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1. 发明申请

US20070109557A1 Method for optically detecting height of a specimen and charged particle beam apparatus using the same 有权
标题翻译：用于光学检测样品的高度的方法和使用其的带电粒子束装置的方法
公开(公告)号：US20070109557A1
公开(公告)日：2007-05-17
申请号：US11591563
申请日：2006-11-02
申请人： Keiya Saito , Masahiro Watanabe , Yasuhiro Yoshitake
发明人： Keiya Saito , Masahiro Watanabe , Yasuhiro Yoshitake
IPC分类号： G01B11/24
CPC分类号： G01B11/0608 , H01J37/20 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/20292 , H01J2237/216 , H01J2237/2482 , H01J2237/2817
摘要： The present invention provides an optical height detection method and electron beam apparatus to which the method is applied, in which the focusing accuracy of the CD-SEM apparatus, a SEM inspection apparatus, and others is improved by reducing detection errors and improving detection accuracy so as to improve the accuracy of the optical height detection method, and throughput of a CD-SEM apparatus or others is improved by reducing the processing time of automatic focus control performed based on the detected height according to the optical height detection method. An optical detection optical system projects two-dimensional slit light to a measurement object from diagonally above it, detects the light reflected by the measurement object, converts a detected two-dimensional slit image into an electrical signal by a two-dimensional area sensor, eliminates slit parts having a large detection error from the electrical signal, and detects the height of the measurement object.
摘要翻译：本发明提供了采用该方法的光学高度检测方法和电子束装置，其中通过降低检测误差并提高检测精度来提高CD-SEM装置，SEM检查装置等的聚焦精度为了提高光学高度检测方法的精度，通过根据光学高度检测方法减少基于检测到的高度进行的自动聚焦控制的处理时间来提高CD-SEM装置等的生产量。光学检测光学系统将二维狭缝光从对角线投射到测量对象上，检测由测量对象反射的光，通过二维区域传感器将检测到的二维狭缝图像转换为电信号，消除狭缝部分具有来自电信号的大的检测误差，并且检测测量对象的高度。

2. 发明授权

US07599076B2 Method for optically detecting height of a specimen and charged particle beam apparatus using the same 有权
标题翻译：用于光学检测样品的高度的方法和使用其的带电粒子束装置的方法
公开(公告)号：US07599076B2
公开(公告)日：2009-10-06
申请号：US11591563
申请日：2006-11-02
申请人： Keiya Saito , Masahiro Watanabe , Yasuhiro Yoshitake
发明人： Keiya Saito , Masahiro Watanabe , Yasuhiro Yoshitake
IPC分类号： G01B11/28
CPC分类号： G01B11/0608 , H01J37/20 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/20292 , H01J2237/216 , H01J2237/2482 , H01J2237/2817
摘要： The present invention provides an optical height detection method and electron beam apparatus to which the method is applied, in which the focusing accuracy of the CD-SEM apparatus, a SEM inspection apparatus, and others is improved by reducing detection errors and improving detection accuracy so as to improve the accuracy of the optical height detection method, and throughput of a CD-SEM apparatus or others is improved by reducing the processing time of automatic focus control performed based on the detected height according to the optical height detection method. An optical detection optical system projects two-dimensional slit light to a measurement object from diagonally above it, detects the light reflected by the measurement object, converts a detected two-dimensional slit image into an electrical signal by a two-dimensional area sensor, eliminates slit parts having a large detection error from the electrical signal, and detects the height of the measurement object.
摘要翻译：本发明提供了采用该方法的光学高度检测方法和电子束装置，其中通过降低检测误差并提高检测精度来提高CD-SEM装置，SEM检查装置等的聚焦精度为了提高光学高度检测方法的精度，通过根据光学高度检测方法减少基于检测到的高度进行的自动聚焦控制的处理时间来提高CD-SEM装置等的生产量。光学检测光学系统将二维狭缝光从对角线投射到测量对象上，检测由测量对象反射的光，通过二维区域传感器将检测到的二维狭缝图像转换为电信号，消除狭缝部分具有来自电信号的大的检测误差，并且检测测量对象的高度。

3. 发明授权

US08982332B2 Distance measuring device and distance measuring method 有权
标题翻译：距离测量装置和距离测量方法
公开(公告)号：US08982332B2
公开(公告)日：2015-03-17
申请号：US13518727
申请日：2011-01-28
申请人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
发明人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
IPC分类号： G01C3/08 , G01S17/36
CPC分类号： G01S17/36 , G01B9/02003 , G01B9/02007 , G01B9/02008 , G01B9/0207 , G01S7/4815 , G01S7/4911 , G01S17/42
摘要： Disclosed is a distance measuring device using an optical comb. In order for the absolute distance to an object to be measured which has a surface with low reflection ratio or a scattering surface and is approximately 10 m apart, to be easily measured with accuracy of 0.1 mm or more using an optical and contactless method, the distance measuring device which measures the distance to the object to be measured is configured such that the distance to the object to be measured is measured by comparing the phase of the beat signal between a light source and a plurality of CW lasers which are reflected or scattered by the object with the phase of the beat signal between the light source and a plurality of CW lasers prior to being irradiated onto the object.
摘要翻译：公开了使用光梳的距离测量装置。为了使具有低反射率或散射面的表面的测量对象的绝对距离相差10微米，使用光学和非接触方法可以容易地测量精度为0.1mm以上，测量到被测量物体的距离的距离测量装置被配置为通过比较反射或散射的光源和多个CW激光器之间的拍频信号的相位来测量到被测量物体的距离在被照射到物体上之前，通过光源和多个CW激光器之间的拍频信号的相位的对象。

4. 发明授权

US08659761B2 Method and apparatus for measuring displacement of a sample using a wire grid polarizer to generate interference light 有权
标题翻译：用于使用线栅偏振器测量样品的位移以产生干涉光的方法和装置
公开(公告)号：US08659761B2
公开(公告)日：2014-02-25
申请号：US13302948
申请日：2011-11-22
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01B9/02057 , G01B9/02003 , G01B9/02081 , G01B2290/30 , G01B2290/70 , G03F7/70775
摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.
摘要翻译：在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。

5. 发明授权

US08064066B2 Method and apparatus for measuring displacement of a sample to be inspected using an interference light 有权
标题翻译：使用干涉光测量被检样品的位移的方法和装置
公开(公告)号：US08064066B2
公开(公告)日：2011-11-22
申请号：US12605089
申请日：2009-10-23
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01B9/02057 , G01B9/02003 , G01B9/02081 , G01B2290/30 , G01B2290/70 , G03F7/70775
摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.
摘要翻译：在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。

6. 发明授权

US08736830B2 Pattern inspection device of substrate surface and pattern inspection method of the same 有权
标题翻译：基板表面图案检查装置及图案检验方法相同
公开(公告)号：US08736830B2
公开(公告)日：2014-05-27
申请号：US13145968
申请日：2009-12-10
申请人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
发明人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
IPC分类号： G01N21/00
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译：提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

7. 发明申请

US20120013890A1 PATTERN INSPECTION DEVICE OF SUBSTRATE SURFACE AND PATTERN INSPECTION METHOD OF THE SAME 有权
标题翻译：基板表面图案检测装置及其图案检测方法
公开(公告)号：US20120013890A1
公开(公告)日：2012-01-19
申请号：US13145968
申请日：2009-12-10
申请人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
发明人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
IPC分类号： G01N21/956 , G01N21/47
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译：提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

8. 发明申请

US20060215171A1 Method and apparatus for measuring displacement of a sample 有权
公开(公告)号：US20060215171A1
公开(公告)日：2006-09-28
申请号：US11188732
申请日：2005-07-26
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01B9/02057 , G01B9/02003 , G01B9/02081 , G01B2290/30 , G01B2290/70 , G03F7/70775
摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.

9. 发明申请

US20090161244A1 Method and apparatus for inspecting defects of patterns formed on a hard disk medium 有权
标题翻译：用于检查形成在硬盘介质上的图案的缺陷的方法和装置
公开(公告)号：US20090161244A1
公开(公告)日：2009-06-25
申请号：US12314938
申请日：2008-12-19
申请人： Takenori Hirose , Masahiro Watanabe , Yasuhiro Yoshitake
发明人： Takenori Hirose , Masahiro Watanabe , Yasuhiro Yoshitake
IPC分类号： G11B27/36
CPC分类号： G11B5/82 , B82Y10/00 , G01N21/55 , G01N21/95607 , G01N2021/95615 , G11B5/743 , G11B5/855 , G11B20/18 , G11B2220/2516
摘要： If an inspection method for inspecting a patterned medium is intended for the nanoimprint process control, it is necessary to measure a correct shape of each pattern element. On the other hand, if the inspection method is intended for the quality control of products, it is necessary to inspect the products on a 100 percent basis. However, the conventional method which uses SEM or AFM could not satisfy these requirements.According to the present invention, 100-percent inspection of products becomes possible by a method including the steps of: irradiating a surface of a hard disk medium, on which a magnetic material pattern is formed, with a light beam including a plurality of wavelengths; detecting the intensity of a reflected light beam from the hard disk medium on a wavelength basis; calculating a spectral reflectance from the detected intensity of the reflected light beam; and detecting a shape of each pattern element formed on the hard disk medium on the basis of the calculated spectral reflectance.
摘要翻译：如果用于检查图案化介质的检查方法用于纳米压印过程控制，则需要测量每个图案元件的正确形状。另一方面，如果检验方法是用于产品的质量控制，则必须以100％的价格检查产品。然而，使用SEM或AFM的常规方法不能满足这些要求。根据本发明，通过包括以下步骤的方法可以对产品进行100％的检查：用包括多个波长的光束照射形成有磁性材料图案的硬盘介质的表面; 以波长为基础检测来自硬盘介质的反射光束的强度; 根据所检测的反射光束的强度计算光谱反射率; 并根据计算出的光谱反射率检测形成在硬盘介质上的每个图形元素的形状。

10. 发明授权

US08148705B2 Method and apparatus for inspecting defects of patterns formed on a hard disk medium 有权
标题翻译：用于检查形成在硬盘介质上的图案的缺陷的方法和装置
公开(公告)号：US08148705B2
公开(公告)日：2012-04-03
申请号：US12314938
申请日：2008-12-19
申请人： Takenori Hirose , Masahiro Watanabe , Yasuhiro Yoshitake
发明人： Takenori Hirose , Masahiro Watanabe , Yasuhiro Yoshitake
IPC分类号： G01N21/86 , G01V8/00
CPC分类号： G11B5/82 , B82Y10/00 , G01N21/55 , G01N21/95607 , G01N2021/95615 , G11B5/743 , G11B5/855 , G11B20/18 , G11B2220/2516
摘要： If an inspection method for inspecting a patterned medium is intended for the nanoimprint process control, it is necessary to measure a correct shape of each pattern element. On the other hand, if the inspection method is intended for the quality control of products, it is necessary to inspect the products on a I00 percent basis. However, the conventional method which uses SEM or AFM could not satisfy these requirements. According to the present invention, IO0-percent inspection of products becomes possible by a method including the steps of: irradiating a surface of a hard disk medium, on which a magnetic material pattern is formed, with a light beam including a plurality of wavelengths; detecting the intensity of a reflected light beam from the hard disk medium on a wavelength basis; calculating a spectral reflectance from the detected intensity of the reflected light beam; and detecting a shape of each pattern element formed on the hard disk medium on the basis of the calculated spectral reflectance.
摘要翻译：如果用于检查图案化介质的检查方法用于纳米压印过程控制，则需要测量每个图案元件的正确形状。另一方面，如果检验方法是为了产品的质量控制，则以百分之百为基础检查产品是必要的。然而，使用SEM或AFM的常规方法不能满足这些要求。根据本发明，通过包括以下步骤的方法可以进行产品的IO0百分比检查：用形成有多个波长的光束照射形成有磁性材料图案的硬盘介质的表面; 以波长为基础检测来自硬盘介质的反射光束的强度; 根据所检测的反射光束的强度计算光谱反射率; 并根据计算出的光谱反射率检测形成在硬盘介质上的每个图形元素的形状。

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