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1. 发明申请

US20140001038A1 Ferromagnetic Sputtering Target with Less Particle Generation 审中-公开
标题翻译：具有较少颗粒生成的铁磁溅射靶
公开(公告)号：US20140001038A1
公开(公告)日：2014-01-02
申请号：US14004227
申请日：2012-04-06
申请人： Shin-ichi Ogino , Atsushi Sato , Atsutoshi Arakawa , Yuichiro Nakamura
发明人： Shin-ichi Ogino , Atsushi Sato , Atsutoshi Arakawa , Yuichiro Nakamura
IPC分类号： C23C14/34
CPC分类号： C23C14/3414 , C22C19/07 , C23C14/35 , G11B5/851
摘要： Provided is a nonmagnetic-material-dispersed sputtering target having a metal composition comprising 20 mol % or less of Cr and the balance of Co. The target has a structure including a phase (A) in which a nonmagnetic oxide material is dispersed in the basis metal, and a metal phase (B) containing 40 mol % or more of Co; the area proportion of grains of the nonmagnetic oxide material in the phase (A) is 50% or less; and when a minimum-area rectangle circumscribed to the phase (B) is assumed, the proportion of the circumscribed rectangle having a short side of 2 to 300 μm is 90% or more of all of the phases (B). The ferromagnetic sputtering target can suppress particle generation during sputtering and can improve leakage magnetic flux to allow stable electrical discharge with a magnetron sputtering apparatus.
摘要翻译：本发明提供一种非磁性材料分散溅射靶，其具有包含20mol％以下的Cr和余量的Co的金属组成物。靶具有包括其中非磁性氧化物材料分散在基材中的相（A）的结构金属和含有40摩尔％以上的Co的金属相（B）相（A）中非磁性氧化物材料的面积比例为50％以下; 并且当假设包围相（B）的最小面积矩形时，具有2〜300μm的短边的外接矩形的比例为所有相（B）的90％以上。铁磁性溅射靶可以抑制溅射时的粒子产生，能够提高漏磁通，能够通过磁控溅射装置进行稳定的放电。

2. 发明授权

US09945026B2 Fe-Pt-based sputtering target with dispersed C grains 有权
公开(公告)号：US09945026B2
公开(公告)日：2018-04-17
申请号：US13880135
申请日：2011-11-14
申请人： Atsushi Sato , Shin-ichi Ogino
发明人： Atsushi Sato , Shin-ichi Ogino
IPC分类号： H01B1/02 , C23C14/34 , B22F3/14 , C22C33/02 , G11B5/851
CPC分类号： C23C14/3407 , B22F3/14 , C22C33/0228 , C23C14/3414 , G11B5/851 , H01B1/02
摘要： A sintered compact sputtering target in which a composition ratio based on atomicity is represented by a formula of (Fe100-x—Ptx)100-A—CA (provided A is a number which satisfies 20≤A≤50 and X is a number which satisfies 35≤X≤55), wherein C grains are finely dispersed in an alloy, and the relative density is 90% or higher. The production of a magnetic thin film with granular structure is provided without using an expensive simultaneous sputtering device, and a high-density sputtering target capable of reducing the amount of particles generated during sputtering is provided.

3. 发明授权

US08679268B2 Sputtering target of ferromagnetic material with low generation of particles 有权
标题翻译：铁磁材料的溅射靶与低代粒子
公开(公告)号：US08679268B2
公开(公告)日：2014-03-25
申请号：US13320840
申请日：2010-09-30
申请人： Shin-ichi Ogino , Atsushi Sato , Yuichiro Nakamura , Atsutoshi Arakawa
发明人： Shin-ichi Ogino , Atsushi Sato , Yuichiro Nakamura , Atsutoshi Arakawa
IPC分类号： C23C14/06 , C23C14/34 , H01F41/18 , C22C19/07
CPC分类号： C23C14/3414 , B22F2998/00 , C22C19/07 , C22C32/00 , C22C2202/02 , H01F41/183 , C22C32/0026 , B22F9/082
摘要： A ferromagnetic sputtering target comprising metal having a composition containing 20 mol % or less of Cr, and Co as the remainder; wherein the target structure includes a basis metal (A), and flat phases (B), containing 90 wt % or more of Co, within the basis metal (A), the average grain size of the phases (B) is 10 μm or more and 150 μm or less, and the average aspect ratio of the phases (B) is 1:2 to 1:10. Provided is a ferromagnetic sputtering target capable of inhibiting the generation of particles during sputtering, and improving the pass-through flux to achieve a stable electrical discharge with a magnetron sputtering device.
摘要翻译：一种铁磁溅射靶，其包含具有20摩尔％以下的Cr的组成的金属，余量为Co; 其特征在于，在所述基体金属（A）中，所述基体金属（A）和含有90重量％以上的Co的平坦相（B），所述相（B）的平均粒径为10μm，多于150μm以下，相（B）的平均纵横比为1:2〜1:10。本发明提供能够抑制溅射时的粒子产生的铁磁性溅射靶，提高通过磁通以通过磁控溅射装置实现稳定的放电。

4. 发明授权

US09181617B2 Sputtering target of ferromagnetic material with low generation of particles 有权
标题翻译：铁磁材料的溅射靶与低代粒子
公开(公告)号：US09181617B2
公开(公告)日：2015-11-10
申请号：US13808938
申请日：2011-01-28
申请人： Shin-ichi Ogino , Atsushi Sato , Yuichiro Nakamura , Atsutoshi Arakawa
发明人： Shin-ichi Ogino , Atsushi Sato , Yuichiro Nakamura , Atsutoshi Arakawa
IPC分类号： H01F41/18 , C23C14/34 , C22C1/04 , C22C19/07 , C22C32/00 , C22F1/10 , G11B5/851 , H01F10/16
CPC分类号： C23C14/3407 , C22C1/0433 , C22C19/07 , C22C32/0026 , C22F1/10 , C23C14/3414 , G11B5/851 , H01F10/16 , H01F41/18
摘要： Provided is a sputtering target of ferromagnetic material comprising a metal having a composition containing 20 mol % or less of Cr, and Co as the remainder; wherein the target structure includes a phase (A) which is a basis metal, and metal phases (B) having a component composition different from the peripheral texture within the phase (A), the area ratio occupied by oxides within 1 μm from the most outer periphery of metal phases (B) is 80% or less, and the average grain size of the metal phases (B) is 10 μm or more and 150 μm or less. Provided is a sputtering target of ferromagnetic material capable of inhibiting the generation of particles during sputtering, and improving the pass-through flux to achieve a stable electrical discharge with a magnetron sputtering device.
摘要翻译：提供一种铁磁材料的溅射靶，其包含具有20摩尔％以下的Cr的组成的金属，余量为Co; 其特征在于，所述目标结构体包括作为基础金属的相（A）和具有与相（A）以外的周边构造不同的成分组成的金属相（B），最大范围内的氧化物占所述面积比1μm以内金属相（B）的外周的平均粒径为80％以下，金属相（B）的平均粒径为10μm以上且150μm以下。本发明提供能够抑制溅射时粒子产生的强磁性材料的溅射靶，提高通过磁通以通过磁控溅射装置实现稳定的放电。

5. 发明申请

US20120097535A1 Sputtering Target of Ferromagnetic Material with Low Generation of Particles 有权
标题翻译：具有低产生粒子的铁磁材料的溅射靶
公开(公告)号：US20120097535A1
公开(公告)日：2012-04-26
申请号：US13320840
申请日：2010-09-30
申请人： Shin-ichi Ogino , Atsushi Sato , Yuichiro Nakamura , Atsutoshi Arakawa
发明人： Shin-ichi Ogino , Atsushi Sato , Yuichiro Nakamura , Atsutoshi Arakawa
IPC分类号： C23C14/06
CPC分类号： C23C14/3414 , B22F2998/00 , C22C19/07 , C22C32/00 , C22C2202/02 , H01F41/183 , C22C32/0026 , B22F9/082
摘要： A ferromagnetic sputtering target comprising metal having a composition containing 20 mol % or less of Cr, and Co as the remainder; wherein the target structure includes a basis metal (A), and flat phases (B), containing 90 wt % or more of Co, within the basis metal (A), the average grain size of the phases (B) is 10 μm or more and 150 μm or less, and the average aspect ratio of the phases (B) is 1:2 to 1:10. Provided is a ferromagnetic sputtering target capable of inhibiting the generation of particles during sputtering, and improving the pass-through flux to achieve a stable electrical discharge with a magnetron sputtering device.
摘要翻译：一种铁磁溅射靶，其包含具有20摩尔％以下的Cr的组成的金属，余量为Co; 其特征在于，在所述基体金属（A）中，所述基体金属（A）和含有90重量％以上的Co的平坦相（B），所述相（B）的平均粒径为10μm，多于150μm以下，相（B）的平均纵横比为1:2〜1:10。本发明提供能够抑制溅射时的粒子产生的铁磁性溅射靶，提高通过磁通以通过磁控溅射装置实现稳定的放电。

6. 发明申请

US20130213803A1 Fe-Pt-Based Sputtering Target with Dispersed C Grains 有权
标题翻译：基于Fe-Pt的溅射靶与分散C颗粒
公开(公告)号：US20130213803A1
公开(公告)日：2013-08-22
申请号：US13880135
申请日：2011-11-14
申请人： Atsushi Sato , Shin-ichi Ogino
发明人： Atsushi Sato , Shin-ichi Ogino
IPC分类号： C23C14/34
CPC分类号： C23C14/3407 , B22F3/14 , C22C33/0228 , C23C14/3414 , G11B5/851 , H01B1/02
摘要： A sintered compact sputtering target in which a composition ratio based on atomicity is represented by a formula of (Fe100-X—PtX)100-A—CA (provided A is a number which satisfies 20≦A≦50 and X is a number which satisfies 35≦X≦55), wherein C grains are finely dispersed in an alloy, and the relative density is 90% or higher.An object of this invention is to enable the production of a magnetic thin film with granular structure without using an expensive simultaneous sputtering device, as well as provide a high-density sputtering target capable of reducing the amount of particles generated during sputtering.
摘要翻译：其中基于原子性的组成比由式（Fe100-X-PtX）100-A-CA表示的烧结致密溅射靶（提供A为满足20≤A@ 50的数，X为满足35 @ X @ 55），其中C晶粒细分散在合金中，相对密度为90％以上。本发明的目的是能够制造具有颗粒结构的磁性薄膜而不使用昂贵的同时溅射装置，并且提供能够减少溅射期间产生的颗粒量的高密度溅射靶。

7. 发明授权

US09091797B2 Light guide panel, surface light source apparatus including light guide panel, and flat panel display including surface light source apparatus 有权
标题翻译：导光板，包括导光板的表面光源装置和包括表面光源装置的平板显示器
公开(公告)号：US09091797B2
公开(公告)日：2015-07-28
申请号：US13530739
申请日：2012-06-22
申请人： Tadao Yagi , Atsushi Sato , Nobuji Sakai , Yoshihiro Yokote , Shigeto Kobori , Hideki Imamura
发明人： Tadao Yagi , Atsushi Sato , Nobuji Sakai , Yoshihiro Yokote , Shigeto Kobori , Hideki Imamura
IPC分类号： G02F1/13357 , F21V8/00
CPC分类号： G02B6/0056 , G02B6/0051 , G02B6/0068
摘要： A light guide panel includes: a light guide layer having a light incident surface; a polarization separation layer configured to select a desired polarization among light emitted from the light guide layer and to emit light having the polarization; and a light homogenization layer including a plurality of fibers and a supporting medium of the fibers, the light homogenization layer configured to diffuse and scatter light incident on the light guide layer into the light guide layer. The polarization separation layer includes: a plurality of first fibers having birefringence; and a first supporting medium that is isotropic and configured to support the first fibers. The refractive index of the first supporting medium corresponds to at least one of two different refractive indices of the first fibers. The light homogenization layer includes: a plurality of second fibers having birefringence; and a second supporting medium that is isotropic and configured to support the second fibers.
摘要翻译：导光板包括：具有光入射表面的导光层; 偏振分离层，被配置为在从所述导光层发射的光中选择期望的偏振并发射具有所述偏振的光; 以及光均质化层，其包括多根纤维和所述纤维的支撑介质，所述光均质化层被配置为将入射到所述导光层的光扩散和散射到所述导光层中。偏振分离层包括：具有双折射的多个第一纤维; 以及第一支撑介质，其是各向同性的并且构造成支撑第一纤维。第一支撑介质的折射率对应于第一纤维的两种不同折射率中的至少一种。光均质化层包括：具有双折射的多个第二纤维; 以及第二支撑介质，其是各向同性的并且构造成支撑第二纤维。

8. 发明授权

US08926897B2 Nickel-base superalloy excellent in the oxidation resistance 有权
标题翻译：镍基超耐热合金性能优良
公开(公告)号：US08926897B2
公开(公告)日：2015-01-06
申请号：US11992308
申请日：2006-09-27
申请人： Hiroshi Harada , Kyoko Kawagishi , Toshiharu Kobayashi , Yutaka Koizumi , Atsushi Sato
发明人： Hiroshi Harada , Kyoko Kawagishi , Toshiharu Kobayashi , Yutaka Koizumi , Atsushi Sato
IPC分类号： C22C19/05 , C22C1/04
CPC分类号： C22C1/0433 , B22F2998/00 , C22C19/057 , B22F5/04 , B22F5/009
摘要： A nickel-base superalloy having excellent oxidation resistance is provided. It is useful as high-temperature members such as turbine blades and turbine vanes for jet engines or gas turbines. The nickel-base superalloy has a composition containing Co: 0.1 to 15% by weight, Cr: 0.1 to 10% by weight, Mo: 0.1 to 4.5% by weight, W: 0.1 to 15% by weight, Al: 2 to 8% by weight, Ta+Nb+Ti: 0 to 16% by weight, Hf: 0 to 5% by weight, Re: 0.1 to 16% by weight, Ru: 0.1 to 16% by weight, Si: 0.2 to 5% by weight and a balance made of Ni and unavoidable impurities.
摘要翻译：提供了具有优异抗氧化性的镍基超耐热合金。作为喷气发动机或燃气轮机的涡轮叶片和涡轮叶片的高温部件是有用的。镍基超级合金具有Co：0.1〜15重量％，Cr：0.1〜10重量％，Mo：0.1〜4.5重量％，W：0.1〜15重量％，Al：2〜8 重量％，Ta + Nb + Ti：0〜16％（重量），Hf：0〜5％（重量）Re：0.1〜16％（重量）Ru：0.1〜16％（重量）Si：0.2〜和由Ni和不可避免的杂质构成的平衡物。

9. 发明授权

US08848327B2 Controller, controlling method, and solar cell 有权
标题翻译：控制器，控制方法和太阳能电池
公开(公告)号：US08848327B2
公开(公告)日：2014-09-30
申请号：US13161589
申请日：2011-06-16
申请人： Atsushi Sato , Yoshiaki Inoue , Mikio Takenaka
发明人： Atsushi Sato , Yoshiaki Inoue , Mikio Takenaka
IPC分类号： H02H3/00 , H01L31/02 , H01L31/04 , H02M7/539
CPC分类号： H01L31/02021 , Y02E10/542
摘要： Disclosed is a controller for controlling short-circuit across positive and negative terminals of a dye sensitized solar cell for converting a light energy into an electrical energy. The controller includes: a voltage detecting section detecting a voltage developed across the positive and negative terminals of the cell; a current detecting section detecting a current caused to flow through the positive terminal of the cell; a judging section judging how a power generation state of the cell is, and whether or not a release state is provided across the positive and negative terminals of the cell in accordance with a value of the voltage detected by the voltage detecting section and a value of the current detected by the current detecting section; and a short-circuiting/releasing section short-circuiting or releasing across the positive and negative terminals of the cell in accordance with a result of the judgment made by the judging section.
摘要翻译：公开了一种用于控制用于将光能转换成电能的染料敏化太阳能电池的正极和负极端子之间的短路的控制器。所述控制器包括：电压检测部分，检测在所述电池的正极和负极端子两端产生的电压; 电流检测部，检测流过所述电池的正极的电流; 判断单元的发电状态的判定部，以及根据电压检测部检测出的电压的值，判定单元的正极和负极两端的释放状态是否为由电流检测部检测出的电流; 以及短路/释放部分，根据判断部分的判断结果，在电池的正极和负极端子之间短路或释放。

10. 发明授权

US08816213B2 Terminal structure, printed wiring board, module substrate, and electronic device 有权
标题翻译：端子结构，印刷线路板，模块基板和电子设备
公开(公告)号：US08816213B2
公开(公告)日：2014-08-26
申请号：US13189062
申请日：2011-07-22
申请人： Yuhei Horikawa , Kenichi Yoshida , Atsushi Sato
发明人： Yuhei Horikawa , Kenichi Yoshida , Atsushi Sato
IPC分类号： H05K1/03 , H05K1/09 , H01L23/48 , H01L23/52 , H01L29/40 , H01B5/00 , H05K3/24 , H01L23/498 , H01L23/00 , H05K3/34
CPC分类号： H05K3/244 , H01L23/49816 , H01L23/49866 , H01L24/24 , H01L2924/01019 , H01L2924/01327 , H01L2924/14 , H01L2924/15311 , H01L2924/19041 , H05K3/3436 , H05K3/3457 , H05K2203/043 , H01L2924/00
摘要： The present invention relates to a terminal structure and an electronic device having the terminal structure. The terminal structure includes: a terminal having: a conductor layer containing at least one metal selected from gold, silver, and copper; a first layer containing nickel and phosphorus, laid on the conductor layer; a second layer having a smaller atomic ratio of nickel to phosphorus than the first layer and containing Ni3P, laid on the first layer; and a third layer containing a first intermetallic compound of an Ni—Cu—Sn type, laid on the second layer; and a solder layer on the third layer of the terminal. A second intermetallic compound of an Ni—P—Sn type partly covers a surface of the second layer on the third layer side and a maximum thickness of the second intermetallic compound in a lamination direction is from 0.05 to 0.7 μm.
摘要翻译：本发明涉及一种终端结构和具有终端结构的电子设备。端子结构包括：端子，具有：包含至少一种选自金，银和铜的金属的导体层; 铺设在导体层上的含有镍和磷的第一层; 第二层，其具有比所述第一层更小的镍与磷的原子比，并且包含放置在所述第一层上的Ni 3 P; 和含有Ni-Cu-Sn型的第一金属间化合物的第三层，放置在第二层上; 以及端子的第三层上的焊料层。 Ni-P-Sn型的第二金属间化合物部分地覆盖第三层侧的第二层的表面，层叠方向上的第二金属间化合物的最大厚度为0.05〜0.7μm。

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