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    • 10. 发明申请
    • MASKING SYSTEMS AND METHODS
    • 掩蔽系统和方法
    • US20160177621A1
    • 2016-06-23
    • US14973348
    • 2015-12-17
    • PDS IG Holding LLC
    • Paul Trpkovski
    • E06B9/00B05D1/32
    • E06B9/00B05D1/32C03C17/002C03C2218/355
    • Embodiments provide systems, methods, and masking workstations for masking a planar substrate with a shield. The shield is configured to facilitate the removal of a waste portion of masking material from a portion of a planar substrate. In some cases the shield is placed adjacent to a substrate and a masking material is applied to the substrate and at least a portion of the shield. A waste portion is separated from the masking material and the shield removes the waste portion. Embodiments can be useful for masking only a portion of a planar substrate, including glass panes and glass units, for example.
    • 实施例提供了用屏蔽屏蔽平面基板的系统,方法和掩蔽工作站。 屏蔽构造成便于从平面基板的一部分去除掩模材料的废弃部分。 在一些情况下,屏蔽件被放置成与衬底相邻,并且掩蔽材料被施加到衬底和屏蔽件的至少一部分。 废弃部分与掩蔽材料分离,并且屏蔽件去除废物部分。 例如,实施例可用于仅掩盖平面基板的一部分,包括玻璃板和玻璃单元。