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1. 发明授权

US07081946B2 Holding apparatus, holding method, exposure apparatus and device manufacturing method 失效
标题翻译：保持装置，保持方法，曝光装置和装置制造方法
公开(公告)号：US07081946B2
公开(公告)日：2006-07-25
申请号：US10639651
申请日：2003-08-13
申请人： Tsuneyuki Hagiwara , Hiromitsu Yoshimoto , Hiroto Horikawa , Hideo Mizutani
发明人： Tsuneyuki Hagiwara , Hiromitsu Yoshimoto , Hiroto Horikawa , Hideo Mizutani
IPC分类号： G03B27/32 , G03B27/42
CPC分类号： G03F7/707 , G03F7/70833 , H01L21/6838
摘要： A reticle holder 18 has; a first suction section 63 facing a precision warrantable area AR1 having a predetermined surface precision, of a lower face Ra of a reticle R; a second suction section 64 facing a precision unwarrantable area AR2 outside of the precision warrantable area AR1; a pore 70a connected to a suction apparatus which draws out gas in a space between the lower face Ra of the reticle R and the first suction section 63, and a pore 70b connected to the suction apparatus 72 which draws out gas in the space between the lower face Ra of the reticle R and the second suction section 64. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.
摘要翻译：标线架保持架18具有：与掩模版R的下表面Ra相对的具有预定表面精度的精密保证区域AR 1的第一吸入部63; 第二抽吸部分64面对精密保证区域AR 1之外的精确不可区域AR 2; 连接到在标线片R的下表面Ra和第一吸入部分63之间的空间中抽出气体的抽吸装置的孔70a和连接到抽吸装置72的孔70b，抽吸装置72在空间中抽出气体在标线片R的下表面Ra和第二吸引部分64之间。结果，可以使光罩保持稳定，而不会降低精密保证区域的表面精度。

2. 发明申请

US20060146312A1 Holding apparatus, holding method, exposure apparatus and device manufacturing method 审中-公开
标题翻译：保持装置，保持方法，曝光装置和装置制造方法
公开(公告)号：US20060146312A1
公开(公告)日：2006-07-06
申请号：US11359468
申请日：2006-02-23
申请人： Tsuneyuki Hagiwara , Hiromitsu Yoshimoto , Hiroto Horikawa , Hideo Mizutani
发明人： Tsuneyuki Hagiwara , Hiromitsu Yoshimoto , Hiroto Horikawa , Hideo Mizutani
IPC分类号： G03B27/58
CPC分类号： G03F7/707 , G03F7/70833 , H01L21/6838
摘要： A reticle holder has a first suction section facing a precision warrantable area having a predetermined surface precision, of a lower face of a reticle, a second suction section facing a precision unwarrantable area outside of the precision warrantable area, a pore connected to a suction apparatus that draws out gas in a space between the lower face of the reticle and the first suction section, and a pore connected to the suction apparatus and that draws out gas in the space between the lower face of the reticle and the second suction section. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.
摘要翻译：标线保持器具有面对具有预定表面精度的精密保证区域的第一抽吸部分，标线片的下表面，面对精密保留区域外部的精确不可区域的第二抽吸部分，连接到抽吸装置的孔在标线片的下表面和第一吸引部之间的空间中抽出气体，以及连接到抽吸装置的孔，并且在标线片的下表面和第二吸引部之间的空间中抽出气体。结果，可以使光罩保持稳定，而不会降低精密保证区域的表面精度。

3. 发明授权

US08323855B2 Pellicle frame apparatus, mask, exposing method, exposure apparatus, and device fabricating method 有权
标题翻译：防护薄膜框架装置，掩模，曝光方法，曝光装置和装置制造方法
公开(公告)号：US08323855B2
公开(公告)日：2012-12-04
申请号：US12073120
申请日：2008-02-29
申请人： Tomoki Miyakawa , Hiromitsu Yoshimoto
发明人： Tomoki Miyakawa , Hiromitsu Yoshimoto
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F1/64
摘要： A pellicle is provided to one end surface of end surfaces of a frame. Another end surface of the end surfaces of the frame has an area that opposes a substrate. A configuration is adopted that prevents the deformation of the one end surface of the frame and the shape of the opposing area on the other end surface from affecting one another.
摘要翻译：防护薄膜组件被提供到框架的端表面的一个端表面。框架的端面的另一端面具有与基板相对的区域。采用防止框架的一个端面的变形和另一端面上的对置区域的形状的结构不会相互影响。

4. 发明申请

US20080213679A1 Pellicle frame apparatus, mask, exposing method, exposure apparatus, and device fabricating method 有权
标题翻译：防护薄膜框架装置，掩模，曝光方法，曝光装置和装置制造方法
公开(公告)号：US20080213679A1
公开(公告)日：2008-09-04
申请号：US12073120
申请日：2008-02-29
申请人： Tomoki Miyakawa , Hiromitsu Yoshimoto
发明人： Tomoki Miyakawa , Hiromitsu Yoshimoto
IPC分类号： G03F7/20 , G03F1/00
CPC分类号： G03F1/64
摘要： A pellicle is provided to one end surface of end surfaces of a frame. Another end surface of the end surfaces of the frame has an area that opposes a substrate. A configuration is adopted that prevents the deformation of the one end surface of the frame and the shape of the opposing area on the other end surface from affecting one another.
摘要翻译：防护薄膜组件被提供到框架的端表面的一个端表面。框架的端面的另一端面具有与基板相对的区域。采用防止框架的一个端面的变形和另一端面上的对置区域的形状的结构不会相互影响。

5. 发明申请

US20100073661A1 Stage apparatus, exposure apparatus and device manufacturing method 有权
标题翻译：舞台装置，曝光装置及装置的制造方法
公开(公告)号：US20100073661A1
公开(公告)日：2010-03-25
申请号：US12385577
申请日：2009-04-13
申请人： Yuichi Shibazaki , Hiromitsu Yoshimoto
发明人： Yuichi Shibazaki , Hiromitsu Yoshimoto
IPC分类号： G03B27/58
CPC分类号： G03F7/70783
摘要： An exposure apparatus comprises a stage main body having a mounting surface, and a correcting mechanism that corrects a shape of the mounting surface.
摘要翻译：曝光装置包括具有安装表面的台主体和校正安装表面的形状的校正机构。

6. 发明申请

US20090033907A1 DEVICES AND METHODS FOR DECREASING RESIDUAL CHUCKING FORCES 审中-公开
标题翻译：减少残肢的装置和方法
公开(公告)号：US20090033907A1
公开(公告)日：2009-02-05
申请号：US12168726
申请日：2008-07-07
申请人： Douglas C. Watson , Christopher S. Margeson , Alton H. Phillips , Hiromitsu Yoshimoto , Noriya Kato
发明人： Douglas C. Watson , Christopher S. Margeson , Alton H. Phillips , Hiromitsu Yoshimoto , Noriya Kato
IPC分类号： G03B27/62
CPC分类号： G03B27/62 , G03F7/707
摘要： Devices and methods are disclosed for holding a reticle or analogous object, particularly a planar object. An exemplary reticle-holding device includes a reticle chuck having a reticle-holding surface on which a reticle is placed to hold the reticle. The device includes at least one ultrasonic transducer (as an exemplary vibration-inducing device) sonically coupled to the reticle to excite, whenever the ultrasonic transducer is being energized, a vibrational mode in the reticle or reticle chuck, or both. The vibration mode is sufficient to reduce an adhesion force holding the reticle to the reticle-holding surface. Sonic coupling can be by direct contact with the transducer or across a gap.
摘要翻译：公开了用于保持掩模版或类似物体，特别是平面物体的装置和方法。示例性的掩模版保持装置包括具有掩模版保持表面的掩模版卡盘，在其上放置掩模版以保持掩模版。每当超声波换能器通电时，该装置包括至少一个超声波换能器（作为示例性的振动诱导装置），其超声波耦合到光罩以激发，在标线片或光罩卡盘或两者中均振动模式。振动模式足以减少将掩模版保持在掩模版保持表面上的粘附力。声波耦合可以通过与换能器或间隙直接接触。

7. 发明申请

US20120120379A1 SYSTEM AND METHOD FOR CONTROLLING THE DISTORTION OF A RETICLE 审中-公开
标题翻译：用于控制物品失真的系统和方法
公开(公告)号：US20120120379A1
公开(公告)日：2012-05-17
申请号：US13090183
申请日：2011-04-19
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Hiroki Okuno
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Hiroki Okuno
IPC分类号： G03B27/68
CPC分类号： F28F3/12 , F28D2021/0077 , G03F7/70783 , G03F7/70875
摘要： An apparatus for controlling the distortion of a reticle (28) includes a temperature adjuster (258) and a control system (226). The temperature adjuster (258) includes a plurality of adjuster elements (258E) that individually adjust the temperature of a plurality of regions (28R) of the reticle (28). The control system (226) includes a state observer (250) and a controller (260). The state observer (250) estimates an estimated physical condition (250C) of the reticle (28). The controller (260) controls the adjuster elements (258E) of the temperature adjuster (258) based at least in part on the estimated physical condition (250C).
摘要翻译：用于控制掩模版（28）的变形的装置包括温度调节器（258）和控制系统（226）。温度调节器（258）包括分别调节掩模版（28）的多个区域（28R）的温度的多个调节元件（258E）。控制系统（226）包括状态观察器（250）和控制器（260）。状态观察器（250）估计掩模版（28）的估计的物理条件（250℃）。控制器（260）至少部分地基于估计的身体状况（250C）来控制温度调节器（258）的调节器元件（258E）。

8. 发明授权

US06727981B2 Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method 失效
标题翻译：照明光学装置及其制造方法，曝光装置及其制造方法以及装置制造方法
公开(公告)号：US06727981B2
公开(公告)日：2004-04-27
申请号：US10307963
申请日：2002-12-03
申请人： Taichi Taniuchi , Kyoji Nakamura , Eizo Ohya , Hiromitsu Yoshimoto
发明人： Taichi Taniuchi , Kyoji Nakamura , Eizo Ohya , Hiromitsu Yoshimoto
IPC分类号： G03B2752
CPC分类号： G03F7/70916 , G03B27/42 , G03F7/70058 , G03F7/709
摘要： The illuminating optical system is divided into a first portion including movable blades moving during exposure, and a second portion not containing a movable portion moving over the movable blade during exposure. The second portion is installed on the exposure main portion, and the first portion, separately from the exposure main portion. The frames configuring the first and the second optical units, the second optical unit having optical elements of a smaller movable amount than the movable amount of the movable blades, are relatively displaceably connected via the bellows-shaped member. The frames configuring the second optical units are fixed to each other via the O-ring suppressing relative displacement. As a result, the effect of vibration of the illuminating optical system during exposure on the main portion can be reduced. Upon purging nitrogen gas or the like in the space interior of the frame and the space between adjacent frames, the degree of air-tightness and chemical cleanliness is improved, consequently improving the exposure accuracy.
摘要翻译：照明光学系统被分为包括在曝光期间移动的可移动刀片的第一部分和不包含在曝光期间在可动刀片上移动的可移动部分的第二部分。第二部分安装在曝光主体部分上，第一部分与曝光主体部分分开。构成第一和第二光学单元的框架，具有比可动叶片的可移动量小的可移动量的光学元件的第二光学单元经由波纹管状构件相对可移动地连接。构成第二光学单元的框架经由O形环彼此固定，抑制相对位移。结果，可以减少照射光学系统在主要部分的曝光期间的振动的影响。当在框架的空间内部和相邻框架之间的空间中吹扫氮气等时，提高了气密性和化学清洁度，从而提高了曝光精度。

9. 发明授权

US09304385B2 Exposure method and device manufacturing method including selective deformation of a mask 有权
标题翻译：包括掩模选择性变形的曝光方法和装置制造方法
公开(公告)号：US09304385B2
公开(公告)日：2016-04-05
申请号：US12560760
申请日：2009-09-16
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
IPC分类号： G03B27/32 , G03F1/00 , G03F7/20
CPC分类号： G03B27/32 , G03F1/144 , G03F1/50 , G03F7/70783 , G03F7/70875
摘要： An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference. Since it is possible to put the pattern projected via the substrate into a linearly correctable status, it is possible to reduce warping of the pattern.
摘要翻译：一种使用由保持构件（28）保持的基板（M）进行曝光处理的曝光方法，包括通过保持构件保持基板的规定区域（AR3）作为保持区域的保持工序，以及变形过程，其选择性地使通过保持过程保持的基板的保持区域的一侧相对于另一侧变形。根据本发明，通过保持构件将衬底的规定区域保持为保持区域，并且所述保持衬底的保持区域的一侧相对于另一侧选择性地变形，因此可能以使用保持区域作为基准来选择性地消除归因于基板相对于基板的两侧之间的一侧的保持的非线性变形分量。由于可以将通过基板投射的图案置于线性可校正状态，可以减少图案的翘曲。

10. 发明申请

US20100097588A1 EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND MASK 有权
标题翻译：曝光方法，装置制造方法和掩模
公开(公告)号：US20100097588A1
公开(公告)日：2010-04-22
申请号：US12560760
申请日：2009-09-16
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
IPC分类号： G03B27/42 , G03B27/32 , G03F1/00
CPC分类号： G03B27/32 , G03F1/144 , G03F1/50 , G03F7/70783 , G03F7/70875
摘要： An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference. Since it is possible to put the pattern projected via the substrate into a linearly correctable status, it is possible to reduce warping of the pattern.
摘要翻译：一种使用由保持构件（28）保持的基板（M）进行曝光处理的曝光方法，包括通过保持构件保持基板的规定区域（AR3）作为保持区域的保持工序，以及变形过程，其选择性地使通过保持过程保持的基板的保持区域的一侧相对于另一侧变形。根据本发明，通过保持构件将衬底的规定区域保持为保持区域，并且所述保持衬底的保持区域的一侧相对于另一侧选择性地变形，因此可能以使用保持区域作为基准来选择性地消除归因于基板相对于基板的两侧之间的一侧的保持的非线性变形分量。由于可以将通过基板投射的图案置于线性可校正状态，可以减少图案的翘曲。

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