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1. 发明公开

US20240194446A1 CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER 审中-公开
公开(公告)号：US20240194446A1
公开(公告)日：2024-06-13
申请号：US18063888
申请日：2022-12-09
申请人： Applied Materials, Inc.
发明人： Linying CUI , James ROGERS , Keith HERNANDEZ , William CHIN , Leonid DORF
IPC分类号： H01J37/32
CPC分类号： H01J37/32155 , H01J37/32128 , H01J37/32568 , H01J2237/024 , H01J2237/24507 , H01J2237/334
摘要： Embodiments of the disclosure include an apparatus and a method for controlling plasma uniformity by controlling plasma density in the bulk plasma over the center region and circumferential edge region of the substrate. Plasma uniformity can be controlled by use of an RF tuning circuit coupled to one of a plurality of electrodes positioned relative to a substrate during plasma processing. By adjusting the electrical characteristics of at least one of the RF tuning circuits, the effect that the generated RF fundamental frequency and related RF harmonic frequencies have on the plasma processing results can be controlled. Beneficially, the use of one or more of the tuning circuits and methods of using the same may be used to provide individual tuning knobs for controlling reactive neutral species concentration, ion energy and angular distribution, ion directionality and directionality uniformity, and separately controlling ion flux and reactive neutral species uniformity across the surface of the substrate.

2. 发明公开

US20240047184A1 PLASMA PROCESSING APPARATUS 审中-公开
公开(公告)号：US20240047184A1
公开(公告)日：2024-02-08
申请号：US18359163
申请日：2023-07-26
申请人： Tokyo Electron Limited
发明人： Kazuki MOYAMA , Yuzuru SAKAI
IPC分类号： H01J37/32
CPC分类号： H01J37/32834 , H01J37/32633 , H01J37/32715 , H01J2237/024
摘要： A plasma processing apparatus includes a plasma processing chamber; a substrate support disposed in the plasma processing chamber; a movable member and a stationary member each disposed around the substrate support, the movable member having a plurality of moving blades, the plurality of moving blades being rotatable, the stationary member having a plurality of stationary blades, the plurality of moving blades and the plurality of stationary blades being alternately disposed along a height direction of the plasma processing chamber, and an exhaust space being formed beneath the movable member and the stationary member; a first driver configured to rotate the movable member; a pressure regulating member movably disposed around the substrate support and above the movable member and the stationary member; and a second driver configured to move the pressure regulating member.

3. 发明公开

US20230369025A1 HIGH PRECISION EDGE RING CENTERING FOR SUBSTRATE PROCESSING SYSTEMS 审中-公开
公开(公告)号：US20230369025A1
公开(公告)日：2023-11-16
申请号：US17912990
申请日：2020-03-23
申请人： LAM RESEARCH CORPORATION
发明人： Hui Ling HAN , Seetharaman RAMACHANDRAN , Marc ESTOQUE
IPC分类号： H01J37/32 , H01L21/68
CPC分类号： H01J37/32642 , H01L21/681 , H01J2237/24578 , H01J2237/024
摘要： An edge ring centering system for a plasma processing system includes a processing chamber including a substrate support and R edge ring lift pins, where R is an integer greater than or equal to 3. An edge ring includes P grooves located on a bottom surface thereof, where P is an integer greater than or equal to R. A robot arm includes an end effector. A controller is configured to cause the optical sensor to sense a first position of the edge ring on the end effector; cause the robot arm to deliver the edge ring to a first center location on the edge ring lift pins; retrieve the edge ring from the edge ring lift pins; and cause the optical sensor to sense a second position of the edge ring on the end effector.

4. 发明公开

US20230241650A1 GAS SUPPLY DEVICE, SYSTEM HAVING A GAS SUPPLY DEVICE, AND PARTICLE BEAM APPARATUS HAVING A GAS DELIVERY DEVICE OR THE SYSTEM 审中-公开
公开(公告)号：US20230241650A1
公开(公告)日：2023-08-03
申请号：US18079071
申请日：2022-12-12
申请人： Carl Zeiss Microscopy GmbH
发明人： Andreas Schmaunz , Gero Walter , Bernd Stenke , Gerald Schmid
IPC分类号： B08B5/00 , H01J37/10 , H01J37/244 , H01J37/28
CPC分类号： B08B5/00 , H01J37/10 , H01J37/244 , H01J37/28 , H01J2237/006 , H01J2237/022 , H01J2237/2448 , H01J2237/24475 , H01J2237/024 , F16K31/06
摘要： A gas feed device includes a feed unit that feeds a gaseous state of a first precursor and/or a gaseous state of a second precursor, a first line device that conducts the gaseous state of the first precursor to the feed unit and a second line device that conducts the gaseous state of the second precursor to the feed unit. A first valve is arranged between the first line device and the feed unit. A second valve is arranged between the second line device and the feed unit. A control valve is connected to the first valve and is arranged between the first valve and the feed unit. The control valve is connected to the second valve and is arranged between the second valve and the feed unit. The first valve, the second valve and/or the control valve may be magnetic valve(s).

5. 发明授权

US11705252B2 Vacuum chamber arrangement for charged particle beam generator 有权
公开(公告)号：US11705252B2
公开(公告)日：2023-07-18
申请号：US17403849
申请日：2021-08-16
申请人： ASML Netherlands B.V.
发明人： Alexander Hendrik Vincent Van Veen , Willem Henk Urbanus , Marco Jan-Jaco Wieland
IPC分类号： H01J37/30 , G21K5/04 , G21K1/02 , H01J37/317 , H01J37/16 , H01J37/12
CPC分类号： G21K5/04 , G21K1/02 , H01J37/12 , H01J37/16 , H01J37/3007 , H01J37/3177 , H01J2237/002 , H01J2237/024 , H01J2237/0213 , H01J2237/0216 , H01J2237/0262 , H01J2237/032 , H01J2237/1207 , H01J2237/1215 , H01J2237/16 , H01J2237/1825 , H01J2237/30472
摘要： The disclosure relates to an electron-optical module of an electron-optical apparatus. The electron-optical module comprises a vacuum chamber, a high voltage shielding arrangement located within the vacuum chamber, and an aperture array configured to form a plurality of beamlets from an electron beam and located within the high voltage shielding arrangement. Wherein the electron-optical module can be configured to be removable from the electron-optical apparatus.

6. 发明申请

US20170213696A1 MULTI MODE SYSTEMS WITH RETRACTABLE DETECTORS 审中-公开
公开(公告)号：US20170213696A1
公开(公告)日：2017-07-27
申请号：US15414517
申请日：2017-01-24
申请人： APPLIED MATERIALS ISRAEL LTD.
发明人： Alon Litman , Efim Vinnitsky , Ofir Arzouan , Igor Petrov
IPC分类号： H01J37/244 , H01J37/20 , H01J37/28
CPC分类号： H01J37/244 , H01J37/145 , H01J37/20 , H01J37/28 , H01J2237/024 , H01J2237/032 , H01J2237/047 , H01J2237/2445 , H01J2237/24475 , H01J2237/2448
摘要： A method for evaluating a specimen includes positioning a detector in an inserted position in which a first distance between a tip of the detector and a plane extending along a surface of the specimen is less than a distance between the plane and a tip of charged particle beam optics. While maintaining the detector at the inserted position, the surface of the specimen is scanned by a primary beam that exits from the tip of the charged particle beam optics. The detector detects x-ray photons and/or charged particles emitted or reflected from the specimen as a result of scanning the specimen with the primary beam. After completion of the scanning, the detector is positioned at a retracted position in which a second distance between the tip of the detector and the plane exceeds a distance between the tip of the charged particle beam optics and the plane.

7. 发明授权

US09653260B2 High throughput TEM preparation processes and hardware for backside thinning of cross-sectional view lamella 有权
公开(公告)号：US09653260B2
公开(公告)日：2017-05-16
申请号：US13691270
申请日：2012-11-30
申请人： FEI Company
发明人： Paul Keady , Brennan Peterson , Guus Das , Craig Henry , Larry Dworkin , Jeff Blackwood , Stacey Stone , Michael Schmidt
IPC分类号： G01N1/32 , H01J37/305 , C23C14/58 , H01J37/28 , H01J37/30
CPC分类号： H01J37/3056 , C23C14/5833 , G01N1/32 , H01J37/20 , H01J37/28 , H01J37/3005 , H01J2237/024 , H01J2237/20207 , H01J2237/31745 , H01J2237/31749
摘要： A method for TEM sample preparation and analysis that can be used in a FIB-SEM system without re-welds, unloads, user handling of the lamella, or a motorized flip stage. The method allows a dual beam FIB-SEM system with a typical tilt stage to be used to extract a sample to from a substrate, mount the sample onto a TEM sample holder capable of tilting, thin the sample using FIB milling, and rotate the sample so that the sample face is perpendicular to an electron column for STEM imaging.

8. 发明授权

US09583303B2 Aligning a featureless thin film in a TEM 有权
标题翻译：在TEM中对齐无特征薄膜
公开(公告)号：US09583303B2
公开(公告)日：2017-02-28
申请号：US14878513
申请日：2015-10-08
申请人： FEI Company
发明人： Bart Buijsse , Gijs van Duinen
IPC分类号： H01J37/26 , H01J37/02 , H01J37/153
CPC分类号： H01J37/023 , H01J37/153 , H01J37/26 , H01J37/261 , H01J2237/024 , H01J2237/1532 , H01J2237/1534 , H01J2237/2602 , H01J2237/2614
摘要： When preparing a Hole-Free Phase Plates (HFPP) a preferably featureless thin film should be placed with high accuracy in the diffraction plane of the TEM, or a plane conjugate to it. Two methods for accurately placing the thin film in said plane are described. One method uses a Ronchigram of the thin film while the TEM is in imaging mode, and the magnification of the Ronchigram is tuned so that the magnification in the middle of the Ronchigram is infinite. The second method uses electrons scattered by the thin film while the TEM is in diffraction mode. When the thin film does not coincide with the diffraction plane, electrons scattered by the thin film seem to originate from another location than the cross-over of the zero beam. This is observed as a halo. The absence of the halo is proof that the thin film coincides with the diffraction plane.
摘要翻译：当准备无孔相板（HFPP）时，应该在TEM的衍射平面或与其共轭的平面上以高精度放置优选无特征薄膜。描述了将薄膜准确地放置在所述平面中的两种方法。当TEM处于成像模式时，一种方法使用薄膜的Ronchigram，并且调整Ronchigram的放大倍率，使得Ronchigram中间的放大倍率是无穷大的。第二种方法是在TEM处于衍射模式时使用由薄膜散射的电子。当薄膜与衍射平面不一致时，由薄膜散射的电子似乎源自与零光束交叉的另一位置。这被观察为光环。光晕的不存在证明薄膜与衍射平面重合。

9. 发明申请

US20150371857A1 LOWER DOSE RATE ION IMPLANTATION USING A WIDER ION BEAM 有权
标题翻译：使用更宽的离子束降低剂量离子植入
公开(公告)号：US20150371857A1
公开(公告)日：2015-12-24
申请号：US14312617
申请日：2014-06-23
申请人： Advanced Ion Beam Technology, Inc.
发明人： Zhimin WAN , Rekha PADMANABHAN , Xiao BAI , Gary N. CAI , Ching-I LI , Ger-Pin LIN , Shao-Yu HU , David HOGLUND , Robert E. KAIM , Kourosh SAADATMAND
IPC分类号： H01L21/265
CPC分类号： H01J37/08 , H01J37/3171 , H01J2237/024 , H01J2237/0835 , H01J2237/303 , H01J2237/30477
摘要： In an exemplary process for lower dose rate ion implantation of a work piece, an ion beam may be generated using an ion source and an extraction manipulator. The extraction manipulator may be positioned at a gap distance from an exit aperture of the ion source. A current of the ion beam exiting the extraction manipulator may be maximized when the extraction manipulator is positioned at an optimal gap distance from the exit aperture. The gap distance at which the extraction manipulator is positioned from the exit aperture may differ from the optimal gap distance by at least 10 percent. A first potential may be applied to a first set of electrodes. An x-dimension of the ion beam may increase as the ion beam passes through the first set of electrodes. The work piece may be positioned in the ion beam to implant ions into the work piece.
摘要翻译：在用于工件的较低剂量率离子注入的示例性过程中，可以使用离子源和提取操纵器来产生离子束。提取操纵器可以位于离离子源的出口孔的间隙距离处。当提取操纵器定位在与出射孔的最佳间隙距离处时，离开提取操纵器的离子束的电流可以最大化。提取操纵器从出口孔定位的间隙距离可以不同于最佳间隙距离至少10％。可以将第一电位施加到第一组电极。当离子束通过第一组电极时，离子束的x维度可能增加。工件可以位于离子束中以将离子注入到工件中。

10. 发明申请

US20150321356A1 ENCLOSURE FOR A TARGET PROCESSING MACHINE 审中-公开
标题翻译：目标加工机的外壳
公开(公告)号：US20150321356A1
公开(公告)日：2015-11-12
申请号：US14705928
申请日：2015-05-06
申请人： Mapper Lithography IP B.V.
发明人： Joep Gerard Vijverberg , Laurens Vincent Plandsoen , Bas van Gelder , Guido de Boer , Michel Pieter Dansberg
IPC分类号： B25J11/00 , G03F9/00
CPC分类号： B25J11/00 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F9/7096 , H01J37/16 , H01J37/3177 , H01J2237/024 , H01J2237/166 , H01L21/6719 , H01L21/67225 , H01L21/67775
摘要： The invention relates to an assembly for enclosing a target processing machine. The assembly comprises an enclosure and a transfer unit. The enclosure comprises a base plate for arranging said target processing machine thereon, side wall panels, which are fixed to said base plate, and a top wall panel which is fixed to said side wall panels. In addition, the enclosure comprises an access opening in a side wall of the enclosure. The transfer unit comprising one or more transfer elements for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.
摘要翻译：本发明涉及用于封闭目标加工机器的组件。组件包括外壳和转移单元。外壳包括用于在其上布置所述目标加工机的基板，固定到所述基板的侧壁板和固定到所述侧壁板的顶壁板。此外，外壳包括在外壳的侧壁中的进入开口。转印单元包括用于相对于基板移动转印单元的一个或多个转印元件。传送单元还包括门板，其被布置成用于关闭进入开口，其中门板通过柔性联接件可移动地安装到传送单元，该柔性联接器允许门板相对于传送单元至少移动在朝向和/或远离外壳的方向上。

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