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1. 发明授权

US5312717A Residue free vertical pattern transfer with top surface imaging resists 失效
标题翻译：残留自由垂直图案转印与顶部表面成像抗蚀剂
公开(公告)号：US5312717A
公开(公告)日：1994-05-17
申请号：US949963
申请日：1992-09-24
申请人： Harbans S. Sachdev , John C. Forster , Leo L. Linehan , Scott A. MacDonald , K. Paul L. Muller , Walter E. Mlynko , Linda K. Somerville
发明人： Harbans S. Sachdev , John C. Forster , Leo L. Linehan , Scott A. MacDonald , K. Paul L. Muller , Walter E. Mlynko , Linda K. Somerville
IPC分类号： G03F7/26 , G03F7/36 , G03C5/00
CPC分类号： G03F7/36 , G03F7/265
摘要： A method for transferring a pattern through a photoresist layer in the fabrication of submicron semiconductor devices structures is disclosed. A photoresist is provided on a substrate and the same is imagewise exposed with a desired pattern to form exposed and unexposed patterned areas in the top surface of the photoresist. The photoresist is then baked to form cross-linked regions in the exposed pattern areas of the photoresist. Silylation is then performed to incorporate silicon into the unexposed patterned areas of the photoresist, wherein some incorporation of silicon occurs in the exposed patterned crosslinked areas of the photoresist. The patterned photoresist is subsequently etched using a high density, low pressure, anisotropic O.sub.2 plasma alone to produce residue-free images with vertical wall profiles in the photoresist. This method is particularly advantageous with RFI reactive ion etch systems.
摘要翻译：公开了在制造亚微米半导体器件结构中通过光致抗蚀剂层转印图案的方法。在基板上提供光致抗蚀剂，并将其以所需图案成像曝光，以在光致抗蚀剂的顶表面中形成曝光和未曝光的图案区域。然后将光致抗蚀剂烘烤以在光致抗蚀剂的暴露图案区域中形成交联区域。然后进行硅烷化以将硅结合到光致抗蚀剂的未曝光图案区域中，其中硅的一些掺入发生在光致抗蚀剂的暴露的图案化交联区域中。随后使用高密度，低压，各向异性O 2等离子体蚀刻图案化的光致抗蚀剂，以在光致抗蚀剂中产生具有垂直壁分布的无残留图像。该方法对于RFI反应离子蚀刻系统是特别有利的。

2. 发明授权

US5322765A Dry developable photoresist compositions and method for use thereof 失效
标题翻译：干可显影光致抗蚀剂组合物及其使用方法
公开(公告)号：US5322765A
公开(公告)日：1994-06-21
申请号：US796527
申请日：1991-11-22
申请人： Nicholas J. Clecak , Willard E. Conley , Ranee W.-L. Kwong , Leo L. Linehan , Scott A. MacDonald , Harbans S. Sachdev , Hubert Schlosser , Carlton G. Willson
发明人： Nicholas J. Clecak , Willard E. Conley , Ranee W.-L. Kwong , Leo L. Linehan , Scott A. MacDonald , Harbans S. Sachdev , Hubert Schlosser , Carlton G. Willson
IPC分类号： G03F7/004 , G03F7/029 , G03F7/038 , G03F7/039 , G03F7/26 , G03F7/36 , G03F7/38 , H01L21/027 , H01L21/30 , G03C1/72 , G03F7/00
CPC分类号： G03F7/038 , G03F7/039 , G03F7/265
摘要： Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of being inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.
摘要翻译：干可显影的顶表面可成像光致抗蚀剂组合物，其包含活化成亲电取代的成膜芳族聚合物树脂，能够插入到芳族聚合物树脂中的酸催化剂，以及可辐射降解酸生成化合物和产生正色调抵消了基板上的图像。

3. 发明授权

US06821715B2 Fully undercut resist systems using E-beam lithography for the fabrication of high resolution MR sensors 有权
标题翻译：使用电子束光刻的完全底切抗蚀剂系统用于制造高分辨率MR传感器
公开(公告)号：US06821715B2
公开(公告)日：2004-11-23
申请号：US09853345
申请日：2001-05-10
申请人： Robert Edward Fontana, Jr. , Jordan A. Katine , Jennifer Liu , Scott A. MacDonald , Michael J. Rooks , Hugo Alberto Emilio Santini
发明人： Robert Edward Fontana, Jr. , Jordan A. Katine , Jennifer Liu , Scott A. MacDonald , Michael J. Rooks , Hugo Alberto Emilio Santini
IPC分类号： G11B539
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/3116 , G11B5/3163 , G11B5/3903 , G11B5/3909 , G11B2005/3996 , Y10T29/49032 , Y10T29/49044 , Y10T29/49052
摘要： A suspended resist bridge suitable for lithographically patterning MR sensors having trackwidths narrower than 0.2 micron is fabricated using the method of the present invention. First, PMGI is spun onto a substrate to form a first thin resist layer. Next, PMMA is spun onto the first resist layer to form a second resist layer. The PMMA layer is exposed to an electron beam to pattern the trackwidth of the MR sensors. E-beam exposed PMMA is then developed in an IPA solution. The resist structure is then placed in a basic solution for dissolving PMGI, which results in a fully undercut resist bridge that is used for patterning the MR sensors.
摘要翻译：使用本发明的方法制造适于光刻图形具有窄于0.2微米的轨道宽度的MR传感器的悬浮抗蚀桥。首先，将PMGI旋转到基板上以形成第一薄抗蚀剂层。接下来，将PMMA旋涂到第一抗蚀剂层上以形成第二抗蚀剂层。将PMMA层暴露于电子束以对MR传感器的轨道宽度进行图案化。然后在IPA解决方案中开发电子束暴露的PMMA。然后将抗蚀剂结构放置在用于溶解PMGI的碱性溶液中，这导致用于图案化MR传感器的完全底切抗蚀剂桥。

4. 发明申请

US20080206602A1 Nanoimprinting of topography for patterned magnetic media 审中-公开
标题翻译：图形磁性介质的地形的纳米压印
公开(公告)号：US20080206602A1
公开(公告)日：2008-08-28
申请号：US11712644
申请日：2007-02-28
申请人： Jordan A. Katine , Scott A. MacDonald , Neil L. Robertson
发明人： Jordan A. Katine , Scott A. MacDonald , Neil L. Robertson
IPC分类号： G11B5/65
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/855
摘要： One embodiment in accordance with the invention is a method comprising depositing a material above a disk substrate. The disk substrate is for a data storage device. The material above the disk substrate can be nanoimprinted. The material can be processed to transform it into a substantially solidified material. A magnetic material can be deposited on the substantially solidified material.
摘要翻译：根据本发明的一个实施例是一种方法，包括在盘基底上沉积材料。磁盘基板用于数据存储装置。磁盘基板上方的材料可以是纳米压印的。可以将该材料加工成基本上固化的材料。可以将磁性材料沉积在基本上凝固的材料上。

5. 发明授权

US06482566B1 Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography 有权
标题翻译：羟基碳硼烷光刻胶及其在双层薄膜成像光刻中的应用方法
公开(公告)号：US06482566B1
公开(公告)日：2002-11-19
申请号：US09507522
申请日：2000-02-18
申请人： Donald C. Hofer , Scott A. MacDonald , Arpan P. Mahorowala , Robert D. Miller , Josef Michl , Gregory M. Wallraff
发明人： Donald C. Hofer , Scott A. MacDonald , Arpan P. Mahorowala , Robert D. Miller , Josef Michl , Gregory M. Wallraff
IPC分类号： G03C173
CPC分类号： G03F7/0392 , G03F7/0042 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A photoresist composition which includes hydroxycarborane either incorporated as a monomeric dissolution modifier or as pendent groups on a polymer backbone. The photoresist composition is particularly useful in a bilayer thin film imaging lithographic process in which ultraviolet radiation-imaging in a wavelength range of between about 365 nm and about 13 nm is employed.
摘要翻译：一种光致抗蚀剂组合物，其包括作为单体溶解改性剂掺入或作为聚合物主链上的悬挂基团引入的羟基碳硼烷。光致抗蚀剂组合物在双层薄膜成像光刻工艺中特别有用，其中采用波长范围在约365nm至约13nm之间的紫外线辐射成像。

6. 发明授权

US08128830B2 Labeling an imprint lithography template 有权
标题翻译：标记刻印光刻模板
公开(公告)号：US08128830B2
公开(公告)日：2012-03-06
申请号：US12561470
申请日：2009-09-17
申请人： Jeffrey S. Lille , Scott A. MacDonald
发明人： Jeffrey S. Lille , Scott A. MacDonald
IPC分类号： B44C1/22 , C25F3/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/24612
摘要： Embodiments herein provide relatively permanent labeling of an imprint lithography template. The imprint lithography template generally has first and second sides, one side having a pattern to imprint a substrate and the other being optically smooth to unobstructably pass UV light. In one embodiment, a method of labeling the imprint lithography template includes placing a masking layer on a portion of the first side (e.g., the optically smooth side) of the template, forming a liftoff layer on the remainder of the first side of the template, removing the masking layer to expose the portion of the first side of the template, and placing a polymer mark on the exposed portion of the first side of the template. The method also includes depositing an opaque material on the first side of the template and removing the liftoff layer and the mark to form a label on the first side of the template with the deposited opaque material.
摘要翻译：本文的实施例提供了压印光刻模板的相对永久的标记。压印光刻模板通常具有第一侧和第二侧，一侧具有压印衬底的图案，另一侧具有光学平滑以不通过地通过紫外光。在一个实施例中，标记压印光刻模板的方法包括将掩模层放置在模板的第一侧（例如，光学平滑侧）的一部分上，在模板的第一侧的其余部分上形成剥离层去除所述掩模层以暴露所述模板的所述第一侧的所述部分，以及在所述模板的第一侧的所述暴露部分上放置聚合物标记。该方法还包括在模板的第一侧上沉积不透明材料，并用沉积的不透明材料除去剥离层和标记以在模板的第一侧上形成标签。

7. 发明申请

US20110064914A1 LABELING AN IMPRINT LITHOGRAPHY TEMPLATE 有权
标题翻译：标记一个印刷图案模板
公开(公告)号：US20110064914A1
公开(公告)日：2011-03-17
申请号：US12561470
申请日：2009-09-17
申请人： Jeffrey S. Lille , Scott A. MacDonald
发明人： Jeffrey S. Lille , Scott A. MacDonald
IPC分类号： B32B3/00 , B44C1/22
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/24612
摘要： Embodiments herein provide relatively permanent labeling of an imprint lithography template. The imprint lithography template generally has first and second sides, one side having a pattern to imprint a substrate and the other being optically smooth to unobstructably pass UV light. In one embodiment, a method of labeling the imprint lithography template includes placing a masking layer on a portion of the first side (e.g., the optically smooth side) of the template, forming a liftoff layer on the remainder of the first side of the template, removing the masking layer to expose the portion of the first side of the template, and placing a polymer mark on the exposed portion of the first side of the template. The method also includes depositing an opaque material on the first side of the template and removing the liftoff layer and the mark to form a label on the first side of the template with the deposited opaque material.
摘要翻译：本文的实施例提供了压印光刻模板的相对永久的标记。压印光刻模板通常具有第一侧和第二侧，一侧具有压印衬底的图案，另一侧具有光学平滑以不通过地通过紫外光。在一个实施例中，标记压印光刻模板的方法包括将掩模层放置在模板的第一侧（例如，光学平滑侧）的一部分上，在模板的第一侧的其余部分上形成剥离层去除所述掩模层以暴露所述模板的所述第一侧的所述部分，以及在所述模板的第一侧的所述暴露部分上放置聚合物标记。该方法还包括在模板的第一侧上沉积不透明材料，并用沉积的不透明材料除去剥离层和标记以在模板的第一侧上形成标签。

8. 发明授权

US4551418A Process for preparing negative relief images with cationic photopolymerization 失效
标题翻译：用阳离子光聚合制备负浮雕图像的方法
公开(公告)号：US4551418A
公开(公告)日：1985-11-05
申请号：US702514
申请日：1985-02-19
申请人： Anders Hult , Hiroshi Ito , Scott A. MacDonald , Carlton G. Willson
发明人： Anders Hult , Hiroshi Ito , Scott A. MacDonald , Carlton G. Willson
IPC分类号： H01L21/30 , G03F7/20 , G03F7/26 , G03F7/38 , H01L21/027 , H01L21/302 , H01L21/3065 , G03C5/00
CPC分类号： G03F7/265
摘要： Negative relief images are generated by a process comprising the use of cationic polymerization and plasma etching.
摘要翻译：负浮雕图像通过包括使用阳离子聚合和等离子体蚀刻的方法产生。

9. 发明授权

US06507456B1 Dual coil and lead connections fabricated by image transfer and selective etch 失效
标题翻译：通过图像传输和选择性蚀刻制造的双线圈和引线连接
公开(公告)号：US06507456B1
公开(公告)日：2003-01-14
申请号：US09651149
申请日：2000-08-30
申请人： Thomas Edward Dinan , Richard Hsiao , Eric James Lee , Scott A. MacDonald
发明人： Thomas Edward Dinan , Richard Hsiao , Eric James Lee , Scott A. MacDonald
IPC分类号： G11B517
CPC分类号： G11B5/17 , G11B5/313 , G11B5/3163
摘要： A magnetic head including a dual layer induction coil fabricated by reactive ion etching (RIE) techniques. An etch stop layer and an etchable insulation material layer and an induction coil etching mask are fabricated on a first magnetic pole. Induction coil trenches are thereafter RIE etched into the insulation material to the etch stop layer, and the first induction coil is fabricated into the induction coil trenches. Following a chemical mechanical polishing (CMP) step, a second etch stop layer, a second layer of etchable insulation material and a second induction coil etching mask are fabricated. Second induction coil trenches are RIE etched into the second insulation material layer to the second etch stop layer, and a second induction coil is fabricated into the second induction coil trenches. A second CMP step is followed by an insulation layer and the fabrication of a second magnetic pole (P2) upon the insulation layer.
摘要翻译：包括通过反应离子蚀刻（RIE）技术制造的双层感应线圈的磁头。在第一磁极上制造蚀刻停止层和可蚀刻绝缘材料层和感应线圈蚀刻掩模。此后，感应线圈沟槽RIE蚀刻到绝缘材料到蚀刻停止层，并且第一感应线圈被制造成感应线圈沟槽。在化学机械抛光（CMP）步骤之后，制造第二蚀刻停止层，第二层可蚀刻绝缘材料和第二感应线圈蚀刻掩模。将第二感应线圈沟槽RIE蚀刻到第二绝缘材料层到第二蚀刻停止层，并且将第二感应线圈制造成第二感应线圈沟槽。第二CMP步骤之后是绝缘层，并且在绝缘层上制造第二磁极（P2）。

10. 发明授权

US5666100A Linear potentiometer with a floating pin joint 失效
标题翻译：线性电位器带浮动销接头
公开(公告)号：US5666100A
公开(公告)日：1997-09-09
申请号：US529054
申请日：1995-09-15
申请人： Scott A. MacDonald
发明人： Scott A. MacDonald
IPC分类号： H01C10/40 , H01C1/12
CPC分类号： H01C10/40 , Y10T403/45 , Y10T403/459
摘要： A floating pin joint is provided for coupling a linear potentiometer to a machine for measuring relative movement between first and second component parts of the machine. The potentiometer has an elongated housing securable to the first component part and a drive actuator slidably attached to the housing. In one embodiment, the floating pin joint includes a bushing, an actuator rod and a spring. The bushing can be positioned in a mounting hole on the drive actuator with an annular bearing surface disposed at one end of the bushing facing outwardly from the mounting hole. The actuator rod has a flange disposed between a first end and second end which contacts the bearing surface when the second end of the rod is extended through the bushing. The spring attaches to the second end of the rod for maintaining the flange in contact with the bearing surface. The first end of the actuator rod can be connected to the second component part of the machine so that movement of the second component part in a predetermined direction causes movement of the drive actuator along the potentiometer in the predetermined direction to result in accurate positional measurements between the component parts of the machine. The floating pin joint reduces or substantially eliminates axial movement within the joint that can introduce measurement errors, while allowing radial, rotational and pivotal movement in the joint.
摘要翻译：提供浮动销接头用于将线性电位计耦合到机器，用于测量机器的第一和第二部件之间的相对运动。电位器具有可固定到第一部件的细长壳体和可滑动地附接到壳体的驱动致动器。在一个实施例中，浮动销接头包括衬套，致动器杆和弹簧。衬套可以定位在驱动致动器上的安装孔中，其中环形支承表面设置在衬套的一端处，从安装孔朝外。致动器杆具有设置在第一端和第二端之间的凸缘，当第二端延伸穿过衬套时，凸缘与轴承表面接触。弹簧附接到杆的第二端，用于保持凸缘与支承表面接触。致动器杆的第一端可以连接到机器的第二部件，使得第二部件在预定方向上的移动导致驱动致动器沿着电位计在预定方向上的移动，从而在第机器的组成部分。浮动销接头可减少或基本上消除接头内的轴向运动，从而引起测量误差，同时允许接头中的径向，旋转和枢转运动。

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