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1. 发明授权

US08980121B2 Etching liquid for a copper/titanium multilayer thin film 有权
标题翻译：用于铜/钛多层薄膜的蚀刻液
公开(公告)号：US08980121B2
公开(公告)日：2015-03-17
申请号：US13575767
申请日：2011-01-28
申请人： Tomoyuki Adaniya , Satoshi Okabe , Toshiyuki Gotou , Taketo Maruyama , Kazuki Kobayashi , Keiichi Tanaka , Wataru Nakamura , Kenichi Kitoh , Tetsunori Tanaka
发明人： Tomoyuki Adaniya , Satoshi Okabe , Toshiyuki Gotou , Taketo Maruyama , Kazuki Kobayashi , Keiichi Tanaka , Wataru Nakamura , Kenichi Kitoh , Tetsunori Tanaka
IPC分类号： B44C1/22 , C23F1/00 , C03C15/00 , C03C25/68 , H01L21/302 , H01L21/461 , C09K13/00 , C09K13/08 , H01L21/3213 , C23F1/18 , C23F1/26 , C23F1/44 , H05K3/06 , H01L23/532
CPC分类号： H01L21/32134 , C23F1/18 , C23F1/26 , C23F1/44 , H01L23/53238 , H01L2924/0002 , H05K3/067 , H01L2924/00
摘要： The present invention provides an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, and a method of using it for etching a multilayer thin film containing a copper layer and a titanium layer, that is, an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, which comprises (A) hydrogen peroxide, (B) nitric acid, (C) a fluoride ion source, (D) an azole, (E) a quaternary ammonium hydroxide and (F) a hydrogen peroxide stabilizer and has a pH of from 1.5 to 2.5, and a etching method of using it.
摘要翻译：本发明提供了一种用于含有铜层和钛层的多层薄膜的蚀刻液及其用于蚀刻含有铜层和钛层的多层薄膜的方法，即，用于含有（A）过氧化氢，（B）硝酸，（C）氟化物离子源，（D）唑，（E）季铵氢氧化物和（F））的含有铜层和钛层的多层薄膜）过氧化氢稳定剂，pH为1.5〜2.5，使用其蚀刻方法。

2. 发明申请

US20130048904A1 ETCHING LIQUID FOR A COPPER/TITANIUM MULTILAYER THIN FILM 有权
标题翻译：铜/薄片多层薄膜的蚀刻液
公开(公告)号：US20130048904A1
公开(公告)日：2013-02-28
申请号：US13575767
申请日：2011-01-28
申请人： Tomoyuki Adaniya , Satoshi Okabe , Toshiyuki Gotou , Taketo Maruyama , Kazuki Kobayashi , Keiichi Tanaka , Wataru Nakamura , Kenichi Kitoh , Tetsunori Tanaka
发明人： Tomoyuki Adaniya , Satoshi Okabe , Toshiyuki Gotou , Taketo Maruyama , Kazuki Kobayashi , Keiichi Tanaka , Wataru Nakamura , Kenichi Kitoh , Tetsunori Tanaka
IPC分类号： C23F1/10
CPC分类号： H01L21/32134 , C23F1/18 , C23F1/26 , C23F1/44 , H01L23/53238 , H01L2924/0002 , H05K3/067 , H01L2924/00
摘要： The present invention provides an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, and a method of using it for etching a multilayer thin film containing a copper layer and a titanium layer, that is, an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, which comprises (A) hydrogen peroxide, (B) nitric acid, (C) a fluoride ion source, (D) an azole, (E) a quaternary ammonium hydroxide and (F) a hydrogen peroxide stabilizer and has a pH of from 1.5 to 2.5, and a etching method of using it.
摘要翻译：本发明提供了一种用于含有铜层和钛层的多层薄膜的蚀刻液及其用于蚀刻含有铜层和钛层的多层薄膜的方法，即，用于含有（A）过氧化氢，（B）硝酸，（C）氟化物离子源，（D）唑，（E）季铵氢氧化物和（F））的含有铜层和钛层的多层薄膜）过氧化氢稳定剂，pH为1.5〜2.5，使用其蚀刻方法。

3. 发明申请

US20120236319A1 OBJECT DETECTING APPARATUS 审中-公开
标题翻译：对象检测装置
公开(公告)号：US20120236319A1
公开(公告)日：2012-09-20
申请号：US13418652
申请日：2012-03-13
申请人： Toshiyuki Gotou , Toshiyuki Konishi
发明人： Toshiyuki Gotou , Toshiyuki Konishi
IPC分类号： G01B11/14
CPC分类号： G01S17/93 , B60R2001/1223 , G01S7/497
摘要： An object detecting apparatus may include a laser sensor and a contamination detection unit. The laser sensor emits a laser beam through an optical window to scan in a plane by changing an emission direction of the laser beam, and receives a reflected beam through the optical window from an object positioned in the plane. The contamination detection unit detects contamination of the optical window by positioning the emission direction of the laser beam in a downward direction towards a pavement surface. The contamination detection unit determines whether or not the optical window is contaminated based on whether the reflected laser beam from the pavement surface is received.
摘要翻译：物体检测装置可以包括激光传感器和污染检测单元。激光传感器通过光学窗口发射激光束，通过改变激光束的发射方向在平面内扫描，并且通过光学窗口从位于平面中的物体接收反射光束。污染检测单元通过将激光束的发射方向向下朝向路面表面定位来检测光学窗口的污染。污染检测单元基于是否接收到来自路面的反射激光束来确定光学窗口是否被污染。

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