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1. 发明授权

US09091797B2 Light guide panel, surface light source apparatus including light guide panel, and flat panel display including surface light source apparatus 有权
标题翻译：导光板，包括导光板的表面光源装置和包括表面光源装置的平板显示器
公开(公告)号：US09091797B2
公开(公告)日：2015-07-28
申请号：US13530739
申请日：2012-06-22
申请人： Tadao Yagi , Atsushi Sato , Nobuji Sakai , Yoshihiro Yokote , Shigeto Kobori , Hideki Imamura
发明人： Tadao Yagi , Atsushi Sato , Nobuji Sakai , Yoshihiro Yokote , Shigeto Kobori , Hideki Imamura
IPC分类号： G02F1/13357 , F21V8/00
CPC分类号： G02B6/0056 , G02B6/0051 , G02B6/0068
摘要： A light guide panel includes: a light guide layer having a light incident surface; a polarization separation layer configured to select a desired polarization among light emitted from the light guide layer and to emit light having the polarization; and a light homogenization layer including a plurality of fibers and a supporting medium of the fibers, the light homogenization layer configured to diffuse and scatter light incident on the light guide layer into the light guide layer. The polarization separation layer includes: a plurality of first fibers having birefringence; and a first supporting medium that is isotropic and configured to support the first fibers. The refractive index of the first supporting medium corresponds to at least one of two different refractive indices of the first fibers. The light homogenization layer includes: a plurality of second fibers having birefringence; and a second supporting medium that is isotropic and configured to support the second fibers.
摘要翻译：导光板包括：具有光入射表面的导光层; 偏振分离层，被配置为在从所述导光层发射的光中选择期望的偏振并发射具有所述偏振的光; 以及光均质化层，其包括多根纤维和所述纤维的支撑介质，所述光均质化层被配置为将入射到所述导光层的光扩散和散射到所述导光层中。偏振分离层包括：具有双折射的多个第一纤维; 以及第一支撑介质，其是各向同性的并且构造成支撑第一纤维。第一支撑介质的折射率对应于第一纤维的两种不同折射率中的至少一种。光均质化层包括：具有双折射的多个第二纤维; 以及第二支撑介质，其是各向同性的并且构造成支撑第二纤维。

2. 发明授权

US06797452B2 Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition 失效
标题翻译：包含光敏皂化聚乙酸乙烯酯的光敏组合物和使用该组合物的图案形成方法
公开(公告)号：US06797452B2
公开(公告)日：2004-09-28
申请号：US10198657
申请日：2002-07-12
申请人： Masahiro Takano , Shin Utsunomiya , Nobuji Sakai , Noriaki Tochizawa
发明人： Masahiro Takano , Shin Utsunomiya , Nobuji Sakai , Noriaki Tochizawa
IPC分类号： G03C173
CPC分类号： G03F7/0048 , G03F7/0388 , Y10S430/106 , Y10S430/11
摘要： A photosensitive resin composition which includes a photosensitive saponified PVA having a pendant group derived from a quaternary styrylpyridinium or styrylquinolinium, or a derivative thereof. The composition comprises a photosensitive saponified PVA which has structural units represented by formulas (1) to (4): which product is dissolved in at least one organic solvent selected from the group consisting of compounds represented by formulas (5), (6), and (7). The resin composition can be dissolved in a comparatively safe high-boiling-point solvent, such as propylene glycol, and can be developed with water.
摘要翻译：一种感光性树脂组合物，其包含具有衍生自季戊烯基吡啶鎓或苯乙烯基喹啉鎓的侧基的感光性皂化PVA或其衍生物。该组合物包含具有由式（1）至（4）表示的结构单元的光敏皂化PVA：该产物溶于至少一种选自式（5），（6），和（7）。树脂组合物可以溶解在比较安全的高沸点溶剂如丙二醇中，并可用水显影。

3. 发明申请

US20120327332A1 LIGHT GUIDE PANEL, SURFACE LIGHT SOURCE APPARATUS INCLUDING LIGHT GUIDE PANEL, AND FLAT PANEL DISPLAY INCLUDING SURFACE LIGHT SOURCE APPARATUS 有权
标题翻译：光导板，表面光源装置，包括光导板，以及包括表面光源装置的平板显示器
公开(公告)号：US20120327332A1
公开(公告)日：2012-12-27
申请号：US13530739
申请日：2012-06-22
申请人： Tadao Yagi , Atsushi Sato , Nobuji Sakai , Yoshihiro Yokote , Shigeto Kobori , Hideki Imamura
发明人： Tadao Yagi , Atsushi Sato , Nobuji Sakai , Yoshihiro Yokote , Shigeto Kobori , Hideki Imamura
IPC分类号： G02F1/13357 , F21V8/00 , G02F1/13363
CPC分类号： G02B6/0056 , G02B6/0051 , G02B6/0068
摘要： A light guide panel includes: a light guide layer having a light incident surface; a polarization separation layer configured to select a desired polarization among light emitted from the light guide layer and to emit light having the polarization; and a light homogenization layer including a plurality of fibers and a supporting medium of the fibers, the light homogenization layer configured to diffuse and scatter light incident on the light guide layer into the light guide layer. The polarization separation layer includes: a plurality of first fibers having birefringence; and a first supporting medium that is isotropic and configured to support the first fibers. The refractive index of the first supporting medium corresponds to at least one of two different refractive indices of the first fibers. The light homogenization layer includes: a plurality of second fibers having birefringence; and a second supporting medium that is isotropic and configured to support the second fibers.
摘要翻译：导光板包括：具有光入射表面的导光层; 偏振分离层，被配置为在从所述导光层发射的光中选择期望的偏振并发射具有所述偏振的光; 以及光均质化层，其包括多根纤维和所述纤维的支撑介质，所述光均质化层被配置为将入射到所述导光层的光扩散和散射到所述导光层中。偏振分离层包括：具有双折射的多个第一纤维; 以及第一支撑介质，其是各向同性的并且构造成支撑第一纤维。第一支撑介质的折射率对应于第一纤维的两种不同折射率中的至少一种。光均质化层包括：具有双折射的多个第二纤维; 以及第二支撑介质，其是各向同性的并且构造成支撑第二纤维。

4. 发明授权

US07329480B2 Radiation-sensitive negative-type resist composition for pattern formation method 失效
标题翻译：用于图案形成方法的辐射敏感负型抗蚀剂组合物
公开(公告)号：US07329480B2
公开(公告)日：2008-02-12
申请号：US10526383
申请日：2003-08-29
申请人： Nobuji Sakai , Kentaro Tada
发明人： Nobuji Sakai , Kentaro Tada
IPC分类号： G03F7/038 , G03F7/004
CPC分类号： G03F7/038 , G03F7/0045
摘要： The radiation-sensitive negative-type resist composition for pattern formation containing an epoxy resin, a radiation-sensitive cationic polymerization initiator, and a solvent for dissolving the epoxy resin therein, characterized in that the resist composition, through drying, forms a resist film having a softening point falling within range of 30 to 120 C and that the epoxy resin is represented by formula (1): (wherein R1 represents a moiety derived from an organic compound having k active hydrogen atoms (k represents an integer of 1 to 100); each of n1, n2, through nk represents 0 or an integer of 1 to 100; the sum of n1, n2, through nK falls within a range of 1 to 100; and each of “A”s, which may be identical to or different from each other, represents an oxycyclohexane skeleton represented by formula (2): (wherein X represents any of groups represented by formulas (3) to (5): and at least two groups represented by formula (3) are contained in one molecule of the epoxy resin))
摘要翻译：包含环氧树脂，辐射敏感性阳离子聚合引发剂和用于溶解环氧树脂的溶剂的用于图案形成的辐射敏感性负型抗蚀剂组合物，其特征在于，所述抗蚀剂组合物通过干燥形成抗蚀剂膜，软化点在30〜120℃的范围内，环氧树脂由式（1）表示：（其中R1表示衍生自具有k个活性氢原子的有机化合物的部分（k表示1〜100的整数） n 1，n 2，n 2，n 2，n 2各自表示0或1〜100的整数，n＆lt; 1 2，N 2，N 2，N 2，N 2，N 2，N 2，N 2，彼此表示由式（2）表示的氧环己烷骨架：（其中X表示由式（3）至（5）表示的基团中的任一个：和由f （3）包含在环氧树脂的一分子中））

5. 发明申请

US20060172222A1 Radiation-sensitive negative-type resist composition for pattern formation method 失效
标题翻译：用于图案形成方法的辐射敏感负型抗蚀剂组合物
公开(公告)号：US20060172222A1
公开(公告)日：2006-08-03
申请号：US10526383
申请日：2003-08-29
申请人： Nobuji Sakai , Kentaro Tada
发明人： Nobuji Sakai , Kentaro Tada
IPC分类号： G03C1/76
CPC分类号： G03F7/038 , G03F7/0045
摘要： The radiation-sensitive negative-type resist composition for pattern formation containing an epoxy resin, a radiation-sensitive cationic polymerization initiator, and a solvent for dissolving the epoxy resin therein, characterized in that the resist composition, through drying, forms a resist film having a softening point falling within range of 30 to 120 C. and that the epoxy resin is represented by formula (1): (wherein R1 represents a moiety derived from an organic compound having k active hydrogen atoms (k represents an integer of 1 to 100); each of n1, n2, through nk represents 0 or an integer of 1 to 100; the sum of n1, n2, through nK falls within a range of 1 to 100; and each of “A”s, which may be identical to or different from each other, represents an oxycyclohexane skeleton represented by formula (2): (wherein X represents any of groups represented by formulas (3) to (5): and at least two groups represented by formula (3) are contained in one molecule of the epoxy resin)).
摘要翻译：包含环氧树脂，辐射敏感性阳离子聚合引发剂和用于溶解环氧树脂的溶剂的用于图案形成的辐射敏感性负型抗蚀剂组合物，其特征在于，所述抗蚀剂组合物通过干燥形成抗蚀剂膜，软化点在30〜120℃的范围内，环氧树脂由式（1）表示：（其中R1表示衍生自具有k个活性氢原子的有机化合物的部分（k表示1〜100的整数））; n 1，n 2，...，n 2中的每一个表示0或1至100的整数; n _{1 ，N 2，N 2，N 2，N 2，N 2，N 2，表示由式（2）表示的氧环己烷骨架：（式中，X表示由式（3）〜（5）表示的基团中的任一种，式（3）包含在环氧树脂的一个分子中））。}

6. 发明申请

US20060189160A1 Method for producing a pattern formation mold 审中-公开
公开(公告)号：US20060189160A1
公开(公告)日：2006-08-24
申请号：US10526384
申请日：2003-08-29
申请人： Tadashi Hattori , Yuichi Utsumi , Nobuji Sakai , Kentaro Tada
发明人： Tadashi Hattori , Yuichi Utsumi , Nobuji Sakai , Kentaro Tada
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： B81C99/009 , C08G59/32 , C08G59/3218 , G03F7/0017 , G03F7/038
摘要： The method for producing a pattern formation mold includes: a first step of applying to a substrate a radiation-sensitive negative-type resist composition containing an epoxy resin represented by formula (I): (wherein R1 represents a moiety derived from an organic compound having k active hydrogen atoms (k represents an integer of 1 to 100); each of n1, n2, through nk represents 0 or an integer of 1 to 100; the sum of n1, n2, through nk falls within a range of 1 to 100; and each of “A” s, which may be identical to or different from each other, represents an oxycyclohexane skeleton represented by formula (II): (wherein X represents any of groups represented by formulas (III) to (V): and at least two groups represented by formula (III) are contained in one molecule of the epoxy resin)), along with a radiation-sensitive cationic polymerization initiator, and a solvent for dissolving the epoxy resin therein; a second step of drying the substrate coated with the radiation-sensitive negative-type resist composition, to thereby form a resist film; a third step of selectively exposing the formed resist film to an active energy beam according to a desired pattern; a fourth step of heating the exposed resist film so as to enhance a contrast of a pattern to be formed; a fifth step of developing the heated resist film, to thereby remove the unexposed area of the resist film through dissolution, thereby forming a patterned layer; and a sixth step of applying to the patterned layer a material other than that of the patterned layer such that spaces present in the patterned layer are filled, at least to some height, with the material, to thereby form a second layer, and removing the second layer, to thereby yield a pattern formation mold.

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