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    • 1. 发明申请
    • CONTROL ROD
    • 控制杆
    • US20120148012A1
    • 2012-06-14
    • US12019103
    • 2008-01-24
    • Takayuki ARAKAWAKoichi MachidaNorio KawashimaKazuki KobayashiYoshiharu Kikuchi
    • Takayuki ARAKAWAKoichi MachidaNorio KawashimaKazuki KobayashiYoshiharu Kikuchi
    • G21C7/06
    • G21C7/113G21C7/10Y02E30/39
    • A control rod includes a tie-rod, a handle mounted to an upper end portion of the tie-rod, either a connector plate or a fall velocity limiter mounted to a lower end portion of the tie-rod, sheaths having a U-shaped cross-section, welded intermittently to the tie-rod at a plurality of locations in the axial direction of the tie-rod, and having an upper end welded to the handle and a lower end welded to either the connector plate or the fall velocity limiter, and a neutron absorbing member disposed inside each of the sheaths. An upper end of a weld portion located at uppermost position in an axial direction of the tie-rod among a plurality of weld portions between the tie-rod and the sheath is disposed at a position within a range between 0.8 and 13% of total axial length Ls of the sheath below an upper end of the sheath.
    • 控制杆包括拉杆,安装到拉杆的上端部分的手柄,安装到拉杆的下端部分的连接板或下落速度限制器,具有U形的护套 横截面,在连杆的轴向方向上的多个位置处间断地焊接到拉杆,并且具有焊接到手柄的上端,以及焊接到连接器板或下落速度限制器的下端 以及设置在每个护套内的中子吸收构件。 位于拉杆和护套之间的多个焊接部分中的位于拉杆的轴向方向上的最上位置处的焊接部分的上端设置在总轴向的0.8和13%之间的范围内的位置 在鞘的上端下方的鞘的长度Ls。
    • 2. 发明授权
    • Control rod
    • 控制杆
    • US08213563B1
    • 2012-07-03
    • US12019103
    • 2008-01-24
    • Takayuki ArakawaKoichi MachidaNorio KawashimaKazuki KobayashiYoshiharu Kikuchi
    • Takayuki ArakawaKoichi MachidaNorio KawashimaKazuki KobayashiYoshiharu Kikuchi
    • G21C7/00
    • G21C7/113G21C7/10Y02E30/39
    • A control rod includes a tie-rod, a handle mounted to an upper end portion of the tie-rod, either a connector plate or a fall velocity limiter mounted to a lower end portion of the tie-rod, sheaths having a U-shaped cross-section, welded intermittently to the tie-rod at a plurality of locations in the axial direction of the tie-rod, and having an upper end welded to the handle and a lower end welded to either the connector plate or the fall velocity limiter, and a neutron absorbing member disposed inside each of the sheaths. An upper end of a weld portion located at uppermost position in an axial direction of the tie-rod among a plurality of weld portions between the tie-rod and the sheath is disposed at a position within a range between 0.8 and 13% of total axial length Ls of the sheath below an upper end of the sheath.
    • 控制杆包括拉杆,安装到拉杆的上端部分的手柄,安装到拉杆的下端部分的连接板或下落速度限制器,具有U形的护套 横截面,在连杆的轴向方向上的多个位置处间断地焊接到拉杆,并且具有焊接到手柄的上端,以及焊接到连接器板或下落速度限制器的下端 以及设置在每个护套内的中子吸收构件。 位于拉杆和护套之间的多个焊接部分中的位于拉杆的轴向方向上的最上位置处的焊接部分的上端设置在总轴向的0.8和13%之间的范围内的位置 在鞘的上端下方的鞘的长度Ls。
    • 6. 发明授权
    • Thin film transistor and matrix display device
    • 薄膜晶体管和矩阵显示装置
    • US06563174B2
    • 2003-05-13
    • US10224879
    • 2002-08-21
    • Masashi KawasakiHideo OhnoKazuki KobayashiIkuo Sakono
    • Masashi KawasakiHideo OhnoKazuki KobayashiIkuo Sakono
    • H01L2701
    • H01L29/7869H01L27/1214H01L27/1225H01L29/4908H01L29/66969H01L29/78603
    • In a thin film transistor, a gate insulating film having a first insulating film and a second insulating film is formed on a gate electrode, and a semiconductor layer including ZnO etc. is formed on the second insulating film. The first insulating film is formed by using SiNx having a high insulating characteristic, and the second insulating film is formed by using an oxide (for example, SiO2). This structure improves a crystalline characteristic of the semiconductor layer that constitutes an interface in combination with the second insulating film, and decreases a defective level of the interface between the semiconductor layer and the second insulating film. Further, the second insulating film is constituted of the oxide, so that it is possible to restrain a material for the second insulating film from depriving oxygen of the semiconductor layer. This keeps a crystalline characteristic of the semiconductor layer under a preferable condition in the vicinity of the interface between the second insulating film and the semiconductor layer. As a result, it is possible to realize a thin film transistor such that: a leak current level at an OFF area is low, and the mobility is high, and a switching characteristic is preferable. Thus, in the thin film transistor having a transparent semiconductor film, a TFT characteristic is improved.
    • 在薄膜晶体管中,在栅电极上形成具有第一绝缘膜和第二绝缘膜的栅极绝缘膜,并且在第二绝缘膜上形成包括ZnO等的半导体层。 第一绝缘膜通过使用具有高绝缘特性的SiNx形成,并且第二绝缘膜通过使用氧化物(例如,SiO 2)形成。 该结构改善了构成与第二绝缘膜结合的界面的半导体层的结晶特性,并降低了半导体层与第二绝缘膜之间的界面的缺陷水平。 此外,第二绝缘膜由氧化物构成,使得可以抑制第二绝缘膜的材料剥夺半导体层的氧。 这在第二绝缘膜和半导体层之间的界面附近的优选条件下保持半导体层的结晶特性。 结果,可以实现薄膜晶体管,使得在OFF区域的漏电流水平低,并且迁移率高,并且切换特性是优选的。 因此,在具有透明半导体膜的薄膜晶体管中,提高了TFT特性。
    • 7. 发明授权
    • Ultrasound cleaning device and resist-stripping device
    • 超声波清洗装置和抗剥离装置
    • US06497240B1
    • 2002-12-24
    • US09557052
    • 2000-04-21
    • Kazuki KobayashiToshiaki MurataniHiroto Yoshioka
    • Kazuki KobayashiToshiaki MurataniHiroto Yoshioka
    • B08B310
    • H01L21/67051B08B3/022B08B2203/0288Y10S134/902
    • To provide an ultrasonic cleaning device (1) that ensures stable operation of a vibrating element for generating ultrasonic without a complex structure and distribution of a great quantity of a cleaning liquid and (2) that is capable of cleaning upper and lower surfaces of a cleaning target easily, an ultrasonic cleaning section of the device is provided with an upper cleaning-liquid-supply nozzle and a lower cleaning-liquid-supply nozzle for projection of ultrasonic. The upper cleaning-liquid-supply nozzle supplies an upper surface cleaning liquid to an upper surface of a glass substrate. The lower cleaning-liquid-supply nozzle supplies the lower surface cleaning liquid to a lower surface of the substrate in a form of shower to which ultrasonic has been projected. A vibrating element for generating ultrasonic to be projected to the lower surface cleaning liquid is provided in a cleaning liquid distribution path that extends from an upstream side to a downstream side in a direction in a range of a horizontal direction to an upward direction.
    • 提供一种超声波清洗装置(1),其确保用于产生超声波的振动元件的稳定运行,而没有复杂的结构和大量的清洗液体的分布,以及(2)能够清洁清洁的上下表面的超声波清洗装置 所述装置的超声波清洗部设置有用于超声波投影的上部清洗液供给喷嘴和下部清洗液供给喷嘴。 上清洗液供给喷嘴将上表面清洗液供给到玻璃基板的上表面。 下部清洗液供给喷嘴将下表面清洗液以投射了超声波的喷淋形式向基板的下表面供给。 用于产生超声波的振动元件设置在从水平方向向上方的范围内的上游侧向下游侧延伸的清洗液分配路径中。
    • 9. 发明授权
    • Vehicle
    • 车辆
    • US08612049B2
    • 2013-12-17
    • US13566307
    • 2012-08-03
    • Noriyuki OgitaKazunari SakuraiRyou MaedaKazuki KobayashiKoshu Yamashita
    • Noriyuki OgitaKazunari SakuraiRyou MaedaKazuki KobayashiKoshu Yamashita
    • G06F7/00
    • B60P1/6472
    • When the load factor of a loading/unloading apparatus reaches a second reference value that is smaller in load factor than the first reference value, the operation speed of the loading/unloading apparatus becomes a reduction state. It is possible to make load vibration difficult to be generated in a load. Further, fine adjustment of the manipulation becomes easy, such that it is possible to prevent the load factor from reaching the first reference value due to careless manipulation of the operator. Even if the load factor reaches the first reference value, the operation speed of the loading/unloading apparatus has been reduced, such that it is possible to prevent load vibration of the load W when stopping.
    • 当加载/卸载装置的负载系数达到比第一参考值小的负载因子的第二参考值时,装载/卸载装置的操作速度变为降低状态。 可能使负载振动难以在负载中产生。 此外,操作的精细调整变得容易,使得可以防止由于操作者的粗心操作而导致的负载因素达到第一参考值。 即使负载因子达到第一参考值,装载/卸载装置的操作速度也降低,从而可以防止在停止时负载W的负载振动。
    • 10. 发明申请
    • METHOD FOR MANUFACTURING COLOR FILTER SUBSTRATE
    • 制造彩色滤光片基板的方法
    • US20130115385A1
    • 2013-05-09
    • US13809649
    • 2011-04-13
    • Yoshitaka OkumotoYusuke WarataniKeiichi TanakaKazuki Kobayashi
    • Yoshitaka OkumotoYusuke WarataniKeiichi TanakaKazuki Kobayashi
    • B05D5/06
    • B05D5/06G02B5/201G02F1/133514G02F1/133516
    • The present invention provides a method for manufacturing a color filter substrate, in which the occurrence of color mixing between adjacent sub-pixels is prevented even when an inkjet method is used. A color filter substrate having color filters of a plurality of colors arranged in a matrix with a bank therebetween is manufactured using this method. The method has: a first inkjet step in which an ink is jetted to at least one region among a plurality of regions partitioned by the bank, and the ink is not jetted to any of regions adjacent to the one region in the horizontal direction and the vertical direction; and a second inkjet step in which the ink is jetted to at least one region to which the ink has not been jetted in the first inkjet step, the aforementioned at least one region being among the plurality of regions partitioned by the bank.
    • 本发明提供了一种制造滤色器基板的方法,其中即使在使用喷墨方法时也防止了相邻子像素之间的颜色混合的出现。 使用该方法制造具有排列成矩阵中的多个颜色的具有多个颜色的滤色器的滤色器基板。 该方法具有:第一喷墨步骤,其中将油墨喷射到由堤分隔开的多个区域中的至少一个区域上,并且油墨不被喷射到在水平方向上与该区域相邻的区域中的任一个区域,并且 垂直方向 以及第二喷墨步骤,其中在所述第一喷墨步骤中将所述油墨喷射到至少一个未喷墨的区域,所述至少一个区域在由所述堤分隔开的所述多个区域中。