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    • 4. 发明申请
    • Nucleic acid nanostructure and method of manufacturing the same
    • 核酸纳米结构及其制造方法
    • US20070275394A1
    • 2007-11-29
    • US11634437
    • 2006-12-06
    • Dong ShinMoon JungSe ParkHyeon PyoChang Choi
    • Dong ShinMoon JungSe ParkHyeon PyoChang Choi
    • C12Q1/68C12M3/00
    • C12Q1/6825B82B1/001C12Q2565/133C12Q2563/137
    • Provided are a nucleic acid nanostructure including: a substrate; a nucleic acid quadruplex immobilized on the substrate to be vertical with respect to the substrate; a metal ion present in a unit lattice of the nucleic acid quadruplex, the unit lattice being made up of eight nucleobases; and a nanoparticle bound to an end of the nucleic acid quadruplex, and a method of manufacturing the same. According to the method, a nucleic acid nanostructure having an array of nanoparticles can be manufactured. The nucleic acid nanostructure can be applied as a sensor nanostructure for sensors such as gas sensors, chemical sensors, and biosensors. In particular, a nucleic acid nanostructure in which metal nanoparticles, e.g., gold or silver, are introduced can be useful as a device having local surface plasmon characteristics.
    • 提供的核酸纳米结构包括:底物; 固定在所述基板上的相对于所述基板垂直的核酸四重链; 存在于核酸四联体的单位晶格中的金属离子,单位晶格由八个核碱基组成; 和结合到核酸四链体末端的纳米颗粒及其制造方法。 根据该方法,可以制造具有纳米颗粒阵列的核酸纳米结构。 核酸纳米结构可用作传感器的传感器纳米结构,如气体传感器,化学传感器和生物传感器。 特别地,其中引入金属纳米颗粒例如金或银的核酸纳米结构可用作具有局部表面等离子体特征的器件。
    • 5. 发明申请
    • Method of forming fine pattern for semiconductor device
    • 形成半导体器件精细图案的方法
    • US20050142872A1
    • 2005-06-30
    • US11026572
    • 2004-12-30
    • Se Park
    • Se Park
    • H01L21/027H01L21/44H01L21/768
    • H01L21/76802
    • An object of the present invention is to provide a method that is capable of forming easily a fine pattern corresponding to a high integration density device, without using a new exposure apparatus. The object of the present invention as noted above is accomplished by etching a second insulating layer to expose a portion of an underlying first insulating layer; forming a third insulating layer on the entire surface of the substrate; etching the third insulating layer and the first insulating layer using the second insulating layer as an etch barrier, to define a pattern region; forming a material layer on the entire surface of the substrate so as to fill the pattern region; and planarizing the material layer and/or substrate so as to expose the first insulating layer, to form a pattern.
    • 本发明的目的是提供一种能够容易地形成与高集成度密度装置相对应的精细图案的方法,而不使用新的曝光装置。 如上所述的本发明的目的是通过蚀刻第二绝缘层以暴露下面的第一绝缘层的一部分来实现; 在所述基板的整个表面上形成第三绝缘层; 使用第二绝缘层作为蚀刻阻挡层蚀刻第三绝缘层和第一绝缘层,以限定图案区域; 在基板的整个表面上形成材料层以填充图案区域; 并且平坦化材料层和/或衬底以露出第一绝缘层,以形成图案。
    • 10. 发明申请
    • Method for fabricating a multimode optical fiber preform having longitudinal uniformity
    • 制造具有纵向均匀性的多模光纤预制件的方法
    • US20060185398A1
    • 2006-08-24
    • US11348390
    • 2006-02-06
    • Jin-Haing KimSe ParkMun-Hyun Do
    • Jin-Haing KimSe ParkMun-Hyun Do
    • C03B37/07C03B37/018
    • C03B37/01807C03B2201/31C03B2203/26C03B2207/70
    • A method for fabricating a multimode optical fiber preform having a longitudinal uniformity is provided. The method of fabricating includes performing a plurality of radial deposition passes using a thermal source while inserting raw materials into a glass tube. A reference chemical core shape index is set to determine a refractive index profile of a preform section. A core shape index distribution of each longitudinal deposition pass varying in a longitudinal direction of the glass tube is set such that an error of a reference chemical core shape index distribution in the longitudinal direction of the preform defined by the reference chemical core shape index is compensated for and such that a uniform chemical core shape index is obtained in the longitudinal direction. Deposition is performed while an amount of raw materials corresponding to a preset chemical core shape index is inserted in each longitudinal deposition pass of each radial deposition pass.
    • 提供了一种制造具有纵向均匀性的多模光纤预制件的方法。 制造方法包括在将原材料插入玻璃管中时使用热源进行多个径向沉积通道。 设定参考化学品核心形状指数以确定预制件部分的折射率分布。 设定在玻璃管的长度方向上变化的各纵向沉积通路的芯形指数分布,使得由参考化学核心形状指数所限定的预成型件在长度方向上的基准化学品核心形状指数分布的误差被补偿 并且使得在纵向方向上获得均匀的化学核心形状指数。 在每个径向沉积通道的每个纵向沉积通道中插入对应于预设化学核心形状指数的原料的量的沉积。