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1. 发明授权

US08264666B2 Exposure apparatus, exposure method, and method of manufacturing device 失效
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08264666B2
公开(公告)日：2012-09-11
申请号：US12692443
申请日：2010-01-22
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： G03B27/42 , G03B27/58 , G03B27/32
CPC分类号： G03F7/70791 , G03F7/70275 , G03F7/70358 , G03F7/70425
摘要： An exposure apparatus of one aspect of the present invention is provided with a moving mechanism that moves a first portion of a belt-shaped substrate that has photosensitivity in a first heading along a first direction and moves a second portion of the substrate in a second heading along the first direction, a stage mechanism that holds a mask and moves it in a third heading along a second direction in synchronization with the movement of the substrate, and a projection optical system. The projection optical system forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond.
摘要翻译：本发明的一个方面的曝光装置设置有移动机构，该移动机构使沿第一方向的第一标题中具有感光性的带状基板的第一部分移动，并且在第二标题中移动基板的第二部分沿着第一方向，具有平台机构，其保持掩模并且与基板的移动同步地沿着第二方向在第三方向移动;以及投影光学系统。投影光学系统在第一部分上形成图案的第一投影图像，使得掩模上的第三标题和第一部分上的第一标题光学对应，并且在第二部分上形成图案的第二投影图像，使得掩模上的第三个标题和第二部分的第二个标题光学对应。

2. 发明申请

US20130027684A1 EXPOSURE APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，基板处理装置和装置制造方法
公开(公告)号：US20130027684A1
公开(公告)日：2013-01-31
申请号：US13640875
申请日：2011-04-13
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： G03B27/54 , G03B27/58
CPC分类号： G03F7/70275 , G03F7/703 , G03F7/70791
摘要： An exposure apparatus that transfers a pattern provided along a predetermined cylindrical surface onto a substrate while rotating the pattern in a circumferential direction of the cylindrical surface is provided, which includes a first projection optical system that projects an image of a first partial pattern of the pattern which is disposed in a first area of the cylindrical surface onto a first projection area, a second projection optical system that projects an image of a second partial pattern of the pattern which is disposed in a second area different from the first area onto a second projection area different from the first projection area, and a guide device that guides the substrate to the first projection area and the second projection area in synchronization with a rotation of the pattern in the circumferential direction.
摘要翻译：提供了一种曝光装置，其将沿着预定圆柱形表面设置的图案转印到基板上同时在圆柱形表面的圆周方向上旋转图案，其包括第一投影光学系统，其将图案的第一部分图案的图像投影其布置在所述圆柱形表面的第一区域中的第一投影区域上;第二投影光学系统，其将布置在不同于所述第一区域的第二区域中的所述图案的第二部分图案的图像投影到第二投影与第一投影区域不同的区域，以及引导装置，其与圆周方向上的图案的旋转同步地将基板引导到第一投影区域和第二投影区域。

3. 发明授权

US5583609A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5583609A
公开(公告)日：1996-12-10
申请号：US547622
申请日：1995-10-25
申请人： Hideo Mizutani , Tohru Kiuchi
发明人： Hideo Mizutani , Tohru Kiuchi
IPC分类号： G03F9/00 , G01N21/86 , G01B11/00
CPC分类号： G03F9/70
摘要： A projection exposure apparatus includes an illumination system for illuminating a mask, on which a pattern to be transferred is formed, with exposure light, a projection optical system for imaging and projecting the pattern on the mask onto a photosensitive substrate, beam radiation means for radiating an alignment beam with a wavelength different from the wavelength of the exposure light toward a first grating mark formed on the mask and a transparent portion near the first grating mark, and radiating the alignment beam onto a second grating mark formed on the photosensitive substrate via the transparent portion and the projection optical system, the beam radiation means having a four-beam generation member for generating two first alignment beams which cross each other on the first grating mark, and two second alignment beams which cross each other in a space separated by a predetermined distance from the surface of the mask.
摘要翻译：投影曝光装置包括照射系统，用于利用曝光灯照亮其上形成有转印图案的掩模，用于将掩模上的图案成像并投影到感光基板上的投影光学系统，用于辐射的光束辐射装置具有波长不同于形成在掩模上的第一光栅标记的曝光光的波长的对准光束和靠近第一光栅标记的透明部分，并且将对准光束经由形成在感光基板上的第二光栅标记经由透明部分和投影光学系统，所述光束辐射装置具有用于产生在第一光栅标记上彼此交叉的两个第一对准光束的四光束发生部件和在由第一光栅标记分隔开的空间中彼此交叉的两个第二对准光束距掩模表面的预定距离。

4. 发明授权

US10541160B2 Substrate case and substrate accommodation apparatus 有权
公开(公告)号：US10541160B2
公开(公告)日：2020-01-21
申请号：US12976149
申请日：2010-12-22
申请人： Hideo Mizutani , Tohru Kiuchi , Toru Kawaguchi , Takashi Masukawa
发明人： Hideo Mizutani , Tohru Kiuchi , Toru Kawaguchi , Takashi Masukawa
IPC分类号： B65H19/22 , H01L21/67 , B65H75/28 , H01L21/673
摘要： A substrate case includes a shaft portion around which a sheet-shaped substrate having a circuit area in which a circuit manufacturing process is performed is wound; and a cover portion that accommodates the substrate in the state of being wound around the shaft portion, the shaft portion having a holding portion that holds an area different from the circuit area at a winding start portion of the substrate.

5. 发明授权

US08379186B2 Pattern formation apparatus, pattern formation method, and device manufacturing method 有权
标题翻译：图案形成装置，图案形成方法和装置制造方法
公开(公告)号：US08379186B2
公开(公告)日：2013-02-19
申请号：US12833632
申请日：2010-07-09
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： G03B27/46 , G03B27/58
CPC分类号： G03F7/70791 , G03F7/70716 , G03F7/70725 , G03F7/70733
摘要： When a segmented region SAi of a sheet S is scan-exposed, a stage SST1 adsorbs, at a standby position at the +X end portion of a scan region AS, a rear surface portion corresponding to the segmented region SAi of the sheet S onto a holding surface of a sheet holder SH1, and moves in the X axis direction (the −X direction) with a predetermined stroke in synchronization with a mask (a mask stage). At this time, illumination beams corresponding to the parts of a pattern of the mask are irradiated onto the sheet S via projection optical systems. Thereby, the pattern is transferred (formed). After scan-exposure on the segmented region SAi, a stage SST2 moves to a standby position within the XY plane. After the stage SST2 adsorbs a rear surface portion corresponding to the next segmented region SAi+1 of the sheet S onto a holding surface of a sheet holder SH1, an exposure is performed by the scan-exposure method similarly to the above, to thereby form the pattern.
摘要翻译：当片材S的分割区域SAi被扫描曝光时，阶段SST1在扫描区域AS的+ X端部的待机位置处吸收与片材S的分割区域SAi对应的后表面部分，片保持件SH1的保持表面，并且与掩模（掩模台）同步地以预定行程沿X轴方向（-X方向）移动。此时，与掩模的图案的部分对应的照明光束经由投影光学系统照射到片材S上。由此，图案被转印（形成）。在分割区域SAi上的扫描曝光之后，台SST2移动到XY平面内的待机位置。在阶段SST2将对应于片材S的下一个分割区域SAi + 1的后表面部分吸附到片材保持器SH1的保持表面上之后，通过与上述类似的扫描曝光方法进行曝光，从而形成模式。

6. 发明授权

US08235695B2 Pattern forming device, pattern forming method, and device manufacturing method 有权
标题翻译：图案形成装置，图案形成方法和装置制造方法
公开(公告)号：US08235695B2
公开(公告)日：2012-08-07
申请号：US12822773
申请日：2010-06-24
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： B29C35/02
CPC分类号： G03F7/70791 , G03F9/7003
摘要： Six auxiliary sheet holders SH2 and SH3 temporarily holding a sheet S are minutely driven in the −Z-axis direction by a control device so that holding surfaces thereof are positioned on the slightly lower side (−Z side) of the holding surface of the sheet holder SH1. Accordingly, an appropriate tension is applied to the sheet S in the width direction (Y-axis direction) and the longitudinal direction, so that the center portion of the sheet S is fixed onto the holding surface of the sheet holder SH1. That is, in the state where an XY two-dimensional tension is applied to a separate area SAi of the sheet S, a rear surface portion corresponding to the separate area SAi of the sheet S is changed in accordance with the flat shape of the holding surface of the sheet holder SH1. In addition, in the state where the tension is applied to the predetermined area in the longitudinal direction and the width direction, the rear surface portion corresponding to the predetermined area of the sheet material S is changed in accordance with the flat reference surface so as to be flattened. In addition, the predetermined area of the flattened sheet material is irradiated with an energy beam so as to form a pattern thereon.
摘要翻译：临时保持片材S的六个辅助片材保持件SH2和SH3通过控制装置在-Z轴方向上被微小地驱动，使得其保持表面位于片材的保持表面的稍低侧（-Z侧）上持有人SH1。因此，在纸张S的宽度方向（Y轴方向）和长度方向上施加适当的张力，使得纸张S的中心部分固定在纸张保持器SH1的保持面上。也就是说，在将XY二维张力施加到片材S的分离区域SAi的状态下，与片材S的分离区域SAi相对应的后表面部分根据保持的平坦形状而改变表面保持器SH1。此外，在向长度方向和宽度方向的规定区域施加张力的状态下，与片材S的规定区域对应的后表面部分根据平坦的基准面而变化，从而被压扁此外，用能量束照射扁平片材的预定面积，以在其上形成图案。

7. 发明申请

US20110012294A1 PATTERN FORMING DEVICE, PATTERN FORMING METHOD, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：图案形成装置，图案形成方法和装置制造方法
公开(公告)号：US20110012294A1
公开(公告)日：2011-01-20
申请号：US12822773
申请日：2010-06-24
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： B29C59/16 , B29B13/08 , B28B11/08
CPC分类号： G03F7/70791 , G03F9/7003
摘要： Six auxiliary sheet holders SH2 and SH3 temporarily holding a sheet S are minutely driven in the −Z-axis direction by a control device so that holding surfaces thereof are positioned on the slightly lower side (−Z side) of the holding surface of the sheet holder SH1. Accordingly, an appropriate tension is applied to the sheet S in the width direction (Y-axis direction) and the longitudinal direction, so that the center portion of the sheet S is fixed onto the holding surface of the sheet holder SH1. That is, in the state where an XY two-dimensional tension is applied to a separate area SAi of the sheet S, a rear surface portion corresponding to the separate area SAi of the sheet S is changed in accordance with the flat shape of the holding surface of the sheet holder SH1. In addition, in the state where the tension is applied to the predetermined area in the longitudinal direction and the width direction, the rear surface portion corresponding to the predetermined area of the sheet material S is changed in accordance with the flat reference surface so as to be flattened. In addition, the predetermined area of the flattened sheet material is irradiated with an energy beam so as to form a pattern thereon.
摘要翻译：临时保持片材S的六个辅助片材保持件SH2和SH3通过控制装置在-Z轴方向上被微小地驱动，使得其保持表面位于片材的保持表面的稍低侧（-Z侧）上持有人SH1。因此，在纸张S的宽度方向（Y轴方向）和长度方向上施加适当的张力，使得纸张S的中心部分固定在纸张保持器SH1的保持面上。也就是说，在将XY二维张力施加到片材S的分离区域SAi的状态下，与片材S的分离区域SAi相对应的后表面部分根据保持的平坦形状而改变表面保持器SH1。此外，在向长度方向和宽度方向的规定区域施加张力的状态下，与片材S的规定区域对应的后表面部分根据平坦的基准面而变化，从而被压扁此外，用能量束照射扁平片材的预定面积，以在其上形成图案。

8. 发明申请

US20100265483A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTRUING DEVICE 失效
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US20100265483A1
公开(公告)日：2010-10-21
申请号：US12692443
申请日：2010-01-22
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： G03B27/72 , G03B27/32
CPC分类号： G03F7/70791 , G03F7/70275 , G03F7/70358 , G03F7/70425
摘要： An exposure apparatus of one aspect of the present invention is provided with a moving mechanism that moves a first portion of a belt-shaped substrate that has photosensitivity in a first heading along a first direction and moves a second portion of the substrate in a second heading along the first direction, a stage mechanism that holds a mask and moves it in a third heading along a second direction in synchronization with the movement of the substrate, and a projection optical system. The projection optical system forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond.
摘要翻译：本发明的一个方面的曝光装置设置有移动机构，该移动机构沿着第一方向移动具有第一标题中的光敏性的带状基板的第一部分，并且在第二标题中移动基板的第二部分沿着第一方向，具有平台机构，其保持掩模并且与基板的移动同步地沿着第二方向在第三方向移动;以及投影光学系统。投影光学系统在第一部分上形成图案的第一投影图像，使得掩模上的第三标题和第一部分上的第一标题光学对应，并且在第二部分上形成图案的第二投影图像，使得掩模上的第三个标题和第二部分的第二个标题光学对应。

9. 发明授权

US09152062B2 Pattern forming device, pattern forming method, and device manufacturing method 有权
标题翻译：图案形成装置，图案形成方法和装置制造方法
公开(公告)号：US09152062B2
公开(公告)日：2015-10-06
申请号：US13526428
申请日：2012-06-18
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： B29C35/02 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70791 , G03F9/7003
摘要： Presented are methods for forming a predetermined pattern in a predetermined area of an elongated sheet material. The methods include applying a two-dimensional tension to a portion including the predetermined area of the sheet material, and allowing a flat reference surface to adsorb a rear surface portion corresponding to the predetermined area of the sheet material applied with the two-dimensional tension. The methods then illuminate an energy beam corresponding to the pattern to the predetermined area of the sheet material adsorbed to the reference surface.
摘要翻译：提出了在细长片材的预定区域中形成预定图案的方法。所述方法包括将二维张力施加到包括片材的预定区域的部分，并且允许平坦的参考表面吸附与施加二维张力的片材的预定区域相对应的后表面部分。然后，该方法将对应于图案的能量束照射到吸附到参考表面的片材的预定区域。

10. 发明授权

US08399263B2 Method for measuring expansion/contraction, method for processing substrate, method for producing device, apparatus for measuring expansion/contraction, and apparatus for processing substrate 有权
标题翻译：用于测量膨胀/收缩的方法，基板的处理方法，装置的制造方法，膨胀/收缩测量装置以及基板的处理装置
公开(公告)号：US08399263B2
公开(公告)日：2013-03-19
申请号：US12551057
申请日：2009-08-31
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： H01L21/66
CPC分类号： B41J3/407 , B41J11/008 , B41J11/42
摘要： An expansion/contraction measuring apparatus includes a transport section which transports a flexible substrate along a surface of the substrate; a detecting section detecting first and second marks which are formed on the substrate while being separated from each other by a predetermined spacing distance in a transport direction of the substrate and which are moved, in accordance with the transport of the substrate, to first and second detection areas disposed on a transport route for the substrate respectively; a substrate length setting section which sets a length of the substrate along the transport route between the first and second detection areas to a reference length; and a deriving section which derives information about expansion/contraction of the substrate in relation to the transport direction based on a detection result of the first and second marks. Accordingly, the expansion/contraction state of an expandable/contractible substrate is measured highly accurately.
摘要翻译：膨胀/收缩测量装置包括：输送部，其沿着基板的表面输送柔性基板; 检测部，其检测形成在所述基板上的第一和第二标记，同时沿着所述基板的输送方向彼此分离预定的间隔距离，并且根据所述基板的输送而移动到所述基板的第一和第二分别设置在基板的输送路径上的检测区域; 基板长度设定部，其将沿着第一和第二检测区域之间的输送路径的基板的长度设定为基准长度; 以及导出部，其基于第一和第二标记的检测结果，得出关于基板相对于输送方向的伸缩的信息。因此，可高精度地测量可膨胀/收缩基材的膨胀/收缩状态。

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