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    • 7. 发明授权
    • Substrate processing apparatus capable of switching control mode of heater
    • 能够切换加热器的控制模式的基板处理装置
    • US09418881B2
    • 2016-08-16
    • US13192784
    • 2011-07-28
    • Shinobu SugiuraMasaaki UenoKazuo TanakaMasashi SugishitaHideto YamaguchiKenji Shirako
    • Shinobu SugiuraMasaaki UenoKazuo TanakaMasashi SugishitaHideto YamaguchiKenji Shirako
    • H01L21/67G05D23/19G05D23/20C23C14/54C23C16/458C23C16/52G05D23/22
    • H01L21/67248C23C14/541C23C16/4584C23C16/52G05D23/1931G05D23/22H01L21/67109
    • Provided is a substrate processing apparatus capable of suppressing inferiority when heat treatment is controlled using a temperature sensor. The substrate processing apparatus includes a heating means configured to heat a process chamber wherein a substrate is accommodated; a first temperature detection means configured to detect a temperature about the substrate using a first thermocouple; a second temperature detection means configured to detect a temperature about the heating means using a second thermocouple; a control unit configured to control the heating means based on the temperature detected by the first temperature detection means and the temperature detected by the second temperature detection means; and a control switching means configured to control the control unit based on the temperatures detected by the first temperature detection means and the second temperature detection means such that the control unit is switched between a first control mode and a second control mode, wherein a heat resistance of the first thermocouple is greater than that of the second thermocouple, and a temperature detection performance of the second thermocouple is higher than that of the first thermocouple.
    • 提供一种当使用温度传感器控制热处理时能够抑制劣化的基板处理装置。 基板处理装置包括加热装置,其构造成加热容纳基板的处理室; 第一温度检测装置,被配置为使用第一热电偶检测关于所述基板的温度; 第二温度检测装置,被配置为使用第二热电偶检测关于加热装置的温度; 控制单元,被配置为基于由第一温度检测装置检测的温度和由第二温度检测装置检测的温度来控制加热装置; 以及控制切换装置,被配置为基于由第一温度检测装置和第二温度检测装置检测到的温度来控制控制单元,使得控制单元在第一控制模式和第二控制模式之间切换,其中耐热性 的第一热电偶的温度检测性能高于第一热电偶的温度检测性能。