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1. 发明授权

US08253123B2 Method and device for generating EUV radiation or soft X-rays with enhanced efficiency 有权
标题翻译：用于产生EUV辐射或软X射线的提高效率的方法和装置
公开(公告)号：US08253123B2
公开(公告)日：2012-08-28
申请号：US13139601
申请日：2009-12-09
申请人： Jeroen Jonkers , Felix A. Kuepper , Harald E. Verbraak , Jakob W. Neff
发明人： Jeroen Jonkers , Felix A. Kuepper , Harald E. Verbraak , Jakob W. Neff
IPC分类号： G01N21/00 , G01N21/33 , H05G2/00 , G01J3/10
CPC分类号： H05G2/003 , H05G2/005
摘要： The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6) which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device at least two consecutive pulses (9, 18) are applied within a time interval of each electrical discharge onto said surface(s). With this measure, the collectable conversion efficiency is increased compared to the use of only one single energy pulse within each electrical discharge.
摘要翻译：本发明涉及通过电动放电产生光辐射，特别是EUV辐射或软X射线的方法和装置。等离子体（15）在至少两个电极（1,2）之间的气态介质中点燃，其中所述气体介质至少部分地由施加到移动的一个或多个表面的液体材料（6）产生在放电空间中并且被一个或多个脉冲能量束至少部分蒸发。在所提出的方法和装置中，在每个放电到所述表面的时间间隔内施加至少两个连续脉冲（9,18）。通过这种措施，与在每次放电期间仅使用一个单个能量脉冲相比，可收集的转换效率提高。

2. 发明申请

US20090250638A1 EUV PLASMA DISCHARGE LAMP WITH CONVEYOR BELT ELECTRODES 有权
标题翻译：带输送带皮带电极的EUV等离子体放电灯
公开(公告)号：US20090250638A1
公开(公告)日：2009-10-08
申请号：US12439696
申请日：2007-08-29
申请人： Jeroen Jonkers , Jacob Willi Neff , Ralf Pruemmer
发明人： Jeroen Jonkers , Jacob Willi Neff , Ralf Pruemmer
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005
摘要： The present invention relates to a plasma discharge lamp for generating EUV radiation and/or soft X-rays by means of an electrically operated discharge. The proposed lamp comprises at least two electrodes arranged in a discharge space at a distance from one another to form a gap which allows the ignition of a plasma (14) in a gaseous medium between said electrodes. A metal applying device applies a metal to a surface of said electrodes. The electrodes are formed of conveyer belts (15) driven to transport the metal to said gap, wherein for each of the electrodes a shaper element (13) is provided at the gap to ensure a proper form and distance of the electrodes at the gap. An energy beam device (4) is adapted to direct an energy beam onto at least one of said surfaces in the gap evaporating said applied metal at least partially thereby producing said gaseous medium. With the proposed plasma discharge lamp high input powers can be achieved at a compact design of the lamp.
摘要翻译：本发明涉及一种用于通过电动放电产生EUV辐射和/或软X射线的等离子体放电灯。所提出的灯包括布置在彼此间隔一定距离的放电空间中的至少两个电极，以形成允许在所述电极之间的气态介质中的等离子体（14）点火的间隙。金属施加装置将金属施加到所述电极的表面。电极由驱动以将金属输送到所述间隙的输送带（15）形成，其中对于每个电极，在间隙处设置成形元件（13），以确保电极在间隙处的适当形式和距离。能量束装置（4）适于将能量束引导到间隙中的至少一个所述表面中，至少部分地蒸发所述施加的金属，从而产生所述气体介质。利用所提出的等离子体放电灯，可以在灯的紧凑设计下实现高输入功率。

3. 发明申请

US20090206279A1 Method and Device for Removing Particles Generated by Means of a Radiation Source During Generation of Short-Wave Radiation 有权
标题翻译：用于在短波辐射产生期间通过辐射源产生的颗粒去除颗粒的方法和装置
公开(公告)号：US20090206279A1
公开(公告)日：2009-08-20
申请号：US10599345
申请日：2005-03-18
申请人： Jeroen Jonkers , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
发明人： Jeroen Jonkers , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
IPC分类号： A61N5/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908
摘要： A method for removing contaminant particles (14), such as atoms, molecules, clusters, ions, and the like, produced by means of a radiation source (10) during generation of short-wave radiation (12) having a wavelength of up to approximately 20 nm, by means of a first gas (22) guided at high mass throughput between the radiation source (10) and a particle trap (20) arranged in a wall (16) of a mirror chamber (18) is described that can be used for a lithography device or a microscope. In order to protect an optical device and/or articles to he irradiated against contamination, the method is designed such that a second gas (24) is introduced into the mirror chamber (18) and its pressure is adjusted such that it is at least as high as the pressure of the first gas (22).
摘要翻译：一种用于去除在产生短波辐射（12）期间通过辐射源（10）产生的污染物颗粒（14）的方法，例如原子，分子，簇，离子等，其具有波长直至描述了通过在辐射源（10）和布置在反射镜腔（18）的壁（16）中的颗粒捕获器（20）之间以高质量通量引导的第一气体（22）的大约20nm，其可以用于光刻设备或显微镜。为了保护光学装置和/或物品以照射到污染物上，该方法被设计成使得第二气体（24）被引入反射镜室（18）中，并且调节其压力使其至少等于作为第一气体（22）的压力高。

4. 发明申请

US20090168967A1 METHOD AND APPARATUS FOR GENERATING RADIATION IN THE WAVELENGTH RANGE FROM ABOUT 1 NM TO ABOUT 30 NM, AND USE IN A LITHOGRAPHY DEVICE OR IN METROLOGY 有权
标题翻译：用于在从1海里至约30海里的波长范围内产生辐射的方法和装置，以及在地平线设备中或在地质学中的使用
公开(公告)号：US20090168967A1
公开(公告)日：2009-07-02
申请号：US11719881
申请日：2005-11-18
申请人： Jeroen Jonkers , Dominik Marcel Vaudrevange
发明人： Jeroen Jonkers , Dominik Marcel Vaudrevange
IPC分类号： H05G2/00
CPC分类号： H05G2/003
摘要： A description is given of a method and an apparatus for generating radiation (12) in the wavelength range from about 1 nm to about 30 nm by means of an electrically operated discharge, which can be used in lithography or in metrology. Use is made of at least one first electrode (14) and at least one second electrode (16) at a distance therefrom, wherein at least one working gas (22) is provided between the electrodes (14, 16). A plasma is ignited in the working gas (22), the generated radiation (12) of which plasma is forwarded via a first opening (30) for further use, and wherein debris particles (28) are produced in at least one region (26) of at least one of the electrodes (14, 16). In order to retain the debris particles (28), the method is configured such that at least the region (26) is arranged with respect to the first opening (30) in such a way that the movement paths (32) of the debris particles (28) run at least predominantly outside an area delimited by the first opening (30).
摘要翻译：给出了一种用于通过电动放电产生辐射（12）的方法和装置，该辐射（12）可以用于光刻或计量学中，其范围为约1nm至约30nm。使用由至少一个第一电极（14）和至少一个第二电极（16）构成，其中至少一个工作气体（22）设置在电极（14,16）之间。等离子体在工作气体（22）中被点燃，所产生的辐射（12）等离子体经由第一开口（30）进一步使用，并且其中碎片颗粒（28）在至少一个区域（26 ）至少一个电极（14,16）。为了保持碎屑颗粒（28），该方法被构造成使得至少区域（26）相对于第一开口（30）布置成使得碎屑颗粒的运动路径（32）（28）至少主要在由所述第一开口（30）限定的区域的外部延伸。

5. 发明申请

US20080203325A1 Method of Protecting a Radiation Source Producing Euv-Radiation and/or Soft X-Rays Against Short Circuits 审中-公开
标题翻译：保护产生Euv辐射和/或软X射线的辐射源短路方法
公开(公告)号：US20080203325A1
公开(公告)日：2008-08-28
申请号：US11917198
申请日：2006-06-06
申请人： Dominik Marcel Vaudravange , Jeroen Jonkers
发明人： Dominik Marcel Vaudravange , Jeroen Jonkers
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005
摘要： The present invention relates to a method of protecting a radiation source producing extreme ultraviolet radiation (EUV) and/or soft X-rays against short circuits. The method applies to radiation sources producing said EUV-radiation and/or soft X-rays by means of an electrically operated discharge, which is ignited in a vapor between at least two electrodes (1, 2) in a discharge space, wherein said vapor is produced from a metal melt (6), which is applied to a surface in said discharge space and at least partially evaporated by an energy beam (9). Such a radiation source has one or several small gaps (17) between said electrodes (1, 2) and/or between components (4, 5) electrically connected to said electrodes (1, 2). These gaps (17) can cause short circuits when evaporated metal condenses there. In the present method during operation of the radiation source at least one surface bordering said gaps (17) and/or one or several protective elements (16, 18) covering said gaps (17) or arranged inside said gaps (17) are heated to a temperature at which the vapor pressure of said metal is high enough to evaporate metal material condensed on said surface or protective elements. With the present method the lifetime of the radiation source is extended.
摘要翻译：本发明涉及一种保护产生极紫外辐射（EUV）和/或软X射线的辐射源免于短路的方法。该方法适用于通过在放电空间中的至少两个电极（1,2）之间的蒸气中点燃的电操作放电产生所述EUV辐射和/或软X射线的辐射源，其中所述蒸气由金属熔体（6）制成，其被施加到所述放电空间中的表面并且被能量束（9）至少部分蒸发。这种辐射源在所述电极（1,2）之间和/或电连接到所述电极（1,2）的部件（4,5）之间具有一个或几个小间隙（17）。当蒸发的金属在那里冷凝时，这些间隙（17）可能导致短路。在本方法中，在辐射源的操作期间，覆盖所述间隙（17）和/或覆盖所述间隙（17）或布置在所述间隙（17）内的一个或多个保护元件（16,18）的至少一个表面被加热到所述金属的蒸汽压高到足以蒸发在所述表面上凝结的金属材料或保护元件的温度。利用本方法，辐射源的寿命延长。

6. 发明授权

US07397190B2 Gas discharge lamp for extreme UV radiation 有权
标题翻译：用于极紫外辐射的气体放电灯
公开(公告)号：US07397190B2
公开(公告)日：2008-07-08
申请号：US10536918
申请日：2003-11-28
申请人： Guenther Hans Derra , Joseph Robert Rene Pankert , Willi Neff , Klaus Bergmann , Jeroen Jonkers
发明人： Guenther Hans Derra , Joseph Robert Rene Pankert , Willi Neff , Klaus Bergmann , Jeroen Jonkers
IPC分类号： H01J61/09
CPC分类号： H05G2/003 , H01J61/09
摘要： The invention relates to a gas discharge lamp for EUV radiation with an anode (1) and a hollow cathode (2), wherein the hollow cathode (2) has at least two openings (3, 3′) and the anode (1) has a through hole (4), which is characterized in that the longitudinal axes (5, 5′) of the hollow cathode openings (3) have a common point of intersection S lying on the axis of symmetry (6) of the anode opening (4).
摘要翻译：本发明涉及一种用于具有阳极（1）和中空阴极（2）的EUV辐射的气体放电灯，其中中空阴极（2）具有至少两个开口（3,3'），阳极（1）具有一个通孔（4），其特征在于，中空阴极开口（3）的纵向轴线（5,5'）具有位于阳极开口（6）的对称轴线（6）上的公共交点S 4）。

7. 发明申请

US20060250599A1 Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method 有权
标题翻译：光刻投影装置，其中使用的反射器组件和装置制造方法
公开(公告)号：US20060250599A1
公开(公告)日：2006-11-09
申请号：US11482147
申请日：2006-07-07
申请人： Levinus Bakker , Jeroen Jonkers , Frank Schuurmans , Hugo Visser
发明人： Levinus Bakker , Jeroen Jonkers , Frank Schuurmans , Hugo Visser
IPC分类号： G03B27/54
CPC分类号： B82Y10/00 , G02B17/004 , G02B17/006 , G02B27/0043 , G03F7/70166 , G03F7/70175 , G03F7/70891 , G03F7/70916
摘要： A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.
摘要翻译：光刻投影设备包括反射器组件，反射器组件包括沿光轴方向延伸的第一和第二反射器，第一和第二反射器各自具有反射表面，背衬表面和入口部分分别为第一并且与所述光轴的距离为第二距离，所述第一距离大于所述第二距离，从所述光轴上的点导出的光线被所述第一反射器和所述第二反射器的入射部分切断并且在所述光轴的反射表面上被反射第一反射器并且在反射器之间限定高辐射强度区域和低辐射强度区域; 径向支撑构件，构造成支撑在低辐射强度区域中延伸的反射器，其中径向支撑构件在光轴的下游方向上产生阴影，并在光轴的上游方向上产生虚拟阴影; 以及放置在虚拟阴影中的结构。

8. 发明申请

US20110248192A1 METHOD AND DEVICE FOR GENERATING EUV RADIATION OR SOFT X-RAYS WITH ENHANCED EFFICIENCY 有权
标题翻译：用于产生具有增强效率的EUV辐射或软X射线的方法和装置
公开(公告)号：US20110248192A1
公开(公告)日：2011-10-13
申请号：US13139601
申请日：2009-12-09
申请人： Jeroen Jonkers , Felix Alexander Krepper , Harald Ernest Verbraak , Jakob Willi Neff
发明人： Jeroen Jonkers , Felix Alexander Krepper , Harald Ernest Verbraak , Jakob Willi Neff
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005
摘要： The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6) which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device at least two consecutive pulses (9, 18) are applied within a time interval of each electrical discharge onto said surface(s). With this measure, the collectable conversion efficiency is increased compared to the use of only one single energy pulse within each electrical discharge.
摘要翻译：本发明涉及通过电动放电产生光辐射，特别是EUV辐射或软X射线的方法和装置。等离子体（15）在至少两个电极（1,2）之间的气态介质中点燃，其中所述气体介质至少部分地由施加到移动的一个或多个表面的液体材料（6）产生在放电空间中并且被一个或多个脉冲能量束至少部分蒸发。在所提出的方法和装置中，在每个放电到所述表面的时间间隔内施加至少两个连续脉冲（9,18）。通过这种措施，与在每次放电期间仅使用一个单个能量脉冲相比，可收集的转换效率提高。

9. 发明申请

US20090206268A1 METHOD OF INCREASING THE CONVERSION EFFICIENCY OF AN EUV AND/OR SOFT X-RAY LAMP AND A CORRESPONDING APPARATUS 有权
标题翻译：提高EUV和/或软X射线灯转换效率的方法及相关装置
公开(公告)号：US20090206268A1
公开(公告)日：2009-08-20
申请号：US12300858
申请日：2007-05-08
申请人： Jeroen Jonkers , Dominik Marcel Vaudrevange
发明人： Jeroen Jonkers , Dominik Marcel Vaudrevange
IPC分类号： G01T1/18 , G01J3/10
CPC分类号： H05G2/003 , H05G2/005
摘要： The present invention relates to a method of increasing the conversion efficiency of an EUV and/or soft X-ray lamp, in which a discharge plasma (8) emitting EUV radiation or soft X-rays is generated in a gaseous medium formed by an evaporated liquid material in a discharge space, said liquid material being provided on a surface in the discharge space and being at least partially evaporated by an energy beam (9). The invention also refers to a corresponding apparatus for producing EUV radiation and/or soft X-rays. In the method, a gas (11) composed of chemical elements having a lower mass number than chemical elements of the liquid material is supplied through at least one nozzle (10) in a directed manner to the discharge space and/or to the liquid material on a supply path to the discharge space in order to reduce the density of the evaporated liquid material in the discharge space. With the present method and corresponding apparatus the conversion efficiency of the lamp is increased.
摘要翻译：本发明涉及一种提高EUV和/或软X射线灯的转换效率的方法，其中在由蒸发的形成的气体介质中产生发射EUV辐射或软X射线的放电等离子体（8）液体材料在放电空间中，所述液体材料设置在放电空间中的表面上，并被能量束（9）至少部分地蒸发。本发明还涉及用于产生EUV辐射和/或软X射线的相应装置。在该方法中，由具有比液体材料的化学元素低的质量数的化学元素构成的气体（11）通过至少一个喷嘴（10）以指向的方式供给到放电空间和/或液体材料在放电空间的供给路径上，以便减小放电空间中蒸发的液体材料的密度。利用本方法和相应的装置，灯的转换效率提高。

10. 发明申请

US20070090304A1 Method and apparatus for producing extreme ultraviolet radiation or soft x-ray radiation 有权
标题翻译：用于产生极紫外辐射或软X射线辐射的方法和装置
公开(公告)号：US20070090304A1
公开(公告)日：2007-04-26
申请号：US10570535
申请日：2004-09-01
申请人： Jeroen Jonkers , Dominik Vaudrevange , Willi Neff
发明人： Jeroen Jonkers , Dominik Vaudrevange , Willi Neff
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , H05G2/005
摘要： A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced. The gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).
摘要翻译：一种通过电操作的放电产生极紫外辐射（EUV）或软X射线辐射的方法，特别是用于EUV光刻或计量的方法，其中等离子体（22）在气体介质中点燃至少两个放电空间（12）中的电极（14,16），所述等离子体发射要产生的辐射。气体介质由金属熔体（24）产生，金属熔体（24）施加到所述放电空间（12）中的表面，并且至少部分地被能量束，特别是激光束（20）蒸发。

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