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1. 发明授权

US08264666B2 Exposure apparatus, exposure method, and method of manufacturing device 失效
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08264666B2
公开(公告)日：2012-09-11
申请号：US12692443
申请日：2010-01-22
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： G03B27/42 , G03B27/58 , G03B27/32
CPC分类号： G03F7/70791 , G03F7/70275 , G03F7/70358 , G03F7/70425
摘要： An exposure apparatus of one aspect of the present invention is provided with a moving mechanism that moves a first portion of a belt-shaped substrate that has photosensitivity in a first heading along a first direction and moves a second portion of the substrate in a second heading along the first direction, a stage mechanism that holds a mask and moves it in a third heading along a second direction in synchronization with the movement of the substrate, and a projection optical system. The projection optical system forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond.
摘要翻译：本发明的一个方面的曝光装置设置有移动机构，该移动机构使沿第一方向的第一标题中具有感光性的带状基板的第一部分移动，并且在第二标题中移动基板的第二部分沿着第一方向，具有平台机构，其保持掩模并且与基板的移动同步地沿着第二方向在第三方向移动;以及投影光学系统。投影光学系统在第一部分上形成图案的第一投影图像，使得掩模上的第三标题和第一部分上的第一标题光学对应，并且在第二部分上形成图案的第二投影图像，使得掩模上的第三个标题和第二部分的第二个标题光学对应。

2. 发明授权

US07379158B2 Exposure apparatus and method for producing device 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US07379158B2
公开(公告)日：2008-05-27
申请号：US11350787
申请日：2006-02-10
申请人： Hideo Mizutani , Nobutaka Magome
发明人： Hideo Mizutani , Nobutaka Magome
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70341
摘要： A liquid immersion type exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate, a liquid film forming system for forming a liquid film in a predetermined region between the projection optical system and the substrate, and a sensor for detecting disappearance of at least a portion of the liquid film in the predetermined region.
摘要翻译：液浸式曝光装置包括：投影光学系统，用于将掩模图案投射到基板上;液膜形成系统，用于在投影光学系统和基板之间的预定区域中形成液膜，以及用于检测的传感器在预定区域中液膜的至少一部分消失。

3. 发明授权

US07081946B2 Holding apparatus, holding method, exposure apparatus and device manufacturing method 失效
标题翻译：保持装置，保持方法，曝光装置和装置制造方法
公开(公告)号：US07081946B2
公开(公告)日：2006-07-25
申请号：US10639651
申请日：2003-08-13
申请人： Tsuneyuki Hagiwara , Hiromitsu Yoshimoto , Hiroto Horikawa , Hideo Mizutani
发明人： Tsuneyuki Hagiwara , Hiromitsu Yoshimoto , Hiroto Horikawa , Hideo Mizutani
IPC分类号： G03B27/32 , G03B27/42
CPC分类号： G03F7/707 , G03F7/70833 , H01L21/6838
摘要： A reticle holder 18 has; a first suction section 63 facing a precision warrantable area AR1 having a predetermined surface precision, of a lower face Ra of a reticle R; a second suction section 64 facing a precision unwarrantable area AR2 outside of the precision warrantable area AR1; a pore 70a connected to a suction apparatus which draws out gas in a space between the lower face Ra of the reticle R and the first suction section 63, and a pore 70b connected to the suction apparatus 72 which draws out gas in the space between the lower face Ra of the reticle R and the second suction section 64. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.
摘要翻译：标线架保持架18具有：与掩模版R的下表面Ra相对的具有预定表面精度的精密保证区域AR 1的第一吸入部63; 第二抽吸部分64面对精密保证区域AR 1之外的精确不可区域AR 2; 连接到在标线片R的下表面Ra和第一吸入部分63之间的空间中抽出气体的抽吸装置的孔70a和连接到抽吸装置72的孔70b，抽吸装置72在空间中抽出气体在标线片R的下表面Ra和第二吸引部分64之间。结果，可以使光罩保持稳定，而不会降低精密保证区域的表面精度。

4. 发明申请

US20060146312A1 Holding apparatus, holding method, exposure apparatus and device manufacturing method 审中-公开
标题翻译：保持装置，保持方法，曝光装置和装置制造方法
公开(公告)号：US20060146312A1
公开(公告)日：2006-07-06
申请号：US11359468
申请日：2006-02-23
申请人： Tsuneyuki Hagiwara , Hiromitsu Yoshimoto , Hiroto Horikawa , Hideo Mizutani
发明人： Tsuneyuki Hagiwara , Hiromitsu Yoshimoto , Hiroto Horikawa , Hideo Mizutani
IPC分类号： G03B27/58
CPC分类号： G03F7/707 , G03F7/70833 , H01L21/6838
摘要： A reticle holder has a first suction section facing a precision warrantable area having a predetermined surface precision, of a lower face of a reticle, a second suction section facing a precision unwarrantable area outside of the precision warrantable area, a pore connected to a suction apparatus that draws out gas in a space between the lower face of the reticle and the first suction section, and a pore connected to the suction apparatus and that draws out gas in the space between the lower face of the reticle and the second suction section. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.
摘要翻译：标线保持器具有面对具有预定表面精度的精密保证区域的第一抽吸部分，标线片的下表面，面对精密保留区域外部的精确不可区域的第二抽吸部分，连接到抽吸装置的孔在标线片的下表面和第一吸引部之间的空间中抽出气体，以及连接到抽吸装置的孔，并且在标线片的下表面和第二吸引部之间的空间中抽出气体。结果，可以使光罩保持稳定，而不会降低精密保证区域的表面精度。

5. 发明授权

US06320658B1 Apparatus and method for detecting the position of a surface to be examined, exposure apparatus equipped with the detecting apparatus and method of producing the exposure apparatus, and method of producing devices using the exposure apparatus 失效
标题翻译：用于检测待检测表面的位置的装置和方法，配备有检测装置的曝光装置和制造曝光装置的方法，以及使用该曝光装置制造装置的方法
公开(公告)号：US06320658B1
公开(公告)日：2001-11-20
申请号：US09455773
申请日：1999-12-07
申请人： Hideo Mizutani
发明人： Hideo Mizutani
IPC分类号： G01B1100
CPC分类号： G03F9/7026
摘要： The present invention relates to a detecting apparatus capable of detecting the position of a surface to be examined at higher accuracy and speed. Particularly, the detecting apparatus of the present invention allows a slit image, which is tilted relative to a base pattern on the surface of a substrate, to be applied to the surface of the substrate and its reflection on the surface to be re-imaged and recorded as a two-dimensional image on an image pick-up device. In particular, a row of imaging elements of the image pick-up device aligned in one dimension are arranged with its direction extending at an angle to the lengthwise direction of the two-dimensional image of the slit pattern reflection. Also, the two-dimensional image of the slit pattern reflection is defocused along the lengthwise direction by the action of a specific optics thus to average data of the optical characteristics on the surface of the substrate. An exposure apparatus according to the present invention is also provided capable of detecting the position of a surface to be examined along the normal to the surface from data of one dimensional image picked up by an image pick-up device and may also use two beams of light which interfere with each other for the purpose.
摘要翻译：本发明涉及能够以更高的精度和速度检测被检查表面的位置的检测装置。特别地，本发明的检测装置允许将相对于基板表面上的基底图案倾斜的狭缝图像施加到基板的表面并且在要重新成像的表面上的反射，记录在图像拾取装置上的二维图像。特别地，排列在一个维度上的摄像装置的一行成像元件被布置成其方向与狭缝图案反射的二维图像的长度方向成一角度延伸。此外，狭缝图案反射的二维图像通过特定光学器件的作用沿着长度方向散焦，从而平均了基板表面上的光学特性的数据。根据本发明的曝光装置还提供能够根据由摄像装置拾取的一维图像的数据来检测沿着与表面垂直的法线的位置的位置，并且还可以使用两束为了目的而相互干扰的光。

6. 发明授权

US06230176B1 Fast fourier transform processing device, fast fourier transform processing system, and fast fourier transform processing method 失效
标题翻译：快速傅里叶变换处理装置，快速傅里叶变换处理系统，快速傅里叶变换处理方法
公开(公告)号：US06230176B1
公开(公告)日：2001-05-08
申请号：US09018530
申请日：1998-02-04
申请人： Hideo Mizutani
发明人： Hideo Mizutani
IPC分类号： G06F1500
CPC分类号： G06F17/142
摘要： An object of the invention is to perform fast Fourier transform processes of radix 4 and 2 at a high speed. In order to attain this object, the invention divides complex number data in which the number of sampling points is 4n×2 or 4n into 4 groups A to D, and then repeats at n times a butterfly arithmetic operation of: ai={(Ai+Ci)+(Bi+Di)}×Wi1 ci={(Ai+Ci)−(Bi+Di)}×Wi3 bi={(Ai−Ci)−j(Bi−Di)}×Wi2 di={(Ai−Ci)+j(Bi−Di)}×Wi4, using the ith complex number data Ai, Bi, Ci and Di belonging to the groups A to D and twiddle factors Wi1, Wi2, Wi3 and Wi4, and then in case that the number of sampling points is 4n×2, the invention further performs once a butterfly arithmetic operation: ai=Ai+Bi bi=Ai−Bi ci=Ci+Di di=Ci−Di.
摘要翻译：本发明的目的是高速执行基数4和2的快速傅立叶变换处理。为了实现该目的，本发明将采样点数为4nx2或4n的复数数据分成4组A至D，然后在n次蝶形运算中重复：使用第i个复数数据Ai ，属于组A至D的旋转因子，旋转因子Wi1，Wi2，Wi3和Wi4，然后在采样点数为4nx2的情况下，本发明还执行一次蝶式运算：

7. 发明授权

US5633721A Surface position detection apparatus 失效
标题翻译：表面位置检测装置
公开(公告)号：US5633721A
公开(公告)日：1997-05-27
申请号：US643765
申请日：1996-05-06
申请人： Hideo Mizutani
发明人： Hideo Mizutani
IPC分类号： G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F9/7026
摘要： A surface position detection apparatus for detecting a surface position on a surface to be detected, comprises a projection pattern formed on a first surface, a projection optical system for projecting the pattern from an oblique direction onto the surface to be detected, a condensing optical system for condensing a light beam reflected by the surface to be detected, and forming an image of the pattern on a second surface, and a detector for photoelectrically detecting the image of the pattern. The first surface and the surface to be detected are arranged to satisfy a Scheimpflug condition in association with a principal plane of the projection optical system. The surface to be detected and the second surface are arranged to satisfy a Scheimpflug condition in association with a principal plane of the condensing optical system.
摘要翻译：用于检测待检测表面上的表面位置的表面位置检测装置包括形成在第一表面上的突起图案，用于将图案从倾斜方向突出到待检测表面上的投影光学系统，聚光光学系统用于聚集由待检测表面反射的光束，以及在第二表面上形成图案的图像;以及光电检测图案的检测器。被检测的第一表面和表面被布置成与投影光学系统的主平面相关联地满足Scheimpflug条件。待检测表面和第二表面被布置成满足与聚光光学系统的主平面相关联的Scheimpflug条件。

8. 发明授权

US5488230A Double-beam light source apparatus, position detecting apparatus and aligning apparatus 失效
公开(公告)号：US5488230A
公开(公告)日：1996-01-30
申请号：US91501
申请日：1993-07-14
申请人： Hideo Mizutani , Kazuya Ota
发明人： Hideo Mizutani , Kazuya Ota
IPC分类号： G03F9/00 , G01N21/86 , H04N1/00
CPC分类号： G03F9/7049 , G03F9/7076
摘要： A position detecting apparatus comprises a double-beam producing device for producing two beams different in frequency from each other, which are guided to irradiate a diffraction grating on an object to be inspected in two predetermined directions, and a detector photoelectrically detecting through an objective optical system diffracted light produced by the diffraction grating, in which the double-beam producing device comprises a light source for supplying a beam of a single wavelength or multiple wavelengths, a beam splitting device for splitting the beam from the light source into two predetermined beams, a relay optical system for converging the two split beams at a predetermined position, and a frequency difference producing device disposed at or near a converging position by the relay optical system, for producing a predetermined frequency difference between the two split beams.

9. 发明授权

US5214489A Aligning device for exposure apparatus 失效
标题翻译：曝光装置对准装置
公开(公告)号：US5214489A
公开(公告)日：1993-05-25
申请号：US687944
申请日：1991-04-19
申请人： Hideo Mizutani , Kenji Nishi
发明人： Hideo Mizutani , Kenji Nishi
IPC分类号： G01B11/00 , G01B11/26 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7049 , G01B11/26
摘要： In an alignment device, irradiation means irradiates two coherent beams, having a predetermined wavelength, to a first diffraction grating formed on a mask and a second diffraction grating formed on a photosensitive substrate via an object optical system in such a manner as to cross with each other at a predetermined angle on one of the first and second diffraction gratings. First light receiving means photoelectrically detects interference light of diffracted rays produced substantially in the same direction from the one diffraction grating. A third diffraction grating is disposed in a plane substantially conjugate to the one diffraction grating, and second light receiving means photoelectrically detects interference light of diffracted rays produced by the third diffraction grating from diffracted rays of the two beams which are diffracted by the other of the first and second diffraction gratings and impinged upon the third diffraction grating at a predetermined incident angle via the object optical system. Detection means compares respective signals from the first and second light receiving means to output a detection signal depending on a shift in relative position between the mask and the photosensitive substrate, and movement means moves the mask and the photosensitive substrate based on the detection signal for changing the relative position therebetween.
摘要翻译：在对准装置中，照射装置将具有预定波长的两个相干光束以形成在掩模上的第一衍射光栅和形成在感光基板上的第二衍射光栅经由物体光学系统以与每个相交的光束交叉的方式照射另一个在第一和第二衍射光栅之一上以预定角度。第一光接收装置光电检测从一个衍射光栅基本上沿相同方向产生的衍射光的干涉光。第三衍射光栅设置在基本上与一个衍射光栅共轭的平面中，第二光接收装置对由第三衍射光栅产生的衍射光线的干涉光进行光电检测，所述衍射光线被衍射的两个光束的衍射光线第一和第二衍射光栅，并经由物体光学系统以预定的入射角度撞击在第三衍射光栅上。检测装置比较来自第一和第二光接收装置的各信号，以根据掩模和感光基片之间的相对位置的移动来输出检测信号，移动装置基于用于改变的检测信号移动掩模和感光基片其间的相对位置。

10. 发明授权

US5184196A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5184196A
公开(公告)日：1993-02-02
申请号：US810130
申请日：1991-12-19
申请人： Masahiro Nakagawa , Hideo Mizutani , Kouichirou Komatsu , Yawara Nojima
发明人： Masahiro Nakagawa , Hideo Mizutani , Kouichirou Komatsu , Yawara Nojima
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70066 , G03F9/7049
摘要： A projection exposure apparatus comprises a projection optical system for forming an image of a predetermined pattern on a mask onto a photosensitive substrate under exposure light having a first wavelength, an illumination system for illuminating a mask on the photosensitive substrate with light having a second wavelength different from the first wavelength through the projection optical system so as to attain alignment, and a detection system for detecting light reflected by the mark. The illumination system comprises a light source for emitting the light having the second wavelength, a first field stop for defining an illumination field on the photosensitive substrate and a second field stop for defining an illumination field on the photosensitive substrate. The first field stop has at least two linear edges which extend in a direction substantially perpendicular to a sagittal direction in a visual field of the projection optical system and are juxtaposed in the sagittal direction at a predetermined interval. The second field stop extends in a direction substantially perpendicular to a meridional direction in a visual field of the projection optical system and has at least two linear edges juxtaposed in the meridional direction at a predetermined interval.
摘要翻译：投影曝光装置包括：投影光学系统，用于在具有第一波长的曝光光下将掩模上的预定图案的图像形成在感光基板上;照明系统，用于用具有第二波长的光照射感光基板上的掩模从第一波长通过投影光学系统获得对准;以及检测系统，用于检测由标记反射的光。照明系统包括用于发射具有第二波长的光的光源，用于限定感光基板上的照明场的第一场停止件和用于限定感光基板上的照明场的第二场停止。第一场停止件具有至少两个在投影光学系统的视野中沿垂直于矢状方向的方向延伸的直线边缘，并且以预定的间隔在矢状方向并列。第二场停止件在投影光学系统的视场中沿基本上垂直于子午方向的方向延伸，并且具有至少两个以预定间隔沿子午方向并置的线性边缘。

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