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    • 8. 发明申请
    • Stackable semiconductor device and manufacturing method thereof
    • 可堆叠半导体器件及其制造方法
    • US20080251937A1
    • 2008-10-16
    • US12082724
    • 2008-04-11
    • Chin-Huang ChangChien-Ping HuangChih-Ming HuangCheng-Hsu Hsiao
    • Chin-Huang ChangChien-Ping HuangChih-Ming HuangCheng-Hsu Hsiao
    • H01L23/52H01L21/00
    • H01L21/76898H01L25/0657H01L2224/48091H01L2225/06513H01L2225/06551H01L2225/06562H01L2924/00014
    • A stackable semiconductor device and a manufacturing method thereof are disclosed. The method includes providing a wafer comprised of a plurality of chips, wherein a plurality of solder pads are formed on the active surface of each chip, and a plurality of grooves are formed between the solder pads of any two adjacent ones of the chips; forming a dielectric layer on regions between the solder pads of any two adjacent ones of the chips ; forming a metal layer on the dielectric layer electrically connected to the solder pads and forming a connective layer on the metal layer, wherein the width of the connective layer is smaller than that of the metal layer; cutting along the grooves to break off the electrical connection between adjacent chips; thinning the non-active surface of the wafer to the extent that the metal layer is exposed from the wafer; and separating the chips to form a plurality of stackable semiconductor devices. Accordingly, a multi-chip stack structure can be obtained by stacking and electrically connecting a plurality of semiconductor devices through the electrical connection between the connective layer of a semiconductor device and the metal layer of another semiconductor device, thereby effectively integrating more chips without having to increase the stacking area, and further the problems of poor electrical connection, complicated manufacturing processes and high costs known in the prior art can be avoided.
    • 公开了一种可堆叠半导体器件及其制造方法。 该方法包括提供由多个芯片组成的晶片,其中在每个芯片的有源表面上形成多个焊盘,并且在任何两个相邻芯片的焊盘之间形成多个沟槽; 在任何两个相邻芯片的焊盘之间的区域上形成电介质层; 在与所述焊料焊盘电连接的所述电介质层上形成金属层,并在所述金属层上形成连接层,其中所述连接层的宽度小于所述金属层的宽度; 沿着凹槽切割以破坏相邻芯片之间的电连接; 使晶片的非活性表面变薄至金属层从晶片露出的程度; 并分离所述芯片以形成多个可堆叠半导体器件。 因此,通过半导体器件的连接层与另一半导体器件的金属层之间的电连接层叠并电连接多个半导体器件,可以获得多芯片堆叠结构,从而有效地集成更多的芯片,而不必 增加堆积面积,进一步避免了现有技术中已知的电连接不良,制造工艺复杂,成本高的问题。