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1. 发明申请

US20130020220A1 RETICLE POD 有权
公开(公告)号：US20130020220A1
公开(公告)日：2013-01-24
申请号：US13562087
申请日：2012-07-30
申请人： Steven P. Kolbow , Kevin McMullen , Anthony Mathius Tieben , Matthew Kusz , Christian Andersen , Huaping Wang , Michael Cisewski , Michael L. Johnson , David L. Halbmaier , John Lystad
发明人： Steven P. Kolbow , Kevin McMullen , Anthony Mathius Tieben , Matthew Kusz , Christian Andersen , Huaping Wang , Michael Cisewski , Michael L. Johnson , David L. Halbmaier , John Lystad
IPC分类号： B65D85/48
CPC分类号： B65D85/48 , G03F1/66 , H01L21/67353 , H01L21/67359 , H01L21/67383 , H01L21/67386
摘要： A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.
摘要翻译：一个双重安全壳，具有一个外舱和一个内舱，提供支撑结构和环境控制装置。内部容器包括具有平坦的抛光表面的基部，该表面具有突出部，所述掩模版位于所述底部上并且在所述掩模版和抛光表面之间提供间隙。该间隙将掩模版与基底的平坦抛光表面分开，并且其尺寸被设计成抑制颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。内部容器的顶盖位于靠近基座周边的抛光表面上。内部容器的顶盖上的可移动的标线接合销与外部容器的顶盖接合，当内部容器组装在外部容器内部时，提供掩模版限制。

2. 发明申请

US20080204680A1 PURGE SYSTEM FOR A SUBSTRATE CONTAINER 有权
标题翻译：用于基底容器的灌装系统
公开(公告)号：US20080204680A1
公开(公告)日：2008-08-28
申请号：US12039700
申请日：2008-02-28
申请人： Anthony Mathius Tieben , David L. Halbmaier , Steven P. Kolbow
发明人： Anthony Mathius Tieben , David L. Halbmaier , Steven P. Kolbow
IPC分类号： G03B27/52
CPC分类号： H01L21/67353 , H01L21/67017 , H01L21/67359 , H01L21/67386 , H01L21/67393 , Y10S414/14
摘要： A purging station with a substrate container receiving zone having at least one upwardly extending purging nozzle. The nozzle has a circular engaging lip. The substrate container has support means for at least one substrate and a purge port assembly that includes an externally facing sealing flange facing downward from the container. The sealing flange has a central aperture and a cantilevered flange portion that engages with the circular engaging lip of the nozzle. The weight of the substrate container on the nozzle carried by the canilevered portion of the flange causes bending of the flange for a resilient soft seal.
摘要翻译：具有基板容器接收区域的清洗站具有至少一个向上延伸的清洗喷嘴。喷嘴具有圆形的接合唇缘。衬底容器具有用于至少一个衬底和吹扫口组件的支撑装置，该清洗口组件包括面向下从容器向外的密封凸缘。密封凸缘具有中心孔和与喷嘴的圆形接合唇接合的悬臂凸缘部分。由凸缘的装载部分承载的喷嘴上的基底容器的重量导致凸缘的弯曲，用于弹性软密封。

3. 发明授权

US08231005B2 Reticle pod 有权
标题翻译：标线荚
公开(公告)号：US08231005B2
公开(公告)日：2012-07-31
申请号：US12088120
申请日：2006-09-27
申请人： Steven P. Kolbow , Kevin McMullen , Anthony Mathius Tieben , Matthew Kusz , Christian Andersen , Huaping Wang , Michael Cisewski , Michael L. Johnson , David L. Halbmaier , John Lystad
发明人： Steven P. Kolbow , Kevin McMullen , Anthony Mathius Tieben , Matthew Kusz , Christian Andersen , Huaping Wang , Michael Cisewski , Michael L. Johnson , David L. Halbmaier , John Lystad
IPC分类号： B65D85/48
CPC分类号： B65D85/48 , G03F1/66 , H01L21/67353 , H01L21/67359 , H01L21/67383 , H01L21/67386
摘要： A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint. Dual containment pod embodiment provides further isolation and protection.
摘要翻译：提供支撑结构和环境控制装置的容器包括例如与其中包含的晶片或掩模版的最小接触，其与晶片或掩模版配合以提供扩散屏障，以抵抗沉淀在晶片或掩模版的表面上的颗粒。该容器包括具有平坦抛光表面的底座，该表面具有突起，晶片或标线贴在其上。这些突起具有几何形状，例如球体，其赋予与晶片或掩模版的最小接触，并且将晶片或掩模版悬挂在基座上，从而在其间提供间隙。间隙将晶片或掩模版与基底的平坦抛光表面隔离，但其尺寸设计成抑制颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。扩散过滤器提供压力平衡，无需过滤介质。顶盖上的可移动的分划板针可提供掩模版限制。双重安全壳实施例提供进一步的隔离和保护。

4. 发明授权

US08727125B2 Substrate container with fluid-sealing flow passageway 有权
标题翻译：具有流体密封流动通道的基板容器
公开(公告)号：US08727125B2
公开(公告)日：2014-05-20
申请号：US12026336
申请日：2008-02-05
申请人： Anthony Mathius Tieben , John Lystad , David L. Halbmaier
发明人： Anthony Mathius Tieben , John Lystad , David L. Halbmaier
IPC分类号： B65B31/04
CPC分类号： H01L21/67017 , H01L21/67126 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67769
摘要： A substrate container includes an enclosure and an access structure formed in the enclosure and providing fluid access through the enclosure to an interior of the substrate container. The access structure includes an opening and an inner surface. A grommet is situated against the inner surface of the access structure.
摘要翻译：衬底容器包括外壳和形成在外壳中的进入结构，并且通过外壳提供流体进入到基底容器的内部。进入结构包括开口和内表面。索环位于接近结构的内表面上。

5. 发明申请

US20080121560A1 SUBSTRATE CONTAINER WITH FLUID-SEALING FLOW PASSAGEWAY 有权
标题翻译：具有流体密封流动通道的基座容器
公开(公告)号：US20080121560A1
公开(公告)日：2008-05-29
申请号：US12026336
申请日：2008-02-05
申请人： Anthony Mathius Tieben , John Lystad , David L. Halbmaier
发明人： Anthony Mathius Tieben , John Lystad , David L. Halbmaier
IPC分类号： H01L21/677 , B65B31/04
CPC分类号： H01L21/67017 , H01L21/67126 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67769
摘要： A substrate container includes an enclosure and an access structure formed in the enclosure and providing fluid access through the enclosure to an interior of the substrate container. The access structure includes an opening and an inner surface. A grommet is situated against the inner surface of the access structure.
摘要翻译：衬底容器包括外壳和形成在外壳中的进入结构，并且通过外壳提供流体进入到基底容器的内部。进入结构包括开口和内表面。索环位于接近结构的内表面上。

6. 发明授权

US07328727B2 Substrate container with fluid-sealing flow passageway 有权
标题翻译：具有流体密封流动通道的基板容器
公开(公告)号：US07328727B2
公开(公告)日：2008-02-12
申请号：US11108619
申请日：2005-04-17
申请人： Anthony Mathius Tieben , John Lystad , David L. Halbmaier
发明人： Anthony Mathius Tieben , John Lystad , David L. Halbmaier
IPC分类号： B65B1/20
CPC分类号： H01L21/67017 , H01L21/67126 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67769
摘要： A substrate container includes an enclosure and an access structure formed in the enclosure and providing fluid access through the enclosure to an interior of the substrate container. The access structure includes an opening and an inner surface. A grommet is situated against the inner surface of the access structure.
摘要翻译：衬底容器包括外壳和形成在外壳中的进入结构，并且通过外壳提供流体进入到基底容器的内部。进入结构包括开口和内表面。索环位于接近结构的内表面上。

7. 发明申请

US20090301917A1 RETICLE POD 有权
公开(公告)号：US20090301917A1
公开(公告)日：2009-12-10
申请号：US12088120
申请日：2006-09-27
申请人： Steven Kolbow , Kevin McMullen , Anthony M. Tieben , Matthew Kusz , Christian Andersen , Huaping Wang , Michael Cisewski , Michael L. Johnson , David L. Halbmaier , John Lystad
发明人： Steven Kolbow , Kevin McMullen , Anthony M. Tieben , Matthew Kusz , Christian Andersen , Huaping Wang , Michael Cisewski , Michael L. Johnson , David L. Halbmaier , John Lystad
IPC分类号： B65D85/48
CPC分类号： B65D85/48 , G03F1/66 , H01L21/67353 , H01L21/67359 , H01L21/67383 , H01L21/67386
摘要： A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint. Dual containment pod embodiment provides further isolation and protection.
摘要翻译：提供支撑结构和环境控制装置的容器包括例如与其中包含的晶片或掩模版的最小接触，其与晶片或掩模版配合以提供扩散屏障，以抵抗沉淀在晶片或掩模版的表面上的颗粒。该容器包括具有平坦抛光表面的底座，该表面具有突起，晶片或标线贴在其上。这些突起具有几何形状，例如球体，其赋予与晶片或掩模版的最小接触，并且将晶片或掩模版悬挂在基座上，从而在其间提供间隙。间隙将晶片或掩模版与基底的平坦抛光表面隔离，但其尺寸设计成抑制颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。扩散过滤器提供压力平衡，无需过滤介质。顶盖上的可移动的分划板针可提供掩模版限制。双重安全壳实施例提供进一步的隔离和保护。

8. 发明授权

US07325698B2 Wafer container door with particulate collecting structure 失效
标题翻译：晶圆集装箱门采用颗粒收集结构
公开(公告)号：US07325698B2
公开(公告)日：2008-02-05
申请号：US11108620
申请日：2005-04-17
申请人： David L. Halbmaier
发明人： David L. Halbmaier
IPC分类号： B65D45/16 , B65D51/24 , B65D85/86 , B65D25/54 , B65D85/30
CPC分类号： H01L21/67373 , H01L21/67393 , Y10S206/832
摘要： A substrate container having an enclosure with an access opening for inserting and removing substrates into an interior of the enclosure and a door chassis that is configured to selectively enclose the opening, the door chassis comprising a first wall having a peripheral wall extending therefrom. The substrate container includes a latch mechanism that is operably coupled with the chassis, the latch mechanism configured to operably secure the chassis to the opening. The door of the substrate container includes a textured particle capture region wherein particles generated by the latch mechanism and elsewhere are captured by the particle capture region.
摘要翻译：一种具有外壳的基板容器，该外壳具有用于将基板插入和移除到外壳的内部的进入开口，以及构造成选择性地封闭开口的门框架，该门框架包括具有从其延伸的周壁的第一壁。基板容器包括与底盘可操作地联接的闩锁机构，闩锁机构构造成将底盘可操作地固定到开口。基板容器的门包括织构化的颗粒捕获区域，其中由闩锁机构和其他地方产生的颗粒被颗粒捕获区捕获。

9. 发明授权

US07216655B2 Wafer container washing apparatus 有权
标题翻译：晶圆容器清洗设备
公开(公告)号：US07216655B2
公开(公告)日：2007-05-15
申请号：US10282924
申请日：2002-10-29
申请人： David L. Halbmaier , Barry Gregerson
发明人： David L. Halbmaier , Barry Gregerson
IPC分类号： B08B3/02
CPC分类号： H01L21/67051 , B08B3/02 , B08B9/08 , B08B9/093 , Y10S134/902
摘要： A semi-conductor handling equipment cleaning method and apparatus are configured for use with wafer carriers. The cleaning apparatus comprises a base portion having first and second apertures and configured to support the wafer carrier in sealing contact about the first aperture. A first fluidic circuit introduces a first cleaning fluid to the inner surface of the carrier and a second fluidic circuit introduces a second cleaning fluid to the outer surface of the carrier. The carrier forms a barrier with the base so that the cleaning media is isolated so as to substantially prevent the second fluid from communicating with the first fluid. An optional door cleaning assembly comprises a rotational housing, a shaft disposed in the housing and a door receiving assembly rotatably disposed on the shaft and within the housing and securably receives the door and forms a fluid-tight seal between the door and the door receiving assembly.
摘要翻译：半导体处理设备清洁方法和设备被配置为与晶片载体一起使用。清洁装置包括具有第一和第二孔的基部，并且构造成支撑晶片载体围绕第一孔密封接触。第一流体回路将第一清洗流体引入载体的内表面，第二流体回路将第二清洗流体引入载体的外表面。载体与基底形成屏障，使得清洁介质被隔离，以便基本上防止第二流体与第一流体连通。可选的门清洁组件包括旋转壳体，设置在壳体中的轴和可旋转地设置在轴上并在壳体内的门接收组件，并且可安全地容纳门并在门和门接收组件之间形成流体密封。

10. 发明申请

US20110114129A1 METHODS AND APPARATUSES FOR CONTROLLING CONTAMINATION OF SUBSTRATES 审中-公开
标题翻译：控制基质污染的方法和装置
公开(公告)号：US20110114129A1
公开(公告)日：2011-05-19
申请号：US12809049
申请日：2008-12-18
申请人： Oleg P. Kishkovich , David L. Halbmaier , Anatoly Grayfer
发明人： Oleg P. Kishkovich , David L. Halbmaier , Anatoly Grayfer
IPC分类号： B08B9/00 , A47L9/00 , B65D85/00
CPC分类号： H01L21/67769 , H01L21/67017
摘要： Components, systems, and methods for maintaining an extremely dry environment within substrate containers formed of polymers provides supplemental exterior gas washing of the substrate container to minimize permeation of moisture and oxygen through the polymer walls of the container and to control desorption of water entrapped in the polymer walls of the container.
摘要翻译：用于在由聚合物形成的基底容器内维持极端干燥的环境的组件，系统和方法提供了衬底容器的补充外部气体洗涤，以最小化湿气和氧气通过容器的聚合物壁的渗透，并且控制包埋在容器中的水的解吸附容器的聚合物壁。

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