专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09025852B2 Substrate inspection apparatus and method for operating the same 有权
标题翻译：基板检查装置及其操作方法
公开(公告)号：US09025852B2
公开(公告)日：2015-05-05
申请号：US13482270
申请日：2012-05-29
申请人： Kazuya Hisano , Hiroshi Tomita , Norihisa Koga , Tadashi Nishiyama , Makoto Hayakawa
发明人： Kazuya Hisano , Hiroshi Tomita , Norihisa Koga , Tadashi Nishiyama , Makoto Hayakawa
IPC分类号： G06K9/00 , G01N21/956 , G01N21/88 , G01N21/93 , G01N21/95 , G06T7/00
CPC分类号： G01N21/956 , G01N21/8806 , G01N21/93 , G01N21/9501 , G01N2021/9513 , G06T7/0004
摘要： In one embodiment, a substrate inspection apparatus performs, in its maintenance mode, operations including: guiding a light emitted from an illuminating unit to an imaging device via a light-guiding member disposed in a casing; judging whether or not a level of a brightness signal obtained by the imaging device falls within a predetermined allowable range when a light emitted from the illuminating unit falls on the imaging device via the light-guiding member; and alarming, if it is judged that the value of the brightness signal is out of the predetermined allowable range, that replacement of the illuminating unit is required.
摘要翻译：在一个实施例中，基板检查装置在其维护模式中执行以下操作，其包括：经由设置在壳体中的导光构件将从照明单元发射的光引导到成像装置; 当从照明单元发射的光经由导光部件落在成像装置上时，判断由成像装置获得的亮度信号的电平是否落入预定的允许范围内; 并且如果判断亮度信号的值在预定的允许范围之外，则需要更换照明单元。

2. 发明申请

US20120307045A1 SUBSTRATE INSPECTION APPARATUS AND METHOD FOR OPERATING THE SAME 有权
标题翻译：基板检查装置及其操作方法
公开(公告)号：US20120307045A1
公开(公告)日：2012-12-06
申请号：US13482270
申请日：2012-05-29
申请人： Kazuya Hisano , Hiroshi Tomita , Norihisa Koga , Tadashi Nishiyama , Makoto Hayakawa
发明人： Kazuya Hisano , Hiroshi Tomita , Norihisa Koga , Tadashi Nishiyama , Makoto Hayakawa
IPC分类号： H04N7/18
CPC分类号： G01N21/956 , G01N21/8806 , G01N21/93 , G01N21/9501 , G01N2021/9513 , G06T7/0004
摘要： In one embodiment, a substrate inspection apparatus performs, in its maintenance mode, operations including: guiding a light emitted from an illuminating unit to an imaging device via a light-guiding member disposed in a casing; judging whether or not a level of a brightness signal obtained by the imaging device falls within a predetermined allowable range when a light emitted from the illuminating unit falls on the imaging device via the light-guiding member; and alarming, if it is judged that the value of the brightness signal is out of the predetermined allowable range, that replacement of the illuminating unit is required.
摘要翻译：在一个实施例中，基板检查装置在其维护模式中执行以下操作，其包括：经由设置在壳体中的导光部件将从照明单元发射的光引导到成像装置; 当从照明单元发射的光经由导光部件落在成像装置上时，判断由成像装置获得的亮度信号的电平是否落入预定的允许范围内; 并且如果判断亮度信号的值在预定的允许范围之外，则需要更换照明单元。

3. 发明授权

US08257605B2 Apparatus and method for removing coating film 有权
标题翻译：去除涂膜的设备和方法
公开(公告)号：US08257605B2
公开(公告)日：2012-09-04
申请号：US12620375
申请日：2009-11-17
申请人： Shinji Kobayashi , Norihisa Koga
发明人： Shinji Kobayashi , Norihisa Koga
IPC分类号： C03C15/00
CPC分类号： C03C17/002 , C03C2218/328 , C03C2218/355 , G03F7/168 , Y10S134/902
摘要： An apparatus and a method for removing a coating film capable of stable treatment for removing unnecessary coating film at a substrate edge are provided. A substrate is clamped by approach stages from front and rear directions on a chuck, and fixed when accurate registration thereof is achieved. Then, the substrate edge is moved back and forth together with the chuck and the approach stage, so that the edge of the substrate is introduced in a space between an upper piece and a lower piece of a fixed arm portion. While the substrate is being moved, a solvent is fed from a nozzle portion onto a surface thereof and a purge gas is fed through a purge gas feeding pipe, so as to remove the coating film from the surface of the substrate by sucking and discharging the solvent and dissolved coating film through a discharge pipe.
摘要翻译：提供了一种用于去除能够在基板边缘去除不需要的涂膜的稳定处理的涂膜的设备和方法。基板通过卡盘上的前后方向的夹持夹紧，并且在实现精确对准时固定。然后，基板边缘与卡盘和接近台一起前后移动，使得基板的边缘被引入到固定臂部分的上部件和下部件之间的空间中。在基板移动的同时，将溶剂从喷嘴部分供给到其表面，并且净化气体通过吹扫气体供给管进给，从而通过吸附和排出基板从基板的表面除去涂膜溶剂和溶解的涂膜通过排放管。

4. 发明授权

US07473321B2 Laser treatment apparatus 失效
标题翻译：激光治疗仪
公开(公告)号：US07473321B2
公开(公告)日：2009-01-06
申请号：US11213705
申请日：2005-08-30
申请人： Norihisa Koga , Shinji Koga , Naoto Yoshitaka , Akira Nishiya
发明人： Norihisa Koga , Shinji Koga , Naoto Yoshitaka , Akira Nishiya
IPC分类号： B05C11/00 , B05C13/02 , B05C1/28 , B05B5/00
CPC分类号： H01L21/67034 , B23K26/146 , B23K26/147 , H01L21/67051 , Y10S438/949
摘要： A drain port and an exhaust port arranged at the bottom of a cup surrounding a substrate holding unit. A drainage tray is arranged below the cup so as to cover the moving area of the drain port when the substrate holding unit and the cup move in X-directions and Y-directions. An exhaust unit is arranged at a position corresponding to the position of the exhaust port of the cup when the substrate holding unit is in its spin-drying position. The exhaust unit is connected to the exhaust port to suck the interior of the cup when the spin-drying of the substrate is executed. The use of a flexible tube which is always connected to the exhaust port is no longer necessary.
摘要翻译：排水口和排气口，布置在围绕衬底保持单元的杯的底部。当基板保持单元和杯子沿X方向和Y方向移动时，排水盘布置在杯下方以覆盖排水口的移动区域。当衬底保持单元处于其脱水位置时，排气单元布置在与杯的排气口的位置相对应的位置处。当执行基板的旋转干燥时，排气单元连接到排气口以吸收杯的内部。始终连接到排气口的柔性管的使用不再需要。

5. 发明授权

US07087118B2 Coating film forming apparatus and coating unit 失效
标题翻译：涂膜成膜装置和涂装单元
公开(公告)号：US07087118B2
公开(公告)日：2006-08-08
申请号：US11080756
申请日：2005-03-16
申请人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
发明人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
IPC分类号： B05C11/10 , B05B12/12
CPC分类号： H01L21/6715 , G03F7/162 , Y10S134/902
摘要： A coating film forming apparatus for forming a film by applying a coating solution to a substrate, which is provided with a cassette section, coating unit, developing unit, pre-treatment/post-treatment units and a main arm for transferring the substrate between the respective units. In the coating unit, provided is a coating section in which a resist is applied on the substrate in a manner of single stroke by intermittently moving the substrate in a Y-direction and by moving a nozzle in an X-direction, and provided is a reduced-pressure drying section for drying under reduced pressure the substrate after being applied, and further provided is equipment for removing the coating film adhered to a periphery of the substrate. Additionally, when the reduced-pressure drying section is arranged outside the coating unit, the main arm is covered with a cover so that the inside thereof is under a solvent atmosphere.
摘要翻译：一种涂膜形成装置，用于通过将涂布溶液涂布到基底上来形成膜，该基材设置有盒部，涂布单元，显影单元，预处理/后处理单元和用于在基板之间转移基板的主臂各单位。在涂布单元中，设置了通过在Y方向间歇地移动基板并且沿X方向移动喷嘴，以单行程的方式将抗蚀剂施加在基板上的涂布部分，并且设置为减压干燥部分，用于在施加后在减压下干燥基板，并且还提供了用于去除附着到基板周边的涂膜的设备。此外，当将减压干燥部配置在涂布单元的外侧时，主臂被盖覆盖，使其内部处于溶剂气氛下。

6. 发明申请

US20060090848A1 Laser processing apparatus and laser processing method 失效
公开(公告)号：US20060090848A1
公开(公告)日：2006-05-04
申请号：US11258040
申请日：2005-10-26
申请人： Norihisa Koga , Shinji Koga , Naoto Yoshitaka , Akira Nishiya
发明人： Norihisa Koga , Shinji Koga , Naoto Yoshitaka , Akira Nishiya
IPC分类号： H01L21/306 , C23C16/52 , B44C1/22 , C23F1/00 , H01L21/78 , G21G5/00 , B05D3/00
CPC分类号： H01L21/6715 , H01L21/681
摘要： A notch or the like of a wafer is detected via a guide member by means of a CCD camera provided so that an optical axis is coaxial to an optical axis of a laser beam, and alignment of the wafer is carried out. Next, in a state in which liquid ejected from a main nozzle or sub-nozzles is guided by means of the guide member, a laser beam whose optical axis is provided to be coaxial to the optical axis of the CCD camera is irradiated via the guide member. In addition, a predetermined processing operation is carried out with respect to the surface while an irradiation position of the laser beam is moved in a horizontal direction. The wafer is then transported from a chuck to the outside, and then, a purge gas is supplied to a bottom face of the guide member, and the bottom face is dried.

7. 发明授权

US06605153B2 Coating film forming apparatus 失效
标题翻译：涂膜成膜装置
公开(公告)号：US06605153B2
公开(公告)日：2003-08-12
申请号：US09735657
申请日：2000-12-14
申请人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
发明人： Takahiro Kitano , Masateru Morikawa , Yukihiko Esaki , Nobukazu Ishizaka , Norihisa Koga , Kazuhiro Takeshita , Hirofumi Ookuma , Masami Akimoto
IPC分类号： B05C1110
CPC分类号： H01L21/6715 , B05B12/20 , B05B13/041 , B05C5/0212 , B05C5/0216 , B05C5/0291 , B05C11/1039
摘要： An apparatus includes a holding portion for holding a substrate, a nozzle, provided to face the substrate held by the holding portion, for discharging a solution to the substrate, a driver for moving the nozzle along a surface of the substrate relatively with respect to the substrate while the solution is being discharged to the surface of the substrate from the nozzle, a mask unit covering a portion other than a film formation area of the substrate and including a mask member for catching the solution from the nozzle, and a cleaner provided in the mask unit. The coating solution can be supplied to the surface of the substrate in a way similar to a picture drawn with a single stroke of a brush. A cleaning unit for cleaning the mask member does not need to be provided separately, leading to the facilitation of cleaning and a reduction in space.
摘要翻译：一种装置，包括用于保持基板的保持部分，设置成面对由保持部分保持的基板的喷嘴，用于将溶液排出到基板;驱动器，用于相对于所述基板沿着基板的表面移动喷嘴基板，同时溶液从喷嘴排出到基板的表面;掩模单元，覆盖除了基板的成膜区域以外的部分，并且包括用于从喷嘴捕获溶液的掩模构件，以及设置在该基板中的清洁器面具单元。涂布溶液可以以类似于用笔刷的单次笔画绘制的图像的方式供应到基底的表面。用于清洁面罩构件的清洁单元不需要单独提供，从而促进清洁和减少空间。

8. 发明授权

US08088455B2 Laser treatment apparatus 有权
标题翻译：激光治疗仪
公开(公告)号：US08088455B2
公开(公告)日：2012-01-03
申请号：US12247750
申请日：2008-10-08
申请人： Norihisa Koga , Shinji Koga , Naoto Yoshitaka , Akira Nishiya
发明人： Norihisa Koga , Shinji Koga , Naoto Yoshitaka , Akira Nishiya
IPC分类号： B05D1/00 , B05D3/06 , B05D3/12 , B23K26/08 , B23K26/14 , B05C11/10 , B08B7/04 , B08B3/10
CPC分类号： H01L21/67034 , B23K26/146 , B23K26/147 , H01L21/67051 , Y10S438/949
摘要： A drain port and an exhaust port arranged at the bottom of a cup surrounding a substrate holding unit. A drainage tray is arranged below the cup so as to cover the moving area of the drain port when the substrate holding unit and the cup move in X-directions and Y-directions. An exhaust unit is arranged at a position corresponding to the position of the exhaust port of the cup when the substrate holding unit is in its spin-drying position. The exhaust unit is connected to the exhaust port to suck the interior of the cup when the spin-drying of the substrate is executed. The use of a flexible tube which is always connected to the exhaust port is no longer necessary.
摘要翻译：排水口和排气口，布置在围绕衬底保持单元的杯的底部。当基板保持单元和杯子沿X方向和Y方向移动时，排水盘布置在杯下方以覆盖排水口的移动区域。当衬底保持单元处于其脱水位置时，排气单元布置在与杯的排气口的位置相对应的位置处。当执行基板的旋转干燥时，排气单元连接到排气口以吸收杯的内部。始终连接到排气口的柔性管的使用不再需要。

9. 发明授权

US07710582B2 Laser processing apparatus and laser processing method for cutting and removing a part of a surface region of a substrate 失效
标题翻译：激光加工装置和用于切割和去除基板的表面区域的一部分的激光加工方法
公开(公告)号：US07710582B2
公开(公告)日：2010-05-04
申请号：US11258281
申请日：2005-10-26
申请人： Norihisa Koga , Shinji Koga , Naoto Yoshitaka , Akira Nishiya
发明人： Norihisa Koga , Shinji Koga , Naoto Yoshitaka , Akira Nishiya
IPC分类号： G01B11/30
CPC分类号： H01L21/67092 , B23K26/04 , B23K26/0853 , B23K26/146 , B23K2101/40
摘要： Before applying a processing laser beam to a surface of a substrate through a film of liquid, distance M2 between a reference point on an axis of a first laser displacement meter and the surface of the substrate is measured to correct distance M1 between a lower end of an optical unit and the surface of the substrate, on the basis of distance M2, the processing laser beam is applied to the surface of the substrate, thereby cutting and removing a part of the surface of the substrate, and a depth to which the surface of the substrate has been cut and removed with the processing laser beam is measured by a second laser displacement meter.
摘要翻译：在通过液体膜将处理激光束施加到基板的表面之前，测量第一激光位移计的轴上的参考点与基板的表面之间的距离M2，以校正距离M1 光学单元和基板的表面，基于距离M2，将处理激光束施加到基板的表面，从而切割和去除基板的一部分表面，并且将表面的深度已经通过第二激光位移计测量加工激光束来切割和去除衬底。

10. 发明授权

US07622000B2 Laser processing apparatus and laser processing method 失效
标题翻译：激光加工设备和激光加工方法
公开(公告)号：US07622000B2
公开(公告)日：2009-11-24
申请号：US11258040
申请日：2005-10-26
申请人： Norihisa Koga , Shinji Koga , Naoto Yoshitaka , Akira Nishiya
发明人： Norihisa Koga , Shinji Koga , Naoto Yoshitaka , Akira Nishiya
IPC分类号： B05B7/00 , B05B7/06 , B05B5/00 , B05B1/34 , B05C11/02 , B05C11/00
CPC分类号： H01L21/6715 , H01L21/681
摘要： A notch or the like of a wafer is detected via a guide member by means of a CCD camera provided so that an optical axis is coaxial to an optical axis of a laser beam, and alignment of the wafer is carried out. Next, in a state in which liquid ejected from a main nozzle or sub-nozzles is guided by means of the guide member, a laser beam whose optical axis is provided to be coaxial to the optical axis of the CCD camera is irradiated via the guide member. In addition, a predetermined processing operation is carried out with respect to the surface while an irradiation position of the laser beam is moved in a horizontal direction. The wafer is then transported from a chuck to the outside, and then, a purge gas is supplied to a bottom face of the guide member, and the bottom face is dried.
摘要翻译：晶片的凹口等通过引导部件通过CCD照相机被检测，所述CCD照相机设置为使得光轴与激光束的光轴同轴，并且进行晶片的对准。接下来，在从主喷嘴喷射的液体或副喷嘴通过引导构件引导的状态下，通过引导件照射设置为与CCD照相机的光轴同轴的光轴的激光束会员。此外，当激光束的照射位置沿水平方向移动时，相对于表面执行预定的处理操作。然后将晶片从卡盘输送到外部，然后将净化气体供应到引导构件的底面，并且底面被干燥。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式