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1. 发明授权

US06063233A Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna 失效
公开(公告)号：US06063233A
公开(公告)日：2000-05-16
申请号：US733555
申请日：1996-10-21
申请人： Kenneth Collins , Michael Rice , Eric Askarinam , Douglas Buchberger , Craig Roderick
发明人： Kenneth Collins , Michael Rice , Eric Askarinam , Douglas Buchberger , Craig Roderick
IPC分类号： H05H1/46 , C23C16/517 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/311 , H01L21/683 , C23F1/02 , C23C16/00
CPC分类号： H01J37/32458 , C23C16/517 , H01J37/32082 , H01J37/321 , H01J37/32146 , H01J37/32165 , H01J37/32467 , H01J37/32522 , H01J37/32688 , H01J37/32706 , H01J37/32871 , H01L21/31116 , H01L21/6831 , H01F2029/143 , H01J2237/3343 , H01J2237/3345 , H01J2237/3346
摘要： The invention is embodied in a plasma reactor including a plasma reactor chamber and a workpiece support for holding a workpiece near a support plane inside the chamber during processing, the chamber having a reactor enclosure portion facing the support, a cold body overlying the reactor enclosure portion, a plasma source power applicator between the reactor enclosure portion and the cold body and a thermally conductor between and in contact with the cold body and the reactor enclosure. The thermal conductor and the cold sink define a cold sink interface therebetween, the reactor preferably further including a thermally conductive substance within the cold sink interface for reducing the thermal resistance across the cold sink interface. The thermally conductive substance can be a thermally conductive gas filling the cold body interface. Alternatively, the thermally conductive substance can be a thermally conductive solid material. The reactor can include a gas manifold in the cold body communicable with a source of the thermally conductive gas an inlet through the cold body from the gas manifold and opening out to the cold body interface. The reactor can further include an O-ring apparatus sandwiched between the cold body and the thermal conductor and defining a gas-containing volume in the cold body interface of nearly infinitesimal thickness in communication with the inlet from the cold body. More generally, the reactor can include the facilitation of thermal transfer across an interface between a hot and/or cold sink and any part exposed to the reactor chamber interior atmosphere, such as the ceiling, wall or polymer-hardening precursor ring, for example, by the insertion into that interface of a thermally conductive gas or substance.

2. 发明授权

US06514376B1 Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna 失效
标题翻译：具有架空螺线管天线的电感耦合射频等离子体反应器的热控制装置
公开(公告)号：US06514376B1
公开(公告)日：2003-02-04
申请号：US09520623
申请日：2000-03-07
申请人： Kenneth Collins , Michael Rice , Eric Askarinam , Douglas Buchberger , Craig Roderick
发明人： Kenneth Collins , Michael Rice , Eric Askarinam , Douglas Buchberger , Craig Roderick
IPC分类号： C23C1600
CPC分类号： C23C16/517 , H01F2029/143 , H01J37/32082 , H01J37/321 , H01J37/32146 , H01J37/32165 , H01J37/32458 , H01J37/32467 , H01J37/32522 , H01J37/32688 , H01J37/32706 , H01J37/32871 , H01J2237/3343 , H01J2237/3345 , H01J2237/3346 , H01L21/31116 , H01L21/6831
摘要： The invention is embodied in a plasma reactor including a plasma reactor chamber and a workpiece support for holding a workpiece near a support plane inside the chamber during processing, the chamber having a reactor enclosure portion facing the support, a cold body overlying the reactor enclosure portion, a plasma source power applicator between the reactor enclosure portion and the cold body and a thermally conductor between and in contact with the cold body and the reactor enclosure. The thermal conductor and the cold sink define a cold sink interface therebetween, the reactor preferably further including a thermally conductive substance within the cold sink interface for reducing the thermal resistance across the cold sink interface. The thermally conductive substance can be a thermally conductive gas filling the cold body interface. Alternatively, the thermally conductive substance can be a thermally conductive solid material. The reactor can include a gas manifold in the cold body communicable with a source of the thermally conductive gas an inlet through the cold body from the gas manifold and opening out to the cold body interface. The reactor can further include an O-ring apparatus sandwiched between the cold body and the thermal conductor and defining a gas-containing volume in the cold body interface of nearly infinitesimal thickness in communication with the inlet from the cold body. More generally, the reactor can include the facilitation of thermal transfer across an interface between a hot and/or cold sink and any part exposed to the reactor chamber interior atmosphere, such as the ceiling, wall or polymer-hardening precursor ring, for example, by the insertion into that interface of a thermally conductive gas or substance.
摘要翻译：本发明体现在等离子体反应器中，该等离子体反应器包括等离子体反应器室和工件支撑件，用于在加工期间将工件保持在室内的支撑平面附近，该室具有面向支撑件的反应器外壳部分，覆盖反应器外壳部分的冷体，反应器外壳部分和冷体之间的等离子体源功率施加器和在冷体和反应器外壳之间并与其接触的导热体。热导体和冷却槽在它们之间限定冷沉接口，反应器优选地还包括在冷沉接口内的导热物质，以降低冷接口接口上的热阻。导热物质可以是填充冷体界面的导热气体。或者，导热物质可以是导热固体材料。反应器可以包括在冷体中的气体歧管，其与导热气体源连通，通过来自气体歧管的冷体和通向冷体界面的入口。反应器还可以包括夹在冷体和热导体之间的O形环装置，并且在与冷体的入口连通的几乎无穷小的厚度的冷体界面中限定含气体体积。更一般地，反应器可以包括促进热和/或冷沉之间的界面和暴露于反应室内部大气的任何部分（例如天花板，壁或聚合物硬化前体环）之间的热传递，例如，通过插入该导热气体或物质的界面。

3. 发明授权

US06454898B1 Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners 失效
标题翻译：电感耦合RF等离子体反应器，具有架空螺线管天线和模块化限制磁铁衬垫
公开(公告)号：US06454898B1
公开(公告)日：2002-09-24
申请号：US09482261
申请日：2000-01-11
申请人： Kenneth Collins , Michael Rice , Douglas Buchberger , Craig Roderick , Eric Askarinam , Gerhard Schneider , John Trow , Joshua Tsui , Dennis Grimard , Gerald Yin , Robert Wu
发明人： Kenneth Collins , Michael Rice , Douglas Buchberger , Craig Roderick , Eric Askarinam , Gerhard Schneider , John Trow , Joshua Tsui , Dennis Grimard , Gerald Yin , Robert Wu
IPC分类号： C23C1434
CPC分类号： H01J37/32522 , C23C16/517 , H01F2029/143 , H01J37/32082 , H01J37/321 , H01J37/32146 , H01J37/32165 , H01J37/32458 , H01J37/32467 , H01J37/32688 , H01J37/32706 , H01J37/32871 , H01J2237/3343 , H01J2237/3345 , H01J2237/3346 , H01L21/31116 , H01L21/6831
摘要： In accordance with a first aspect of the invention, a plasma reactor having a chamber for containing a plasma and a passageway communicating with the chamber is enhanced with a first removable plasma confinement magnet module placed adjacent the passageway including a first module housing and a first plasma confinement magnet inside the housing. It may further include a second removable plasma confinement magnet module placed adjacent the passageway including a second module housing, and a second plasma confinement magnet. Preferably, the first and second modules are located on opposite sides of the passageway. Moreover, the first and second plasma confinement magnets have magnetic orientations which tend to oppose plasma transport or leakage through the passageway. Preferably, the module housing includes a relatively non-magnetic thermal conductor such as aluminum and is in thermal contact with said chamber body. Cooling apparatus can be thermally coupled to the chamber body, whereby to maintain the first plasma confinement magnet below its Curie temperature. If the reactor includes a pumping annulus adjacent of a periphery of the chamber, then the passageway can be one which communicates between the chamber and the pumping annulus. Also, the passageway can be a wafer slit valve or a gas feed inlet. Such a gas feed inlet can be a center gas feed through a ceiling of the chamber. The module housing can rest upon the chamber side wall and the chamber ceiling can rest upon the module housing.
摘要翻译：根据本发明的第一方面，具有用于容纳等离子体的腔室和与腔室连通的通路的等离子体反应器通过与通道相邻放置的第一可移除等离子体约束磁体模块而增强，该模块包括第一模块壳体和第一等离子体限制磁体在壳体内。其还可以包括邻近通道设置的第二可移除等离子体限制磁体模块，包括第二模块壳体和第二等离子体限制磁体。优选地，第一和第二模块位于通道的相对侧上。此外，第一和第二等离子体限制磁体具有倾向于抵抗等离子体输送或通过通道的泄漏的磁性取向。优选地，模块壳体包括诸如铝的相对非磁性的热导体，并且与所述室主体热接触。冷却装置可以热耦合到室主体，从而将第一等离子体限制磁体保持在其居里温度以下。如果反应器包括邻近室的周边的泵送环，则通道可以是在室和泵送环之间连通的通道。此外，通道可以是晶片狭缝阀或气体进料口。这种气体进料口可以是通过室的天花板的中心气体进料。模块壳体可以搁置在腔室侧壁上，并且室顶板可以靠在模块壳体上。

4. 发明授权

US6074512A Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners 失效
标题翻译：具有架空螺线管天线和模块化限制磁铁衬垫的感应耦合射频等离子体反应器
公开(公告)号：US6074512A
公开(公告)日：2000-06-13
申请号：US893393
申请日：1997-07-15
申请人： Kenneth Collins , Michael Rice , Douglas Buchberger , Craig Roderick , Eric Askarinam , Gerhard Schneider , John Trow , Joshua Tsui , Dennis Grimard , Gerald Yin , Robert Wu
发明人： Kenneth Collins , Michael Rice , Douglas Buchberger , Craig Roderick , Eric Askarinam , Gerhard Schneider , John Trow , Joshua Tsui , Dennis Grimard , Gerald Yin , Robert Wu
IPC分类号： H05H1/46 , C23C16/517 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/311 , H01L21/683 , C23C14/34 , C23C16/00 , C23F1/02
CPC分类号： H01J37/32522 , C23C16/517 , H01J37/32082 , H01J37/321 , H01J37/32146 , H01J37/32165 , H01J37/32458 , H01J37/32467 , H01J37/32688 , H01J37/32706 , H01J37/32871 , H01L21/31116 , H01L21/6831 , H01F2029/143 , H01J2237/3343 , H01J2237/3345 , H01J2237/3346
摘要： In accordance with a first aspect of the invention, a plasma reactor having a chamber for containing a plasma and a passageway communicating with the chamber is enhanced with a first removable plasma confinement magnet module placed adjacent the passageway including a first module housing and a first plasma confinement magnet inside the housing. It may further include a second removable plasma confinement magnet module placed adjacent the passageway including a second module housing, and a second plasma confinement magnet. Preferably, the first and second modules are located on opposite sides of the passageway. Moreover, the first and second plasma confinement magnets have magnetic orientations which tend to oppose plasma transport or leakage through the passageway. Preferably, the module housing includes a relatively non-magnetic thermal conductor such as aluminum and is in thermal contact with said chamber body. Cooling apparatus can be thermally coupled to the chamber body, whereby to maintain the first plasma confinement magnet below its Curie temperature. If the reactor includes a pumping annulus adjacent of a periphery of the chamber, then the passageway can be one which communicates between the chamber and the pumping annulus. Also, the passageway can be a wafer slit valve or a gas feed inlet. Such a gas feed inlet can be a center gas feed through a ceiling of the chamber. The module housing can rest upon the chamber side wall and the chamber ceiling can rest upon the module housing.
摘要翻译：根据本发明的第一方面，具有用于容纳等离子体的腔室和与腔室连通的通路的等离子体反应器通过与通道相邻放置的第一可移除等离子体约束磁体模块而增强，该模块包括第一模块壳体和第一等离子体限制磁体在壳体内。其还可以包括邻近通道设置的第二可移除等离子体限制磁体模块，包括第二模块壳体和第二等离子体限制磁体。优选地，第一和第二模块位于通道的相对侧上。此外，第一和第二等离子体限制磁体具有倾向于抵抗等离子体输送或通过通道的泄漏的磁性取向。优选地，模块壳体包括诸如铝的相对非磁性的热导体，并且与所述室主体热接触。冷却装置可以热耦合到室主体，从而将第一等离子体限制磁体保持在其居里温度以下。如果反应器包括邻近室的周边的泵送环，则通道可以是在室和泵送环之间连通的通道。此外，通道可以是晶片狭缝阀或气体进料口。这种气体进料口可以是通过室的天花板的中心气体进料。模块壳体可以搁置在腔室侧壁上，并且室顶板可以靠在模块壳体上。

5. 发明授权

US06524432B1 Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density 失效
标题翻译：具有感应天线的平行板电极等离子体反应器和等离子体离子密度的可调径向分布
公开(公告)号：US06524432B1
公开(公告)日：2003-02-25
申请号：US09539814
申请日：2000-03-30
申请人： Kenneth Collins , Michael Rice , John Trow , Douglas Buchberger , Eric Askarinam , Joshua Tsui , David Groechel , Raymond Hung
发明人： Kenneth Collins , Michael Rice , John Trow , Douglas Buchberger , Eric Askarinam , Joshua Tsui , David Groechel , Raymond Hung
IPC分类号： H01L2100
CPC分类号： H01J37/321 , H01J37/32165 , H01J37/32458 , H01J37/32467 , H01J37/32522 , H01L21/6831
摘要： There is disclosed a plasma reactor for processing a semiconductor workpiece such as a wafer, including a chamber having an overhead ceiling with a three-dimensional shape such as a hemisphere or dome. The reactor further includes an inductive antenna over the ceiling which may be conformal or nonconformal in shape with the ceiling. The ceiling may be a semiconductor material so that it can function as both a window for the inductive field of the antenna as well as an electrode which can be grounded, or to which RF power may be applied or which may be allowed to float electrically. The reactor includes various features which allow the radial distribution of the plasma ion density across the wafer surface to be adjusted to an optimum distribution for processing uniformity across the wafer surface.
摘要翻译：公开了一种用于处理诸如晶片的半导体工件的等离子体反应器，其包括具有诸如半球或圆顶的三维形状的架空天花板的室。反应器还包括在天花板上的感应天线，其可以与天花板的形状保形或不共形。天花板可以是半导体材料，使得其可以用作天线的感应场的窗口，以及可以接地的电极，或者可以施加RF功率或可以允许电力浮动的电极。反应器包括允许跨晶片表面的等离子体离子密度的径向分布被调整到最佳分布以处理跨晶片表面的均匀性的各种特征。

6. 发明授权

US6054013A Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density 失效
标题翻译：平行板电极等离子体反应器具有感应天线和等离子体离子密度的径向分布
公开(公告)号：US6054013A
公开(公告)日：2000-04-25
申请号：US740124
申请日：1996-10-24
申请人： Kenneth Collins , Michael Rice , John Trow , Douglas Buchberger , Eric Askarinam , Joshua Tsui , David Groechel , Raymond Hung
发明人： Kenneth Collins , Michael Rice , John Trow , Douglas Buchberger , Eric Askarinam , Joshua Tsui , David Groechel , Raymond Hung
IPC分类号： H05H1/46 , C23C16/50 , C23F4/00 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/31 , H01L21/683 , H05H1/00
CPC分类号： H01J37/321 , H01J37/32165 , H01J37/32458 , H01J37/32467 , H01J37/32522 , H01L21/6831
摘要： There is disclosed a plasma reactor for processing a semiconductor workpiece such as a wafer, including a chamber having an overhead ceiling with a three-dimensional shape such as a hemisphere or dome. The reactor further includes an inductive antenna over the ceiling which may be conformal or nonconformal in shape with the ceiling. The ceiling may be a semiconductor material so that it can function as both a window for the inductive field of the antenna as well as an electrode which can be grounded, or to which RF power may be applied or which may be allowed to float electrically. The reactor includes various features which allow the radial distribution of the plasma ion density across the wafer surface to be adjusted to an optimum distribution for processing uniformity across the wafer surface.
摘要翻译：公开了一种用于处理诸如晶片的半导体工件的等离子体反应器，其包括具有诸如半球或圆顶的三维形状的架空天花板的室。反应器还包括在天花板上的感应天线，其可以与天花板的形状保形或不共形。天花板可以是半导体材料，使得其可以用作天线的感应场的窗口，以及可以接地的电极，或者可以施加RF功率或可以允许电力浮动的电极。反应器包括允许跨晶片表面的等离子体离子密度的径向分布被调整到最佳分布以处理跨晶片表面的均匀性的各种特征。

7. 发明授权

US6077384A Plasma reactor having an inductive antenna coupling power through a parallel plate electrode 失效
标题翻译：等离子体反应器具有通过平行板电极耦合电力的感应天线
公开(公告)号：US6077384A
公开(公告)日：2000-06-20
申请号：US597577
申请日：1996-02-02
申请人： Kenneth S. Collins , Michael Rice , John Trow , Douglas Buchberger , Eric Askarinam , Joshua Chiu-Wing Tsui , David W. Groechel , Raymond Hung
发明人： Kenneth S. Collins , Michael Rice , John Trow , Douglas Buchberger , Eric Askarinam , Joshua Chiu-Wing Tsui , David W. Groechel , Raymond Hung
IPC分类号： H05H1/46 , A21D2/18 , A23G3/34 , A23G9/52 , A23L1/0524 , A23L1/0526 , A23L1/0532 , A23L1/054 , A23L1/187 , A23L1/214 , A23L1/236 , A23L1/308 , A23L2/60 , H01J37/32 , H01L21/302 , H01L21/3065 , H01L21/683 , H05H1/00
CPC分类号： H01J37/32458 , A21D2/185 , A23G3/346 , A23G9/52 , A23L19/115 , A23L2/60 , A23L27/30 , A23L27/32 , A23L29/231 , A23L29/238 , A23L29/256 , A23L29/27 , A23L33/21 , A23L9/12 , H01J37/321 , H01J37/32165 , H01J37/32467 , H01J37/32522 , H01J37/32871 , H01L21/6831 , A23G2200/06 , H01J2237/3345 , H01J2237/3346
摘要： The invention is embodied by a plasma reactor for processing a workpiece, including a reactor enclosure defining a processing chamber, a semiconductor window, a base within the chamber for supporting the workpiece during processing thereof, a gas inlet system for admitting a plasma precursor gas into the chamber, and an inductive antenna adjacent a side of the semiconductor window opposite the base for coupling power into the interior of the chamber through the semiconductor window electrode.
摘要翻译：本发明由用于处理工件的等离子体反应器实现，包括限定处理室的反应器壳体，半导体窗口，用于在其处理期间支撑工件的室内的基座，用于将等离子体前体气体引入的气体入口系统所述腔室和靠近所述半导体窗口的与所述基座相对的一侧的感应天线，用于通过所述半导体窗口电极将功率耦合到所述腔室的内部。

8. 发明授权

US06623596B1 Plasma reactor having an inductive antenna coupling power through a parallel plate electrode 失效
标题翻译：等离子体反应器具有通过平行板电极耦合电力的感应天线
公开(公告)号：US06623596B1
公开(公告)日：2003-09-23
申请号：US09523824
申请日：2000-03-13
申请人： Kenneth S. Collins , Michael Rice , John Trow , Douglas Buchberger , Eric Askarinam , Joshua Chiu-Wing Tsui , David W. Groechel , Raymond Hung
发明人： Kenneth S. Collins , Michael Rice , John Trow , Douglas Buchberger , Eric Askarinam , Joshua Chiu-Wing Tsui , David W. Groechel , Raymond Hung
IPC分类号： C23F100
CPC分类号： H01J37/32458 , A21D2/185 , A23G3/346 , A23G9/52 , A23G2200/06 , A23L2/60 , A23L9/12 , A23L19/115 , A23L27/30 , A23L27/32 , A23L29/231 , A23L29/238 , A23L29/256 , A23L29/27 , A23L33/21 , H01J37/321 , H01J37/32165 , H01J37/32467 , H01J37/32522 , H01J37/32871 , H01J2237/3345 , H01J2237/3346 , H01L21/6831
摘要： A plasma reactor for processing a workpiece includes a reactor enclosure defining a processing chamber, a base within the chamber for supporting the workpiece during processing thereof, a semiconductor window electrode overlying the base, a gas inlet system for admitting a plasma precursor gas into the chamber, an electrical terminal coupled to the semiconductor window electrode, an inductive antenna adjacent one side of the semiconductor window electrode opposite the base for coupling power into the interior of said chamber through the semiconductor window electrode.
摘要翻译：一种用于加工工件的等离子体反应器包括限定处理室的反应器壳体，用于在其处理期间支撑工件的室内的基座，覆盖在基底上的半导体窗口电极，用于将等离子体前体气体引入室中的气体入口系统耦合到所述半导体窗口电极的电端子，与所述半导体窗电极的与所述半导体窗电极相对的一侧的电感天线，用于通过所述半导体窗电极将功率耦合到所述室的内部。

9. 发明授权

US6095083A Vacuum processing chamber having multi-mode access 失效
标题翻译：真空处理室具有多模式存取
公开(公告)号：US6095083A
公开(公告)日：2000-08-01
申请号：US892300
申请日：1997-07-14
申请人： Michael Rice , Eric Askarinam , Gerhard Schneider , Kenneth S. Collins
发明人： Michael Rice , Eric Askarinam , Gerhard Schneider , Kenneth S. Collins
IPC分类号： H01J37/32 , H01L21/311 , H01L21/683 , C23C16/00 , H05H1/00
CPC分类号： H01L21/31116 , C23C16/517 , H01J37/32082 , H01J37/321 , H01J37/32146 , H01J37/32165 , H01J37/32458 , H01J37/32467 , H01J37/32522 , H01J37/32688 , H01J37/32706 , H01J37/32871 , H01L21/6831 , H01F2029/143 , H01J2237/3343 , H01J2237/3345 , H01J2237/3346
摘要： The case of maintainability and component replacement for a vacuum processing chamber is enhanced by providing a vacuum chamber roof assembly whose connection to the vacuum chamber body is through a clamped connection. Accessories needed for the roof assembly, e.g. cooling, heating, RF power, are separately supported and terminated to an accessories supporting cold plate, which is separately mounted such it is easily movable, for example by hinging from the chamber body. The roof of the chamber can then easily be separated from the chamber body and replaced. In an further mode the chamber roof can be easily raised to provide easy access to modular components inside the processing chamber. All components exposed to the plasma in the chamber can be easily accessed and replaced. Moreover, such access is provided without the need to disconnect utilities or instrumentation, since the release of a latch and pivoting the cold plate assembly away from the chamber body upwards is all that is needed to gain access to either the top of the roof of the processing chamber or the inside of the chamber. Chamber roof cooling is provided through a separable connection which is spring clamped to provide a high confidence that uniform thermal conductivity across a clamped joint is maintained.
摘要翻译：通过提供真空室顶部组件来增强真空处理室的可维护性和部件更换的情况，真空室顶部组件与真空室主体的连接通过夹紧连接。屋顶组件所需的配件，例如冷却，加热，RF功率分别被支撑并终止于支撑冷板的附件，其被单独安装，例如通过从室主体铰接而易于移动。然后，室的屋顶可以容易地与室主体分离并被更换。在另外的模式中，可以容易地升高室顶，以便容易地进入处理室内的模块化部件。暴露于腔室中的等离子体的所有组件都可以轻松访问和更换。此外，由于释放闩锁并将冷板组件向上远离室体转动，因此提供了这种接入，而不需要断开连接器的使用或仪器，因为所有这些都需要进入屋顶的顶部处理室或室内。室顶冷却是通过弹簧夹紧的可分离连接来提供的，以提供保持夹紧接头两端的均匀热导率的高置信度。

10. 发明授权

US5722668A Protective collar for vacuum seal in a plasma etch reactor 失效
标题翻译：用于等离子体蚀刻反应器中真空密封的保护套环
公开(公告)号：US5722668A
公开(公告)日：1998-03-03
申请号：US235602
申请日：1994-04-29
申请人： Michael Rice , Eric Askarinam
发明人： Michael Rice , Eric Askarinam
IPC分类号： B01J3/00 , H01J37/18 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , F16J15/10
CPC分类号： H01L21/67126 , H01J37/18 , H01J37/32431 , H01J2237/166 , Y10S277/913
摘要： A vacuum seal assembly that can be used in a plasma etch reactor to seal the chamber interior from the outside environment consists of a protective collar that is injection molded or machined of a high strength, high temperature and corrosion resistant thermoplastic material, the collar has an elastomeric gasket installed therein and is used in combination with a second elastomeric gasket to achieve a fluid-tight seal between two rigid surfaces made of silicon and quartz, respectively.
摘要翻译：可用于等离子体蚀刻反应器以将室内部与外部环境密封的真空密封组件包括由高强度，耐高温和耐腐蚀的热塑性材料注射成型或加工的保护套圈，所述套环具有安装在其中的弹性垫圈并且与第二弹性垫圈组合使用以分别在由硅和石英制成的两个刚性表面之间实现流体密封。

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