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1. 发明授权

US09193560B2 Leader member, substrate, substrate cartridge, substrate-processing apparatus, leader-connecting method, method of manufacturing display element, and apparatus for manufacturing display element 有权
标题翻译：引导部件，基板，基板盒，基板处理装置，引线连接方法，显示元件的制造方法以及显示元件的制造装置
公开(公告)号：US09193560B2
公开(公告)日：2015-11-24
申请号：US13475368
申请日：2012-05-18
申请人： Tomohide Hamada , Tohru Kiuchi
发明人： Tomohide Hamada , Tohru Kiuchi
IPC分类号： B65H75/28
CPC分类号： B65H75/28 , B65H2701/124
摘要： A leader member includes a connection portion that is connected to a substrate and a position reference portion that is used at least for aligning the substrate with the connection portion.
摘要翻译：引导构件包括连接到基板的连接部分和至少用于使基板与连接部分对准使用的位置参考部分。

2. 发明授权

US08801307B2 Substrate cartridge, substrate processing apparatus, substrate processing system, control apparatus, and method of manufacturing display element 有权
标题翻译：基板盒，基板处理装置，基板处理系统，控制装置以及显示元件的制造方法
公开(公告)号：US08801307B2
公开(公告)日：2014-08-12
申请号：US12876842
申请日：2010-09-07
申请人： Tohru Kiuchi
发明人： Tohru Kiuchi
IPC分类号： B41J15/00 , H01L21/67
CPC分类号： H05K13/00 , B41J15/04 , H01L21/67132 , Y10T29/49002 , Y10T29/51
摘要： In order to provide a substrate cartridge, a substrate processing apparatus, a substrate processing system, a control apparatus, and a method of manufacturing a display element capable of preventing foreign objects from being attached to the substrate, there is provided a substrate cartridge including: a cartridge mainframe that has an opening which a substrate is carried in/out and accommodates the substrate through the opening; a mount portion that is provided in the cartridge mainframe and is detachably connected to an external connecting portion; and a blocking unit that blocks the opening depending on a connection state between the mount portion and an external connecting portion.
摘要翻译：为了提供基板盒，基板处理装置，基板处理系统，控制装置以及能够防止异物附着到基板上的显示元件的制造方法，提供了一种基板盒，包括：具有开口的盒式磁带主体，基板被输入/输出并通过开口容纳基板; 安装部分，其设置在所述盒主机中并且可拆卸地连接到外部连接部分; 以及阻挡单元，其根据所述安装部和外部连接部之间的连接状态来阻挡所述开口。

3. 发明申请

US20130027684A1 EXPOSURE APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，基板处理装置和装置制造方法
公开(公告)号：US20130027684A1
公开(公告)日：2013-01-31
申请号：US13640875
申请日：2011-04-13
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： G03B27/54 , G03B27/58
CPC分类号： G03F7/70275 , G03F7/703 , G03F7/70791
摘要： An exposure apparatus that transfers a pattern provided along a predetermined cylindrical surface onto a substrate while rotating the pattern in a circumferential direction of the cylindrical surface is provided, which includes a first projection optical system that projects an image of a first partial pattern of the pattern which is disposed in a first area of the cylindrical surface onto a first projection area, a second projection optical system that projects an image of a second partial pattern of the pattern which is disposed in a second area different from the first area onto a second projection area different from the first projection area, and a guide device that guides the substrate to the first projection area and the second projection area in synchronization with a rotation of the pattern in the circumferential direction.
摘要翻译：提供了一种曝光装置，其将沿着预定圆柱形表面设置的图案转印到基板上同时在圆柱形表面的圆周方向上旋转图案，其包括第一投影光学系统，其将图案的第一部分图案的图像投影其布置在所述圆柱形表面的第一区域中的第一投影区域上;第二投影光学系统，其将布置在不同于所述第一区域的第二区域中的所述图案的第二部分图案的图像投影到第二投影与第一投影区域不同的区域，以及引导装置，其与圆周方向上的图案的旋转同步地将基板引导到第一投影区域和第二投影区域。

4. 发明申请

US20120270144A1 PATTERN FORMING DEVICE, PATTERN FORMING METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：图案形成装置，图案形成方法和装置制造方法
公开(公告)号：US20120270144A1
公开(公告)日：2012-10-25
申请号：US13526428
申请日：2012-06-18
申请人： Tohru KIUCHI , Hideo MIZUTANI
发明人： Tohru KIUCHI , Hideo MIZUTANI
IPC分类号： G03F7/20
CPC分类号： G03F7/70791 , G03F9/7003
摘要： Presented are methods for forming a predetermined pattern in a predetermined area of an elongated sheet material. The methods include applying a two-dimensional tension to a portion including the predetermined area of the sheet material, and allowing a flat reference surface to adsorb a rear surface portion corresponding to the predetermined area of the sheet material applied with the two-dimensional tension. The methods then illuminate an energy beam corresponding to the pattern to the predetermined area of the sheet material adsorbed to the reference surface.
摘要翻译：提出了在细长片材的预定区域中形成预定图案的方法。所述方法包括将二维张力施加到包括片材的预定区域的部分，并且允许平坦的参考表面吸附与施加二维张力的片材的预定区域相对应的后表面部分。然后，该方法将对应于图案的能量束照射到吸附到参考表面的片材的预定区域。

5. 发明授权

US08289500B2 Exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US08289500B2
公开(公告)日：2012-10-16
申请号：US12382987
申请日：2009-03-27
申请人： Tohru Kiuchi
发明人： Tohru Kiuchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70725 , G03F7/70733
摘要： An exposure apparatus includes a first optical member from which an exposure beam is emitted; a first object movable at a light-exit side of the first optical member; a second object movable, independently of the first object, at the light-exit side of the first optical member; and a driving unit that moves the first object and the second object in a first direction within a predetermined plane including a first position opposing the first optical member in a state in which the first object and the second object are close to or in contact with each other and in which positions of the first object and the second object in a second direction within the predetermined plane are shifted.
摘要翻译：曝光装置包括从其发射曝光光束的第一光学部件; 在第一光学构件的光出射侧可移动的第一物体; 独立于第一物体的第二物体在第一光学构件的光出射侧; 以及驱动单元，其在第一物体和第二物体接近或接触每个状态的状态下在包括与第一光学构件相对的第一位置的预定平面内沿第一方向移动第一物体和第二物体其中第一物体和第二物体在预定平面内的第二方向上的位置偏移。

6. 发明授权

US08013975B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08013975B2
公开(公告)日：2011-09-06
申请号：US11987371
申请日：2007-11-29
申请人： Tohru Kiuchi
发明人： Tohru Kiuchi
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/70341 , G03F7/70733
摘要： An exposure apparatus includes: a first optical member via which an exposure beam exits; a first movable body movable while holding a substrate in a predetermined area; a first holding device releasably holding a first cover member, capable of forming a space retaining a liquid between the first optical member and the first cover member, such that when the first movable body is away from the first optical member, the first cover member is arranged at the position opposite to the exit surface of the first optical member; a second holding device arranged on the first movable body and capable of holding the first cover member released from the first holding device; and a third holding device arranged on the first movable body and releasably holding a second cover member. Deterioration of the performance due to the cover member can be suppressed while suppressing operating rate deterioration.
摘要翻译：曝光装置包括：曝光光束离开的第一光学部件; 可移动的第一移动体，同时将衬底保持在预定区域; 第一保持装置，其可释放地保持第一盖构件，能够在第一光学构件和第一盖构件之间形成保持液体的空间，使得当第一可移动体远离第一光学构件时，第一盖构件布置在与第一光学构件的出射表面相对的位置处; 第二保持装置，其布置在第一可移动体上并且能够保持从第一保持装置释放的第一盖构件; 以及第三保持装置，其布置在所述第一可移动体上并且可释放地保持第二盖构件。在抑制工作率劣化的同时，可以抑制由盖部件引起的性能的恶化。

7. 发明申请

US20090002660A1 Exposure apparatus and device manufacturing method 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20090002660A1
公开(公告)日：2009-01-01
申请号：US12230073
申请日：2008-08-22
申请人： Tohru Kiuchi
发明人： Tohru Kiuchi
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G02B7/021 , G02B7/023 , G03F7/70825 , G03F7/709
摘要： An exposure apparatus projects a pattern image onto a substrate via a projection optical system and a liquid, and the projection optical system has an optical member that comes into contact with the liquid and an optical group arranged between the optical member and a reticle. A holding mechanism that holds the optical member and the optical group holds the optical member so that it is movable relative to the optical group.
摘要翻译：曝光装置通过投影光学系统和液体将图案图像投射到基板上，并且投影光学系统具有与液体接触的光学构件和布置在光学构件和掩模版之间的光学组。保持光学构件和光学组的保持机构保持光学构件，使得其相对于光学组可移动。

8. 发明申请

US20080299492A1 Exposure method and electronic device manufacturing method 有权
标题翻译：曝光方法和电子元件制造方法
公开(公告)号：US20080299492A1
公开(公告)日：2008-12-04
申请号：US12071913
申请日：2008-02-27
申请人： Tohru Kiuchi , Naomasa Shiraishi , Hideya Inoue
发明人： Tohru Kiuchi , Naomasa Shiraishi , Hideya Inoue
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70266 , G03F7/703 , G03F7/70425 , G03F7/70783 , G03F9/7084 , G03F9/7088 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： An exposure method for exposing a bright-dark pattern onto each exposure region of a substrate via a projection optical system includes a position detection process for detecting positions of a plurality of microscopic regions in a unit exposure field of the substrate, a deformation calculation step of calculating a state of deformation in the unit exposure field based on information related to the positions of the plurality of microscopic regions obtained in the position detection step, and a shape modification step of modifying the shape of the bright-dark pattern to be exposed on the substrate based on the deformation state obtained in the deformation calculation step. The microscopic regions detected in the position detection step include a circuit pattern formed in the unit exposure field.
摘要翻译：用于经由投影光学系统将亮暗图案曝光到基板的每个曝光区域上的曝光方法包括用于检测基板的单位曝光场中的多个微观区域的位置的位置检测处理，变形计算步骤基于与位置检测步骤中获得的多个微观区域的位置相关的信息，计算单位曝光区域中的变形状态;以及形状修改步骤，修改曝光于所述位置检测步骤中的明暗图案的形状基于在变形计算步骤中获得的变形状态的基板。在位置检测步骤中检测到的微观区域包括在单位曝光区域中形成的电路图案。

9. 发明申请

US20080068571A1 Immersion exposure apparatus and immersion exposure method, and device manufacturing method 有权
标题翻译：浸渍曝光装置和浸渍曝光方法以及装置制造方法
公开(公告)号：US20080068571A1
公开(公告)日：2008-03-20
申请号：US11896891
申请日：2007-09-06
申请人： Tohru Kiuchi
发明人： Tohru Kiuchi
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70733
摘要： An immersion type exposure apparatus comprises: an optical member from which an exposure beam is emitted; a first movable member that is movable while holding a substrate, in a predetermined region including a first region including a position facing the optical member and a second region different from the first region; a second movable member that is movable while holding the substrate independently from a first movable member, in a predetermined region including the first region and the second region; a first connection member that is releasably and alternately connected with the first movable member and the second movable member, and moves one movable member in the first region; a second connection member that is releasably and alternately connected with the first movable member and the second movable member, and moves the other movable member in the second region; and a third movable member that is provided on the first connection member and is movable to a position facing the optical member, and at least one of the first movable member, the second movable member, and the third movable member is moved to the position facing the optical member so that a beam path on the emitting side of the optical member is kept filled with a liquid.
摘要翻译：浸没式曝光装置包括：发射曝光光束的光学构件; 在保持基板的同时能够移动的第一可移动部件，包括包括面向光学部件的位置的第一区域和与第一区域不同的第二区域的预定区域; 在包括所述第一区域和所述第二区域的预定区域中能够独立于第一可动构件保持所述基板的同时移动的第二可动构件; 第一连接构件，其与所述第一可动构件和所述第二可动构件可释放地交替地连接，并且移动所述第一区域中的一个可动构件; 第二连接构件，其与所述第一可动构件和所述第二可动构件可释放地交替地连接，并且使所述另一个可动构件在所述第二区域中移动; 以及第三可动构件，其设置在所述第一连接构件上并且可移动到面向所述光学构件的位置，并且所述第一可动构件，所述第二可动构件和所述第三可动构件中的至少一个移动到面向光学构件使得在光学构件的发射侧上的光束路径保持填充有液体。

10. 发明授权

US06583854B1 Method and apparatus for the manufacture of circuits for a large display device using stitch exposure 有权
标题翻译：用于制造使用针迹曝光的大型显示装置的电路的方法和装置
公开(公告)号：US06583854B1
公开(公告)日：2003-06-24
申请号：US09722608
申请日：2000-11-28
申请人： Junji Hazama , Tohru Kiuchi
发明人： Junji Hazama , Tohru Kiuchi
IPC分类号： G03B2742
CPC分类号： G03F7/70358 , G03F7/70475
摘要： A method and apparatus for the manufacture of circuits for a large display device using stitch exposure. In the peripheral region of a circuit pattern on a mask, the method of stitch exposing provides for a joining of pairs of stitch regions in order to join in an interfitting state such that a smaller mask can be combined to form a larger display device. By causing the corresponding positional relationship of mask and plate to change in a direction in which a pair of stitch regions face each other, the arrangement of respectively formed pattern counterparts, after being placed in a mutually complementary interfitting relationship, are transferred so as to be joined to the respective stitch region of a circuit pattern region periphery already transferred onto the plate.
摘要翻译：用于制造使用针迹曝光的大型显示装置的电路的方法和装置。在掩模上的电路图案的外围区域中，针迹曝光的方法提供了一对针脚区域的接合，以便在相互配合状态下结合，使得可以组合更小的掩模以形成更大的显示装置。通过使掩模和板的相应的位置关系在一对针脚区域彼此面对的方向上改变，分别形成的图案对应物的布置在相互互补的相互关系之后被转印为连接到已经转印到板上的电路图案区域周边的各个针脚区域。

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