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    • 1. 发明授权
    • Micromachined vibratory gyroscope with electrostatic coupling
    • 具有静电耦合的微机械振动陀螺仪
    • US06966224B2
    • 2005-11-22
    • US10792043
    • 2004-03-02
    • Hai YanRoland BurghardtBernhard HartmannKonrad KapserMatthias Rose
    • Hai YanRoland BurghardtBernhard HartmannKonrad KapserMatthias Rose
    • G01C19/5712G01P9/04
    • G01C19/5719Y10T74/1275
    • Micromachined vibratory gyroscope having two or more coplanar movable masses suspended over a planar substrate. Two perpendicular axes (x and y) are defined within the substrate plane, while a third, the z-axis or input axis, is defined to be perpendicular to the substrate plane. The movements of the two masses along the x-axis are coupled through an electrostatic coupling means so that the natural resonant frequency of the in-phase mode and that of the anti-phase mode are separated from each other for the resonances along the x-axis. When the two masses are driven to vibrate along the x-axis in the anti-phase mode and the device experiences rotation about the z-axis, Coriolis forces act differentially on the masses in the Y-direction, causing the two masses to dither in an anti-phase motion along the y-axis. The anti-phase dithering along the y-axis can be sensed directly by a rate sensor to measure the rate of rotation about the z-axis. Alternatively, the anti-phase dithering of the first and second bodies along the y-axis can be transferred to other movable bodies (i.e., rate-sensing masses) whose movement is then sensed to measure the rate of rotation about the z-axis. The sensing bodies are preferably suspended in such manner that, in the absence of Coriolis forces, the x-axis motion of the vibrating masses does not affect the sensing bodies. That inhibits motion of the sensing bodies in response to linear acceleration within the plane of the substrate, but permits those bodies to respond readily to the Coriolis-induced motion about an axis perpendicular to the substrate plane.
    • 微机械振动陀螺仪具有悬挂在平面基板上的两个或更多个共面可移动质量块。 两个垂直轴(x和y)被限定在衬底平面内,而第三个z轴或输入轴被定义为垂直于衬底平面。 沿着x轴的两个质量块的移动通过静电耦合装置耦合,使得同相模式和反相模式的固有谐振频率彼此分离,用于沿x轴的谐振, 轴。 当两个质量被驱动以反相模式沿着x轴振动并且该装置经受围绕z轴的旋转时,科里奥利力在Y方向上的质量作用差异地导致两个质量在 沿y轴的反相运动。 可以通过速率传感器直接感测沿y轴的反相抖动,以测量围绕z轴的旋转速率。 或者,沿着y轴的第一和第二主体的相位抖动可以传递到其它可移动体(即,速率感测质量),其移动然后被感测以测量围绕z轴的旋转速率。 感测体优选地以这样的方式悬挂,即在没有科里奥利力的情况下,振动块的x轴运动不影响感测体。 这可以抑制感测体响应于衬底平面内的线性加速度的运动,但是允许这些物体容易地响应于围绕垂直于衬底平面的轴的科里奥利诱发的运动。
    • 5. 发明申请
    • Method for producing insulation structures
    • 绝缘结构的制造方法
    • US20060121735A1
    • 2006-06-08
    • US10527789
    • 2003-09-12
    • Matthias AikeleAlbert EngelhardtMarcus FreyBernhard HartmannHelmut Seidel
    • Matthias AikeleAlbert EngelhardtMarcus FreyBernhard HartmannHelmut Seidel
    • H01L21/302H01L21/461
    • B81C1/00698B81B2201/0235B81B2203/033B81C2201/0178
    • The invention relates to processes for the formation of isolation structures for micro-machined sensors in single-crystal surface technology. In known processes, silicon structures defined by deep trenches are etched and uncovered by a “release etch” step also at their bottom surface towards the substrate. The subsequent lining of these trenches with a non-conducting insulating material, such as silicon dioxide leads to a firm anchoring by means of a surrounding of the silicon structure with the lined trenches on three sides, leaving one side uncovered. It is the main idea of the invention—instead of lining the trenches—to convert thin-walled silicon into an electrically non-conducting material. This can, for instance, be accomplished by means of a thermal oxidation of narrow silicon ribs released prior thereto by trenches. In the minimal configuration, two trenches (holes) per rib with the required structure depth must be etched for this purpose. The silicon rib between them must be narrow enough to permit its complete thermal through oxidation.
    • 本发明涉及用于在单晶表面技术中形成用于微加工传感器的隔离结构的方法。 在已知的工艺中,由深沟槽限定的硅结构通过在其底表面朝向衬底的“释放蚀刻”步骤被蚀刻和未覆盖。 这些具有非导电绝缘材料(例如二氧化硅)的这些沟槽的后续衬里导致通过硅结构的周围与三面沟槽在三面上的牢固锚定,留下一侧未覆盖。 本发明的主要思想是将薄壁硅转化为非导电材料,而不是将沟槽衬里。 这可以例如通过在其之前通过沟槽释放的窄硅肋的热氧化来实现。 在最小的构造中,为了这个目的,必须蚀刻每个具有所需结构深度的肋的两个沟槽(孔)。 它们之间的硅筋必须足够窄以使其完全通过热氧化。