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    • 10. 发明授权
    • Tunneling junction magnetoresistive effect element and manufacturing method thereof
    • 隧道结磁阻效应元件及其制造方法
    • US08284526B2
    • 2012-10-09
    • US12955746
    • 2010-11-29
    • Koichi NishiokaKoji SakamotoTatsumi Hirano
    • Koichi NishiokaKoji SakamotoTatsumi Hirano
    • G11B5/33
    • G11B5/3909B82Y10/00B82Y25/00B82Y40/00G01R33/098G11B5/3906H01F10/3254H01F10/3272H01F41/18H01F41/307H01L43/08H01L43/12Y10T428/1114
    • According to one embodiment, a TMR effect element includes a ground layer, an antiferromagnetic layer above the ground layer, a first ferromagnetic layer above the antiferromagnetic layer and exchange-coupled to the antiferromagnetic layer, an anti-parallel coupling layer above the first ferromagnetic layer, a second ferromagnetic layer having a magnetic moment coupled anti-parallel to the magnetic moment of the first ferromagnetic layer via the anti-parallel coupling layer, an insulation barrier layer above the second ferromagnetic layer, and a third ferromagnetic layer above the insulation barrier layer. At least a portion of the second ferromagnetic layer and at least a portion of the third ferromagnetic layer on an insulation barrier layer side are comprised of a crystal, and the insulation barrier layer comprises MgO and an oxide material having an independent cubic crystal structure and complete solid solubility with MgO. Other elements, heads, and formation methods are described according to various embodiments.
    • 根据一个实施例,TMR效应元件包括接地层,接地层上方的反铁磁层,反铁磁层上方的第一铁磁层并与反铁磁层交换耦合,第一铁磁层上方的反平行耦合层 具有经由所述反平行耦合层反平行于所述第一铁磁层的磁矩而耦合的磁矩的第二铁磁层,所述第二铁磁层上方的绝缘阻挡层和所述绝缘阻挡层上方的第三铁磁层 。 第二铁磁层的至少一部分和绝缘阻挡层侧上的第三铁磁层的至少一部分由晶体构成,绝缘阻挡层包括MgO和具有独立立方晶体结构的氧化物材料 与MgO的固溶度。 根据各种实施例描述其它元件,头和形成方法。