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1. 发明申请

US20090314962A1 METHOD AND APPARATUS FOR CONTROLLING BEAM CURRENT UNIFORMITY IN AN ION IMPLANTER 有权
标题翻译：用于控制离子植入物中光束电流均匀性的方法和装置
公开(公告)号：US20090314962A1
公开(公告)日：2009-12-24
申请号：US12143144
申请日：2008-06-20
申请人： Rajesh DORAI , Peter F. Kurunczi , Alexander S. Perel , Wilhelm P. Platow
发明人： Rajesh DORAI , Peter F. Kurunczi , Alexander S. Perel , Wilhelm P. Platow
IPC分类号： H01J37/08 , G02B5/00
CPC分类号： H01J37/3171 , H01J37/04 , H01J37/08 , H01J37/09 , H01J2237/024 , H01J2237/0455 , H01J2237/08 , H01J2237/083 , H01J2237/0835 , H01J2237/24542
摘要： An electrode assembly for use with an ion source chamber or as part of an ion implanter processing system to provide a uniform ion beam profile. The electrode assembly includes an electrode having an extraction slot with length L aligned with an aperture of the ion source chamber for extracting an ion beam. The electrode includes a plurality of segments partitioned within the length of the extraction slot where each of the segments is configured to be displaced in at least one direction with respect to the ion beam. A plurality of actuators are connected to the plurality of electrode segments for displacing one or more of the segments. By displacing at least one of the plurality of electrode segments, the current density of a portion of the ion beam corresponding to the position of the segment within the extraction slot is modified to provide a uniform current density beam profile associated with the extracted ion beam.
摘要翻译：一种与离子源室一起使用或作为离子注入机处理系统的一部分以提供均匀离子束分布的电极组件。电极组件包括具有长度为L的提取槽的电极，其与用于提取离子束的离子源室的孔径对准。电极包括在提取槽的长度内分隔的多个段，其中每个段被配置为相对于离子束在至少一个方向上移位。多个致动器连接到多个电极段，用于移动一个或多个段。通过移位多个电极段中的至少一个，修改与提取槽内的段的位置相对应的一部分离子束的电流密度，以提供与提取的离子束相关联的均匀的电流密度波束轮廓。

2. 发明申请

US20090314951A1 ION SOURCE CLEANING METHOD AND APPARATUS 有权
标题翻译：离子源清洁方法和装置
公开(公告)号：US20090314951A1
公开(公告)日：2009-12-24
申请号：US12143247
申请日：2008-06-20
申请人： Costel Biloiu , Craig R. Chaney , Eric R. Cobb , Bon-Woong Koo , Wilhelm P. Platow
发明人： Costel Biloiu , Craig R. Chaney , Eric R. Cobb , Bon-Woong Koo , Wilhelm P. Platow
IPC分类号： H01J27/02 , B08B6/00
CPC分类号： H01J37/08 , H01J37/3171 , H01J2237/022 , H01J2237/024 , H01J2237/0458 , H01J2237/061
摘要： In a cleaning process for an ion source chamber, an electrode positioned outside of the ion source chamber includes a suppression plug. When the cleaning gas is introduced into the source chamber, the suppression plug may engage an extraction aperture of the source chamber to adjust the gas pressure within the chamber to enhance chamber cleaning via. plasma-enhanced chemical reaction. The gas conductance between the source chamber aperture and the suppression plug can be adjusted during the cleaning process to provide optimum cleaning conditions and to exhaust unwanted deposits.
摘要翻译：在离子源室的清洁处理中，位于离子源室外的电极包括抑制塞。当清洁气体被引入源室中时，抑制塞可以接合源室的提取孔以调节室内的气体压力以增强室清洁。等离子体增强化学反应。在清洁过程中可以调节源室孔和抑制塞之间的气体传导，以提供最佳的清洁条件并排出不需要的沉积物。

3. 发明授权

US07413596B2 Method and apparatus for the production of purified liquids and vapors 有权
标题翻译：用于生产纯化液体和蒸气的方法和设备
公开(公告)号：US07413596B2
公开(公告)日：2008-08-19
申请号：US10982561
申请日：2004-11-05
申请人： Wilhelm P. Platow , John B. Cracchiolo , Stanislav S. Todorov , Jaime M. Reyes
发明人： Wilhelm P. Platow , John B. Cracchiolo , Stanislav S. Todorov , Jaime M. Reyes
IPC分类号： C02F1/22 , B01D19/00
CPC分类号： C02F1/22 , C02F1/20 , C02F2301/063 , H01J2237/022 , H01J2237/31705
摘要： The present invention provides methods and apparatus for the production of liquids and vapors that are free of, or substantially free of, dissolved or trapped gases. In one embodiment, a liquid is placed in a sealed vessel and subjected to a temperature below the freezing point of the liquid for sufficient time to substantially, if not completely, turn the liquid into a solid. Concurrent with or subsequent to the cooling of the liquid, the interior of the vessel is subjected to a vacuum so as to evacuate all or substantially all of the gaseous atmosphere. Thereafter, the vessel is heated to a temperature above the melting point of the liquid, allowing the frozen material to return to its liquid form or sublimate to form a vapor.
摘要翻译：本发明提供了用于生产不含或基本上不含溶解或捕获的气体的液体和蒸汽的方法和装置。在一个实施方案中，将液体置于密封容器中并经受低于液体凝固点的温度足够的时间以基本上（如果不是完全）将液体转化为固体。与液体冷却同时或之后，容器的内部经受真空，以排出所有或基本上全部的气体气氛。此后，将容器加热到高于液体熔点的温度，使冷冻的材料返回其液体形式或升华以形成蒸气。

4. 发明申请

US20070221871A1 Determining ion beam parallelism using refraction method 有权
$Determining ion beam parallelism using refraction method$
标题翻译：使用折射法确定离子束平行度
公开(公告)号：US20070221871A1
公开(公告)日：2007-09-27
申请号：US11386596
申请日：2006-03-22
申请人： Raymond Callahan , David Olson , Wilhelm P. Platow , Stanislav S. Todorov
发明人： Raymond Callahan , David Olson , Wilhelm P. Platow , Stanislav S. Todorov
IPC分类号： G01N23/00 , G21K5/10
CPC分类号： H01J37/3171 , H01J2237/1501 , H01J2237/24405 , H01J2237/24507 , H01J2237/24542 , H01J2237/2487 , H01J2237/30472 , H01J2237/30477 , H01J2237/31705
摘要： A system, method and program product for determining parallelism of an ion beam using a refraction method, are disclosed. One embodiment includes determining a first test position of the ion beam while not exposing the ion beam to an acceleration/deceleration electrical field, determining a second test position of the ion beam while exposing the ion beam to an acceleration/deceleration electrical field, and determining the parallelism of the ion beam based on the first test position and the second test position. The acceleration/deceleration electrical field acts to refract the ion beam between the two positions when the beam is not parallel, hence magnifying any non-parallelism. The amount of refraction, or lateral shift, can be used to determine the amount of non-parallelism of the ion beam. An ion implanter system and adjustments of the ion implanter system based on the parallelism determination are also disclosed.
摘要翻译：公开了一种使用折射方法确定离子束的平行度的系统，方法和程序产品。一个实施例包括确定离子束的第一测试位置，同时不将离子束暴露于加速/减速电场，确定离子束的第二测试位置，同时将离子束暴露于加速/减速电场，以及确定基于第一测试位置和第二测试位置的离子束的平行度。当光束不平行时，加速/减速电场用于折射两个位置之间的离子束，从而放大任何非平行度。折射量或横向偏移可用于确定离子束的非平行度。还公开了一种离子注入机系统和基于并行度测定的离子注入机系统的调整。

5. 发明授权

US08003959B2 Ion source cleaning end point detection 有权
标题翻译：离子源清洗终点检测
公开(公告)号：US08003959B2
公开(公告)日：2011-08-23
申请号：US12492894
申请日：2009-06-26
申请人： Wilhelm P. Platow , Neil J. Bassom , Peter F. Kurunczi , Alexander S. Perel , Craig R. Chaney
发明人： Wilhelm P. Platow , Neil J. Bassom , Peter F. Kurunczi , Alexander S. Perel , Craig R. Chaney
IPC分类号： H01J37/317 , H01J37/08 , H01J49/10 , H01J27/02 , H01J9/38
CPC分类号： H01J49/10 , H01J27/02 , H01J37/08 , H01J37/3171 , H01J2209/017 , H01J2237/022 , H01J2237/05 , H01J2237/30466
摘要： In an ion implanter, a Faraday cup is utilized to receive an ion beam generated during ion source cleaning. The detected beam has an associated mass spectrum which indicates when the ion source cleaning process is complete. The mass spectrum results in a signal composed of a cleaning agent and the material comprising the ion source. This signal will rise over time as the ion source chamber is being cleaned and will level-off and remain constant once the deposits are etched away from the source chamber, thereby utilizing existing implant tools to determine endpoint detection during ion source cleaning.
摘要翻译：在离子注入机中，法拉第杯用于接收在离子源清洁期间产生的离子束。检测到的光束具有相关联的质谱，其指示何时完成离子源清洁过程。质谱产生由清洁剂和包含离子源的材料组成的信号。当离子源室被清洁时，该信号将随着时间的推移而升高，并且一旦沉积物从源室被蚀刻掉，就会保持恒定，从而利用现有的植入工具确定离子源清洁期间的端点检测。

6. 发明授权

US07888662B2 Ion source cleaning method and apparatus 有权
标题翻译：离子源清洗方法及装置
公开(公告)号：US07888662B2
公开(公告)日：2011-02-15
申请号：US12143247
申请日：2008-06-20
申请人： Costel Biloiu , Craig R. Chaney , Eric R. Cobb , Bon-Woong Koo , Wilhelm P. Platow
发明人： Costel Biloiu , Craig R. Chaney , Eric R. Cobb , Bon-Woong Koo , Wilhelm P. Platow
IPC分类号： H01J37/08
CPC分类号： H01J37/08 , H01J37/3171 , H01J2237/022 , H01J2237/024 , H01J2237/0458 , H01J2237/061
摘要： In a cleaning process for an ion source chamber, an electrode positioned outside of the ion source chamber includes a suppression plug. When the cleaning gas is introduced intothe source chamber, the suppression plug may engage an extraction aperture of the source chamber to adjust the gas pressure within the chamber to enhance chamber cleaning via. plasma-enhanced chemical reaction. The gas conductance between the source chamber aperture and the suppression plug can be adjusted during the cleaning process to provide optimum cleaning conditions and to exhaust unwanted deposits.
摘要翻译：在离子源室的清洁处理中，位于离子源室外的电极包括抑制塞。当清洁气体被引入源室中时，抑制塞可以接合源室的提取孔以调节室内的气体压力以增强室清洁。等离子体增强化学反应。在清洁过程中可以调节源室孔和抑制塞之间的气体传导，以提供最佳的清洁条件并排出不需要的沉积物。

7. 发明授权

US07767986B2 Method and apparatus for controlling beam current uniformity in an ion implanter 有权
标题翻译：用于控制离子注入机中束流均匀性的方法和装置
公开(公告)号：US07767986B2
公开(公告)日：2010-08-03
申请号：US12143144
申请日：2008-06-20
申请人： Rajesh Dorai , Peter F. Kurunczi , Alexander S. Perel , Wilhelm P. Platow
发明人： Rajesh Dorai , Peter F. Kurunczi , Alexander S. Perel , Wilhelm P. Platow
IPC分类号： H01J37/08 , H01J37/15 , H01J27/02
CPC分类号： H01J37/3171 , H01J37/04 , H01J37/08 , H01J37/09 , H01J2237/024 , H01J2237/0455 , H01J2237/08 , H01J2237/083 , H01J2237/0835 , H01J2237/24542
摘要： An electrode assembly for use with an ion source chamber or as part of an ion implanter processing system to provide a uniform ion beam profile. The electrode assembly includes an electrode having an extraction slot with length L aligned with an aperture of the ion source chamber for extracting an ion beam. The electrode includes a plurality of segments partitioned within the length of the extraction slot where each of the segments is configured to be displaced in at least one direction with respect to the ion beam. A plurality of actuators are connected to the plurality of electrode segments for displacing one or more of the segments. By displacing at least one of the plurality of electrode segments, the current density of a portion of the ion beam corresponding to the position of the segment within the extraction slot is modified to provide a uniform current density beam profile associated with the extracted ion beam.
摘要翻译：一种与离子源室一起使用或作为离子注入机处理系统的一部分以提供均匀离子束分布的电极组件。电极组件包括具有长度为L的提取槽的电极，其与用于提取离子束的离子源室的孔径对准。电极包括在提取槽的长度内分隔的多个段，其中每个段被配置为相对于离子束在至少一个方向上移位。多个致动器连接到多个电极段，用于移动一个或多个段。通过移位多个电极段中的至少一个，修改与提取槽内的段的位置相对应的一部分离子束的电流密度，以提供与提取的离子束相关联的均匀的电流密度波束轮廓。

8. 发明授权

US08912976B2 Internal RF antenna with dielectric insulation 有权
标题翻译：内置射频天线，具有绝缘绝缘
公开(公告)号：US08912976B2
公开(公告)日：2014-12-16
申请号：US13612406
申请日：2012-09-12
申请人： Wilhelm P. Platow , Craig R. Chaney
发明人： Wilhelm P. Platow , Craig R. Chaney
IPC分类号： H01Q1/36
CPC分类号： H01J37/3211 , H01J37/32477 , H05H1/46 , H05H2001/4667
摘要： Disclosed is a radio frequency (RF) antenna for plasma ion sources. The RF antenna includes a low-resistance metal tube having an inner and outer diameter. A low friction polymer tube also having an inner and outer diameter surrounds the low-resistance metal tube. The inner diameter of the polymer tube is slightly larger than the outer diameter of the low-resistance metal tube. A pre-formed quartz glass tube encases the low friction polymer tube and low-resistance metal tube. The quartz glass tube is pre-formed in a desired shape. A guide wire is attached inside one end of the low-resistance hollow metal tube. The flexible low friction polymer tube containing the low-resistance metal tubed may then be threaded through the quartz glass tube.
摘要翻译：公开了一种用于等离子体离子源的射频（RF）天线。 RF天线包括具有内径和外径的低电阻金属管。也具有内外径的低摩擦聚合物管围绕低电阻金属管。聚合物管的内径稍微大于低电阻金属管的外径。预制石英玻璃管包裹低摩擦聚合物管和低电阻金属管。石英玻璃管预成形为所需形状。引导线安装在低阻力中空金属管的一端内。含有低电阻金属管的柔性低摩擦聚合物管可以穿过石英玻璃管。

9. 发明授权

US08809800B2 Ion source and a method for in-situ cleaning thereof 有权
公开(公告)号：US08809800B2
公开(公告)日：2014-08-19
申请号：US12533318
申请日：2009-07-31
申请人： Bon-Woong Koo , Christopher R. Campbell , Craig R. Chaney , Robert Lindberg , Wilhelm P. Platow , Alexander S. Perel
发明人： Bon-Woong Koo , Christopher R. Campbell , Craig R. Chaney , Robert Lindberg , Wilhelm P. Platow , Alexander S. Perel
IPC分类号： H01J27/02 , H01J27/14 , H01J37/08 , H01J37/317
CPC分类号： H01J27/022 , H01J27/02 , H01J27/14 , H01J37/08 , H01J37/3002 , H01J37/3171 , H01J2237/022 , H01J2237/31705
摘要： An ion source and method of cleaning are disclosed. One or more heating units are placed in close proximity to the inner volume of the ion source, so as to affect the temperature within the ion source. In one embodiment, one or more walls of the ion source have recesses into which heating units are inserted. In another embodiment, one or more walls of the ion source are constructed of a conducting circuit and an insulating layer. By utilizing heating units near the ion source, it is possible to develop new methods of cleaning the ion source. Cleaning gas is flowed into the ion source, where it is ionized, either by the cathode, as in normal operating mode, or by the heat generated by the heating units. The cleaning gas is able to remove residue from the walls of the ion source more effectively due to the elevated temperature.

10. 发明授权

US08003956B2 Method and apparatus for controlling beam current uniformity in an ion implanter 有权
标题翻译：用于控制离子注入机中束流均匀性的方法和装置
公开(公告)号：US08003956B2
公开(公告)日：2011-08-23
申请号：US12244978
申请日：2008-10-03
申请人： D. Jeffrey Lischer , John (Bon-Woong) Koo , Peter F. Kurunczi , Shardul Patel , Wilhelm P. Platow
发明人： D. Jeffrey Lischer , John (Bon-Woong) Koo , Peter F. Kurunczi , Shardul Patel , Wilhelm P. Platow
IPC分类号： G21K5/10
CPC分类号： H01J37/3171 , H01J37/026 , H01J2237/004 , H01J2237/0041 , H01J2237/006 , H01J2237/047 , H01J2237/182 , H01J2237/188 , H01J2237/24535 , H01J2237/24542 , H01J2237/248 , H01J2237/30438 , H01J2237/30477 , H01J2237/31701 , H01J2237/31703
摘要： An ion implantation system for neutralizing the space charge effect associated with a high current low energy ion beam. The implantation system includes an ion source configured to receive a dopant gas and generate ions having a particular energy and mass from which ions are extracted through an aperture. A work piece positioned downstream of the ion source for receiving the extracted ions in the form of an ion beam. A bleed gas channel disposed between the ion source and the work piece. The bleed gas channel supplying a gas used to neutralize the space charge effect associated with the ion beam.
摘要翻译：一种用于中和与高电流低能量离子束相关的空间电荷效应的离子注入系统。植入系统包括被配置为接收掺杂剂气体并产生具有特定能量和质量的离子的离子源，离子通过孔提取离子。位于离子源下游的工件，用于接收离子束形式的提取的离子。排放气体通道，设置在离子源和工件之间。排出气体通道供应用于中和与离子束相关联的空间电荷效应的气体。

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