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1. 发明授权

US10541160B2 Substrate case and substrate accommodation apparatus 有权
公开(公告)号：US10541160B2
公开(公告)日：2020-01-21
申请号：US12976149
申请日：2010-12-22
申请人： Hideo Mizutani , Tohru Kiuchi , Toru Kawaguchi , Takashi Masukawa
发明人： Hideo Mizutani , Tohru Kiuchi , Toru Kawaguchi , Takashi Masukawa
IPC分类号： B65H19/22 , H01L21/67 , B65H75/28 , H01L21/673
摘要： A substrate case includes a shaft portion around which a sheet-shaped substrate having a circuit area in which a circuit manufacturing process is performed is wound; and a cover portion that accommodates the substrate in the state of being wound around the shaft portion, the shaft portion having a holding portion that holds an area different from the circuit area at a winding start portion of the substrate.

2. 发明授权

US08379186B2 Pattern formation apparatus, pattern formation method, and device manufacturing method 有权
标题翻译：图案形成装置，图案形成方法和装置制造方法
公开(公告)号：US08379186B2
公开(公告)日：2013-02-19
申请号：US12833632
申请日：2010-07-09
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： G03B27/46 , G03B27/58
CPC分类号： G03F7/70791 , G03F7/70716 , G03F7/70725 , G03F7/70733
摘要： When a segmented region SAi of a sheet S is scan-exposed, a stage SST1 adsorbs, at a standby position at the +X end portion of a scan region AS, a rear surface portion corresponding to the segmented region SAi of the sheet S onto a holding surface of a sheet holder SH1, and moves in the X axis direction (the −X direction) with a predetermined stroke in synchronization with a mask (a mask stage). At this time, illumination beams corresponding to the parts of a pattern of the mask are irradiated onto the sheet S via projection optical systems. Thereby, the pattern is transferred (formed). After scan-exposure on the segmented region SAi, a stage SST2 moves to a standby position within the XY plane. After the stage SST2 adsorbs a rear surface portion corresponding to the next segmented region SAi+1 of the sheet S onto a holding surface of a sheet holder SH1, an exposure is performed by the scan-exposure method similarly to the above, to thereby form the pattern.
摘要翻译：当片材S的分割区域SAi被扫描曝光时，阶段SST1在扫描区域AS的+ X端部的待机位置处吸收与片材S的分割区域SAi对应的后表面部分，片保持件SH1的保持表面，并且与掩模（掩模台）同步地以预定行程沿X轴方向（-X方向）移动。此时，与掩模的图案的部分对应的照明光束经由投影光学系统照射到片材S上。由此，图案被转印（形成）。在分割区域SAi上的扫描曝光之后，台SST2移动到XY平面内的待机位置。在阶段SST2将对应于片材S的下一个分割区域SAi + 1的后表面部分吸附到片材保持器SH1的保持表面上之后，通过与上述类似的扫描曝光方法进行曝光，从而形成模式。

3. 发明授权

US08235695B2 Pattern forming device, pattern forming method, and device manufacturing method 有权
标题翻译：图案形成装置，图案形成方法和装置制造方法
公开(公告)号：US08235695B2
公开(公告)日：2012-08-07
申请号：US12822773
申请日：2010-06-24
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： B29C35/02
CPC分类号： G03F7/70791 , G03F9/7003
摘要： Six auxiliary sheet holders SH2 and SH3 temporarily holding a sheet S are minutely driven in the −Z-axis direction by a control device so that holding surfaces thereof are positioned on the slightly lower side (−Z side) of the holding surface of the sheet holder SH1. Accordingly, an appropriate tension is applied to the sheet S in the width direction (Y-axis direction) and the longitudinal direction, so that the center portion of the sheet S is fixed onto the holding surface of the sheet holder SH1. That is, in the state where an XY two-dimensional tension is applied to a separate area SAi of the sheet S, a rear surface portion corresponding to the separate area SAi of the sheet S is changed in accordance with the flat shape of the holding surface of the sheet holder SH1. In addition, in the state where the tension is applied to the predetermined area in the longitudinal direction and the width direction, the rear surface portion corresponding to the predetermined area of the sheet material S is changed in accordance with the flat reference surface so as to be flattened. In addition, the predetermined area of the flattened sheet material is irradiated with an energy beam so as to form a pattern thereon.
摘要翻译：临时保持片材S的六个辅助片材保持件SH2和SH3通过控制装置在-Z轴方向上被微小地驱动，使得其保持表面位于片材的保持表面的稍低侧（-Z侧）上持有人SH1。因此，在纸张S的宽度方向（Y轴方向）和长度方向上施加适当的张力，使得纸张S的中心部分固定在纸张保持器SH1的保持面上。也就是说，在将XY二维张力施加到片材S的分离区域SAi的状态下，与片材S的分离区域SAi相对应的后表面部分根据保持的平坦形状而改变表面保持器SH1。此外，在向长度方向和宽度方向的规定区域施加张力的状态下，与片材S的规定区域对应的后表面部分根据平坦的基准面而变化，从而被压扁此外，用能量束照射扁平片材的预定面积，以在其上形成图案。

4. 发明申请

US20110155838A1 SUBSTRATE CASE AND SUBSTRATE ACCOMMODATION APPARATUS 审中-公开
标题翻译：基板壳体和底板住宅装置
公开(公告)号：US20110155838A1
公开(公告)日：2011-06-30
申请号：US12976149
申请日：2010-12-22
申请人： Hideo MIZUTANI , Tohru KIUCHI , Toru KAWAGUCHI , Takashi MASUKAWA
发明人： Hideo MIZUTANI , Tohru KIUCHI , Toru KAWAGUCHI , Takashi MASUKAWA
IPC分类号： B65H19/28 , B65H19/22 , B65H19/30 , B65D85/00
摘要： A substrate case includes a shaft portion around which a sheet-shaped substrate having a circuit area in which a circuit manufacturing process is performed is wound; and a cover portion that accommodates the substrate in the state of being wound around the shaft portion, the shaft portion having a holding portion that holds an area different from the circuit area at a winding start portion of the substrate.
摘要翻译：基板壳体包括：轴部，卷绕具有进行电路制造工序的电路区域的片状基板; 以及盖部，其以卷绕在所述轴部的状态容纳所述基板，所述轴部具有保持部，其在所述基板的卷绕开始部保持与所述电路区域不同的区域。

5. 发明申请

US20110016709A1 MANUFACTURING METHOD FOR PRINTED WIRING BOARD 有权
标题翻译：印刷线路板制造方法
公开(公告)号：US20110016709A1
公开(公告)日：2011-01-27
申请号：US12771602
申请日：2010-04-30
申请人： Hideo Mizutani , Toshiyuki Matsui , Atsushi Deguchi
发明人： Hideo Mizutani , Toshiyuki Matsui , Atsushi Deguchi
IPC分类号： H05K3/02
CPC分类号： H05K3/108 , H05K3/067 , H05K3/4661 , H05K2203/0369 , H05K2203/0597 , H05K2203/122 , H05K2203/124 , H05K2203/1476 , Y10T29/49126 , Y10T29/49144 , Y10T29/49156 , Y10T29/49165
摘要： A manufacturing method for a printed wiring board includes forming an electroless plated film on an interlayer resin insulation layer, forming on the electroless plated film a plating resist with an opening to expose a portion of the electroless plated film, forming an electrolytic plated film on the portion of the electroless plated film exposed through the opening, removing the plating resist using a resist-removing solution containing an amine, reducing a thickness of a portion of the electroless plated film existing between adjacent portions of the electrolytic plated film by using the resist-removing solution, and forming a conductive pattern by removing the portion of the electroless plated film existing between the adjacent portions of the electrolytic plated film by using an etchant.
摘要翻译：一种印刷电路板的制造方法，包括在层间树脂绝缘层上形成无电解电镀膜，在所述无电解电镀膜上形成具有开口的电镀抗蚀剂，露出所述无电镀膜的一部分，在所述电镀膜上形成电解电镀膜通过开口露出的无电解电镀膜的一部分，使用含有胺的抗蚀剂去除溶液除去电镀抗蚀剂，通过使用抗蚀剂层，减少存在于电解电镀膜的相邻部分之间的部分无电解电镀膜的厚度，通过使用蚀刻剂除去存在于电解电镀膜的相邻部分之间的无电解电镀膜的部分，形成导电图案。

6. 发明申请

US20110012294A1 PATTERN FORMING DEVICE, PATTERN FORMING METHOD, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：图案形成装置，图案形成方法和装置制造方法
公开(公告)号：US20110012294A1
公开(公告)日：2011-01-20
申请号：US12822773
申请日：2010-06-24
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： B29C59/16 , B29B13/08 , B28B11/08
CPC分类号： G03F7/70791 , G03F9/7003
摘要： Six auxiliary sheet holders SH2 and SH3 temporarily holding a sheet S are minutely driven in the −Z-axis direction by a control device so that holding surfaces thereof are positioned on the slightly lower side (−Z side) of the holding surface of the sheet holder SH1. Accordingly, an appropriate tension is applied to the sheet S in the width direction (Y-axis direction) and the longitudinal direction, so that the center portion of the sheet S is fixed onto the holding surface of the sheet holder SH1. That is, in the state where an XY two-dimensional tension is applied to a separate area SAi of the sheet S, a rear surface portion corresponding to the separate area SAi of the sheet S is changed in accordance with the flat shape of the holding surface of the sheet holder SH1. In addition, in the state where the tension is applied to the predetermined area in the longitudinal direction and the width direction, the rear surface portion corresponding to the predetermined area of the sheet material S is changed in accordance with the flat reference surface so as to be flattened. In addition, the predetermined area of the flattened sheet material is irradiated with an energy beam so as to form a pattern thereon.
摘要翻译：临时保持片材S的六个辅助片材保持件SH2和SH3通过控制装置在-Z轴方向上被微小地驱动，使得其保持表面位于片材的保持表面的稍低侧（-Z侧）上持有人SH1。因此，在纸张S的宽度方向（Y轴方向）和长度方向上施加适当的张力，使得纸张S的中心部分固定在纸张保持器SH1的保持面上。也就是说，在将XY二维张力施加到片材S的分离区域SAi的状态下，与片材S的分离区域SAi相对应的后表面部分根据保持的平坦形状而改变表面保持器SH1。此外，在向长度方向和宽度方向的规定区域施加张力的状态下，与片材S的规定区域对应的后表面部分根据平坦的基准面而变化，从而被压扁此外，用能量束照射扁平片材的预定面积，以在其上形成图案。

7. 发明申请

US20100265483A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTRUING DEVICE 失效
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US20100265483A1
公开(公告)日：2010-10-21
申请号：US12692443
申请日：2010-01-22
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： G03B27/72 , G03B27/32
CPC分类号： G03F7/70791 , G03F7/70275 , G03F7/70358 , G03F7/70425
摘要： An exposure apparatus of one aspect of the present invention is provided with a moving mechanism that moves a first portion of a belt-shaped substrate that has photosensitivity in a first heading along a first direction and moves a second portion of the substrate in a second heading along the first direction, a stage mechanism that holds a mask and moves it in a third heading along a second direction in synchronization with the movement of the substrate, and a projection optical system. The projection optical system forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond.
摘要翻译：本发明的一个方面的曝光装置设置有移动机构，该移动机构沿着第一方向移动具有第一标题中的光敏性的带状基板的第一部分，并且在第二标题中移动基板的第二部分沿着第一方向，具有平台机构，其保持掩模并且与基板的移动同步地沿着第二方向在第三方向移动;以及投影光学系统。投影光学系统在第一部分上形成图案的第一投影图像，使得掩模上的第三标题和第一部分上的第一标题光学对应，并且在第二部分上形成图案的第二投影图像，使得掩模上的第三个标题和第二部分的第二个标题光学对应。

8. 发明授权

US07460207B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US07460207B2
公开(公告)日：2008-12-02
申请号：US11147288
申请日：2005-06-08
申请人： Hideo Mizutani , Nobutaka Magome
发明人： Hideo Mizutani , Nobutaka Magome
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341
摘要： An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) via the projection optical system and the liquid, includes a bubble detector (20) which detects air bubble or bubbles in the liquid between the projection optical system and the substrate (P). Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.
摘要翻译：一种曝光装置，其中通过用液体填充投影光学系统和基板（P）之间的空间的至少一部分并将图案的图像投影到基板上来进行基板（P）的曝光（ P）通过投影光学系统和液体包括气泡检测器（20），其检测投影光学系统和基板（P）之间的液体中的气泡或气泡。因此，当用液体填充投影光学系统和基板之间的空间时，曝光装置能够抑制由液体中的气泡引起的图案图像的劣化。

9. 发明授权

US6153886A Alignment apparatus in projection exposure apparatus 失效
标题翻译：投影曝光装置中的对准装置
公开(公告)号：US6153886A
公开(公告)日：2000-11-28
申请号：US407610
申请日：1999-09-28
申请人： Shigeru Hagiwara , Hideo Mizutani , Kazuya Ota
发明人： Shigeru Hagiwara , Hideo Mizutani , Kazuya Ota
IPC分类号： G03F9/00 , G01N21/86
CPC分类号： G03F9/7065 , G03F9/7088
摘要： An alignment apparatus according to the present invention is constructed, for example, which is arranged in an exposure apparatus provided with a projection optical system which projects a predetermined pattern formed on a mask onto a substrate under exposure light, which performs relative positioning between the mask and the substrate, which has light irradiating means for irradiating alignment light in a wavelength region different from that of exposure light onto an alignment mark formed on the substrate through the projection optical system and detecting means for detecting light from the alignment mark through the projection optical system, wherein, for alignment light as irradiation light traveling toward the alignment mark and alignment light as detection light from the alignment mark, there are provided correction optical elements for irradiation light and correction optical elements for detection light to cause axial chromatic aberration and magnification chromatic aberration in the opposite directions to axial chromatic aberration and magnification chromatic aberration of the projection optical system between the mask and the substrate, wherein the alignment light is multi-colored light with a plurality of beams different in wavelength from each other in the wavelength region different from that of exposure light, and wherein the correction optical elements for irradiation light or the correction optical elements for detection light each are provided in correspondence with the plurality of beams different in wavelength.
摘要翻译：根据本发明的对准装置例如被构造成设置在具有投影光学系统的曝光装置中，该投影光学系统将在掩模上形成的预定图案投影到曝光光下的基板上，该曝光装置执行掩模以及基板，其具有用于通过投影光学系统将与曝光光不同的波长区域中的对准光照射到形成在基板上的对准标记上的光照射装置和用于通过投影光学器件检测来自对准标记的光的检测装置系统，其中，对于作为向对准标记行进的照射光的对准光和作为来自对准标记的检测光的对准光，设置有用于照射光的校正光学元件和用于检测光的校正光学元件，以产生轴向色差和倍率色彩像差在与掩模和基板之间的投影光学系统的轴向色差和倍率色差的相反方向上，其中对准光是具有多个不同波长区域的波长不同的多个光束的多色光曝光用光，并且其中用于照射光的校正光学元件或用于检测光的校正光学元件各自对应于波长不同的多个光束。

10. 发明授权

US5757505A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5757505A
公开(公告)日：1998-05-26
申请号：US800062
申请日：1997-02-14
申请人： Hideo Mizutani
发明人： Hideo Mizutani
IPC分类号： G03F7/20 , G03F9/00 , G01B11/00
CPC分类号： G03F7/706 , G03F7/70241 , G03F7/70358 , G03F7/70641 , G03F9/70
摘要： In order to measure an image formation characteristic of a projection optical system directly and continuously without using a substrate to be replaced during a step for exposure a reticle, a wafer or the like, a reference unit, on which a reference mark is formed, is disposed between the projection optical system and the wafer. In a measuring optical system, diffracted light obtained by irradiating laser beam onto a diffraction grating on a measuring reference plate is irradiated onto a reference mark on the reference unit through a modulator and the projection optical system. Interference light generated from the reference mark is received by a photoelectric sensor through the projection optical system. A variation quantity of a focus position of the projection optical system is obtained from a phase difference of a detection signals output from the photoelectric sensor. A variation quantity of a projection magnification is obtained from an average of the phases of the detection signals.
摘要翻译：为了在用于曝光标线片，晶片等的参考单元中，在其上形成参考标记的参考单元，直接且连续地测量投影光学系统的图像形成特性，而不使用要替换的基板，设置在投影光学系统和晶片之间。在测量光学系统中，通过将激光束照射到测量基准板上的衍射光栅上获得的衍射光通过调制器和投影光学系统照射到参考单元上的基准标记上。由参考标记产生的干涉光由光电传感器通过投影光学系统接收。从光电传感器输出的检测信号的相位差获得投影光学系统的聚焦位置的变化量。从检测信号的相位的平均值获得投影倍率的变化量。

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