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1. 发明申请

US20090250638A1 EUV PLASMA DISCHARGE LAMP WITH CONVEYOR BELT ELECTRODES 有权
标题翻译：带输送带皮带电极的EUV等离子体放电灯
公开(公告)号：US20090250638A1
公开(公告)日：2009-10-08
申请号：US12439696
申请日：2007-08-29
申请人： Jeroen Jonkers , Jacob Willi Neff , Ralf Pruemmer
发明人： Jeroen Jonkers , Jacob Willi Neff , Ralf Pruemmer
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005
摘要： The present invention relates to a plasma discharge lamp for generating EUV radiation and/or soft X-rays by means of an electrically operated discharge. The proposed lamp comprises at least two electrodes arranged in a discharge space at a distance from one another to form a gap which allows the ignition of a plasma (14) in a gaseous medium between said electrodes. A metal applying device applies a metal to a surface of said electrodes. The electrodes are formed of conveyer belts (15) driven to transport the metal to said gap, wherein for each of the electrodes a shaper element (13) is provided at the gap to ensure a proper form and distance of the electrodes at the gap. An energy beam device (4) is adapted to direct an energy beam onto at least one of said surfaces in the gap evaporating said applied metal at least partially thereby producing said gaseous medium. With the proposed plasma discharge lamp high input powers can be achieved at a compact design of the lamp.
摘要翻译：本发明涉及一种用于通过电动放电产生EUV辐射和/或软X射线的等离子体放电灯。所提出的灯包括布置在彼此间隔一定距离的放电空间中的至少两个电极，以形成允许在所述电极之间的气态介质中的等离子体（14）点火的间隙。金属施加装置将金属施加到所述电极的表面。电极由驱动以将金属输送到所述间隙的输送带（15）形成，其中对于每个电极，在间隙处设置成形元件（13），以确保电极在间隙处的适当形式和距离。能量束装置（4）适于将能量束引导到间隙中的至少一个所述表面中，至少部分地蒸发所述施加的金属，从而产生所述气体介质。利用所提出的等离子体放电灯，可以在灯的紧凑设计下实现高输入功率。

2. 发明申请

US20140159581A1 METHOD AND DEVICE FOR GENERATING OPTICAL RADIATION BY MEANS OF ELECTRICALLY OPERATED PULSED DISCHARGES 有权
标题翻译：用于通过电动式脉冲放电产生光学辐射的方法和装置
公开(公告)号：US20140159581A1
公开(公告)日：2014-06-12
申请号：US14236936
申请日：2012-06-12
申请人： Ralf Pruemmer , Ralf Conrads , Klaus Bergmann , Felix Kuepper , Jeroen Jonkers
发明人： Ralf Pruemmer , Ralf Conrads , Klaus Bergmann , Felix Kuepper , Jeroen Jonkers
IPC分类号： H05G1/46 , H05G2/00
CPC分类号： H05G1/46 , H05G2/003 , H05G2/008
摘要： The present invention relates to a method and device for generating optical radiation (18), in particular EUV radiation or soft x-rays, by means of electrically operated discharges. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6), which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beam(s) (9). At least two consecutive pulses (16) are applied within a time interval of each electrical discharge onto said surface(s). The delay between and/or the pulse energy of said consecutive pulses is controlled to stabilize the position of an emission center of the plasma (15).
摘要翻译：本发明涉及通过电动放电产生光辐射（18），特别是EUV辐射或软X射线的方法和装置。等离子体（15）在至少两个电极（1,2）之间的气体介质中点燃，其中所述气体介质至少部分地由液体材料（6）产生，所述液体材料（6）施加到一个或多个表面，在放电空间中移动并且被一个或多个脉冲能量束（9）至少部分蒸发。在每个放电的时间间隔内，在所述表面上施加至少两个连续的脉冲（16）。所述连续脉冲之间的延迟和/或脉冲能量被控制以稳定等离子体（15）的发射中心的位置。

3. 发明授权

US09414476B2 Method and device for generating optical radiation by means of electrically operated pulsed discharges 有权
标题翻译：通过电动脉冲放电产生光辐射的方法和装置
公开(公告)号：US09414476B2
公开(公告)日：2016-08-09
申请号：US14236936
申请日：2012-06-12
申请人： Ralf Pruemmer , Ralf Conrads , Klaus Bergmann , Felix Kuepper , Jeroen Jonkers
发明人： Ralf Pruemmer , Ralf Conrads , Klaus Bergmann , Felix Kuepper , Jeroen Jonkers
IPC分类号： H05G1/46 , H05G2/00
CPC分类号： H05G1/46 , H05G2/003 , H05G2/008
摘要： The present invention relates to a method and device for generating optical radiation (18), in particular EUV radiation or soft x-rays, by means of electrically operated discharges. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6), which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beam(s) (9). At least two consecutive pulses (16) are applied within a time interval of each electrical discharge onto said surface(s). The delay between and/or the pulse energy of said consecutive pulses is controlled to stabilize the position of an emission center of the plasma (15).
摘要翻译：本发明涉及通过电动放电产生光辐射（18），特别是EUV辐射或软X射线的方法和装置。等离子体（15）在至少两个电极（1,2）之间的气体介质中点燃，其中所述气体介质至少部分地由液体材料（6）产生，所述液体材料（6）施加到一个或多个表面，在放电空间中移动并且被一个或多个脉冲能量束（9）至少部分蒸发。在每个放电的时间间隔内，在所述表面上施加至少两个连续的脉冲（16）。所述连续脉冲之间的延迟和/或脉冲能量被控制以稳定等离子体（15）的发射中心的位置。

4. 发明授权

US07897948B2 EUV plasma discharge lamp with conveyor belt electrodes 有权
标题翻译： EUV等离子放电灯带传送带电极
公开(公告)号：US07897948B2
公开(公告)日：2011-03-01
申请号：US12439696
申请日：2007-08-29
申请人： Jeroen Jonkers , Jakob Willi Neff , Ralf Pruemmer
发明人： Jeroen Jonkers , Jakob Willi Neff , Ralf Pruemmer
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005
摘要： The present invention relates to a plasma discharge lamp for generating EUV radiation and/or soft X-rays by means of an electrically operated discharge. The proposed lamp comprises at least two electrodes arranged in a discharge space at a distance from one another to form a gap which allows the ignition of a plasma (14) in a gaseous medium between said electrodes. A metal applying device applies a metal to a surface of said electrodes. The electrodes are formed of conveyer belts (15) driven to transport the metal to said gap, wherein for each of the electrodes a shaper element (13) is provided at the gap to ensure a proper form and distance of the electrodes at the gap. An energy beam device (4) is adapted to direct an energy beam onto at least one of said surfaces in the gap evaporating said applied metal at least partially thereby producing said gaseous medium. With the proposed plasma discharge lamp high input powers can be achieved at a compact design of the lamp.
摘要翻译：本发明涉及一种用于通过电动放电产生EUV辐射和/或软X射线的等离子体放电灯。所提出的灯包括布置在彼此间隔一定距离的放电空间中的至少两个电极，以形成允许在所述电极之间的气态介质中的等离子体（14）点火的间隙。金属施加装置将金属施加到所述电极的表面。电极由驱动以将金属输送到所述间隙的输送带（15）形成，其中对于每个电极，在间隙处设置成形元件（13），以确保电极在间隙处的适当形式和距离。能量束装置（4）适于将能量束引导到间隙中的至少一个所述表面中，至少部分地蒸发所述施加的金属，从而产生所述气体介质。利用所提出的等离子体放电灯，可以在灯的紧凑设计下实现高输入功率。

5. 发明申请

US20110248192A1 METHOD AND DEVICE FOR GENERATING EUV RADIATION OR SOFT X-RAYS WITH ENHANCED EFFICIENCY 有权
标题翻译：用于产生具有增强效率的EUV辐射或软X射线的方法和装置
公开(公告)号：US20110248192A1
公开(公告)日：2011-10-13
申请号：US13139601
申请日：2009-12-09
申请人： Jeroen Jonkers , Felix Alexander Krepper , Harald Ernest Verbraak , Jakob Willi Neff
发明人： Jeroen Jonkers , Felix Alexander Krepper , Harald Ernest Verbraak , Jakob Willi Neff
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005
摘要： The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6) which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device at least two consecutive pulses (9, 18) are applied within a time interval of each electrical discharge onto said surface(s). With this measure, the collectable conversion efficiency is increased compared to the use of only one single energy pulse within each electrical discharge.
摘要翻译：本发明涉及通过电动放电产生光辐射，特别是EUV辐射或软X射线的方法和装置。等离子体（15）在至少两个电极（1,2）之间的气态介质中点燃，其中所述气体介质至少部分地由施加到移动的一个或多个表面的液体材料（6）产生在放电空间中并且被一个或多个脉冲能量束至少部分蒸发。在所提出的方法和装置中，在每个放电到所述表面的时间间隔内施加至少两个连续脉冲（9,18）。通过这种措施，与在每次放电期间仅使用一个单个能量脉冲相比，可收集的转换效率提高。

6. 发明申请

US20090206268A1 METHOD OF INCREASING THE CONVERSION EFFICIENCY OF AN EUV AND/OR SOFT X-RAY LAMP AND A CORRESPONDING APPARATUS 有权
标题翻译：提高EUV和/或软X射线灯转换效率的方法及相关装置
公开(公告)号：US20090206268A1
公开(公告)日：2009-08-20
申请号：US12300858
申请日：2007-05-08
申请人： Jeroen Jonkers , Dominik Marcel Vaudrevange
发明人： Jeroen Jonkers , Dominik Marcel Vaudrevange
IPC分类号： G01T1/18 , G01J3/10
CPC分类号： H05G2/003 , H05G2/005
摘要： The present invention relates to a method of increasing the conversion efficiency of an EUV and/or soft X-ray lamp, in which a discharge plasma (8) emitting EUV radiation or soft X-rays is generated in a gaseous medium formed by an evaporated liquid material in a discharge space, said liquid material being provided on a surface in the discharge space and being at least partially evaporated by an energy beam (9). The invention also refers to a corresponding apparatus for producing EUV radiation and/or soft X-rays. In the method, a gas (11) composed of chemical elements having a lower mass number than chemical elements of the liquid material is supplied through at least one nozzle (10) in a directed manner to the discharge space and/or to the liquid material on a supply path to the discharge space in order to reduce the density of the evaporated liquid material in the discharge space. With the present method and corresponding apparatus the conversion efficiency of the lamp is increased.
摘要翻译：本发明涉及一种提高EUV和/或软X射线灯的转换效率的方法，其中在由蒸发的形成的气体介质中产生发射EUV辐射或软X射线的放电等离子体（8）液体材料在放电空间中，所述液体材料设置在放电空间中的表面上，并被能量束（9）至少部分地蒸发。本发明还涉及用于产生EUV辐射和/或软X射线的相应装置。在该方法中，由具有比液体材料的化学元素低的质量数的化学元素构成的气体（11）通过至少一个喷嘴（10）以指向的方式供给到放电空间和/或液体材料在放电空间的供给路径上，以便减小放电空间中蒸发的液体材料的密度。利用本方法和相应的装置，灯的转换效率提高。

7. 发明申请

US20070090304A1 Method and apparatus for producing extreme ultraviolet radiation or soft x-ray radiation 有权
标题翻译：用于产生极紫外辐射或软X射线辐射的方法和装置
公开(公告)号：US20070090304A1
公开(公告)日：2007-04-26
申请号：US10570535
申请日：2004-09-01
申请人： Jeroen Jonkers , Dominik Vaudrevange , Willi Neff
发明人： Jeroen Jonkers , Dominik Vaudrevange , Willi Neff
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , H05G2/005
摘要： A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced. The gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).
摘要翻译：一种通过电操作的放电产生极紫外辐射（EUV）或软X射线辐射的方法，特别是用于EUV光刻或计量的方法，其中等离子体（22）在气体介质中点燃至少两个放电空间（12）中的电极（14,16），所述等离子体发射要产生的辐射。气体介质由金属熔体（24）产生，金属熔体（24）施加到所述放电空间（12）中的表面，并且至少部分地被能量束，特别是激光束（20）蒸发。

8. 发明授权

US07170586B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07170586B2
公开(公告)日：2007-01-30
申请号：US11335681
申请日：2006-01-20
申请人： Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Jeroen Jonkers , Erik Roelof Loopstra
发明人： Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Jeroen Jonkers , Erik Roelof Loopstra
IPC分类号： G03B24/54
CPC分类号： G03F7/70008 , G03F7/7005
摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.
摘要翻译：光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，衬底台和投影系统。此外，光刻设备包括用于向照明系统提供EUV辐射的多个EUV源和布置成将来自每个EUV源的EUV辐射转换成中间辐射束的分配器。辐射的中间束通过镜面从第一方向从分配器引导。分配器可以包括旋转驱动的反射镜布置，旋转轴线不平行于镜面。

9. 发明授权

US07088424B2 Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method 有权
标题翻译：光刻投影装置，其中使用的反射器组件和装置制造方法
公开(公告)号：US07088424B2
公开(公告)日：2006-08-08
申请号：US11034260
申请日：2005-01-13
申请人： Levinus Pieter Bakker , Jeroen Jonkers , Frank Jeroen Pieter Schuurmans , Hugo Matthieu Visser
发明人： Levinus Pieter Bakker , Jeroen Jonkers , Frank Jeroen Pieter Schuurmans , Hugo Matthieu Visser
IPC分类号： G03B27/42
CPC分类号： B82Y10/00 , G02B17/004 , G02B17/006 , G02B27/0043 , G03F7/70166 , G03F7/70175 , G03F7/70891 , G03F7/70916
摘要： A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam of radiation provides the beam of radiation with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.
摘要翻译：光刻投影设备包括被配置成由辐射源发射的辐射形成辐射束的辐射系统，以及被配置为保持图案形成装置的支撑件，当图案形成装置被辐射束照射时，辐射束具有模式。衬底台被配置为保持衬底，并且投影系统被配置为将图案形成装置的照射部分成像到衬底的目标部分上。辐射系统还包括距离光轴一定距离处的孔，当从源观察时，放置在孔后面的反射器和放置在孔后面的低辐射密集区域中的结构。

10. 发明授权

US06683936B2 EUV-transparent interface structure 失效
标题翻译： EUV透明接口结构
公开(公告)号：US06683936B2
公开(公告)日：2004-01-27
申请号：US10124035
申请日：2002-04-17
申请人： Jeroen Jonkers
发明人： Jeroen Jonkers
IPC分类号： G21K500
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G03F7/70933
摘要： An EUV-transparent interface structure for optically linking a first closed chamber (80) and a second closed chamber (70) whilst preventing a contaminating flow of a medium and/or particles from one chamber to the other comprises an EUV-transparent member (60) in the form of a membrane (60) or a channel structure (100). An EUV-transparent (inert) gas (68) is forced to flow at the side of the member facing the source of contamination (LA; W) and towards the source of contamination to keep the contaminating particles away from the member (60; 100). The interface structure may be arranged between an EUV radiation source (LA) and the illuminator optics (IL) and/or between the projection system (PL) and the resist layer (RL) on top of a substrate (W) in a lithographic projection apparatus.
摘要翻译：用于光学连接第一封闭室（80）和第二封闭室（70）同时防止介质和/或颗粒从一个室到另一个室的污染流动的EUV透明界面结构包括EUV透明构件（60 ）以膜（60）或通道结构（100）的形式。 EUV透明（惰性）气体（68）被迫在面向污染源（LA; W）的构件的侧面流动并且朝向污染源流动，以使污染的颗粒远离构件（60; 100））。接口结构可以布置在EUV辐射源（LA）和照明器光学器件（IL）之间和/或投影系统（PL）和抗蚀剂层（RL）之间，在光刻投影仪器。

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