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1. 发明授权

US06770879B1 Motion picture output from electron microscope 有权
标题翻译：电子显微镜的电影输出
公开(公告)号：US06770879B1
公开(公告)日：2004-08-03
申请号：US10386815
申请日：2003-03-12
申请人： Amir Azordegan , Christopher Bevis , Bharat Marathe , David R. Bakker
发明人： Amir Azordegan , Christopher Bevis , Bharat Marathe , David R. Bakker
IPC分类号： H01J37256
CPC分类号： H01J37/28 , H01J37/22
摘要： An apparatus for recording a series of images of a sample over a period of time while varying at least one image parameter. An electron microscope captures images of the sample and also varies the at least one image parameter. A controller triggers the electron microscope to sense multiple images of the sample and also controls the electron microscope to vary the at least one image parameter. An image recorder receives the sensed multiple images and also stores the sensed multiple images as the series of images. A display unit displays the series of images.
摘要翻译：一种用于在一段时间内记录一系列图像的装置，同时改变至少一个图像参数。电子显微镜捕获样品的图像并且还改变至少一个图像参数。控制器触发电子显微镜以感测样品的多个图像，并且还控制电子显微镜来改变至少一个图像参数。图像记录器接收感测的多个图像，并且还将所感测的多个图像存储为一系列图像。显示单元显示一系列图像。

2. 发明授权

US06815675B1 Method and system for e-beam scanning 失效
标题翻译：电子束扫描的方法和系统
公开(公告)号：US06815675B1
公开(公告)日：2004-11-09
申请号：US10426665
申请日：2003-04-30
申请人： Gian Francesco Lorusso , Luca Grella , Douglas K. Masnaghetti , Amir Azordegan
发明人： Gian Francesco Lorusso , Luca Grella , Douglas K. Masnaghetti , Amir Azordegan
IPC分类号： G01N2300
CPC分类号： G01N23/2251 , H01J2237/004 , H01J2237/28
摘要： The disclosure relates to a method and system of electron beam scanning for measurement, inspection or review. In accordance with one embodiment, the method includes a first scan on a region to collect first image data. The first image data is processed to determine information about a feature in the region. A scanning method is selected for imaging the feature. A second scan using the selected scanning method on the feature is then applied to collect second image data.
摘要翻译：本公开涉及用于测量，检查或审查的电子束扫描的方法和系统。根据一个实施例，该方法包括在收集第一图像数据的区域上的第一扫描。处理第一图像数据以确定关于该区域中的特征的信息。选择扫描方法来成像该特征。然后应用使用所选择的扫描方法对该特征进行的第二次扫描来收集第二图像数据。

3. 发明授权

US07423269B1 Automated feature analysis with off-axis tilting 有权
标题翻译：带离轴倾斜的自动特征分析
公开(公告)号：US07423269B1
公开(公告)日：2008-09-09
申请号：US11360325
申请日：2006-02-22
申请人： Amir Azordegan , Hedong Yang , Gongyuan Qu , Gian Francesco Lorusso
发明人： Amir Azordegan , Hedong Yang , Gongyuan Qu , Gian Francesco Lorusso
IPC分类号： G21K7/00 , G21N23/00
CPC分类号： H01J37/222 , G03F7/70625 , H01J37/1478 , H01J37/28 , H01J2237/24578 , H01J2237/2809 , H01J2237/2817
摘要： One embodiment relates to a method of automated microalignment using off-axis beam tilting. Image data is collected from a region of interest on a substrate at multiple beam tilts. Potential edges of a feature to be identified in the region are determined, and computational analysis of edge-related data is performed to positively identify the feature(s). Another embodiment relates to a method of automated detection of undercut on a feature using off-axis beam tilting. For each beam tilt, a determination is made of difference data between the edge measurement of one side and the edge measurement of the other side. An undercut on the feature is detected from the difference data. Other embodiments are also disclosed.
摘要翻译：一个实施例涉及使用离轴光束倾斜的自动微距对准方法。在多个光束倾斜的基底上从感兴趣的区域收集图像数据。确定要在该区域中识别的特征的潜在边缘，并且执行边缘相关数据的计算分析以肯定地识别特征。另一实施例涉及使用离轴光束倾斜在特征上自动检测底切的方法。对于每个光束倾斜，确定一侧的边缘测量与另一侧的边缘测量之间的差数据。根据差异数据检测该特征的底切。还公开了其他实施例。

4. 发明授权

US07015468B1 Methods of stabilizing measurement of ArF resist in CD-SEM 有权
标题翻译：在CD-SEM中稳定测定ArF抗蚀剂的方法
公开(公告)号：US07015468B1
公开(公告)日：2006-03-21
申请号：US10807899
申请日：2004-03-24
申请人： Amir Azordegan , Gian Francesco Lorusso , Ananthanarayanan Mohan , Mark Neil , Waiman Ng , Srini Vedula
发明人： Amir Azordegan , Gian Francesco Lorusso , Ananthanarayanan Mohan , Mark Neil , Waiman Ng , Srini Vedula
IPC分类号： H01J37/26 , G01N23/225
CPC分类号： G03F7/70625 , H01J2237/2067 , H01J2237/2817
摘要： A method of improving stability for CD-SEM measurements of photoresist, in particular 193 nm photoresist, and of reducing shrinkage of 193 nm photoresist during CD-SEM measurements.The photoresist is exposed to a dose of electrons or other stabilizing beam prior to or during CD measurement. One embodiment of the invention includes multiplexing of the SEM electron beam.
摘要翻译：提高光刻胶，特别是193nm光致抗蚀剂的CD-SEM测量的稳定性的方法，以及在CD-SEM测量期间减小193nm光致抗蚀剂的收缩的方法。在CD测量之前或期间，光致抗蚀剂暴露于一定量的电子或其他稳定光束。本发明的一个实施例包括SEM电子束的多路复用。

5. 发明授权

US07173243B1 Non-feature-dependent focusing 有权
标题翻译：非特征相关聚焦
公开(公告)号：US07173243B1
公开(公告)日：2007-02-06
申请号：US11020586
申请日：2004-12-22
申请人： Hedong Yang , Amir Azordegan
发明人： Hedong Yang , Amir Azordegan
IPC分类号： G01R31/305
CPC分类号： H01J37/21 , G01R31/305 , H01J37/28 , H01J2237/216
摘要： One embodiment disclosed relates to an automated process for focusing a charged-particle beam in an apparatus onto an area of a substrate. A focusing parameter of the apparatus is set to a value, and intensity data is acquired from the area. The foregoing setting and acquiring steps are repeated for a range of values for the focusing parameter. A focusing sharpness measure is computed for each value of the focusing parameter based on noise in the acquired intensity data, and an in-focus value is determined for the focusing parameter based on the computed focusing sharpness measures. The focusing parameter of the apparatus may be, for example, an objective lens current, or a substrate bias voltage. The computation of the noise-based focusing sharpness measure may involve generating shifted or interleaved signals and calculating correlations between these signals. The focusing may be advantageously performed on an area lacking substantial edge information.
摘要翻译：公开的一个实施例涉及用于将装置中的带电粒子束聚焦到基板的区域上的自动化方法。将该装置的聚焦参数设置为一个值，并从该区域获取强度数据。对于聚焦参数的值的范围重复上述设置和获取步骤。基于所获取的强度数据中的噪声，针对聚焦参数的每个值计算聚焦锐度度量，并且基于所计算的聚焦锐度度量确定聚焦参数的聚焦值。该装置的聚焦参数可以是例如物镜电流或衬底偏置电压。基于噪声的聚焦清晰度测量的计算可以涉及产生移位或交织的信号并且计算这些信号之间的相关性。可以有利地在缺少实质边缘信息的区域上进行聚焦。

6. 发明授权

US07405402B1 Method and apparatus for aberration-insensitive electron beam imaging 有权
标题翻译：用于像差不敏感电子束成像的方法和装置
公开(公告)号：US07405402B1
公开(公告)日：2008-07-29
申请号：US11360930
申请日：2006-02-22
申请人： Srinivas Vedula , Amir Azordegan , Laurence Hordon , Alan D. Brodie , Gian Francesco Lorusso , Takuji Tada
发明人： Srinivas Vedula , Amir Azordegan , Laurence Hordon , Alan D. Brodie , Gian Francesco Lorusso , Takuji Tada
IPC分类号： G01N23/00 , G21K7/00 , H01J3/14
CPC分类号： G01N23/04 , H01J37/21 , H01J37/28 , H01J2237/0492 , H01J2237/153 , H01J2237/2817
摘要： One embodiment relates to an electron beam apparatus for automated imaging of a substrate surface. An electron source is configured to emit electrons, and a gun lens is configured to focus the electrons emitted by the electron source so as to form an electron beam. A condenser lens system is configured to receive the electron beam and to reduce its numerical aperture to an ultra-low numerical aperture. An objective lens is configured to focus the ultra-low numerical aperture beam onto the substrate surface. Other embodiments are also disclosed.
摘要翻译：一个实施例涉及用于衬底表面的自动成像的电子束装置。电子源被配置为发射电子，并且枪形透镜被配置为聚焦由电子源发射的电子以形成电子束。聚光透镜系统被配置为接收电子束并且将其数值孔径减小到超低数值孔径。物镜被配置为将超低数值孔径光束聚焦到衬底表面上。还公开了其他实施例。

7. 发明授权

US07276690B1 Method and system for e-beam scanning 有权
标题翻译：电子束扫描的方法和系统
公开(公告)号：US07276690B1
公开(公告)日：2007-10-02
申请号：US10911216
申请日：2004-08-04
申请人： Gian Francesco Lorusso , Luca Grella , Douglas K. Masnaghetti , Amir Azordegan
发明人： Gian Francesco Lorusso , Luca Grella , Douglas K. Masnaghetti , Amir Azordegan
IPC分类号： G01N23/00
CPC分类号： G01N23/2251 , H01J2237/004 , H01J2237/28
摘要： The disclosure relates to a method and system of electron beam scanning for measurement, inspection or review. In accordance with one embodiment, the method includes a first scan on a region to collect first image data. The first image data is processed to determine information about a feature in the region. A scanning method is selected for imaging the feature. A second scan using the selected scanning method on the feature is then applied to collect second image data.
摘要翻译：本公开涉及用于测量，检查或审查的电子束扫描的方法和系统。根据一个实施例，该方法包括在收集第一图像数据的区域上的第一扫描。处理第一图像数据以确定关于该区域中的特征的信息。选择扫描方法来成像该特征。然后应用使用所选择的扫描方法对特征进行的第二次扫描来收集第二图像数据。

8. 发明授权

US06995369B1 Scanning electron beam apparatus and methods of processing data from same 有权
标题翻译：扫描电子束装置及其处理数据的方法
公开(公告)号：US06995369B1
公开(公告)日：2006-02-07
申请号：US10876833
申请日：2004-06-24
申请人： Matthew Lent , Amir Azordegan , Hedong Yang
发明人： Matthew Lent , Amir Azordegan , Hedong Yang
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G06T5/002 , G06T5/50 , G06T2207/10061 , H01J37/222
摘要： One embodiment disclosed relates to a scanning electron beam apparatus. The apparatus includes an electron beam column, a scanning system, and a detection system. Circuitry in the apparatus is configured to store detected pixel data from each scan into one of the multiple frame buffers. A multi-frame data processor is configured to analyze the pixel data available in the multiple frame buffers. Another embodiment disclosed relates to a scanning electron beam apparatus having a data processor is configured to process the image data with a filter function having a filter strength, store results of the processing, and repeat the processing and the storing using various filter strengths. The results of the processing may comprise a critical dimension measurement at each filter strength.
摘要翻译：公开的一个实施例涉及一种扫描电子束装置。该装置包括电子束柱，扫描系统和检测系统。设备中的电路被配置为将来自每个扫描的检测到的像素数据存储到多个帧缓冲器之一中。多帧数据处理器被配置为分析在多帧缓冲器中可用的像素数据。所公开的另一实施例涉及一种具有数据处理器的扫描电子束装置，其配置为利用具有滤波强度的滤波器功能处理图像数据，存储处理结果，并且使用各种滤波器强度重复处理和存储。处理的结果可以包括在每个过滤器强度下的临界尺寸测量。

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