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1. 再颁专利

USRE38320E1 Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system 失效
标题翻译：通过控制投影光学系统的透镜元件的温度来改变设备的聚焦的投射曝光设备
公开(公告)号：USRE38320E1
公开(公告)日：2003-11-18
申请号：US09809224
申请日：2001-03-16
申请人： Kenji Nishi , Kazuo Ushida , Seiro Murakami , Tohru Kiuchi , Yasuaki Tanaka
发明人： Kenji Nishi , Kazuo Ushida , Seiro Murakami , Tohru Kiuchi , Yasuaki Tanaka
IPC分类号： G03B2754
CPC分类号： G03F7/70891 , G03B27/26 , G03B27/54 , G03F7/70883
摘要： A projection optical system of a projection exposure apparatus according to the present invention has a plurality of optical members made of glass materials at least one of which has a temperature characteristic of index of refraction different from that of the other glass material. Further, a temperature control device for controlling a temperature of at least one of the optical members is provided. An imaging characteristic of the projection optical system is controlled. The imaging characteristic to be controlled is a non-linear magnification or curvature of field. The temperature control device sets the temperature to be controlled to a variable target temperature determined in accordance with the imaging characteristic of the projection optical system. An exposing operation for transferring a mask pattern to a photosensitive substrate is started after the temperature of the optical member to be controlled reaches a predetermined allowable range of the target temperature.

2. 发明授权

US5883704A Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system 失效
标题翻译：通过控制投影光学系统的透镜元件的温度来改变设备的聚焦的投射曝光设备
公开(公告)号：US5883704A
公开(公告)日：1999-03-16
申请号：US689233
申请日：1996-08-06
申请人： Kenji Nishi , Kazuo Ushida , Seiro Murakami , Tohru Kiuchi , Yasuaki Tanaka
发明人： Kenji Nishi , Kazuo Ushida , Seiro Murakami , Tohru Kiuchi , Yasuaki Tanaka
IPC分类号： H01L21/027 , G03B27/26 , G03B27/54 , G03F7/20 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70891 , G03B27/26 , G03B27/54 , G03F7/70883
摘要： A projection optical system of a projection exposure apparatus according to the present invention has a plurality of optical members made of glass materials at least one of which has a temperature characteristic of index of refraction different from that of the other glass material. Further, a temperature control device for controlling a temperature of at least one of the optical members is provided. An imaging characteristic of the projection optical system is controlled. The imaging characteristic to be controlled is a non-linear magnification or curvature of field. The temperature control device sets the temperature to be controlled to a variable target temperature determined in accordance with the imaging characteristic of the projection optical system. An exposing operation for transferring a mask pattern to a photosensitive substrate is started after the temperature of the optical member to be controlled reaches a predetermined allowable range of the target temperature.
摘要翻译：根据本发明的投影曝光装置的投影光学系统具有多个由玻璃材料制成的光学构件，其中至少一个具有不同于另一玻璃材料的折射率的温度特性。此外，提供了一种用于控制至少一个光学构件的温度的温度控制装置。控制投影光学系统的成像特性。要控制的成像特性是非线性放大或曲率。温度控制装置将要控制的温度设定为根据投影光学系统的成像特性确定的可变目标温度。在要控制的光学部件的温度达到目标温度的预定容许范围之后，开始将掩模图案转印到感光基板上的曝光操作。

3. 发明授权

US09178155B2 Flexible substrate, manufacturing method of display element, and manufacturing apparatus of display element 有权
标题翻译：柔性基板，显示元件的制造方法以及显示元件的制造装置
公开(公告)号：US09178155B2
公开(公告)日：2015-11-03
申请号：US12576752
申请日：2009-10-09
申请人： Kei Nara , Tomohide Hamada , Masaki Kato , Tohru Kiuchi
发明人： Kei Nara , Tomohide Hamada , Masaki Kato , Tohru Kiuchi
IPC分类号： B05D5/12 , B65G47/26 , B65G1/133 , H01L51/00 , H01L51/52 , H01L51/56
CPC分类号： H01L51/00 , H01L51/52 , H01L51/56 , H01L2251/5338 , Y10T428/24479
摘要： In a manufacturing apparatus of display element, a display element is formed in a flexible substrate that has a first surface and a second surface that is an opposite surface thereof, and this manufacturing apparatus of display element includes a transportation section that transports the flexible substrate in a predetermined direction that intersects with a width direction of the flexible substrate; a first partition wall formation section that forms a first partition wall for a display element in the first surface; and a second partition wall formation section that forms a second partition wall in the second surface.
摘要翻译：在显示元件的制造装置中，显示元件形成在柔性基板中，该柔性基板具有作为其相对表面的第一表面和第二表面，并且该显示元件的制造装置包括：输送柔性基板的输送部与柔性基板的宽度方向相交的预定方向; 第一分隔壁形成部，其形成第一表面中的显示元件的第一分隔壁; 以及在所述第二表面中形成第二隔壁的第二分隔壁形成部。

4. 发明授权

US08508714B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08508714B2
公开(公告)日：2013-08-13
申请号：US12923848
申请日：2010-10-12
申请人： Tohru Kiuchi
发明人： Tohru Kiuchi
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03B27/42 , G03F7/70341 , G03F7/70733 , G03F7/70775
摘要： An immersion exposure apparatus includes an optical system via which the exposure beam exits, a first stage on which a substrate is placed and onto which the exposure beam is irradiated, and a second stage which is movable independently from the first stage. A liquid immersion system supplies a liquid beneath the optical system and forms a liquid immersion area. A bridge member provided on the first stage has an upper surface retaining the liquid immersion area between the upper surface and the optical system. A driving device moves the first stage and the bridge member relative to each other, and a driving system moves the first stage and the second stage so that a change is made from the liquid immersion area being retained between the optical system and the first stage to the liquid immersion area being retained between the optical system and the second stage.
摘要翻译：浸没曝光装置包括曝光光束离开的光学系统，放置基板的第一阶段和照射曝光束的第一阶段以及可独立于第一阶段移动的第二阶段。液浸系统在光学系统下面提供液体并形成液浸区域。设置在第一台上的桥构件具有保持上表面和光学系统之间的液浸区域的上表面。驱动装置相对于彼此移动第一级和桥式构件，并且驱动系统移动第一级和第二级，使得从保持在光学系统和第一级之间的液浸区域发生变化，液浸区域保持在光学系统和第二阶段之间。

5. 发明授权

US08264666B2 Exposure apparatus, exposure method, and method of manufacturing device 失效
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08264666B2
公开(公告)日：2012-09-11
申请号：US12692443
申请日：2010-01-22
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： G03B27/42 , G03B27/58 , G03B27/32
CPC分类号： G03F7/70791 , G03F7/70275 , G03F7/70358 , G03F7/70425
摘要： An exposure apparatus of one aspect of the present invention is provided with a moving mechanism that moves a first portion of a belt-shaped substrate that has photosensitivity in a first heading along a first direction and moves a second portion of the substrate in a second heading along the first direction, a stage mechanism that holds a mask and moves it in a third heading along a second direction in synchronization with the movement of the substrate, and a projection optical system. The projection optical system forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond.
摘要翻译：本发明的一个方面的曝光装置设置有移动机构，该移动机构使沿第一方向的第一标题中具有感光性的带状基板的第一部分移动，并且在第二标题中移动基板的第二部分沿着第一方向，具有平台机构，其保持掩模并且与基板的移动同步地沿着第二方向在第三方向移动;以及投影光学系统。投影光学系统在第一部分上形成图案的第一投影图像，使得掩模上的第三标题和第一部分上的第一标题光学对应，并且在第二部分上形成图案的第二投影图像，使得掩模上的第三个标题和第二部分的第二个标题光学对应。

6. 发明申请

US20110222037A1 Exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20110222037A1
公开(公告)日：2011-09-15
申请号：US11517397
申请日：2006-09-08
申请人： Tohru Kiuchi , Takeyuki Mizutani , Masahiro Nei , Masato Hamatani , Masahiko Okumura
发明人： Tohru Kiuchi , Takeyuki Mizutani , Masahiro Nei , Masato Hamatani , Masahiko Okumura
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/70733
摘要： An exposure apparatus comprises a liquid immersion system, a first mover, and a prescribed member. The exposure apparatus exposes a substrate via an optical member and a liquid. The liquid immersion system performs supply and recovery of the liquid. The first mover can move in a first area, and can hold the liquid between itself and the optical member. The prescribed member is removed from the first mover when the first mover withdraws from a position opposing the optical member, and can hold the liquid between itself and the optical member.
摘要翻译：曝光装置包括液浸系统，第一推动器和规定构件。曝光装置经由光学部件和液体露出基板。液浸系统进行液体的供给和回收。第一移动器可以在第一区域中移动，并且可以在其与光学构件之间保持液体。当第一移动器从与光学构件相对的位置退出时，规定构件从第一移动体移除，并且能够将液体保持在其与光学构件之间。

7. 发明申请

US20090208885A1 Exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20090208885A1
公开(公告)日：2009-08-20
申请号：US12382987
申请日：2009-03-27
申请人： Tohru Kiuchi
发明人： Tohru Kiuchi
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70725 , G03F7/70733
摘要： An exposure apparatus includes a first optical member from which an exposure beam is emitted; a first object movable at a light-exit side of the first optical member; a second object movable, independently of the first object, at the light-exit side of the first optical member; and a driving unit that moves the first object and the second object in a first direction within a predetermined plane including a first position opposing the first optical member in a state in which the first object and the second object are close to or in contact with each other and in which positions of the first object and the second object in a second direction within the predetermined plane are shifted.
摘要翻译：曝光装置包括从其发射曝光光束的第一光学部件; 在第一光学构件的光出射侧可移动的第一物体; 独立于第一物体的第二物体在第一光学构件的光出射侧; 以及驱动单元，其在第一物体和第二物体接近或接触每个状态的状态下在包括与第一光学构件相对的第一位置的预定平面内沿第一方向移动第一物体和第二物体其中第一物体和第二物体在预定平面内的第二方向上的位置偏移。

8. 发明授权

US09193560B2 Leader member, substrate, substrate cartridge, substrate-processing apparatus, leader-connecting method, method of manufacturing display element, and apparatus for manufacturing display element 有权
标题翻译：引导部件，基板，基板盒，基板处理装置，引线连接方法，显示元件的制造方法以及显示元件的制造装置
公开(公告)号：US09193560B2
公开(公告)日：2015-11-24
申请号：US13475368
申请日：2012-05-18
申请人： Tomohide Hamada , Tohru Kiuchi
发明人： Tomohide Hamada , Tohru Kiuchi
IPC分类号： B65H75/28
CPC分类号： B65H75/28 , B65H2701/124
摘要： A leader member includes a connection portion that is connected to a substrate and a position reference portion that is used at least for aligning the substrate with the connection portion.
摘要翻译：引导构件包括连接到基板的连接部分和至少用于使基板与连接部分对准使用的位置参考部分。

9. 发明授权

US08801307B2 Substrate cartridge, substrate processing apparatus, substrate processing system, control apparatus, and method of manufacturing display element 有权
标题翻译：基板盒，基板处理装置，基板处理系统，控制装置以及显示元件的制造方法
公开(公告)号：US08801307B2
公开(公告)日：2014-08-12
申请号：US12876842
申请日：2010-09-07
申请人： Tohru Kiuchi
发明人： Tohru Kiuchi
IPC分类号： B41J15/00 , H01L21/67
CPC分类号： H05K13/00 , B41J15/04 , H01L21/67132 , Y10T29/49002 , Y10T29/51
摘要： In order to provide a substrate cartridge, a substrate processing apparatus, a substrate processing system, a control apparatus, and a method of manufacturing a display element capable of preventing foreign objects from being attached to the substrate, there is provided a substrate cartridge including: a cartridge mainframe that has an opening which a substrate is carried in/out and accommodates the substrate through the opening; a mount portion that is provided in the cartridge mainframe and is detachably connected to an external connecting portion; and a blocking unit that blocks the opening depending on a connection state between the mount portion and an external connecting portion.
摘要翻译：为了提供基板盒，基板处理装置，基板处理系统，控制装置以及能够防止异物附着到基板上的显示元件的制造方法，提供了一种基板盒，包括：具有开口的盒式磁带主体，基板被输入/输出并通过开口容纳基板; 安装部分，其设置在所述盒主机中并且可拆卸地连接到外部连接部分; 以及阻挡单元，其根据所述安装部和外部连接部之间的连接状态来阻挡所述开口。

10. 发明申请

US20130027684A1 EXPOSURE APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，基板处理装置和装置制造方法
公开(公告)号：US20130027684A1
公开(公告)日：2013-01-31
申请号：US13640875
申请日：2011-04-13
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： G03B27/54 , G03B27/58
CPC分类号： G03F7/70275 , G03F7/703 , G03F7/70791
摘要： An exposure apparatus that transfers a pattern provided along a predetermined cylindrical surface onto a substrate while rotating the pattern in a circumferential direction of the cylindrical surface is provided, which includes a first projection optical system that projects an image of a first partial pattern of the pattern which is disposed in a first area of the cylindrical surface onto a first projection area, a second projection optical system that projects an image of a second partial pattern of the pattern which is disposed in a second area different from the first area onto a second projection area different from the first projection area, and a guide device that guides the substrate to the first projection area and the second projection area in synchronization with a rotation of the pattern in the circumferential direction.
摘要翻译：提供了一种曝光装置，其将沿着预定圆柱形表面设置的图案转印到基板上同时在圆柱形表面的圆周方向上旋转图案，其包括第一投影光学系统，其将图案的第一部分图案的图像投影其布置在所述圆柱形表面的第一区域中的第一投影区域上;第二投影光学系统，其将布置在不同于所述第一区域的第二区域中的所述图案的第二部分图案的图像投影到第二投影与第一投影区域不同的区域，以及引导装置，其与圆周方向上的图案的旋转同步地将基板引导到第一投影区域和第二投影区域。

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