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1. 发明申请

US20080213496A1 Method of coating semiconductor processing apparatus with protective yttrium-containing coatings 审中-公开
标题翻译：用保护性钇涂层涂覆半导体处理装置的方法
公开(公告)号：US20080213496A1
公开(公告)日：2008-09-04
申请号：US11890221
申请日：2007-08-02
申请人： Jennifer Y. Sun , Shun Jackson Wu , Senh Thach , Ananda Kumar , Robert W. Wu , Hong Wang , Yixing Lin , Clifford C. Stow , Jim Dempster , Li Xu , Kenneth S. Collins , Ren-Guan Duan , Thomas Graves , Xiaoming He , Jie Yuan
发明人： Jennifer Y. Sun , Shun Jackson Wu , Senh Thach , Ananda Kumar , Robert W. Wu , Hong Wang , Yixing Lin , Clifford C. Stow , Jim Dempster , Li Xu , Kenneth S. Collins , Ren-Guan Duan , Thomas Graves , Xiaoming He , Jie Yuan
IPC分类号： C23C4/10 , C23C14/34
CPC分类号： C23C28/042 , C23C4/11 , C23C4/18 , C23C16/4404
摘要： Methods of applying specialty ceramic materials to semiconductor processing apparatus, where the specialty ceramic materials are resistant to halogen-comprising plasmas. The specialty ceramic materials contain at least one yttrium oxide-comprising solid solution. Some embodiments of the specialty ceramic materials have been modified to provide a resistivity which reduces the possibility of arcing within a semiconductor processing chamber.
摘要翻译：将特种陶瓷材料应用于半导体加工设备的方法，其中特种陶瓷材料耐卤素等离子体。特种陶瓷材料含有至少一种含氧化钇的固溶体。已经修改了特种陶瓷材料的一些实施例以提供降低半导体处理室内的电弧的可能性的电阻率。

2. 发明授权

US08067067B2 Clean, dense yttrium oxide coating protecting semiconductor processing apparatus 有权
标题翻译：清洁，致密的氧化钇涂层保护半导体加工设备
公开(公告)号：US08067067B2
公开(公告)日：2011-11-29
申请号：US10898113
申请日：2004-07-22
申请人： Jennifer Y. Sun , Senh Thach , Jim Dempster , Li Xu
发明人： Jennifer Y. Sun , Senh Thach , Jim Dempster , Li Xu
IPC分类号： C23C16/00 , C23C4/00 , C23C4/10 , C23C4/06 , C23C4/04 , C23C4/08 , C23C16/08 , C23F1/00 , H01L21/306 , B05D1/08 , B05D1/02 , B05D1/32 , B05D1/36 , H05H1/26 , H05H1/52
CPC分类号： C30B35/00 , C23C4/11 , C23C4/18 , C23C14/00 , C23C16/4404 , C23C28/042 , Y10S134/902 , Y10T428/26
摘要： Disclosed herein is a method for applying plasma-resistant coatings for use in semiconductor processing apparatus. The coatings are applied over a substrate which typically comprises an aluminum alloy of the 2000 series or the 5000 through 7000 series. The coating typically comprises an oxide or a fluoride of Y, Sc, La, Ce, Eu, Dy, or the like, or yttrium-aluminum-garnet (YAG). The coating may further comprise about 20 volume % or less of Al2O3. The coatings are typically applied to a surface of an aluminum alloy substrate or an anodized aluminum alloy substrate using a technique selected from the group consisting of thermal/flame spraying, plasma spraying, sputtering, and chemical vapor deposition (CVD). To provide the desired corrosion resistance, it is necessary to place the coating in compression. This is accomplished by controlling deposition conditions during application of the coating.
摘要翻译：本文公开了一种用于施加用于半导体处理装置的耐等离子体涂层的方法。将涂层施加在通常包括2000系列或5000至7000系列的铝合金的基底上。涂层通常包含Y，Sc，La，Ce，Eu，Dy等的氧化物或氟化物，或钇 - 铝 - 石榴石（YAG）。涂层可以进一步包含约20体积％或更少的Al 2 O 3。涂层通常使用选自热/火焰喷涂，等离子喷涂，溅射和化学气相沉积（CVD）的技术施加到铝合金基板或阳极氧化铝合金基板的表面上。为了提供所需的耐腐蚀性，必须将涂层置于压缩状态。这是通过在施加涂层期间控制沉积条件来实现的。

3. 发明申请

US20050037193A1 Clean, dense yttrium oxide coating protecting semiconductor processing apparatus 有权
标题翻译：清洁，致密的氧化钇涂层保护半导体加工设备
公开(公告)号：US20050037193A1
公开(公告)日：2005-02-17
申请号：US10898113
申请日：2004-07-22
申请人： Jennifer Sun , Senh Thach , Jim Dempster , Li Xu
发明人： Jennifer Sun , Senh Thach , Jim Dempster , Li Xu
IPC分类号： C23C16/44 , C23C28/00 , B32B15/04
CPC分类号： C30B35/00 , C23C4/11 , C23C4/18 , C23C14/00 , C23C16/4404 , C23C28/042 , Y10S134/902 , Y10T428/26
摘要： Disclosed herein is a method for applying plasma-resistant coatings for use in semiconductor processing apparatus. The coatings are applied over a substrate which typically comprises an aluminum alloy of the 2000 series or the 5000 through 7000 series. The coating typically comprises an oxide or a fluoride of Y, Sc, La, Ce, Eu, Dy, or the like, or yttrium-aluminum-garnet (YAG). The coating may further comprise about 20 volume % or less of Al2O3. The coatings are typically applied to a surface of an aluminum alloy substrate or an anodized aluminum alloy substrate using a technique selected from the group consisting of thermal/flame spraying, plasma spraying, sputtering, and chemical vapor deposition (CVD). To provide the desired corrosion resistance, it is necessary to place the coating in compression. This is accomplished by controlling deposition conditions during application of the coating.
摘要翻译：本文公开了一种用于施加用于半导体处理装置的耐等离子体涂层的方法。将涂层施加在通常包括2000系列或5000至7000系列的铝合金的基底上。涂层通常包含Y，Sc，La，Ce，Eu，Dy等的氧化物或氟化物，或钇 - 铝 - 石榴石（YAG）。涂层可以进一步包含约20体积％或更少的Al 2 O 3。涂层通常使用选自热/火焰喷涂，等离子喷涂，溅射和化学气相沉积（CVD）的技术施加到铝合金基板或阳极氧化铝合金基板的表面上。为了提供所需的耐腐蚀性，必须将涂层置于压缩状态。这是通过在施加涂层期间控制沉积条件来实现的。

4. 发明授权

US06729884B1 E-Critter game for teaching personal values and financial responsibility to a child 失效
标题翻译： E-Critter游戏，为儿童教授个人价值观和财务责任
公开(公告)号：US06729884B1
公开(公告)日：2004-05-04
申请号：US10015057
申请日：2001-11-13
申请人： Patricia Kelton , Tom Gomoll , Tim A. Priebe , Jim Dempster , Matthew Aaron Marcus
发明人： Patricia Kelton , Tom Gomoll , Tim A. Priebe , Jim Dempster , Matthew Aaron Marcus
IPC分类号： G09B1900
CPC分类号： G09B23/28
摘要： An Internet-based game for teaching personal values and financial responsibility to a child includes interactive game events, an adventure story activity with selectable story elements, a scoring system awarding a virtual collectible creature having artificial intelligence characteristics and characteristics mimicking a financial instrument, and indicia of account information.
摘要翻译：用于教授个人价值观和对孩子的财务责任的基于互联网的游戏包括交互式游戏活动，具有可选故事元素的冒险故事活动，奖励具有模仿金融工具的人造智能特征和特征的虚拟可收集生物的评分系统以及标记的帐户信息。

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