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    • 4. 发明授权
    • Optical element, mold, and optical device
    • 光学元件,模具和光学装置
    • US09500778B2
    • 2016-11-22
    • US14163224
    • 2014-01-24
    • Chieko HatashitaTakayuki NakamuraKentaroh HagitaToshiya Yamaguchi
    • Chieko HatashitaTakayuki NakamuraKentaroh HagitaToshiya Yamaguchi
    • G02B1/118G02B13/14
    • G02B1/118G02B13/14
    • An optical element having an antireflection effect includes an incident plane and an emission plane and a conical microstructure formed on at least one plane of the incident plane and the emission plane. The conical microstructure includes a first structure formed of a plurality of conical microprojections with an average height H1 and a second structure formed of a plurality of conical microrecesses with an average height H2. The average height H1 satisfies an inequality H1≦1/3*λ/n and the average height H2 satisfies an inequality H2≦1/3*λ/n. An average pitch P between the first structure and the second structure satisfies following conditions: H1/2≦P≦1/3*λ/n, and H2/2≦P≦1/3*λ/n, in which the use wavelength is defined as λ and the refractive index relative to the use wavelength is n.
    • 具有防反射效果的光学元件包括在入射面和发射面的至少一个平面上形成的入射面和发射面以及圆锥形微结构。 圆锥形微结构包括由具有平均高度H1的多个锥形微喷射体形成的第一结构和由具有平均高度H2的多个锥形微过程形成的第二结构。 平均高度H1满足不等式H1≤1/ 3 *λ/ n,平均高度H2满足不等式H2≤1/ 3 *λ/ n。 第一结构和第二结构之间的平均间距P满足以下条件:H1 /2≤P≤1/ 3 *λ/ n,H2 /2≤P≤1/ 3 *λ/ n,其中使用波长 被定义为λ,相对于使用波长的折射率为n。
    • 10. 发明申请
    • OPTICAL ELEMENT, MOLD, AND OPTICAL DEVICE
    • 光学元件,模具和光学器件
    • US20140211302A1
    • 2014-07-31
    • US14163224
    • 2014-01-24
    • Chieko HATASHITATakayuki NAKAMURAKentaroh HAGITAToshiya YAMAGUCHI
    • Chieko HATASHITATakayuki NAKAMURAKentaroh HAGITAToshiya YAMAGUCHI
    • G02B1/11G02B13/14
    • G02B1/118G02B13/14
    • An optical element having an antireflection effect includes an incident plane and an emission plane and a conical microstructure formed on at least one plane of the incident plane and the emission plane. The conical microstructure includes a first structure formed of a plurality of conical microprojections with an average height H1 and a second structure formed of a plurality of conical microrecesses with an average height H2. The average height H1 satisfies an inequality H1≦1/3*λ/n and the average height H2 satisfies an inequality H2≦1/3*λ/n. An average pitch P between the first structure and the second structure satisfies following conditions: H1/2≦P≦1/3*λ/n, and H2/2≦P≦1/3*λ/n, in which the use wavelength is defined as X and the refractive index relative to the use wavelength is n.
    • 具有防反射效果的光学元件包括在入射面和发射面的至少一个平面上形成的入射面和发射面以及圆锥形微结构。 圆锥形微结构包括由具有平均高度H1的多个锥形微喷射体形成的第一结构和由具有平均高度H2的多个锥形微过程形成的第二结构。 平均高度H1满足不等式H1< nlE; 1/3 *λ/ n,平均高度H2满足不等式H2≦̸ 1/3 *λ/ n。 第一结构和第二结构之间的平均间距P满足以下条件:H1 / 2≦̸ P≦̸ 1/3 *λ/ n和H2 / 2≦̸ P≦̸ 1/3 *λ/ 被定义为X,相对于使用波长的折射率为n。