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1. 发明授权

US08920569B2 Pollutant removal method and apparatus, and exposure method and apparatus 有权
标题翻译：污染物去除方法和装置，以及曝光方法和装置
公开(公告)号：US08920569B2
公开(公告)日：2014-12-30
申请号：US11141469
申请日：2005-06-01
申请人： Shunji Watanabe , Masato Hamatani , Tatsuya Kitamoto
发明人： Shunji Watanabe , Masato Hamatani , Tatsuya Kitamoto
IPC分类号： B08B3/00 , B08B7/04 , G03F7/20 , G02B27/00
CPC分类号： G03F7/70941 , G02B27/0006 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要： A method for quickly removing pollutants adhered to a predetermined optical member in an optical system. To remove the pollutants adhered to a lens (32A) disposed at the upper end of a projection optical system (PL), a cylindrical protecting member (53) is disposed through the openings in a reticle stage (22) and a reticle base (23). The bottom surface of a support section (56) at the tip section of a rod section (58) is brought into contact with the surface of the lens (32A) through the inner surface of the protecting member (53). A wiping cloth soaked with a washing solution containing hydrofluoric acid is attached to the bottom surface of the support section (56). The support section (56) is reciprocated via the rod section (58) to remove the pollutants on the lens (32A) with the wiping cloth.
摘要翻译：一种快速去除粘附在光学系统中的预定光学部件上的污染物的方法。为了去除粘附在投影光学系统（PL）的上端的透镜（32A）上的污染物，在标线片平台（22）和标线片基座（23）中穿过开口设置圆柱形保护构件（53））。杆部（58）的前端部的支撑部（56）的底面通过保护部件（53）的内表面与透镜（32A）的表面接触。用含有氢氟酸的洗涤液浸泡的擦拭布附着在支承部（56）的底面上。支撑部分（56）通过杆部分（58）往复运动，以用擦拭布去除透镜（32A）上的污染物。

2. 发明申请

US20090226846A1 Exposure Apparatus, Exposure Method, and Device Manufacturing Method 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20090226846A1
公开(公告)日：2009-09-10
申请号：US11887182
申请日：2006-03-30
申请人： Katsushi Nakano , Masato Hamatani
发明人： Katsushi Nakano , Masato Hamatani
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341
摘要： An exposure apparatus (EX) includes: a substrate stage (ST1) that is movable while holding substrate (P); a first immersion mechanism (1) that fills an optical path space (K1) between a final optical member (LS1) and the substrate stage (ST1) with a liquid (LQ) when the substrate stage (ST1) is disposed opposite the final optical member (LS1) that is closest to the image plane of the projection optical system (PL); a measurement stage (ST2) in which the optical path space (K1) with the final optical member (LS1) is filled with the liquid (LQ) when the measurement stage (ST2) is disposed in place of the substrate stage (ST1) opposite the final optical member (LS1) in the projection optical system; a measuring device (60) that has an upper plate (65) that is disposed on the measurement stage (ST2), and that carries out specific measurements when the upper plate (65) is disposed opposite the final optical member (LS1) of the projection optical system with the liquid (LQ) held therebetween; and a second immersion mechanism (2) that forms an immersion region (LR2) on the upper plate (65) at least when the measurement stage (ST2) has moved away from the final optical member (LS1) in the projection optical system.
摘要翻译：曝光装置（EX）包括：能够在保持基板（P）的同时移动的基板载台（ST1）。当衬底台（ST1）与最终光学相对设置时，用液体（LQ）填充最终光学构件（LS1）和衬底台（ST1）之间的光路空间（K1）的第一浸没机构（1）最靠近投影光学系统（PL）的图像平面的构件（LS1）; 测量台（ST2），其中当设置测量台（ST2）代替相对的基板台（ST1）时，具有最终光学构件（LS1）的光路空间（K1）填充有液体（LQ）投影光学系统中的最终光学构件（LS1）; 测量装置（60），其具有设置在测量台（ST2）上的上板（65），并且当上板（65）与所述上板（65）的最终光学构件（LS1）相对设置时，进行特定测量投影光学系统与液体（LQ）保持在其间; 以及至少当测量台（ST2）已经远离投影光学系统中的最终光学构件（LS1）移动时，在上板（65）上形成浸没区域（LR2）的第二浸没机构（2）。

3. 发明申请

US20080055575A1 Exposure apparatus, device manufacturing method, cleaning method, and cleaning member 有权
标题翻译：曝光装置，装置制造方法，清洁方法和清洁构件
公开(公告)号：US20080055575A1
公开(公告)日：2008-03-06
申请号：US11892944
申请日：2007-08-28
申请人： Hiroyuki Nagasaka , Tomoharu Fujiwara , Masato Hamatani , Yasushi Yoda
发明人： Hiroyuki Nagasaka , Tomoharu Fujiwara , Masato Hamatani , Yasushi Yoda
IPC分类号： G03B27/42
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/7085 , G03F7/70866
摘要： An exposure apparatus is provided with a first member that can form liquid immersion with a first liquid so as to fill an optical path for exposure light with the first liquid, a second member that can form liquid immersion with a second liquid in a position distanced from the first member, and a vibration generator that imparts vibration to the second liquid between the predetermined member and the second member. The predetermined member is cleaned with the second liquid.
摘要翻译：曝光装置设置有第一构件，其可以形成具有第一液体的液浸，以便填充用于与第一液体曝光的光的光路;第二构件，其可以与第二液体形成液体浸没在远离所述第一构件以及在所述预定构件和所述第二构件之间向所述第二液体施加振动的振动发生器。用第二液体清洁预定的构件。

4. 发明申请

US20050274898A1 Pollutant removal method and apparatus, and exposure method and apparatus 有权
标题翻译：污染物去除方法和装置，以及曝光方法和装置
公开(公告)号：US20050274898A1
公开(公告)日：2005-12-15
申请号：US11141469
申请日：2005-06-01
申请人： Shunji Watanabe , Masato Hamatani , Tatsuya Kitamoto
发明人： Shunji Watanabe , Masato Hamatani , Tatsuya Kitamoto
IPC分类号： G02B27/00 , G03F7/20 , G01N21/00 , G01J1/42
CPC分类号： G03F7/70941 , G02B27/0006 , G03F7/70916 , G03F7/70925 , G03F7/70975
摘要： A method for quickly removing pollutants adhered to a predetermined optical member in an optical system. To remove the pollutants adhered to a lens (32A) disposed at the upper end of a projection optical system (PL), a cylindrical protecting member (53) is disposed through the openings in a reticle stage (22) and a reticle base (23). The bottom surface of a support section (56) at the tip section of a rod section (58) is brought into contact with the surface of the lens (32A) through the inner surface of the protecting member (53). A wiping cloth soaked with a washing solution containing hydrofluoric acid is attached to the bottom surface of the support section (56). The support section (56) is reciprocated via the rod section (58) to remove the pollutants on the lens (32A) with the wiping cloth.
摘要翻译：一种快速去除粘附在光学系统中的预定光学部件上的污染物的方法。为了去除附着在投影光学系统（PL）的上端的透镜（32A）上的污染物，圆柱形保护构件（53）通过开口设置在标线片平台（22）和标线基座（ 23）。杆部（58）的前端部的支撑部（56）的底面通过保护部件（53）的内表面与透镜（32A）的表面接触。用含有氢氟酸的洗涤液浸泡的擦拭布附着在支承部（56）的底面上。支撑部分（56）经由杆部分（58）往复运动，以用擦拭布去除透镜（32A）上的污染物。

5. 再颁专利

USRE37309E1 Scanning exposure apparatus 失效
标题翻译：扫描曝光装置
公开(公告)号：USRE37309E1
公开(公告)日：2001-08-07
申请号：US09112380
申请日：1998-07-09
申请人： Toshiharu Nakashima , Masato Hamatani , Ken Ozawa
发明人： Toshiharu Nakashima , Masato Hamatani , Ken Ozawa
IPC分类号： G02B2700
CPC分类号： G03F7/70075 , G03F7/70358 , G03F7/70575 , G03F7/70583
摘要： A projection exposure apparatus for transferring a pattern formed on a mask onto a photosensitive substrate by a scanning exposure method, includes a light source for generating a light beam having a predetermined spatial coherence, an illumination optical system for receiving the light beam from the light source and illuminating a local area on the mask with the light beam, and a device for synchronously moving the mask and the photosensitive substrate so as to transfer the pattern on the mask onto the photosensitive substrate. A direction, corresponding to a higher spatial coherence of the light beam, is made to coincide with the direction of relative scanning an illumination area and the mask in the illumination area.
摘要翻译：用于通过扫描曝光方法将形成在掩模上的图案转印到感光基板上的投影曝光装置包括：用于产生具有预定空间相干性的光束的光源;用于接收来自光源的光束的照明光学系统以及用光束照射掩模上的局部区域，以及用于同步移动掩模和感光基板以将掩模上的图案转印到感光基板上的装置。对应于光束的较高空间相干性的方向与照明区域中的照明区域和掩模的相对扫描方向一致。

6. 发明授权

US6128030A Semiconductor exposure device 失效
标题翻译：半导体曝光装置
公开(公告)号：US6128030A
公开(公告)日：2000-10-03
申请号：US13944
申请日：1998-01-27
申请人： Hiroki Kikuchi , Yushi Kaneda , Masato Hamatani
发明人： Hiroki Kikuchi , Yushi Kaneda , Masato Hamatani
IPC分类号： G03F7/20 , H01L21/027 , H01S3/10 , H01S3/109 , H01S3/11 , B41J2/47
CPC分类号： G03F7/70575 , G03F7/70091 , G03F7/70208 , G03F7/70583
摘要： A semiconductor light exposure device reducing coherency of laser light to an appropriate value by a simplified structure without producing speckles. The semiconductor light exposure device includes an ultraviolet light generating device, a uniform illumination device having the operation of inducing an optical path length difference and a projection device for projecting the laser light from the uniform illumination device. The ultraviolet light generating device includes an Nd:YAG Q-switch laser unit with a wavelength of 1064 nm, oscillated with a longitudinal single mode, a phase modulation unit or phase-modulating the fundamental laser light outgoing from the Nd:YAG Q-switch laser unit with voltage signals having plural frequency components, and a wavelength conversion unit for converting the wavelength of the fundamental laser light phase-modulated by the phase modulation unit into an ultraviolet laser light with a wavelength of 213 nm as a fifth harmonics.
摘要翻译：半导体曝光装置通过简化的结构将激光的相干性降低到适当的值，而不产生斑点。半导体曝光装置包括紫外线发生装置，具有诱导光程长度差的操作的均匀照明装置和用于投射来自均匀照明装置的激光的投影装置。紫外线发生装置具有波长为1064nm的Nd：YAG Q开关激光单元，以纵向单模振荡，相位调制单元或相位调制从Nd：YAG Q开关输出的基本激光具有多个频率分量的电压信号的激光单元和用于将由相位调制单元相位调制的基波激光的波长转换为波长为213nm的紫外激光作为五次谐波的波长转换单元。

7. 发明授权

US5760408A Semiconductor exposure device 失效
公开(公告)号：US5760408A
公开(公告)日：1998-06-02
申请号：US761496
申请日：1996-12-06
申请人： Hiroki Kikuchi , Yushi Kaneda , Masato Hamatani
发明人： Hiroki Kikuchi , Yushi Kaneda , Masato Hamatani
IPC分类号： G03F7/20 , H01L21/027 , H01S3/10 , H01S3/109 , H01S3/11 , G03B27/54
CPC分类号： G03F7/70575 , G03F7/70091 , G03F7/70208 , G03F7/70583
摘要： A semiconductor light exposure device reducing coherency of laser light to an appropriate value by a simplified structure without producing speckles. The semiconductor light exposure device includes an ultraviolet light generating device, a uniform illumination device having the operation of inducing an optical path length difference and a projection device for projecting the laser light from the uniform illumination device. The ultraviolet light generating device includes an Nd:YAG Q-switch laser unit with a wavelength of 1064 nm, oscillated with a longitudinal single mode, a phase modulation unit or phase-modulating the fundamental laser light outgoing from the Nd:YAG Q-switch laser unit with voltage signals having plural frequency components, and a wavelength conversion unit for converting the wavelength of the fundamental laser light phase-modulated by the phase modulation unit into an ultraviolet laser light with a wavelength of 213 nm as a fifth harmonics.

8. 发明授权

US5425045A Short wavelength laser optical apparatus 失效
标题翻译：短波长激光光学仪器
公开(公告)号：US5425045A
公开(公告)日：1995-06-13
申请号：US279072
申请日：1994-07-22
申请人： Masato Hamatani
发明人： Masato Hamatani
IPC分类号： G03F7/20 , G02B7/04 , H01L21/027 , H01L21/30 , H01S3/034
CPC分类号： G02B7/04 , G03F7/70058 , G03F7/70825 , G03F7/70883
摘要： A laser optical apparatus permits the use of a laser beam having a spectrum characteristic which substantially overlaps with an absorption band of oxygen, with a simple construction. Oxygen in a lens barrel of an optical system or a sealed space between lens barrels is absorbed by a deoxidation agent. Accordingly, even if a laser beam by an excimer laser using argon fluoride having a spectrum characteristic which substantially overlaps with the absorption of oxygen is passed through the optical system, the loss of laser energy by the absorption of oxygen, the generation of noxious gas and the swing due to the change of transmission are prevented.
摘要翻译：激光光学装置以简单的结构允许使用具有与氧吸收带大致重叠的光谱特性的激光束。光学系统的镜筒中的氧气或镜筒之间的密封空间被脱氧剂吸收。因此，即使通过使用具有与氧吸收大致重叠的光谱特性的氟化氢的准分子激光的激光束通过光学系统，也可以通过吸收氧而损失激光能量，产生有害气体，防止了由于变速而发生的摆动。

9. 发明申请

US20060007418A1 Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system 有权
公开(公告)号：US20060007418A1
公开(公告)日：2006-01-12
申请号：US11214795
申请日：2005-08-31
申请人： Masato Hamatani , Toshio Tsukakoshi
发明人： Masato Hamatani , Toshio Tsukakoshi
IPC分类号： G03B27/68
CPC分类号： G03F7/706 , H01J2237/30433 , H01J2237/30461
摘要： A computer system comprises a first computer into which target information that an optical apparatus is to achieve is inputted and a second computer that determines the specification of a projection optical system based on the target information received from the first computer via a communication path with using a wave-front aberration amount, which the projection optical system is to satisfy, as a standard. Therefore, in the process of making the projection optical system, higher-order components of the aberration as well as lower-order components can be simultaneously corrected by adjusting the projection optical system based on the result of measuring the wave-front aberration to satisfy the specification, so that the making process becomes simpler. Furthermore, the target that the exposure apparatus is to achieve is securely achieved due to the projection optical system.

10. 发明授权

US06961115B2 Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system 失效
标题翻译：规格确定方法，投影光学系统制作方法和调整方法，曝光装置及其制作方法以及计算机系统
公开(公告)号：US06961115B2
公开(公告)日：2005-11-01
申请号：US10072866
申请日：2002-02-12
申请人： Masato Hamatani , Toshio Tsukakoshi
发明人： Masato Hamatani , Toshio Tsukakoshi
IPC分类号： H01L21/027 , G03F7/20 , G03B27/32 , G03B27/34 , G03B27/52 , G03B27/68
CPC分类号： G03F7/706 , H01J2237/30433 , H01J2237/30461
摘要： A computer system comprises a first computer into which target information that an optical apparatus is to achieve is inputted and a second computer that determines the specification of a projection optical system based on the target information received from the first computer via a communication path with using a wave-front aberration amount, which the projection optical system is to satisfy, as a standard. Therefore, in the process of making the projection optical system, higher-order components of the aberration as well as lower-order components can be simultaneously corrected by adjusting the projection optical system based on the result of measuring the wave-front aberration to satisfy the specification, so that the making process becomes simpler. Furthermore, the target that the exposure apparatus is to achieve is securely achieved due to the projection optical system.
摘要翻译：计算机系统包括输入光学装置要实现的目标信息的第一计算机，以及基于从第一计算机经由通信路径接收的目标信息来确定投影光学系统的规格的第二计算机，其中使用作为标准，投影光学系统要满足的波前像差量。因此，在制造投影光学系统的过程中，可以通过基于测量波前像差的结果调整投影光学系统来同时校正像差的高阶分量以及低阶分量，以满足规范，使得制作过程变得更简单。此外，由于投影光学系统可靠地实现曝光装置要实现的目标。

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