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    • 1. 发明授权
    • Optical element, mold, and optical device
    • 光学元件,模具和光学装置
    • US09500778B2
    • 2016-11-22
    • US14163224
    • 2014-01-24
    • Chieko HatashitaTakayuki NakamuraKentaroh HagitaToshiya Yamaguchi
    • Chieko HatashitaTakayuki NakamuraKentaroh HagitaToshiya Yamaguchi
    • G02B1/118G02B13/14
    • G02B1/118G02B13/14
    • An optical element having an antireflection effect includes an incident plane and an emission plane and a conical microstructure formed on at least one plane of the incident plane and the emission plane. The conical microstructure includes a first structure formed of a plurality of conical microprojections with an average height H1 and a second structure formed of a plurality of conical microrecesses with an average height H2. The average height H1 satisfies an inequality H1≦1/3*λ/n and the average height H2 satisfies an inequality H2≦1/3*λ/n. An average pitch P between the first structure and the second structure satisfies following conditions: H1/2≦P≦1/3*λ/n, and H2/2≦P≦1/3*λ/n, in which the use wavelength is defined as λ and the refractive index relative to the use wavelength is n.
    • 具有防反射效果的光学元件包括在入射面和发射面的至少一个平面上形成的入射面和发射面以及圆锥形微结构。 圆锥形微结构包括由具有平均高度H1的多个锥形微喷射体形成的第一结构和由具有平均高度H2的多个锥形微过程形成的第二结构。 平均高度H1满足不等式H1≤1/ 3 *λ/ n,平均高度H2满足不等式H2≤1/ 3 *λ/ n。 第一结构和第二结构之间的平均间距P满足以下条件:H1 /2≤P≤1/ 3 *λ/ n,H2 /2≤P≤1/ 3 *λ/ n,其中使用波长 被定义为λ,相对于使用波长的折射率为n。
    • 7. 发明授权
    • Pattern inspection apparatus and pattern inspection method
    • 图案检验装置和图案检验方法
    • US08698081B2
    • 2014-04-15
    • US13317860
    • 2011-10-31
    • Takayuki NakamuraTsutomu Murakawa
    • Takayuki NakamuraTsutomu Murakawa
    • H01J37/28
    • H01J37/28G01N23/225
    • The pattern inspection apparatus includes: an irradiator irradiating a sample with an electron beam; an electron detector detecting an amount of electrons generated on the sample having a pattern formed thereon, by the irradiation of the electron beam; an image processor generating a SEM image of the pattern on the basis of the electron amount; and a controller acquiring defect position information on the pattern formed on the sample from an optical defect inspection device. The controller specifies a defect candidate pattern from the SEM image on the basis of the defect position information and judges whether a defect in the defect candidate pattern is to be transferred onto a wafer. The controller determines a view field of the SEM image on the basis of the defect position information and specifies the defect candidate pattern from image information on patterns displayed in the view field.
    • 图案检查装置包括:用电子束照射样品的照射器; 电子检测器,通过电子束的照射检测在其上形成有图案的样品上产生的电子的量; 基于电子量产生图案的SEM图像的图像处理器; 以及控制器从光学缺陷检查装置获取关于在样品上形成的图案的缺陷位置信息。 控制器基于缺陷位置信息从SEM图像指定缺陷候选图案,并判断缺陷候选图案中的缺陷是否被转印到晶片上。 控制器基于缺陷位置信息确定SEM图像的视野,并根据视场中显示的图案的图像信息指定缺陷候选模式。
    • 9. 发明申请
    • GUIDE ASSEMBLY FOR ENDOSCOPE
    • 内镜指南大会
    • US20120302830A1
    • 2012-11-29
    • US13479598
    • 2012-05-24
    • Tsuyoshi AshidaTakayuki NakamuraShinichi YamakawaYasunori Ohta
    • Tsuyoshi AshidaTakayuki NakamuraShinichi YamakawaYasunori Ohta
    • A61B1/00
    • A61B1/0016A61B1/00135A61B1/00154
    • An endoscope includes a head assembly having a first central axis for entry in a body cavity. In combination with the endoscope, a guide assembly includes a shaft sleeve having a lumen, for mounting on the head assembly therewith. An endless track device is supported around the shaft sleeve, for endlessly moving along the first central axis, for propulsion of the head assembly inside the body cavity. A support sleeve is disposed between the shaft sleeve and the endless track device, having a second central axis different from the first central axis, for supporting the endless track device movably. Preferably, the endoscope includes an imaging window area formed in a distal surface of the head assembly and offset from the first central axis. A position shift between the first and second central axes is predetermined according to a position shift between the imaging window area and the first central axis.
    • 内窥镜包括具有用于进入体腔的第一中心轴线的头部组件。 与内窥镜组合,引导组件包括具有内腔的轴套,用于安装在头部组件上。 环形轨道装置被支撑在轴套周围,用于沿着第一中心轴线不停地移动,用于将头部组件推进到体腔内。 支撑套筒设置在轴套和环形轨道装置之间,具有不同于第一中心轴线的第二中心轴线,用于可移动地支撑环形轨道装置。 优选地,内窥镜包括形成在头部组件的远侧表面中并与第一中心轴线偏移的成像窗口区域。 第一和第二中心轴之间的位置偏移根据成像窗口区域和第一中心轴线之间的位置偏移而预先确定。