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1. 发明申请

US20100182589A1 SPECTRAL DETECTION METHOD AND DEVICE, AND DEFECT INSPECTION METHOD AND APPARATUS USING THE SAME 有权
标题翻译：光谱检测方法和装置，以及缺陷检查方法和使用其的装置
公开(公告)号：US20100182589A1
公开(公告)日：2010-07-22
申请号：US12626963
申请日：2009-11-30
申请人： Takenori HIROSE , Minoru Yoshida , Hideaki Sasazawa , Yasuhiro Yoshitake
发明人： Takenori HIROSE , Minoru Yoshida , Hideaki Sasazawa , Yasuhiro Yoshitake
IPC分类号： G01J3/08 , G01J3/00
CPC分类号： G01J3/02 , G01B2210/56 , G01J3/0208 , G01J3/021 , G01J3/0229 , G01N21/95607
摘要： In spectral detection for detecting the shape of repeating pattern structures uniformly formed on a surface of a test object, it is advantageous to use light having a wide wavelength range in a short wavelength region. However, it is not easy to realize a relatively simple optical system capable of spectral detection of light having a wide wavelength range in a short wavelength region, namely in ultraviolet region. The present invention provides an inspection apparatus for detecting pattern defects. The inspection apparatus includes a spectral detection optical system capable of spectral detection of light in a wavelength range from deep ultraviolet to near infrared. The spectral detection optical system includes a spatially partial mirror serving as a half mirror and a reflecting objective provided with an aperture stop for limiting the angle and direction of light to be applied to and reflected by a test object.
摘要翻译：在用于检测在测试对象的表面上均匀形成的重复图案结构的形状的光谱检测中，有利的是在短波长范围内使用宽波长范围的光。然而，实现能够在短波长区域即紫外线区域中具有宽波长范围的光的光谱检测的相对简单的光学系统是不容易的。本发明提供一种用于检测图案缺陷的检查装置。检查装置包括能够对从深紫外线到近红外线的波长范围内的光进行光谱检测的光谱检测光学系统。光谱检测光学系统包括用作半反射镜的空间部分反射镜和设置有孔径光阑的反射物镜，该孔径光阑用于限制被施加到测试对象并由被测物体反射的光的角度和方向。

2. 发明授权

US08279431B2 Spectral detection method and device, and defect inspection method and apparatus using the same 有权
标题翻译：光谱检测方法和装置，以及使用其的缺陷检查方法和装置
公开(公告)号：US08279431B2
公开(公告)日：2012-10-02
申请号：US12626963
申请日：2009-11-30
申请人： Takenori Hirose , Minoru Yoshida , Hideaki Sasazawa , Yasuhiro Yoshitake
发明人： Takenori Hirose , Minoru Yoshida , Hideaki Sasazawa , Yasuhiro Yoshitake
IPC分类号： G01N21/00
CPC分类号： G01J3/02 , G01B2210/56 , G01J3/0208 , G01J3/021 , G01J3/0229 , G01N21/95607
摘要： In spectral detection for detecting the shape of repeating pattern structures uniformly formed on a surface of a test object, it is advantageous to use light having a wide wavelength range in a short wavelength region. However, it is not easy to realize a relatively simple optical system capable of spectral detection of light having a wide wavelength range in a short wavelength region, namely in ultraviolet region. The present invention provides an inspection apparatus for detecting pattern defects. The inspection apparatus includes a spectral detection optical system capable of spectral detection of light in a wavelength range from deep ultraviolet to near infrared. The spectral detection optical system includes a spatially partial mirror serving as a half mirror and a reflecting objective provided with an aperture stop for limiting the angle and direction of light to be applied to and reflected by a test object.
摘要翻译：在用于检测在测试对象的表面上均匀形成的重复图案结构的形状的光谱检测中，有利的是在短波长范围内使用宽波长范围的光。然而，实现能够在短波长区域即紫外线区域中具有宽波长范围的光的光谱检测的相对简单的光学系统是不容易的。本发明提供一种用于检测图案缺陷的检查装置。检查装置包括能够对从深紫外线到近红外线的波长范围内的光进行光谱检测的光谱检测光学系统。光谱检测光学系统包括用作半反射镜的空间部分反射镜和设置有孔径光阑的反射物镜，该孔径光阑用于限制被施加到测试对象并由被测物体反射的光的角度和方向。

3. 发明授权

US07969567B2 Method and device for detecting shape of surface of medium 有权
标题翻译：用于检测介质表面形状的方法和装置
公开(公告)号：US07969567B2
公开(公告)日：2011-06-28
申请号：US12482125
申请日：2009-06-10
申请人： Minoru Yoshida , Takenori Hirose , Hideaki Sasazawa , Shigeru Serikawa
发明人： Minoru Yoshida , Takenori Hirose , Hideaki Sasazawa , Shigeru Serikawa
IPC分类号： G01N21/00
CPC分类号： G11B20/1883 , G11B2020/1826 , G11B2220/20 , G11B2220/2516
摘要： A defect generated during a nano-imprint process is inspected by a scatterometry method. The scatterometry method is to illuminate the surface of a medium with light having a plurality of wave lengths by means of a first illuminator through a half mirror and an objective lens and cause light reflected on the medium to be incident on a spectrometer through the objective lens and the half mirror. A second illuminator illuminates a foreign material or scratch on the surface of the medium from an oblique direction with respect to the surface of the medium. Light is scattered from the foreign material or scratch and detected by first and second detectors. The first detector is placed in a direction defining a first elevation angle with the surface of the medium. The second detector is placed in a direction defining a second elevation angle with the surface of the medium. When coordinates of a defect that are obtained by the scatterometry method match coordinates of the foreign material or scratch, an inspection device determines that the defect is not generated during the nano-imprint process. When the matching is negative, the inspection device determines that the defect is generated during the nano-imprint process.
摘要翻译：在纳米压印过程中产生的缺陷通过散射法进行检查。散射方法是通过半反射镜和物镜通过第一照明器照亮具有多个波长的光的介质的表面，并使介质上反射的光通过物镜入射到光谱仪上和半反射镜。第二个照明器相对于介质的表面从倾斜的方向照射介质表面上的异物或划痕。光从异物或划痕散射并由第一和第二检测器检测。第一检测器被放置在与介质表面限定第一仰角的方向上。第二检测器被放置在与介质表面限定第二仰角的方向上。当通过散射测定方法获得的缺陷的坐标与异物或划痕的坐标匹配时，检查装置确定在纳米压印过程中不产生缺陷。当匹配为负时，检查装置确定在纳米压印过程中产生缺陷。

4. 发明申请

US20100098320A1 METHOD AND DEVICE FOR INSPECTING PATTERNED MEDIUM 失效
标题翻译：用于检查图案的方法和装置
公开(公告)号：US20100098320A1
公开(公告)日：2010-04-22
申请号：US12482126
申请日：2009-06-10
申请人： Hideaki SASAZAWA , Takenori Hirose , Minoru Yoshida , Keiya Saito , Shigeru Serikawa
发明人： Hideaki SASAZAWA , Takenori Hirose , Minoru Yoshida , Keiya Saito , Shigeru Serikawa
IPC分类号： G06K9/00
CPC分类号： G11B5/746 , G01B11/24 , G01N21/8851 , G01N21/956 , G11B5/855
摘要： An inspection region is specified using the design information to perform region division for measurement through a scatterometry method. The obtained detection data is classified by pattern into a periodic region and a non-periodic region. A spectroscopic characteristic is detected by an optical sensor to extract features. The extracted features are compared with features stored in a feature map database for each region to evaluate a state of a patterned medium.
摘要翻译：使用设计信息指定检查区域，以通过散射法进行测量的区域划分。所获得的检测数据通过图案分类为周期性区域和非周期性区域。通过光学传感器检测光谱特性以提取特征。将提取的特征与存储在每个区域的特征图数据库中的特征进行比较，以评估图案化介质的状态。

5. 发明授权

US08411928B2 Scatterometry method and device for inspecting patterned medium 失效
标题翻译：用于检查图案化介质的散射法和装置
公开(公告)号：US08411928B2
公开(公告)日：2013-04-02
申请号：US12482126
申请日：2009-06-10
申请人： Hideaki Sasazawa , Takenori Hirose , Minoru Yoshida , Keiya Saito , Shigeru Serikawa
发明人： Hideaki Sasazawa , Takenori Hirose , Minoru Yoshida , Keiya Saito , Shigeru Serikawa
IPC分类号： G06K9/00
CPC分类号： G11B5/746 , G01B11/24 , G01N21/8851 , G01N21/956 , G11B5/855
摘要： An inspection region is specified using the design information to perform region division for measurement through a scatterometry method. The obtained detection data is classified by pattern into a periodic region and a non-periodic region. A spectroscopic characteristic is detected by an optical sensor to extract features. The extracted features are compared with features stored in a feature map database for each region to evaluate a state of a patterned medium.
摘要翻译：使用设计信息指定检查区域，以通过散射法进行测量的区域划分。所获得的检测数据通过图案分类为周期性区域和非周期性区域。通过光学传感器检测光谱特性以提取特征。将提取的特征与存储在每个区域的特征图数据库中的特征进行比较，以评估图案化介质的状态。

6. 发明授权

US08736830B2 Pattern inspection device of substrate surface and pattern inspection method of the same 有权
标题翻译：基板表面图案检查装置及图案检验方法相同
公开(公告)号：US08736830B2
公开(公告)日：2014-05-27
申请号：US13145968
申请日：2009-12-10
申请人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
发明人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
IPC分类号： G01N21/00
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译：提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

7. 发明申请

US20120013890A1 PATTERN INSPECTION DEVICE OF SUBSTRATE SURFACE AND PATTERN INSPECTION METHOD OF THE SAME 有权
标题翻译：基板表面图案检测装置及其图案检测方法
公开(公告)号：US20120013890A1
公开(公告)日：2012-01-19
申请号：US13145968
申请日：2009-12-10
申请人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
发明人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
IPC分类号： G01N21/956 , G01N21/47
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译：提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

8. 发明授权

US08253935B2 Disk surface inspection apparatus, inspection system thereof, and inspection method thereof 失效
标题翻译：磁盘表面检查装置及其检查系统及其检查方法
公开(公告)号：US08253935B2
公开(公告)日：2012-08-28
申请号：US12694297
申请日：2010-01-27
申请人： Tatsuo Hariyama , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
发明人： Tatsuo Hariyama , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/9506
摘要： The invention has a function of preparing a data base for a relation between a defect shape and an arrangement for the optical system capable of detecting the shape at high sensitivity and automatically adjusting the arrangement for the optical system. As the method of preparing the data base, a method of using optical simulation or an experimental method of using a sample having an optical shape is applied. A pinhole position and a beam size are adjusted automatically so as to attain the optimal arrangement for the optical system to an inputted defect shape based on the data base.
摘要翻译：本发明具有为能够以高灵敏度检测形状并自动调整光学系统的配置的光学系统的缺陷形状和布置之间的关系的准备数据库的功能。作为准备数据库的方法，应用使用光学模拟的方法或使用具有光学形状的样本的实验方法。自动调整针孔位置和光束尺寸，以便根据数据库为光学系统达到输入缺陷形状的最佳布置。

9. 发明申请

US20090190123A1 METHOD AND APPARATUS FOR DETECTING DEFECTS ON A DISK SURFACE 有权
标题翻译：用于检测磁盘表面缺陷的方法和装置
公开(公告)号：US20090190123A1
公开(公告)日：2009-07-30
申请号：US12359388
申请日：2009-01-26
申请人： Tatsuo HARIYAMA , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
发明人： Tatsuo HARIYAMA , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
IPC分类号： G01N21/88 , G06F15/00
CPC分类号： G01N21/8922 , G01N21/9501 , G01N21/9506 , G01N2021/8825 , G01N2021/8854
摘要： The present invention relates to an apparatus for detecting defects on a disk surface which projects light on the disk surface by a light transmitting system, receives specula reflection light and scattered light by a light receiving system, exposes defects by performing a two-dimensional frequency filter process on a signal, and performs a defect determination process to extract a linear-shaped isolative defect candidate. Next, the present invention performs a periodicity determination process to classify and detect the periodically generated linear and circular arc defects and the isolatively generated linear and circular arc defects.
摘要翻译：本发明涉及一种用于检测由透光系统在光盘表面上投射光的盘表面上的缺陷的装置，通过光接收系统接收镜反射光和散射光，通过执行二维频率滤波器来暴露缺陷对信号进行处理，并且执行缺陷确定处理以提取线性形状的隔离缺陷候选。接下来，本发明执行周期性确定处理，以分类和检测周期性产生的线性和圆弧缺陷以及隔离产生的线性和圆弧缺陷。

10. 发明授权

US06631547B2 Manufacturing method for thin film magnetic heads 失效
标题翻译：薄膜磁头制造方法
公开(公告)号：US06631547B2
公开(公告)日：2003-10-14
申请号：US09778776
申请日：2001-02-08
申请人： Minoru Yoshida , Hideaki Sasazawa , Toshihiko Nakata , Minoru Yamasaka
发明人： Minoru Yoshida , Hideaki Sasazawa , Toshihiko Nakata , Minoru Yamasaka
IPC分类号： G11B5127
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/3166 , G11B5/3173 , G11B2005/3996 , Y10T29/49004 , Y10T29/49025 , Y10T29/49032 , Y10T29/49036 , Y10T29/49048 , Y10T29/49131
摘要： To measure positions of a plurality of thin film magnetic head elements formed in a line on a bar, the quantity of positions of samples in the bar is estimated from the magnetic head elements the amount of deviation in position of the next element, and the distance between the elements are obtained, and the amount of deviation and distance are estimated by a primary approximate linear or several-order approximate curve. The estimated amount and the distance between the elements are moved simultaneously, and an image formed by a lens optical system is photo-converted to an image signal, and dimensions are computed. The conversion step is carried out immediately after movement of the next element and is continuously repeated, and the computing step is processed in parallel with the conversation step.
摘要翻译：为了测量形成在棒上的线中的多个薄膜磁头元件的位置，从磁头元件估计条中样品的位置数量，下一个元件的位置偏差量以及距离获得元素之间的距离，并且通过初级近似线性或几阶近似曲线来估计偏差量和距离。估计的量和元件之间的距离同时移动，并且由透镜光学系统形成的图像被光转换成图像信号，并且计算尺寸。转换步骤在下一个元素的移动之后立即执行并且被连续地重复，并且计算步骤与对话步骤并行处理。

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