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    • 1. 发明授权
    • Projection exposure apparatus and method
    • 投影曝光装置及方法
    • US5751403A
    • 1998-05-12
    • US471928
    • 1995-06-06
    • Hideo MizutaniTohru Kawaguchi
    • Hideo MizutaniTohru Kawaguchi
    • G03F7/20G03F9/00G03B27/42G01B11/26
    • G03F7/70358G03F9/70
    • In the projection exposure apparatus, the alignment mechanism comprises first and second light-sending systems for sending first and second light beams through a projection optical system to the wafer and sending third and fourth light beams to the reticle, a first scanning system for scanning the first and second light beams along first and second scan straight lines included in the surface of wafer, respectively, and setting the first and second scan straight lines in axis symmetry with respect to a reference straight line passing an intersecting point between the first and second scan lines and an intersecting point between the surface of wafer and the optical axis of projection optical system, a second scanning system for scanning the third and fourth light beams along third and fourth scan straight lines included in the surface of reticle, respectively, and first and second light-receiving systems for detecting reflected light of the first and third light beams emergent from the respective surfaces of wafer and reticle, respectively, and detecting reflected light of the second and fourth light beams emergent from the respective surfaces of wafer and reticle, respectively.
    • 在投影曝光装置中,对准机构包括用于将第一和第二光束通过投影光学系统发送到晶片并将第三和第四光束发送到光罩的第一和第二发光系统,用于扫描 分别包括在晶片表面中的第一和第二扫描直线的第一和第二光束,并且相对于通过第一和第二扫描之间的相交点的参考直线将第一和第二扫描直线设置为轴对称的第一和第二扫描直线 线和晶片表面与投影光学系统的光轴之间的相交点,第二扫描系统,用于分别沿着包括在掩模版表面中的第三和第四扫描直线扫描第三和第四光束,以及第一和第 用于检测从r出射的第一和第三光束的反射光的第二光接收系统 并且分别检测晶片和掩模版的各个表面,并分别检测第二和第四光束的反射光从晶片和掩模版的各个表面射出。
    • 2. 发明授权
    • Exposure apparatus, exposure method, and method of manufacturing device
    • 曝光装置,曝光方法和制造装置的方法
    • US08264666B2
    • 2012-09-11
    • US12692443
    • 2010-01-22
    • Tohru KiuchiHideo Mizutani
    • Tohru KiuchiHideo Mizutani
    • G03B27/42G03B27/58G03B27/32
    • G03F7/70791G03F7/70275G03F7/70358G03F7/70425
    • An exposure apparatus of one aspect of the present invention is provided with a moving mechanism that moves a first portion of a belt-shaped substrate that has photosensitivity in a first heading along a first direction and moves a second portion of the substrate in a second heading along the first direction, a stage mechanism that holds a mask and moves it in a third heading along a second direction in synchronization with the movement of the substrate, and a projection optical system. The projection optical system forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond.
    • 本发明的一个方面的曝光装置设置有移动机构,该移动机构使沿第一方向的第一标题中具有感光性的带状基板的第一部分移动,并且在第二标题中移动基板的第二部分 沿着第一方向,具有平台机构,其保持掩模并且与基板的移动同步地沿着第二方向在第三方向移动;以及投影光学系统。 投影光学系统在第一部分上形成图案的第一投影图像,使得掩模上的第三标题和第一部分上的第一标题光学对应,并且在第二部分上形成图案的第二投影图像,使得 掩模上的第三个标题和第二部分的第二个标题光学对应。
    • 6. 发明授权
    • Apparatus and method for detecting the position of a surface to be examined, exposure apparatus equipped with the detecting apparatus and method of producing the exposure apparatus, and method of producing devices using the exposure apparatus
    • 用于检测待检测表面的位置的装置和方法,配备有检测装置的曝光装置和制造曝光装置的方法,以及使用该曝光装置制造装置的方法
    • US06320658B1
    • 2001-11-20
    • US09455773
    • 1999-12-07
    • Hideo Mizutani
    • Hideo Mizutani
    • G01B1100
    • G03F9/7026
    • The present invention relates to a detecting apparatus capable of detecting the position of a surface to be examined at higher accuracy and speed. Particularly, the detecting apparatus of the present invention allows a slit image, which is tilted relative to a base pattern on the surface of a substrate, to be applied to the surface of the substrate and its reflection on the surface to be re-imaged and recorded as a two-dimensional image on an image pick-up device. In particular, a row of imaging elements of the image pick-up device aligned in one dimension are arranged with its direction extending at an angle to the lengthwise direction of the two-dimensional image of the slit pattern reflection. Also, the two-dimensional image of the slit pattern reflection is defocused along the lengthwise direction by the action of a specific optics thus to average data of the optical characteristics on the surface of the substrate. An exposure apparatus according to the present invention is also provided capable of detecting the position of a surface to be examined along the normal to the surface from data of one dimensional image picked up by an image pick-up device and may also use two beams of light which interfere with each other for the purpose.
    • 本发明涉及能够以更高的精度和速度检测被检查表面的位置的检测装置。 特别地,本发明的检测装置允许将相对于基板表面上的基底图案倾斜的狭缝图像施加到基板的表面并且在要重新成像的表面上的反射, 记录在图像拾取装置上的二维图像。 特别地,排列在一个维度上的摄像装置的一行成像元件被布置成其方向与狭缝图案反射的二维图像的长度方向成一角度延伸。 此外,狭缝图案反射的二维图像通过特定光学器件的作用沿着长度方向散焦,从而平均了基板表面上的光学特性的数据。 根据本发明的曝光装置还提供能够根据由摄像装置拾取的一维图像的数据来检测沿着与表面垂直的法线的位置的位置,并且还可以使用两束 为了目的而相互干扰的光。
    • 8. 发明授权
    • Surface position detection apparatus
    • 表面位置检测装置
    • US5633721A
    • 1997-05-27
    • US643765
    • 1996-05-06
    • Hideo Mizutani
    • Hideo Mizutani
    • G03F9/00H01L21/027G01B11/00
    • G03F9/7026
    • A surface position detection apparatus for detecting a surface position on a surface to be detected, comprises a projection pattern formed on a first surface, a projection optical system for projecting the pattern from an oblique direction onto the surface to be detected, a condensing optical system for condensing a light beam reflected by the surface to be detected, and forming an image of the pattern on a second surface, and a detector for photoelectrically detecting the image of the pattern. The first surface and the surface to be detected are arranged to satisfy a Scheimpflug condition in association with a principal plane of the projection optical system. The surface to be detected and the second surface are arranged to satisfy a Scheimpflug condition in association with a principal plane of the condensing optical system.
    • 用于检测待检测表面上的表面位置的表面位置检测装置包括形成在第一表面上的突起图案,用于将图案从倾斜方向突出到待检测表面上的投影光学系统,聚光光学系统 用于聚集由待检测表面反射的光束,以及在第二表面上形成图案的图像;以及光电检测图案的检测器。 被检测的第一表面和表面被布置成与投影光学系统的主平面相关联地满足Scheimpflug条件。 待检测表面和第二表面被布置成满足与聚光光学系统的主平面相关联的Scheimpflug条件。
    • 10. 发明授权
    • Aligning device for exposure apparatus
    • 曝光装置对准装置
    • US5214489A
    • 1993-05-25
    • US687944
    • 1991-04-19
    • Hideo MizutaniKenji Nishi
    • Hideo MizutaniKenji Nishi
    • G01B11/00G01B11/26G03F9/00H01L21/027H01L21/30
    • G03F9/7049G01B11/26
    • In an alignment device, irradiation means irradiates two coherent beams, having a predetermined wavelength, to a first diffraction grating formed on a mask and a second diffraction grating formed on a photosensitive substrate via an object optical system in such a manner as to cross with each other at a predetermined angle on one of the first and second diffraction gratings. First light receiving means photoelectrically detects interference light of diffracted rays produced substantially in the same direction from the one diffraction grating. A third diffraction grating is disposed in a plane substantially conjugate to the one diffraction grating, and second light receiving means photoelectrically detects interference light of diffracted rays produced by the third diffraction grating from diffracted rays of the two beams which are diffracted by the other of the first and second diffraction gratings and impinged upon the third diffraction grating at a predetermined incident angle via the object optical system. Detection means compares respective signals from the first and second light receiving means to output a detection signal depending on a shift in relative position between the mask and the photosensitive substrate, and movement means moves the mask and the photosensitive substrate based on the detection signal for changing the relative position therebetween.
    • 在对准装置中,照射装置将具有预定波长的两个相干光束以形成在掩模上的第一衍射光栅和形成在感光基板上的第二衍射光栅经由物体光学系统以与每个相交的光束交叉的方式照射 另一个在第一和第二衍射光栅之一上以预定角度。 第一光接收装置光电检测从一个衍射光栅基本上沿相同方向产生的衍射光的干涉光。 第三衍射光栅设置在基本上与一个衍射光栅共轭的平面中,第二光接收装置对由第三衍射光栅产生的衍射光线的干涉光进行光电检测,所述衍射光线被衍射的两个光束的衍射光线 第一和第二衍射光栅,并经由物体光学系统以预定的入射角度撞击在第三衍射光栅上。 检测装置比较来自第一和第二光接收装置的各信号,以根据掩模和感光基片之间的相对位置的移动来输出检测信号,移动装置基于用于改变的检测信号移动掩模和感光基片 其间的相对位置。