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1. 发明授权

US06992008B2 Method of making a substrate having buried structure and method for fabricating a display device including the substrate 有权
标题翻译：制造具有掩埋结构的衬底的方法和用于制造包括该衬底的显示装置的方法
公开(公告)号：US06992008B2
公开(公告)日：2006-01-31
申请号：US10956886
申请日：2004-10-01
申请人： Kazuki Kobayashi , Kimiaki Fujino , Ikuo Sakono , Tadahiro Ohmi , Shigetoshi Sugawa , Akihiro Morimoto
发明人： Kazuki Kobayashi , Kimiaki Fujino , Ikuo Sakono , Tadahiro Ohmi , Shigetoshi Sugawa , Akihiro Morimoto
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： G02F1/136286 , G02F1/136213 , H01L29/41733 , H01L29/78633
摘要： A method of making a substrate having a buried structure includes the steps of preparing a glass substrate having a principal surface, forming a groove on the principal surface of the glass substrate by a wet etching process, and depositing a first material over the principal surface of the glass substrate and filling the groove with the first material to form the buried structure having a surface that is substantially flush with the principal surface. The step of forming the groove includes the step of performing the wet etching process by using an etchant that includes hydrofluoric acid, ammonium fluoride, and hydrochloric acid or oxalic acid.
摘要翻译：制造具有掩埋结构的基板的方法包括以下步骤：制备具有主表面的玻璃基板，通过湿蚀刻工艺在玻璃基板的主表面上形成凹槽，并且在第一材料的主表面上沉积第一材料玻璃基板并用第一材料填充凹槽，以形成具有与主表面基本齐平的表面的掩埋结构。形成凹槽的步骤包括通过使用包括氢氟酸，氟化铵和盐酸或草酸的蚀刻剂进行湿蚀刻工艺的步骤。

2. 发明申请

US20050040526A1 Method of making a substrate having buried structure and method for fabricating a display device including the substrate 有权
标题翻译：制造具有掩埋结构的衬底的方法和用于制造包括该衬底的显示装置的方法
公开(公告)号：US20050040526A1
公开(公告)日：2005-02-24
申请号：US10956886
申请日：2004-10-01
申请人： Kazuki Kobayashi , Kimiaki Fujino , Ikuo Sakono , Tadahiro Ohmi , Shigetoshi Sugawa , Akihiro Morimoto
发明人： Kazuki Kobayashi , Kimiaki Fujino , Ikuo Sakono , Tadahiro Ohmi , Shigetoshi Sugawa , Akihiro Morimoto
IPC分类号： G02F1/1333 , C03C15/00 , G02F1/13 , G02F1/1335 , G02F1/1343 , G02F1/1362 , G02F1/1368 , G09F9/30 , H01L21/336 , H01L21/768 , H01L23/522 , H01L29/417 , H01L29/786 , G02B6/36 , H01L21/44 , H01L21/4763 , H01L23/48 , H01L29/40
CPC分类号： G02F1/136286 , G02F1/136213 , H01L29/41733 , H01L29/78633
摘要： A method of making a substrate having a buried structure includes the steps of preparing a glass substrate having a principal surface, forming a groove on the principal surface of the glass substrate by a wet etching process, and depositing a first material over the principal surface of the glass substrate and filling the groove with the first material to form the buried structure having a surface that is substantially flush with the principal surface. The step of forming the groove includes the step of performing the wet etching process by using an etchant that includes hydrofluoric acid, ammonium fluoride, and hydrochloric acid or oxalic acid.
摘要翻译：制造具有掩埋结构的基板的方法包括以下步骤：制备具有主表面的玻璃基板，通过湿蚀刻工艺在玻璃基板的主表面上形成凹槽，并且在第一材料的主表面上沉积第一材料玻璃基板并用第一材料填充凹槽，以形成具有与主表面基本齐平的表面的掩埋结构。形成凹槽的步骤包括通过使用包括氢氟酸，氟化铵和盐酸或草酸的蚀刻剂进行湿蚀刻工艺的步骤。

3. 发明授权

US06815720B2 Substrate having buried structure, display device including the substrate, method of making the substrate and method for fabricating the display device 有权
标题翻译：具有掩埋结构的衬底，包括衬底的显示装置，制造衬底的方法以及用于制造显示装置的方法
公开(公告)号：US06815720B2
公开(公告)日：2004-11-09
申请号：US10227121
申请日：2002-08-23
申请人： Kazuki Kobayashi , Kimiaki Fujino , Ikuo Sakono , Tadahiro Ohmi , Shigetoshi Sugawa , Akihiro Morimoto
发明人： Kazuki Kobayashi , Kimiaki Fujino , Ikuo Sakono , Tadahiro Ohmi , Shigetoshi Sugawa , Akihiro Morimoto
IPC分类号： H01L29786
CPC分类号： G02F1/136286 , G02F1/136213 , H01L29/41733 , H01L29/78633
摘要： A method of making a substrate having a buried structure includes the steps of preparing a glass substrate having a principal surface, forming a groove on the principal surface of the glass substrate by a wet etching process, and depositing a first material over the principal surface of the glass substrate and filling the groove with the first material to form the buried structure having a surface that is substantially flush with the principal surface. The step of forming the groove includes the step of performing the wet etching process by using an etchant that includes hydrofluoric acid, ammonium fluoride, and hydrochloric acid or oxalic acid.
摘要翻译：制造具有掩埋结构的基板的方法包括以下步骤：制备具有主表面的玻璃基板，通过湿蚀刻工艺在玻璃基板的主表面上形成凹槽，并且在第一材料的主表面上沉积第一材料玻璃基板并用第一材料填充凹槽，以形成具有与主表面基本齐平的表面的掩埋结构。形成凹槽的步骤包括通过使用包括氢氟酸，氟化铵和盐酸或草酸的蚀刻剂进行湿蚀刻工艺的步骤。

4. 发明授权

US06563174B2 Thin film transistor and matrix display device 有权
标题翻译：薄膜晶体管和矩阵显示装置
公开(公告)号：US06563174B2
公开(公告)日：2003-05-13
申请号：US10224879
申请日：2002-08-21
申请人： Masashi Kawasaki , Hideo Ohno , Kazuki Kobayashi , Ikuo Sakono
发明人： Masashi Kawasaki , Hideo Ohno , Kazuki Kobayashi , Ikuo Sakono
IPC分类号： H01L2701
CPC分类号： H01L29/7869 , H01L27/1214 , H01L27/1225 , H01L29/4908 , H01L29/66969 , H01L29/78603
摘要： In a thin film transistor, a gate insulating film having a first insulating film and a second insulating film is formed on a gate electrode, and a semiconductor layer including ZnO etc. is formed on the second insulating film. The first insulating film is formed by using SiNx having a high insulating characteristic, and the second insulating film is formed by using an oxide (for example, SiO2). This structure improves a crystalline characteristic of the semiconductor layer that constitutes an interface in combination with the second insulating film, and decreases a defective level of the interface between the semiconductor layer and the second insulating film. Further, the second insulating film is constituted of the oxide, so that it is possible to restrain a material for the second insulating film from depriving oxygen of the semiconductor layer. This keeps a crystalline characteristic of the semiconductor layer under a preferable condition in the vicinity of the interface between the second insulating film and the semiconductor layer. As a result, it is possible to realize a thin film transistor such that: a leak current level at an OFF area is low, and the mobility is high, and a switching characteristic is preferable. Thus, in the thin film transistor having a transparent semiconductor film, a TFT characteristic is improved.
摘要翻译：在薄膜晶体管中，在栅电极上形成具有第一绝缘膜和第二绝缘膜的栅极绝缘膜，并且在第二绝缘膜上形成包括ZnO等的半导体层。第一绝缘膜通过使用具有高绝缘特性的SiNx形成，并且第二绝缘膜通过使用氧化物（例如，SiO 2）形成。该结构改善了构成与第二绝缘膜结合的界面的半导体层的结晶特性，并降低了半导体层与第二绝缘膜之间的界面的缺陷水平。此外，第二绝缘膜由氧化物构成，使得可以抑制第二绝缘膜的材料剥夺半导体层的氧。这在第二绝缘膜和半导体层之间的界面附近的优选条件下保持半导体层的结晶特性。结果，可以实现薄膜晶体管，使得在OFF区域的漏电流水平低，并且迁移率高，并且切换特性是优选的。因此，在具有透明半导体膜的薄膜晶体管中，提高了TFT特性。

5. 发明授权

US06953600B2 Conductive film forming composition, conductive film, and method for forming the same 有权
标题翻译：导电膜形成组合物，导电膜及其形成方法
公开(公告)号：US06953600B2
公开(公告)日：2005-10-11
申请号：US10410154
申请日：2003-04-10
申请人： Yasuaki Yokoyama , Yasuo Matsuki , Ikuo Sakono , Kazuki Kobayashi , Yasumasa Takeuchi
发明人： Yasuaki Yokoyama , Yasuo Matsuki , Ikuo Sakono , Kazuki Kobayashi , Yasumasa Takeuchi
IPC分类号： C23C18/08 , C23C18/10 , C23C18/14 , C23C18/16 , H01B5/14 , H01B13/00 , H01J9/02 , H01L21/288 , H01L21/768 , H01L23/498 , H05K3/10 , H05K3/24 , B05D5/12
CPC分类号： H01L21/76838 , C23C18/08 , H01L21/288 , H01L23/49883 , H01L2924/0002 , H01L2924/09701 , H05K3/105 , Y10T428/24917 , H01L2924/00
摘要： There are provided a conductive film forming composition capable of forming wiring or an electrode which can be suitably used in a variety of electronic devices, easily and inexpensively, a method for forming a film using the composition, a conductive film formed by the method, and wiring or an electrode which comprises the film.A conductive film forming composition comprising a complex of an amine compound and aluminum hydride and an organic solvent is applied on a substrate and then subjected to a heat treatment and/or irradiation with light, whereby a conductive film such as an electrode or wiring is produced.
摘要翻译：提供能够容易且廉价地形成布线或电极的导电膜形成组合物，其可以适用于各种电子器件，使用该组合物形成膜的方法，通过该方法形成的导电膜，以及布线或包括该膜的电极。将包含胺化合物和氢化铝的复合物和有机溶剂的导电膜形成组合物施加在基材上，然后进行热处理和/或光照射，由此产生诸如电极或布线的导电膜。

6. 发明授权

US06984476B2 Radiation-sensitive resin composition, forming process for forming patterned insulation film, active matrix board and flat-panel display device equipped with the same, and process for producing flat-panel display device 有权
公开(公告)号：US06984476B2
公开(公告)日：2006-01-10
申请号：US10410394
申请日：2003-04-10
申请人： Kazuki Kobayashi , Ikuo Sakono , Shinji Shiraki , Hirofumi Sasaki , Kazuaki Niwa
发明人： Kazuki Kobayashi , Ikuo Sakono , Shinji Shiraki , Hirofumi Sasaki , Kazuaki Niwa
IPC分类号： G03F7/023 , G03F7/30
CPC分类号： G03F7/0007 , G02F1/136227 , G03F7/0233 , G03F7/0757
摘要： The invention provides a radiation-sensitive resin composition, by which a patterned insulation film whose water repellency varies is easily formed with high precision, a process for forming a patterned insulation film using this composition, a display element and an flat-panel disply device using the composition, and a process for producing the flat-panel disply device.The resin composition comprises (A) an alkali-soluble copolymer, (B) a 1,2-quinonediazide compound and (C) a water-repellent siloxane resin in particular proportions. In the production process of the patterned insulation film, patterning exposure and development are conducted on a coating formed of the resin composition. The display element and flat-panel disply device are equipped with an interlayer insulation film formed by the resin composition. The production process of the flat-panel disply device comprises an interlayer insulation film-forming step including a treatment of patterning exposure exposing conductor layer-forming regions in an exposure that only surface layer portions are cured in one part thereof, and the whole in the thickness-wise direction thereof is cured in the other parts, and a conductor layer-forming step of forming conductor layers on the surface of the interlayer insulation film with a liquid material.

7. 发明授权

US09126523B2 Vehicle elevating a working beam with respect to booms 有权
标题翻译：车辆相对于吊杆升高工作梁
公开(公告)号：US09126523B2
公开(公告)日：2015-09-08
申请号：US13566317
申请日：2012-08-03
申请人： Noriyuki Ogita , Kazunari Sakurai , Ryou Maeda , Kazuki Kobayashi , Koshu Yamashita , Akihiko Go , Toshihiko Nishio , Yoshio Masuda
发明人： Noriyuki Ogita , Kazunari Sakurai , Ryou Maeda , Kazuki Kobayashi , Koshu Yamashita , Akihiko Go , Toshihiko Nishio , Yoshio Masuda
IPC分类号： B60P1/54 , B60P1/64 , B66D3/08
CPC分类号： B60P1/6472 , B60P1/5428 , B66D3/08
摘要： Provided is a vehicle that elevates a working beam installed between a pair of booms with a working beam elevating unit and can ensure the area of a load receiving surface where a load is loaded. The working beam elevating unit is received in a working beam and one end of a chain is fixed to a boom. Therefore, the working beam is moved up/down by loosening and retracting the chain. Therefore, as the working beam elevating unit is installed at the working beam, it is not necessary to ensure a space for installing the working beam on a vehicle body. Therefore, it is correspondingly possible to enlarge the space (area of the load receiving surface) on the vehicle for loading a load.
摘要翻译：提供一种车辆，其将安装在一对起重臂与作业梁提升单元之间的作业梁提升，并且可以确保负载接收表面的负载的面积。工作梁提升单元被接收在工作梁中，链的一端固定在吊杆上。因此，通过松开和缩回链条，工作梁上/下移动。因此，由于工作梁提升单元安装在工作梁上，因此不需要确保用于将工作梁安装在车体上的空间。因此，可以相应地扩大用于装载负载的车辆上的空间（承载面的面积）。

8. 发明授权

US08980121B2 Etching liquid for a copper/titanium multilayer thin film 有权
标题翻译：用于铜/钛多层薄膜的蚀刻液
公开(公告)号：US08980121B2
公开(公告)日：2015-03-17
申请号：US13575767
申请日：2011-01-28
申请人： Tomoyuki Adaniya , Satoshi Okabe , Toshiyuki Gotou , Taketo Maruyama , Kazuki Kobayashi , Keiichi Tanaka , Wataru Nakamura , Kenichi Kitoh , Tetsunori Tanaka
发明人： Tomoyuki Adaniya , Satoshi Okabe , Toshiyuki Gotou , Taketo Maruyama , Kazuki Kobayashi , Keiichi Tanaka , Wataru Nakamura , Kenichi Kitoh , Tetsunori Tanaka
IPC分类号： B44C1/22 , C23F1/00 , C03C15/00 , C03C25/68 , H01L21/302 , H01L21/461 , C09K13/00 , C09K13/08 , H01L21/3213 , C23F1/18 , C23F1/26 , C23F1/44 , H05K3/06 , H01L23/532
CPC分类号： H01L21/32134 , C23F1/18 , C23F1/26 , C23F1/44 , H01L23/53238 , H01L2924/0002 , H05K3/067 , H01L2924/00
摘要： The present invention provides an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, and a method of using it for etching a multilayer thin film containing a copper layer and a titanium layer, that is, an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, which comprises (A) hydrogen peroxide, (B) nitric acid, (C) a fluoride ion source, (D) an azole, (E) a quaternary ammonium hydroxide and (F) a hydrogen peroxide stabilizer and has a pH of from 1.5 to 2.5, and a etching method of using it.
摘要翻译：本发明提供了一种用于含有铜层和钛层的多层薄膜的蚀刻液及其用于蚀刻含有铜层和钛层的多层薄膜的方法，即，用于含有（A）过氧化氢，（B）硝酸，（C）氟化物离子源，（D）唑，（E）季铵氢氧化物和（F））的含有铜层和钛层的多层薄膜）过氧化氢稳定剂，pH为1.5〜2.5，使用其蚀刻方法。

9. 发明申请

US20120148012A1 CONTROL ROD 失效
标题翻译：控制杆
公开(公告)号：US20120148012A1
公开(公告)日：2012-06-14
申请号：US12019103
申请日：2008-01-24
申请人： Takayuki ARAKAWA , Koichi Machida , Norio Kawashima , Kazuki Kobayashi , Yoshiharu Kikuchi
发明人： Takayuki ARAKAWA , Koichi Machida , Norio Kawashima , Kazuki Kobayashi , Yoshiharu Kikuchi
IPC分类号： G21C7/06
CPC分类号： G21C7/113 , G21C7/10 , Y02E30/39
摘要： A control rod includes a tie-rod, a handle mounted to an upper end portion of the tie-rod, either a connector plate or a fall velocity limiter mounted to a lower end portion of the tie-rod, sheaths having a U-shaped cross-section, welded intermittently to the tie-rod at a plurality of locations in the axial direction of the tie-rod, and having an upper end welded to the handle and a lower end welded to either the connector plate or the fall velocity limiter, and a neutron absorbing member disposed inside each of the sheaths. An upper end of a weld portion located at uppermost position in an axial direction of the tie-rod among a plurality of weld portions between the tie-rod and the sheath is disposed at a position within a range between 0.8 and 13% of total axial length Ls of the sheath below an upper end of the sheath.
摘要翻译：控制杆包括拉杆，安装到拉杆的上端部分的手柄，安装到拉杆的下端部分的连接板或下落速度限制器，具有U形的护套横截面，在连杆的轴向方向上的多个位置处间断地焊接到拉杆，并且具有焊接到手柄的上端，以及焊接到连接器板或下落速度限制器的下端以及设置在每个护套内的中子吸收构件。位于拉杆和护套之间的多个焊接部分中的位于拉杆的轴向方向上的最上位置处的焊接部分的上端设置在总轴向的0.8和13％之间的范围内的位置在鞘的上端下方的鞘的长度Ls。

10. 发明授权

US06497240B1 Ultrasound cleaning device and resist-stripping device 有权
标题翻译：超声波清洗装置和抗剥离装置
公开(公告)号：US06497240B1
公开(公告)日：2002-12-24
申请号：US09557052
申请日：2000-04-21
申请人： Kazuki Kobayashi , Toshiaki Muratani , Hiroto Yoshioka
发明人： Kazuki Kobayashi , Toshiaki Muratani , Hiroto Yoshioka
IPC分类号： B08B310
CPC分类号： H01L21/67051 , B08B3/022 , B08B2203/0288 , Y10S134/902
摘要： To provide an ultrasonic cleaning device (1) that ensures stable operation of a vibrating element for generating ultrasonic without a complex structure and distribution of a great quantity of a cleaning liquid and (2) that is capable of cleaning upper and lower surfaces of a cleaning target easily, an ultrasonic cleaning section of the device is provided with an upper cleaning-liquid-supply nozzle and a lower cleaning-liquid-supply nozzle for projection of ultrasonic. The upper cleaning-liquid-supply nozzle supplies an upper surface cleaning liquid to an upper surface of a glass substrate. The lower cleaning-liquid-supply nozzle supplies the lower surface cleaning liquid to a lower surface of the substrate in a form of shower to which ultrasonic has been projected. A vibrating element for generating ultrasonic to be projected to the lower surface cleaning liquid is provided in a cleaning liquid distribution path that extends from an upstream side to a downstream side in a direction in a range of a horizontal direction to an upward direction.
摘要翻译：提供一种超声波清洗装置（1），其确保用于产生超声波的振动元件的稳定运行，而没有复杂的结构和大量的清洗液体的分布，以及（2）能够清洁清洁的上下表面的超声波清洗装置所述装置的超声波清洗部设置有用于超声波投影的上部清洗液供给喷嘴和下部清洗液供给喷嘴。上清洗液供给喷嘴将上表面清洗液供给到玻璃基板的上表面。下部清洗液供给喷嘴将下表面清洗液以投射了超声波的喷淋形式向基板的下表面供给。用于产生超声波的振动元件设置在从水平方向向上方的范围内的上游侧向下游侧延伸的清洗液分配路径中。

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