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1. 发明申请

US20070109659A1 Refractive projection objective for immersion lithography 有权
$Refractive projection objective for immersion lithography$
公开(公告)号：US20070109659A1
公开(公告)日：2007-05-17
申请号：US11649274
申请日：2007-01-04
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
IPC分类号： G02B3/00
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.

2. 发明授权

US07187503B2 Refractive projection objective for immersion lithography 有权
$Refractive projection objective for immersion lithography$
标题翻译：用于浸没光刻的折射投影物镜
公开(公告)号：US07187503B2
公开(公告)日：2007-03-06
申请号：US11011610
申请日：2004-12-15
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
IPC分类号： G02B9/00 , G02B9/60 , G03B27/54
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译：适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。束束狭窄收缩的收缩位置位于腰部区域。在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。

3. 发明授权

US07408716B2 Refractive projection objective for immersion lithography 有权
$Refractive projection objective for immersion lithography$
标题翻译：用于浸没光刻的折射投影物镜
公开(公告)号：US07408716B2
公开(公告)日：2008-08-05
申请号：US11649274
申请日：2007-01-04
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
IPC分类号： G02B3/00 , G02B9/60 , G03B27/54
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译：适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。束束狭窄收缩的收缩位置位于腰部区域。在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。

4. 发明申请

US20050190455A1 Refractive projection objective for immersion lithography 有权
$Refractive projection objective for immersion lithography$
标题翻译：用于浸没光刻的折射投影物镜
公开(公告)号：US20050190455A1
公开(公告)日：2005-09-01
申请号：US11011610
申请日：2004-12-15
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
IPC分类号： G02B13/14 , G02B13/18 , G02B17/08 , G03F7/20 , G02B3/00 , G02B9/00
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译：适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。束束狭窄收缩的收缩位置位于腰部区域。在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。

5. 发明授权

US08068276B2 Projection objective for lithography 有权
标题翻译：光刻投影目标
公开(公告)号：US08068276B2
公开(公告)日：2011-11-29
申请号：US12899297
申请日：2010-10-06
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B17/08
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

6. 发明授权

US07835073B2 Projection objective for lithography 有权
标题翻译：光刻投影目标
公开(公告)号：US07835073B2
公开(公告)日：2010-11-16
申请号：US12014496
申请日：2008-01-15
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B17/08
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

7. 发明申请

US20110026110A1 PROJECTION OBJECTIVE FOR LITHOGRAPHY 有权
标题翻译：投影目标的图像
公开(公告)号：US20110026110A1
公开(公告)日：2011-02-03
申请号：US12899297
申请日：2010-10-06
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B3/00
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

8. 发明授权

US07492509B2 Projection optical system 有权
标题翻译：投影光学系统
公开(公告)号：US07492509B2
公开(公告)日：2009-02-17
申请号：US10581651
申请日：2004-11-25
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
IPC分类号： G02B13/14
CPC分类号： G03F7/70241 , G02B13/143
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation is fulfilled: 2 · y · NA · 1 k · ∑ i = 1 k ⁢  φ i  ≥ V 1 wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, φi is a refractive power in mm−1 of the ith lens, k is a total number of lenses of the projection optical system, and wherein V1 is greater than 0.045.
摘要翻译：投影光学系统包括沿投影光学系统的光轴设置的多个透镜; 其中所述多个透镜可分为四个不重叠的正和负屈光力透镜组，其中满足以下关系： $2。y。NA1k/ mo>我 =1k其中：y是由投影光学系统成像的最大图像场的直径的一半，NA是第二物体一侧的最大数值孔径，phii是第i个透镜的mm-1的屈光度 k是投影光学系统的透镜的总数，其中V1大于0.045。$

9. 发明申请

US20070258152A1 Projection Optical System 有权
标题翻译：投影光学系统
公开(公告)号：US20070258152A1
公开(公告)日：2007-11-08
申请号：US10581651
申请日：2004-11-25
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
IPC分类号： G02B9/34
CPC分类号： G03F7/70241 , G02B13/143
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation is fulfilled: 2 · y · NA · 1 k · ∑ i = 1 k ⁢  φ i  ≥ V 1 wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, φi is a refractive power in mm−1 of the ith lens, k is a total number of lenses of the projection optical system, and wherein V1 is greater than 0.045.
摘要翻译：投影光学系统包括沿投影光学系统的光轴设置的多个透镜; 其中所述多个透镜可被分成具有正和负折射光焦度的四个不重叠的透镜组，其中满足以下关系： $2=1> =V1大于0.045。$

10. 发明申请

US20080174858A1 PROJECTION OBJECTIVE FOR LITHOGRAPHY 有权
标题翻译：投影目标的图像
公开(公告)号：US20080174858A1
公开(公告)日：2008-07-24
申请号：US12014496
申请日：2008-01-15
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B27/18
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

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