includes a substrate conveyor configured to define a substrate conveying path and to horizontally convey the substrate along the substrate conveying path, a chamber configured to define an exposure processing space, a light source including a plurality of light-emitting elements linearly arranged above the substrate conveying path, a light emission drive unit configured to selectively drive one or more of the light-emitting elements of the light source, a substrate detector configured to detect the substrate conveyed by the substrate conveyor, and a control unit configured to control the light emission drive unit such that, when the specific area of the photosensitive film moves below the light source, only the light-emitting elements capable of irradiating the given area are driven to emit the light.
    • 用于对形成在基板上的感光膜的特定区域进行曝光处理的局部曝光装置包括:基板传送器,被配置为限定基板输送路径,并且沿着基板输送路径水平地输送基板;被配置为限定曝光 处理空间,包括线性排列在基板输送路径上方的多个发光元件的光源,被配置为选择性地驱动光源的一个或多个发光元件的发光驱动单元,被配置为 检测由基板输送机输送的基板,以及控制单元,其配置为控制发光驱动单元,使得当感光膜的比表面积在光源下方移动时,仅能够照射给定区域的发光元件 被驱动以发光。
    • 3. 发明授权
    • Interlock apparatus for a transfer machine
    • 用于转印机的联锁装置
    • US06336054B1
    • 2002-01-01
    • US09291045
    • 1999-04-14
    • Yoshiharu OtaMasaaki YoshidaShinya TanoueTatsuya Iwasaki
    • Yoshiharu OtaMasaaki YoshidaShinya TanoueTatsuya Iwasaki
    • G06F1900
    • H01L21/67748H01L21/67242H01L21/67259
    • A processing system for processing a substrate. The processing system includes a plurality of processing machines, a machine movable along a transfer path for transferring the substrate to the machines, a drive unit for driving the machine, and a control unit. The control unit includes a memory for storing a teaching threshold in a teaching mode and a practical operation threshold in a practical operation mode that is higher than the teaching threshold when a moving parameter of the drive unit exceeds a given value. The control unit also includes a controller monitoring a parameter representing a moving state of the drive unit to stop the drive unit when the parameter exceeds the practical operation threshold in the practical operation mode or when the parameter exceeds the teaching threshold in the teaching mode.
    • 一种用于处理衬底的处理系统。 处理系统包括多个处理机器,沿着用于将基板传送到机器的传送路径移动的机器,用于驱动机器的驱动单元和控制单元。 控制单元包括存储器,用于在实际操作模式中存储教学阈值和实际操作阈值,该实际操作模式当驱动单元的移动参数超过给定值时高于教学阈值。 控制单元还包括控制器,当在实践操作模式中参数超过实际操作阈值时或者当教学模式中参数超过教学阈值时,监控表示驱动单元的移动状态的参数以停止驱动单元。
    • 5. 发明申请
    • LOCAL EXPOSURE APPARATUS, LOCAL EXPOSURE METHOD AND STORAGE MEDIUM
    • 本地曝光装置,本地曝光方法和储存介质
    • US20120002183A1
    • 2012-01-05
    • US13171972
    • 2011-06-29
    • Yoshiharu OTAShigeru MORIYAMAYuki MATSUMURAShigeki Tanaka
    • Yoshiharu OTAShigeru MORIYAMAYuki MATSUMURAShigeki Tanaka
    • G03B27/54
    • G03F7/70791G03F7/70291H01L27/1288
    • A local exposure apparatus for performing exposure processing on a specific area of a photosensitive film formed on a substrate includes a substrate conveyor configured to define a substrate conveying path and to horizontally convey the substrate along the substrate conveying path, a chamber configured to define an exposure processing space, a light source including a plurality of light-emitting elements linearly arranged above the substrate conveying path, a light emission drive unit configured to selectively drive one or more of the light-emitting elements of the light source, a substrate detector configured to detect the substrate conveyed by the substrate conveyor, and a control unit configured to control the light emission drive unit such that, when the specific area of the photosensitive film moves below the light source, only the light-emitting elements capable of irradiating the given area are driven to emit the light.
    • 用于对形成在基板上的感光膜的特定区域进行曝光处理的局部曝光装置包括:基板传送器,被配置为限定基板输送路径,并且沿着基板输送路径水平地输送基板;被配置为限定曝光 处理空间,包括线性排列在基板输送路径上方的多个发光元件的光源,被配置为选择性地驱动光源的一个或多个发光元件的发光驱动单元,被配置为 检测由基板输送机输送的基板,以及控制单元,其配置为控制发光驱动单元,使得当感光膜的比表面积在光源下方移动时,仅能够照射给定区域的发光元件 被驱动以发光。